The results of detailed optical, electrical, and structural studies performed on a series of (211)B oriented HgTe–CdTe superlattices grown by photon assisted molecular‐beam epitaxy are reported. Higher order optical transitions in infrared (IR) photoluminescence (PL) spectra were observed for the first time in HgTe–CdTe superlattices. Low residual carrier concentrations were measured in undoped superlattices. Acceptor‐bound excitonic transitions were observed in IR PL spectra of an arsenic doped superlattice for the first time. Excess carrier lifetimes of several hundred nanoseconds were measured, approaching that observed in the corresponding alloy. These results represent significant improvement in the electrical quality of HgTe–CdTe superlattices, and is another step towards the realization of a superlattice‐based IR device technology.
Skip Nav Destination
Article navigation
July 1992
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
July 01 1992
Properties of (211)B HgTe–CdTe superlattices grown by photon assisted molecular‐beam epitaxy Available to Purchase
K. A. Harris;
K. A. Harris
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
Search for other works by this author on:
R. W. Yanka;
R. W. Yanka
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
Search for other works by this author on:
L. M. Mohnkern;
L. M. Mohnkern
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
Search for other works by this author on:
A. R. Reisinger;
A. R. Reisinger
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
Search for other works by this author on:
T. H. Myers;
T. H. Myers
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
Search for other works by this author on:
Z. Yang;
Z. Yang
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
Search for other works by this author on:
Z. Yu;
Z. Yu
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
Search for other works by this author on:
S. Hwang;
S. Hwang
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
Search for other works by this author on:
J. F. Schetzina
J. F. Schetzina
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
Search for other works by this author on:
K. A. Harris
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
R. W. Yanka
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
L. M. Mohnkern
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
A. R. Reisinger
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
T. H. Myers
Electronics Laboratory, General Electric Company, Syracuse, New York 13221
Z. Yang
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
Z. Yu
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
S. Hwang
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
J. F. Schetzina
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695‐8202
J. Vac. Sci. Technol. B 10, 1574–1581 (1992)
Article history
Received:
October 08 1991
Accepted:
March 17 1992
Citation
K. A. Harris, R. W. Yanka, L. M. Mohnkern, A. R. Reisinger, T. H. Myers, Z. Yang, Z. Yu, S. Hwang, J. F. Schetzina; Properties of (211)B HgTe–CdTe superlattices grown by photon assisted molecular‐beam epitaxy. J. Vac. Sci. Technol. B 1 July 1992; 10 (4): 1574–1581. https://doi.org/10.1116/1.586251
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Heating of photocathode via field emission and radiofrequency pulsed heating: Implication toward breakdown
Ryo Shinohara, Soumendu Bagchi, et al.
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
A. S. Stodolna, T. W. Mechielsen, et al.