Journal of Vacuum Science & Technology B

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Current Issue

Volume 42,

Issue 4,

July 2024

Focus and Coverage

Journal of Vacuum Science & Technology B covers microelectronics and nanometer structures with an emphasis on processing, measurement, and phenomena associated with micrometer, nanometer structures and devices and vacuum science and technology.

Editor-in-Chief

Eray Aydil

Editors

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Current Issue

Featured Articles

Research Article

| August 30 2024

Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?

Anthony Ayari, Pascal Vincent et al.

The performance of field emitters is usually analyzed by linear fitting of a Fowler–Nordheim plot. It has sometimes been observed that the fitted slopes and intercepts show a strong correlation, but ...

Research Article

| August 06 2024

Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications

A. S. Stodolna, T. W. Mechielsen et al.

Inside extreme-ultraviolet (EUV) lithography machines, a hydrogen plasma is generated by ionization of the background gas by EUV photons. This plasma is essential for preventing carbon build-up on ...

Review Article

| June 07 2024

Future of plasma etching for microelectronics: Challenges and opportunities

Gottlieb S. Oehrlein, Stephan M. Brandstadter et al.

Plasma etching is an essential semiconductor manufacturing technology required to enable the current microelectronics industry. Along with lithographic patterning, thin-film formation methods, and ...

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Editor's Picks

Research Article

| August 20 2024

Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates

B. Claflin, G. J. Grzybowski et al.

GeSn films were simultaneously deposited on Si (100), Si (111), c-plane sapphire (Al₂O₃), and fused silica substrates to investigate the impact of the substrate on the resulting GeSn film. The ...

Research Article

| August 19 2024

Effects of athermal carrier injection on Co-60 gamma-ray damage in SiC merged-PiN Schottky diodes

Jian-Sian Li, Chao-Ching Chiang et al.

Co-60 gamma irradiation of SiC merged-PiN Schottky (MPS) diodes up to fluences of 1 Mrad (Si) produces increases in both forward and reverse current, with less damage when the devices are biased ...

Research Article

| August 02 2024

Study of selected mild steels for application in vacuum systems of future gravitational wave detectors

Carlo Scarcia, Giuseppe Bregliozzi et al.

Next-generation gravitational wave detectors (GWDs) like the Cosmic Explorer and Einstein Telescope require extensive vacuum tubing, necessitating cost-effective materials. This study explores the ...

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Most Recent

Research Article

| September 04 2024

Structural, surface, and upconversion luminescence properties of pulsed laser-deposited Y₂O₃:Ho³⁺,Yb³⁺ thin films

Vhahangwele Makumbane, M. Y. A. Yagoub et al.

As a potential upconverting layer for solar cell applications, the effect of substrate temperature on the structural, surface, and upconversion (UC) properties of Y₂O₃:Ho³⁺,Yb³⁺ thin films was ...

Research Article

| August 30 2024

Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography

Qi Wang, Kuibo Wang et al.

Particle-caused reticle defects contribute to a profound effect on the final integrated circuit (IC) yield, posing a significant technological challenge in extreme ultraviolet (EUV) lithography. This ...

Research Article

| August 30 2024

Large-field and high-resolution low-voltage scanning electron microscopy with correction of beam-image-shift-induced chromatic deflection aberration

S. Kizawa, D. Bizen et al.

We present a chromatic deflection aberration-free beam-image-shifting technique for low-voltage scanning electron microscopy. The technique utilizes a Wien filter to correct the chromatic deflection ...

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