The work reported here elaborates on the emission of the secondary Te− ions from secondary ion mass spectrometry (SIMS) analysis of HgCdTe using a Cs+ primary ion beam. Investigations of numerous samples covering a wide compositional range showed excellent linear correlation between negative Te ion yield and Cd mole fraction. These led to the newly developed SIMS analytical method for measuring the changes in the composition of Hg1−xCdxTe with high sensitivity and depth resolution. A physical model describing the emission of secondary Te− ions is proposed. The results can be interpreted by considering the short range interaction between reactive Cs primary beam and the CdTe sublattice via a ‘‘harpoon’’ mechanism. The relevance of this method to the development of Hg1−xCdxTe was demonstrated on metalorganic chemical vapor deposition grown heterostructures.
Skip Nav Destination
Article navigation
July 1992
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
July 01 1992
Compositional analysis of HgCdTe epitaxial layers using secondary ion mass spectrometry
L. O. Bubulac;
L. O. Bubulac
Rockwell International Science Center, Thousand Oaks, California 91360
Search for other works by this author on:
D. D. Edwall;
D. D. Edwall
Rockwell International Science Center, Thousand Oaks, California 91360
Search for other works by this author on:
J. T. Cheung;
J. T. Cheung
Rockwell International Science Center, Thousand Oaks, California 91360
Search for other works by this author on:
C. R. Viswanathan
C. R. Viswanathan
University of California Los Angeles, Electrical Engineering Department, Los Angeles, California 90024
Search for other works by this author on:
J. Vac. Sci. Technol. B 10, 1633–1637 (1992)
Article history
Received:
October 10 1991
Accepted:
March 13 1992
Citation
L. O. Bubulac, D. D. Edwall, J. T. Cheung, C. R. Viswanathan; Compositional analysis of HgCdTe epitaxial layers using secondary ion mass spectrometry. J. Vac. Sci. Technol. B 1 July 1992; 10 (4): 1633–1637. https://doi.org/10.1116/1.586260
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Shiva Mudide, Nick Keller, et al.
Related Content
Dislocation reduction in HgCdTe on GaAs and Si
J. Vac. Sci. Technol. B (July 1992)
Effect of dislocations on the electrical and optical properties of long‐wavelength infrared HgCdTe photovoltaic detectors
J. Vac. Sci. Technol. B (July 1992)
Chemical doping of HgCdTe by molecular‐beam epitaxy
J. Vac. Sci. Technol. A (March 1990)
Metalorganic chemical vapor deposition growth of Cd1−yZnyTe epitaxial layers on GaAs and GaAs/Si substrates
J. Vac. Sci. Technol. A (March 1989)
Real-time mass spectroscopy of reflected fluxes during molecular beam epitaxy growth of HgCdTe
J. Vac. Sci. Technol. B (May 2008)