Calixarene is a promising high-resolution negative electron-beam resist having a resolution of the order of 10 nm because of its low molecular weight. We have made a purified calixarene resist containing metal contaminants whose concentrations are measured in parts per billion and which therefore do not degrade the performance of silicon-based electron devices. The purity of the calixarene itself was also improved and we obtained high-purity calix[6]arene and high-purity calix[7]arene, both of which contain the main component, which is more than 95% of all the calixarene present. The resolution of both purified calixarene resists is almost the same as that of the unpurified calixarene, but the sensitivity of calix[7]arene is higher than that of calix[6]arene because its molecular weight is higher.
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November 2000
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Papers from the 44th international conference on electron, ion, and photon beam technology and nanofabrication
30 May-2 June 2000
Rancho Mirage, California, (USA)
Research Article|
November 01 2000
High-purity, ultrahigh-resolution calixarene electron-beam negative resist
Shoko Manako;
Shoko Manako
Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Yukinori Ochiai;
Yukinori Ochiai
Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Hiromasa Yamamoto;
Hiromasa Yamamoto
Tsukuba Research Center, Tokuyama Corp., 40 Wadai, Tsukuba 305-0024, Japan
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Takahiro Teshima;
Takahiro Teshima
Clariant Tokuyama Ltd., 7-38 Harumi-cho, Tokuyama 745-0024, Japan
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Jun-ichi Fujita;
Jun-ichi Fujita
Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Eiichi Nomura
Eiichi Nomura
Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305-8501, Japan
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Shoko Manako
Yukinori Ochiai
Hiromasa Yamamoto
Takahiro Teshima
Jun-ichi Fujita
Eiichi Nomura
Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba 305-8501, Japan
J. Vac. Sci. Technol. B 18, 3424–3427 (2000)
Article history
Received:
June 01 2000
Accepted:
August 29 2000
Citation
Shoko Manako, Yukinori Ochiai, Hiromasa Yamamoto, Takahiro Teshima, Jun-ichi Fujita, Eiichi Nomura; High-purity, ultrahigh-resolution calixarene electron-beam negative resist. J. Vac. Sci. Technol. B 1 November 2000; 18 (6): 3424–3427. https://doi.org/10.1116/1.1321274
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