A vertical stepper for synchrotron radiation (SR) x‐ray lithography has been developed. Evaluation tests have been done with SR light from the superconducting compact synchrotron ‘‘AURORA’’ located in SHI‐Tanashi Works, Tokyo. An overlay accuracy of less than 0.08 μm was obtained. A 0.2 μm line‐and‐space pattern was successfully resolved with a high‐aspect ratio. The designed specifications have been attained. The system is ready for the future generation ultra‐large‐scale integration applications.

Topics
Superconductivity, LSI circuits, Auroral phenomena, X-ray lithography, Synchrotron radiation, Plasmas
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© 1992 American Vacuum Society.
1992
American Vacuum Society
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