The electrical properties, with emphasis on Schottky‐barrier height φB, of ideal (no interfacial oxide) contacts to GaAs have been measured for a diverse group of 14 metals by using current‐voltage and capacitance–voltage methods. The contact interfaces were formed under controlled ultrahigh vacuum conditions by metal evaporation onto clean (100) surfaces of both n‐type and p‐type GaAs. The range of φB for n‐type contacts is 0.96 to 0.62 eV in the decreasing order: Cu, Pd, Ag, Au, Al, Ti, Mn, Pb, Bi, Ni, Cr, Co, Fe, and Mg. For p‐type contacts, the φB range is 0.45 to 0.62 eV. No simple correlation is apparent between φB and contact metal work function nor between φB and the metal–GaAs interface chemistry.

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