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Journal of Vacuum Science & Technology B covers microelectronics and nanometer structures with an emphasis on processing, measurement, and phenomena associated with micrometer, nanometer structures and devices and vacuum science and technology.
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Research Article
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November 27 2024
Mattias Hausladen, Andreas Schels et al.
A CMOS image sensor is utilized to determine the time- and spatially resolved distribution of the total electron emission current of a silicon field emission array. The sensor measures electron ...
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November 07 2024
Shiyang Li, Shuhu Huan et al.
Submicrometer double-grooved gratings feature unique optical properties and diverse potential applications, most of which have been fabricated by electron beam lithography up till now. On the other ...
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November 04 2024
Yasser Pordeli, Céline Steenge et al.
Three-dimensional (3D) stacking of nano-devices is an effective method for increasing areal density, especially as downscaling of lateral device dimensions becomes impractical. This stacking is ...
Editor's Picks
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January 07 2025
Shiva Mudide, Nick Keller et al.
Accurate fabrication of high-aspect ratio (HAR) structures in applications from semiconductor devices to x-ray observatories is essential for their optimal performance because their performance ...
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December 17 2024
Ungdon Ham, Ji-Soo Yoon et al.
We present the design and implementation of an advanced manipulator system for use in low-temperature scanning tunneling microscope (STM) setups, specifically in an ultrahigh vacuum (UHV) chamber ...
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December 12 2024
Chen Tang, Toshiaki Tanaka et al.
The development of chemically amplified resists requires many experiments to optimize the chemical composition, which includes the type of monomer molecules and their component ratios, initiator ...
Most Recent
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January 13 2025
Shengzhou Huang, Dongjie Wu et al.
In this paper, an efficient approach to mask optimization for digital micromirror device lithography is proposed, leveraging an enhanced particle swarm optimization algorithm, which significantly ...
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January 10 2025
Amelia Turnquist, Naoyuki Kofuji et al.
To investigate the impact of plasma-induced stress on line wiggling, pattern deformation was compared with and without hardmask exposure to the plasma during etching of porous SiOCH (p-SiOCH) with ...
Research Article
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January 09 2025
C. J. Edgcombe, J. Huns
Further results from an earlier computation by density functional theory for the ground state of a capped (5,5) carbon nanotube in the zero applied field show details of (a) self-consistent charge ...
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Self-aligned fabrication of vertical, fin-based structures
Joshua Perozek, Tomás Palacios
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