The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) has recently been developed to provide the high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of a recently fabricated EUV 10×-reduction lithographic optical system is presented.
REFERENCES
1.
2.
3.
4.
K. A. Goldberg, Ph.D. dissertation, University of California, Berkeley, 1997.
5.
6.
7.
8.
9.
W. Linnik, Proceedings of the Academy of Science of the USSR, 1933, Vol. 1, p. 210.
10.
11.
12.
13.
14.
D. A. Tichenor et al., in OSA Proceedings on Soft X-Ray Projection Lithography, edited by A. M. Hawryluk and R. H. Stulen (Optical Society of America, Washington, DC, 1993), Vol. 18, p. 79.
15.
16.
17.
18.
This content is only available via PDF.
© 1999 American Vacuum Society.
1999
American Vacuum Society
You do not currently have access to this content.