Studying the structural and photoluminescence properties of pseudomorphic and multiple quantum well (QW) structures on (001) Si substrates offer a quantitative characterization of the band gap and band offset shifts caused by C alloying for The main features of alloys, which are a reduced lattice constant and a strong lowering of the conduction band energy, promise that C may serve as a counterpart to Ge in Si heteroepitaxy. The photoluminescent properties of and SiGeC QWs are comparable to SiGe. Novel pseudomorphic coupled QW structures and quantum dot structures result in a strong enhancement of the photoluminescent efficiency. The ternary SiGeC material system offers a higher degree of freedom in strain and band edge engineering of structures. We focus on our recent results on and SiGeC QW layers embedded in Si concerning the growth by solid-source molecular beam epitaxy, structural properties, thermal stability, optical properties, and band offsets. The prospects of SiGeC alloys for realization of optoelectronic structures are discussed. First characteristics from 0.75 -channel modulation-doped field-effect transistor devices containing an active SiGeC layer demonstrate good electrical properties.
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May 1998
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Papers from the conference on silicon heterostructures: from physics to devices
16-19 September 1997
Barga, Tuscany (Italy)
Research Article|
May 01 1998
SiGeC: Band gaps, band offsets, optical properties, and potential applications Available to Purchase
K. Brunner;
K. Brunner
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
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O. G. Schmidt;
O. G. Schmidt
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
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W. Winter;
W. Winter
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
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K. Eberl;
K. Eberl
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
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M. Glück;
M. Glück
Daimler-Benz AG, Research Center, Wilhelm-Runge-Str. 11 D-89081 Ulm, Germany
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U. König
U. König
Daimler-Benz AG, Research Center, Wilhelm-Runge-Str. 11 D-89081 Ulm, Germany
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K. Brunner
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
O. G. Schmidt
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
W. Winter
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
K. Eberl
Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
M. Glück
Daimler-Benz AG, Research Center, Wilhelm-Runge-Str. 11 D-89081 Ulm, Germany
U. König
Daimler-Benz AG, Research Center, Wilhelm-Runge-Str. 11 D-89081 Ulm, Germany
J. Vac. Sci. Technol. B 16, 1701–1706 (1998)
Article history
Received:
November 10 1997
Accepted:
January 26 1998
Citation
K. Brunner, O. G. Schmidt, W. Winter, K. Eberl, M. Glück, U. König; SiGeC: Band gaps, band offsets, optical properties, and potential applications. J. Vac. Sci. Technol. B 1 May 1998; 16 (3): 1701–1706. https://doi.org/10.1116/1.590038
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