Electron beam lithography and reactive ion etching have been used to fabricate four level aspheric reflecting focusing diffractive optical elements. A fast (f/2), 1 mm diam, four‐phase‐level, reflecting, off‐axis imaging diffractive optical element, without spherical aberration, coma, and astigmatism, has been fabricated on silicon. Alignment and stitching errors have been held to less than 40 nm and the smallest pattern feature is 0.6 μm. The silicon grating is coated with gold to enhance reflectivity with an efficiency of 73%. The quality of diffractive optical elements is limited by the fidelity of the fabrication steps, and methods are demonstrated for proximity effect correction, alignment, high selectivity mask creation, and reactive ion etching that can be used for high quality diffractive optic element fabrication of essentially arbitrary type.
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January 1994
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
January 01 1994
Fabrication of aspheric high numerical aperture reflective diffractive optic elements using electron beam lithography
D. Mikolas;
D. Mikolas
School of Applied and Engineering Physics and National Nanofabrication Facility, Cornell University, Ithaca, New York 14853
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R. Bojko;
R. Bojko
School of Applied and Engineering Physics and National Nanofabrication Facility, Cornell University, Ithaca, New York 14853
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H. G. Craighead;
H. G. Craighead
School of Applied and Engineering Physics and National Nanofabrication Facility, Cornell University, Ithaca, New York 14853
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F. Haas;
F. Haas
USAF Photonics Center, Rome Laboratory, Griffiss Air Force Base, New York 13441
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D. A. Honey;
D. A. Honey
USAF Photonics Center, Rome Laboratory, Griffiss Air Force Base, New York 13441
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H. F. Bare
H. F. Bare
USAF Photonics Center, Rome Laboratory, Griffiss Air Force Base, New York 13441
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J. Vac. Sci. Technol. B 12, 20–25 (1994)
Article history
Received:
May 24 1993
Accepted:
October 28 1993
Citation
D. Mikolas, R. Bojko, H. G. Craighead, F. Haas, D. A. Honey, H. F. Bare; Fabrication of aspheric high numerical aperture reflective diffractive optic elements using electron beam lithography. J. Vac. Sci. Technol. B 1 January 1994; 12 (1): 20–25. https://doi.org/10.1116/1.587185
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