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Current Issue
Volume 42,
Issue 5,
September 2024

Focus and Coverage

Journal of Vacuum Science & Technology B covers microelectronics and nanometer structures with an emphasis on processing, measurement, and phenomena associated with micrometer, nanometer structures and devices and vacuum science and technology.

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Editor's Picks
Research Article
C. R. Fasano, F. Cruz Aguirre et al.
As smaller critical dimensions of devices fabricated via electron-beam lithography (EBL) are achieved over large areas, the need for new metrology techniques follows. Large (cm × cm) ...
Research Article
W. Ethan Maguire, Bruce W. Smith
As extreme ultraviolet lithography tools with higher image numerical apertures (NAi) are introduced, the range of angles at the multilayer mask stack is also increased. Lithography systems are ...
Research Article
B. Claflin, G. J. Grzybowski et al.
GeSn films were simultaneously deposited on Si (100), Si (111), c-plane sapphire (Al2O3), and fused silica substrates to investigate the impact of the substrate on the resulting GeSn film. The ...
Most Recent
Research Article
Zhimeng Yu, Xiaolei Yang et al.
Metallization, plasma, and thermal annealing used in magneto-resistive random access memory integration differs significantly from traditional interconnection processes, usually resulting in the ...
Research Article
C. R. Fasano, F. Cruz Aguirre et al.
As smaller critical dimensions of devices fabricated via electron-beam lithography (EBL) are achieved over large areas, the need for new metrology techniques follows. Large (cm × cm) ...
Research Article
Abdulmecit Turut
The current-voltage (I-V-T) characteristics of an inhomogeneous n-type GaAs Schottky barrier diode have been investigated by numerical analysis using the modified thermionic emission (TE) current ...

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