Surface passivation with organothiolated self-assembled monolayers (SAMs) that form chemical bonds with the InP surface is described. Indium phosphide surfaces coated with thiolated SAMs were characterized by Fourier-transform infrared spectroscopy, contact angle measurements, and Auger spectroscopy. The steady state photoluminescence of InP wafers increased by a factor of 14 as a result of this surface passivation method. A decrease by one to two orders of magnitude in the dark currents of interdigitated metal–semiconductor–metal diodes and p-i-n photodiodes was obtained. The option of using SAMs that are well-wetted by standard encapsulators such as polyimides and the thermal stability of the SAMs at the polymer’s curing temperatures open the way to achieve high quality passivation and encapsulation, even when the electronic devices contain negative slope sidewalls or undercut cavities.

1.
F. Bechstedt and R. Enderlein, Semiconductor Surfaces and Interfaces, Vol. 5 (Akademic-Verlag, Berlin, 1988).
2.
D. E.
Aspnes
,
Surf. Sci.
132
,
406
(
1983
).
3.
W. E.
Spicer
,
L.
Lindau
,
P.
Planetta
,
R. W.
Chye
, and
C. M.
Garner
,
Thin Solid Films
56
,
1
(
1979
).
4.
R. F.
Kopf
,
R. A.
Hamm
,
R. W.
Ryan
,
J.
Burm
,
A.
Tate
,
Y. K.
Chen
,
G.
Georgiou
,
D. V.
Lang
, and
F.
Ren
,
J. Electron. Mater.
27
,
954
(
1998
).
5.
R.
Driad
,
S. R.
Laframboise
,
Z. H.
Lu
,
S. P.
Mcalister
, and
W. R.
McKinnon
,
Solid-State Electron.
43
,
1445
(
1999
).
6.
T.
Kikawa
,
S.
Takatani
,
H.
Masuda
, and
T.
Tanoue
,
Jpn. J. Appl. Phys., Part 1
38
,
1195
(
1999
).
7.
C. J.
Sandroff
,
R. N.
Nottenburg
,
J.-C.
Bischoff
, and
R.
Bhat
,
Appl. Phys. Lett.
51
,
33
(
1987
).
8.
V. N.
Bessolov
and
M. V.
Lebedev
,
Semiconductors
32
,
1141
(
1998
).
9.
R.
Driad
,
Z. H.
Lu
,
S.
Charbonneau
,
W. R.
McKinnon
,
S.
Laframboise
,
P. J.
Poole
, and
S. P.
McAlister
,
Appl. Phys. Lett.
73
,
665
(
1998
).
10.
T.
Ohno
,
Phys. Rev. B
44
,
6306
(
1991
).
11.
C. J.
Spindt
and
W. E.
Spicer
,
Appl. Phys. Lett.
55
,
1653
(
1989
).
12.
A. M.
Green
and
W. E.
Spicer
,
J. Vac. Sci. Technol. A
11
,
1061
(
1993
).
13.
C. W.
Sheen
,
J.-X.
Shi
,
J.
Martensoon
,
A. N.
Parikh
, and
D. L.
Allara
,
J. Am. Chem. Soc.
114
,
1514
(
1992
).
14.
S. R.
Lunt
,
P. G.
Santangelo
, and
N. S.
Lewis
,
J. Vac. Sci. Technol. B
9
,
2333
(
1991
).
15.
S. R.
Lunt
,
G. N.
Ryba
,
P. G.
Santangelo
, and
N. S.
Lewis
,
J. Appl. Phys.
70
,
7449
(
1991
).
16.
Y.
Gu
,
Z.
Lin
,
R. A.
Butera
,
V. S.
Smentkowski
, and
D. H.
Waldeck
,
Langmuir
11
,
1849
(
1995
).
17.
H.
Yamamoto
,
R. A.
Butera
,
Y.
Gu
, and
H.
Waldeck
,
Langmuir
15
,
8640
(
1999
).
18.
Y.
Gu
,
K.
Kumar
,
Z.
Lin
,
I.
Read
,
M. B.
Zimmt
, and
D. H.
Waldeck
,
J. Photochem. Photobiol., A
105
,
189
(
1997
).
19.
K.
Mettler
,
Appl. Phys.
12
,
75
(
1977
).
20.
A. A.
Ketterson
,
J. W.
Seo
,
M. H.
Tong
,
K. L.
Nummila
,
J. J.
Morkuni
,
K. Y.
Cheng
,
S. M.
Kang
, and
I.
Adesida
,
IEEE Trans. Electron Devices
40
,
1406
(
1993
).
21.
V.
Diadiuk
,
S. H.
Groves
,
C. E.
Hurwitz
, and
G. W.
Iseler
,
IEEE J. Quantum Electron.
QE-17
,
260
(
1981
).
22.
O.
Zsebok
,
J. V.
Thordson
,
B.
Nilsson
, and
T. G.
Andersson
,
Nanotechnology
12
,
32
(
2001
).
23.
R.
Yeats
and
K.
Von Dessoneck
,
Appl. Phys. Lett.
44
,
145
(
1984
).
24.
D. H.
Lee
,
S. S.
Li
,
S.
Lee
, and
R. V.
Ramaswamy
,
IEEE Trans. Electron Devices
35
,
1695
(
1988
).
25.
V.
Sidorov
,
A.
Shai
,
D.
Ritter
, and
Y.
Paz
,
Surf. Coat. Technol.
122
,
214
(
1999
).
26.
M.
Schvartzman
,
V.
Sidorov
,
D.
Ritter
, and
Y.
Paz
,
Semicond. Sci. Technol.
16
,
L68
(
2001
).
27.
Y.
Gu
and
D. H.
Waldeck
,
J. Phys. Chem. B
102
,
9015
(
1998
).
28.
R. A.
Hamm
,
D.
Ritter
, and
H.
Temkin
,
J. Vac. Sci. Technol. A
12
,
2790
(
1994
).
29.
A. Ulman, An Introduction To Ultrathin Films: From Langmuir-Blodgett to Self Assembly (Academic, San Diego, 1991), pp. 292–298.
30.
V. N.
Bessolov
,
M. V.
Lebedev
,
N. M.
Binh
,
M.
Friedrich
, and
D. R. T.
Zanh
,
Semicond. Sci. Technol.
13
,
611
(
1998
).
31.
S.
Kollakowski
,
U.
Schade
,
E. H.
Bottcher
,
D.
Kuhi
,
D.
Bimberg
,
P.
Ambree
, and
K.
Wandel
,
J. Vac. Sci. Technol. B
14
,
1712
(
1996
).
32.
U.
Schade
,
S.
Kollakowski
,
E. H.
Bottcher
, and
D.
Bimberg
,
Appl. Phys. Lett.
64
,
1389
(
1994
).
33.
M. D.
Porter
,
T. B.
Bright
,
D. L.
Allara
, and
C. E. D.
Chidsey
,
J. Am. Chem. Soc.
109
,
3559
(
1987
).
34.
E.
Delamarche
,
B.
Michel
,
H.
Kang
, and
C.
Gerber
,
Langmuir
10
,
4103
(
1994
).
This content is only available via PDF.
You do not currently have access to this content.