1-20 of 311 Search Results for

*

Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Ion track formation and porosity in InSb induced by swift heavy ion irradiation

Taleb Alwadi, Christian Notthoff, Shankar Dutt, Jessica Wierbik, Nahid Afrin, Alexander Kiy, Patrick Kluth
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063404 (2023)
https://doi.org/10.1116/6.0003007
Published: October 2023
View article titled, Ion track formation and porosity in InSb induced by swift heavy ion irradiation
Open the PDF for Ion track formation and porosity in InSb induced by swift heavy ion irradiation in another window
Journal Articles

Band-engineered LaFeO3–LaNiO3 thin film interfaces for electrocatalysis of water

Rajendra Paudel, Andricus R. Burton, Marcelo A. Kuroda, Byron H. Farnum, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063207 (2023)
https://doi.org/10.1116/6.0002987
Published: October 2023
View article titled, Band-engineered LaFeO<sub>3</sub>–LaNiO<sub>3</sub> thin film interfaces for electrocatalysis of water
Open the PDF for Band-engineered LaFeO<sub>3</sub>–LaNiO<sub>3</sub> thin film interfaces for electrocatalysis of water in another window
Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Femi Mathew, Nithin Poonkottil, Eduardo Solano, Dirk Poelman, Zeger Hens, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 060401 (2023)
https://doi.org/10.1116/6.0002993
Published: October 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline Ga<sub>2</sub>S<sub>3</sub> thin films
Open the PDF for Plasma-enhanced atomic layer deposition of crystalline Ga<sub>2</sub>S<sub>3</sub> thin films in another window
Includes: Supplementary data
Journal Articles

Evolution of β-Ga2O3 to γ-Ga2O3 solid-solution epitaxial films after high-temperature annealing

Kunyao Jiang, Jingyu Tang, Chengchao Xu, Kelly Xiao, Robert F. Davis, Lisa M. Porter
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062702 (2023)
https://doi.org/10.1116/6.0002962
Published: October 2023
View article titled, Evolution of <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> to <em><em>γ</em></em>-Ga<sub>2</sub>O<sub>3</sub> solid-solution epitaxial films after high-temperature annealing
Open the PDF for Evolution of <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> to <em><em>γ</em></em>-Ga<sub>2</sub>O<sub>3</sub> solid-solution epitaxial films after high-temperature annealing in another window
Includes: Supplementary data
Journal Articles

Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc

Yeliz Unutulmazsoy, Dmitry Kalanov, Kyunghwan Oh, Soheil Karimi Aghda, Jürgen W. Gerlach, Nils Braun, Frans Munnik, Andriy Lotnyk, Jochen M. Schneider, André Anders
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063106 (2023)
https://doi.org/10.1116/6.0002927
Published: October 2023
View article titled, Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc
Open the PDF for Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc in another window
Journal Articles

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

Azmain A. Hossain, Haozhe Wang, David S. Catherall, Martin Leung, Harm C. M. Knoops, James R. Renzas, Austin J. Minnich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062601 (2023)
https://doi.org/10.1116/6.0002965
Published: September 2023
View article titled, Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF<sub>6</sub>/H<sub>2</sub> plasma
Open the PDF for Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF<sub>6</sub>/H<sub>2</sub> plasma in another window
Journal Articles

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma

Wangu Kang, Ji Sang Ahn, Jeong Hwan Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062401 (2023)
https://doi.org/10.1116/6.0002970
Published: September 2023
View article titled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma
Open the PDF for Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma in another window
Includes: Supplementary data
Journal Articles

Application of machine learning to spectrum and image data

Satoka Aoyagi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063202 (2023)
https://doi.org/10.1116/6.0002858
Published: September 2023
View article titled, Application of machine learning to spectrum and image data
Open the PDF for Application of machine learning to spectrum and image data in another window
Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Sanjie Liu, Yangfeng Li, Qing Liu, Jiayou Tao, Xinhe Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052405 (2023)
https://doi.org/10.1116/6.0002639
Published: August 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces
Open the PDF for Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces in another window
Journal Articles

Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

Jake Soares, Wesley Jen, John D. Hues, Drew Lysne, Jesse Wensel, Steven M. Hues, Elton Graugnard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052404 (2023)
https://doi.org/10.1116/6.0002811
Published: August 2023
View article titled, Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films
Open the PDF for Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films in another window
Includes: Supplementary data
Journal Articles

Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering

Smita G. Rao, Pascal Manuel Illgner, Robert Boyd, Gyula Nagy, Philippe Djemia, Daniel Primetzhofer, Ivan Petrov, Arnaud le Febvrier, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053415 (2023)
https://doi.org/10.1116/6.0002947
Published: August 2023
View article titled, Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering
Open the PDF for Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering in another window
Includes: Supplementary data
Journal Articles

Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study

Omesh Dhar Dwivedi, Yuri Barsukov, Sierra Jubin, Joseph R. Vella, Igor Kaganovich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052602 (2023)
https://doi.org/10.1116/6.0002841
Published: August 2023
View article titled, Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study
Open the PDF for Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study in another window
Journal Articles

Quasiatomic layer etching of silicon nitride enhanced by low temperature

Daniel N. Shanks, Rania K. Ahmed, John D. Femi-Oyetoro, Matthew R. Dickie, Andrew D. Beyer, Frank Greer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052601 (2023)
https://doi.org/10.1116/6.0002846
Published: August 2023
View article titled, Quasiatomic layer etching of silicon nitride enhanced by low temperature
Open the PDF for Quasiatomic layer etching of silicon nitride enhanced by low temperature in another window
Journal Articles

Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Nickolas Ashburn, Xiuyao Lang, Sumeet Pandey, Steven Wolf, Steve Kramer, John Smythe, Gurtej Sandhu, Charles Winter, Andrew C. Kummel, Kyeongjae Cho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052403 (2023)
https://doi.org/10.1116/6.0002840
Published: August 2023
View article titled, Density functional theory study on reaction mechanisms of Co(<sup>tbu2</sup>DAD)<sub>2</sub> for area selective-atomic layer deposition of Co films on metal surfaces
Open the PDF for Density functional theory study on reaction mechanisms of Co(<sup>tbu2</sup>DAD)<sub>2</sub> for area selective-atomic layer deposition of Co films on metal surfaces in another window
Includes: Supplementary data
Journal Articles

Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks

Kartik Sondhi, Rahul Sharangpani, Roshan Tirukkonda, Joyeeta Nag, Xing-Cai Guo, Michael A. Gribelyuk, Raghuveer S. Makala, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050402 (2023)
https://doi.org/10.1116/6.0002860
Published: August 2023
View article titled, Extending area selective deposition of ruthenium onto 3D SiO<sub>2</sub>-Si multilayer stacks
Open the PDF for Extending area selective deposition of ruthenium onto 3D SiO<sub>2</sub>-Si multilayer stacks in another window
Includes: Supplementary data
Journal Articles

Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate

Lena Patterer, Sabrina Kollmann, Teresa de los Arcos, Leonie Jende, Soheil Karimi Aghda, Damian M. Holzapfel, Sameer A. Salman, Stanislav Mráz, Guido Grundmeier, Jochen M. Schneider
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053112 (2023)
https://doi.org/10.1116/6.0002921
Published: August 2023
View article titled, Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate
Open the PDF for Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate in another window
Includes: Supplementary data
Journal Articles

In situ plasmonic tip preparation and validation techniques for scanning tunneling microscopy

Benjamen N. Taber, Matthew L. Neill, Trevor N. Thom, Octavia D. Clapp, Vartkess Ara Apkarian, Joonhee Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053205 (2023)
https://doi.org/10.1116/6.0002807
Published: July 2023
View article titled, <em>In situ</em> plasmonic tip preparation and validation techniques for scanning tunneling microscopy
Open the PDF for <em>In situ</em> plasmonic tip preparation and validation techniques for scanning tunneling microscopy in another window
Journal Articles

Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application

N. Sano, A. Bellew, P. Blenkinsopp
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053204 (2023)
https://doi.org/10.1116/6.0002864
Published: July 2023
View article titled, Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application
Open the PDF for Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application in another window
Journal Articles

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Heli Seppänen, Igor Prozheev, Christoffer Kauppinen, Sami Suihkonen, Kenichiro Mizohata, Harri Lipsanen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052401 (2023)
https://doi.org/10.1116/6.0002705
Published: July 2023
View article titled, Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
Open the PDF for Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon in another window
Journal Articles

High quality β-Ga2O3 bulk crystals, grown by edge-defined film-fed growth method: Growth features, structural, and thermal properties

Dmitrii A. Bauman, Dmitrii Iu. Panov, Vladislav A. Spiridonov, Arina V. Kremleva, Aleksei V. Asach, Ekaterina V. Tambulatova, A. V. Sakharov, Alexey E. Romanov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053203 (2023)
https://doi.org/10.1116/6.0002644
Published: July 2023
View article titled, High quality β-Ga<sub>2</sub>O<sub>3</sub> bulk crystals, grown by edge-defined film-fed growth method: Growth features, structural, and thermal properties
Open the PDF for High quality β-Ga<sub>2</sub>O<sub>3</sub> bulk crystals, grown by edge-defined film-fed growth method: Growth features, structural, and thermal properties in another window