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Current Issue
Volume 42,
Issue 2,
March 2024

Focus and Coverage

Journal of Vacuum Science & Technology B covers microelectronics and nanometer structures with an emphasis on processing, measurement, and phenomena associated with micrometer, nanometer structures and devices and vacuum science and technology.

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Editor's Picks
Research Article
Ryuta Tsukazaki (塚嵜 琉太), Haruhiro Naito (内藤 陽大) et al.
Plasma confinement was succeeded by an optoelectronic system with the aid of a vacuum ultraviolet (VUV) light source, called the photoemission-assisted plasma system. The photoemission-assisted ...
Research Article
Sylvester Amoah, Hryhorii Stanchu et al.
Ion implantation is widely used in the complementary metal–oxide–semiconductor process, which stimulates to study its role for doping control in rapidly emerging group IV Ge1−xSnx materials. We ...
Research Article
Jiechao Jiang, Nonso Martin Chetuya et al.
Two distinct ultra-thin Ge1−xSnx (x ≤ 0.1) epilayers were deposited on (001) Si substrates at 457 and 313 °C through remote plasma-enhanced chemical vapor deposition. These films are considered ...
Most Recent
Research Article
Ryuta Tsukazaki (塚嵜 琉太), Haruhiro Naito (内藤 陽大) et al.
Plasma confinement was succeeded by an optoelectronic system with the aid of a vacuum ultraviolet (VUV) light source, called the photoemission-assisted plasma system. The photoemission-assisted ...
Research Article
Emilia W. Hirsch, Dominik Metzler et al.
As feature sizes continue to shrink for more advanced nodes, local critical dimension (CD) uniformity (LCDU) control becomes more critical than ever for improving defectivity, edge placement error, ...
Erratum

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