Novel structures, in which an AlGaAs/GaAs modulation doped structure is overgrown on an underlying Be-implanted p-type region, are successfully fabricated using a system in which focused-ion-beam (FIB) implantation and molecular-beam epitaxy chambers are connected through a high vacuum tunnel. The two-dimensional electron gas (2DEG) at the heterointerface is well controlled by a voltage applied to the Be-FIB written backgate. Though Be out diffusion into the overgrown layer is observed, the sharp front of the out diffusion enables us to fabricate devices with a small separation between the 2DEG and p-type backgate. The three-dimensional hole gas (3DHG) formed by the Be-FIB implantation is used not only as a backgate but also for measuring the interaction between 2DEG and 3DHG.
Skip Nav Destination
,
Article navigation
July 1998
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Papers from the Japan/U.S. workshop on formation of ion nanobeams
16-20 Nov 1997
Osaka (Japan)
Research Article|
July 01 1998
AlGaAs/GaAs heterostructures grown on a focused-Be-ion-beam written backgate
Y. Hirayama;
Y. Hirayama
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-01, Japan
Search for other works by this author on:
T. Saku
T. Saku
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-01, Japan
Search for other works by this author on:
Y. Hirayama
T. Saku
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-01, Japan
J. Vac. Sci. Technol. B 16, 2543–2546 (1998)
Article history
Received:
November 17 1997
Accepted:
April 15 1998
Citation
Y. Hirayama, T. Saku; AlGaAs/GaAs heterostructures grown on a focused-Be-ion-beam written backgate. J. Vac. Sci. Technol. B 1 July 1998; 16 (4): 2543–2546. https://doi.org/10.1116/1.590206
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Exploring SiC CVD growth parameters compatible with remote epitaxy
Daniel J. Pennachio, Jenifer R. Hajzus, et al.
Related Content
Fabrication of a novel split‐backgate transistor by in situ focused ion‐beam lithography and molecular‐beam epitaxial regrowth
J. Vac. Sci. Technol. B (November 1993)
Transport properties of a two‐dimensional electron gas closely separated from an underlying n+ GaAs layer: The fabrication of independent ohmic contacts using molecular beam epitaxial regrowth and in situ focused ion beams
J. Vac. Sci. Technol. B (May 1993)
Fabrication of independent contacts to two closely spaced two‐dimensional electron gases using molecular beam epitaxy regrowth and in situ focused ion beam lithography
J. Vac. Sci. Technol. B (March 1994)
Patterned backgating using single-sided mask aligners: Application to density-matched electron-hole bilayers
J. Appl. Phys. (December 2008)
Large negative persistent photoconductivity in InAs ∕ AlSb quantum wells
Appl. Phys. Lett. (May 2005)