Vacuum microelectronics (VME) concerns the design and manufacture of vacuum devices and components built to sizes and tolerances similar to those found in solid state microelectronic devices. This technology is well suited for use in electron devices of commercial importance, particularly flat‐panel displays. The flat‐panel display industry is projected to have annual revenues measured in the tens of billions of dollars by the turn of the century. As opposed to conventional electron tubes that utilize cathodes based on thermionic emission, vacuum microelectronic devices principally utilize cold cathodes based on field‐electron emission. The introduction of field‐electron emission cathodes can yield unique device performance; however, attaining the level of reliability required for commercial applications requires addressing a host of challenging surface physics and chemistry problems. In this review we outline the surface‐science‐related issues of importance in VME. These issues cover a large realm of surface science ranging from adsorption/desorption phenomena, surface diffusion, surface passivation, and the deposition of overlayers to cathode bombardment, field‐electron current density limits, emission noise, low‐voltage phosphors, thin‐film growth, and voltage breakdown. As the field of VME is relatively new, many of these surface aspects have not been thoroughly investigated and many more remain to be identified.
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July 1995
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
July 01 1995
Surface‐science aspects of vacuum microelectronics Available to Purchase
P. R. Schwoebel;
P. R. Schwoebel
Physical Electronics Laboratory, SRI International, Menlo Park, California 94025
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I. Brodie
I. Brodie
Physical Electronics Laboratory, SRI International, Menlo Park, California 94025
Search for other works by this author on:
P. R. Schwoebel
Physical Electronics Laboratory, SRI International, Menlo Park, California 94025
I. Brodie
Physical Electronics Laboratory, SRI International, Menlo Park, California 94025
J. Vac. Sci. Technol. B 13, 1391–1410 (1995)
Article history
Received:
March 01 1995
Accepted:
April 23 1995
Citation
P. R. Schwoebel, I. Brodie; Surface‐science aspects of vacuum microelectronics. J. Vac. Sci. Technol. B 1 July 1995; 13 (4): 1391–1410. https://doi.org/10.1116/1.588219
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