At-wavelength interferometric measurements of recently fabricated extreme ultraviolet (EUV) microstepper projection optics have revealed the highest performance for prototype EUV lithographic systems observed to date. The phase-shifting point diffraction interferometer is used to measure and align these two-mirror, multilayer-coated Schwarzschild optical systems designed with a numerical aperture of 0.088 and operating at 13.4 nm wavelength. Root-mean-square wave front error magnitudes as small as 0.60 nm have been achieved, actually exceeding the design tolerance set for these objectives.

Topics
Wave forms, Diffraction optics, Fiber optics, Geometrical optics, Interferometry
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1999
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