We report on the measurement of the fringe-to-substrate phase error in our Nanoruler system. This system utilizes scanning beam interference lithography to pattern and measure large-area, nanometer-accuracy gratings that are appropriate for semiconductor and integrated opto-electronic metrology. We present the Nanonruler’s metrology system that is based on digital frequency synthesizers, acousto-optics, and heterodyne phase sensing. It is used to assess the fringe-to-substrate placement stability and the accuracy of the feedback signals. The metrology system can perform measurements in real time, on the fly, and at arbitrary locations on the substrate. Experimental measurements are presented that demonstrate the nanometer-level repeatability of the system. Dominant error sources are highlighted.
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November 2003
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Papers from the 47th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
27-30 May 2003
Tampa, Florida (USA)
Research Article|
December 10 2003
Nanometer-level repeatable metrology using the Nanoruler
Paul T. Konkola;
Paul T. Konkola
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Carl G. Chen;
Carl G. Chen
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Ralf K. Heilmann;
Ralf K. Heilmann
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Chulmin Joo;
Chulmin Joo
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Juan C. Montoya;
Juan C. Montoya
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Chih-Hao Chang;
Chih-Hao Chang
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Mark L. Schattenburg
Mark L. Schattenburg
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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J. Vac. Sci. Technol. B 21, 3097–3101 (2003)
Article history
Received:
June 26 2003
Accepted:
July 21 2003
Citation
Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Juan C. Montoya, Chih-Hao Chang, Mark L. Schattenburg; Nanometer-level repeatable metrology using the Nanoruler. J. Vac. Sci. Technol. B 1 November 2003; 21 (6): 3097–3101. https://doi.org/10.1116/1.1610003
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