In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split.

JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics:

• Applied and fundamental surface science
• Atomic layer deposition and atomic layer etching
• Electronic and photonic materials and their processing, including 2D materials
• Magnetic thin films and interfaces
• Materials and thin films for energy conversion and storage
• Photovoltaics, including thin film solar cells and organic and hybrid solar cells
• Plasma science and technology, including plasma-surface interactions, plasma diagnostics, plasma deposition and etching, and applications of plasmas to micro and nanoelectronics
• Surface coatings and engineering
• Thin film deposition, including physical and chemical vapor deposition and molecular beam epitaxy
• Thin film properties and characterization
• Transmission electron microscopy, including in situ methods
• Tribology

JVSTA - Journal Impact Factor

2022 Journal Citation Reports^® (Clarivate, 2023)*:

* Data from the 2022 Journal Citation Reports^® Science Edition (Clarivate, 2023).

ISSN

The international standard serial number (ISSN) for JVST A is 0734-2101 for the printed edition and the electronic ISSN (E-ISSN) is 1520-8559 for the online edition.

The CODEN is JVTAD6.