Surface passivation with organothiolated self-assembled monolayers (SAMs) that form chemical bonds with the InP surface is described. Indium phosphide surfaces coated with thiolated SAMs were characterized by Fourier-transform infrared spectroscopy, contact angle measurements, and Auger spectroscopy. The steady state photoluminescence of InP wafers increased by a factor of 14 as a result of this surface passivation method. A decrease by one to two orders of magnitude in the dark currents of interdigitated metal–semiconductor–metal diodes and p-i-n photodiodes was obtained. The option of using SAMs that are well-wetted by standard encapsulators such as polyimides and the thermal stability of the SAMs at the polymer’s curing temperatures open the way to achieve high quality passivation and encapsulation, even when the electronic devices contain negative slope sidewalls or undercut cavities.
Skip Nav Destination
Article navigation
January 2003
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
January 07 2003
Passivation of InP surfaces of electronic devices by organothiolated self-assembled monolayers
M. Schvartzman;
M. Schvartzman
Department of Chemical Engineering, Technion, Haifa, 3200, Israel
Search for other works by this author on:
V. Sidorov;
V. Sidorov
Department of Electrical Engineering, Technion, Haifa, 3200, Israel
Search for other works by this author on:
D. Ritter;
D. Ritter
Department of Electrical Engineering, Technion, Haifa, 3200, Israel
Search for other works by this author on:
Y. Paz
Y. Paz
Department of Chemical Engineering, Technion, Haifa, 3200, Israel
Search for other works by this author on:
J. Vac. Sci. Technol. B 21, 148–155 (2003)
Article history
Received:
July 30 2002
Accepted:
October 28 2002
Citation
M. Schvartzman, V. Sidorov, D. Ritter, Y. Paz; Passivation of InP surfaces of electronic devices by organothiolated self-assembled monolayers. J. Vac. Sci. Technol. B 1 January 2003; 21 (1): 148–155. https://doi.org/10.1116/1.1532026
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Filtering the beam from an ionic liquid ion source
Alexander C. G. Storey, Aydin Sabouri, et al.
Related Content
Improved morphology and charge carrier injection in pentacene field-effect transistors with thiol-treated electrodes
J. Appl. Phys. (December 2006)
Formation of extraordinary density alkanethiol self-assembled monolayers on surfaces of digitally photocorroded (001) GaAs/AlGaAs nanoheterostructures
Appl. Phys. Lett. (June 2021)
Regeneration of a thiolated and antibody functionalized GaAs (001) surface using wet chemical processes
Biointerphases (March 2016)
Fabrication of quantum dots using multicoated self-assembled monolayer
J. Vac. Sci. Technol. A (June 2010)
X-ray photoelectron spectroscopy study of self-assembled monolayers of alkanethiols on (001) GaAs
J. Vac. Sci. Technol. A (August 2006)