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Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching source
J. Vac. Sci. Technol. A 8, 3103–3112 (1990)
https://doi.org/10.1116/1.576592
Plasma induced gas heating in electron cyclotron resonance sources
J. Vac. Sci. Technol. A 8, 3113–3117 (1990)
https://doi.org/10.1116/1.576593
A hyperthermal (0.1–4 eV) F atom beam source suitable for surface etching investigations
J. Vac. Sci. Technol. A 8, 3118–3122 (1990)
https://doi.org/10.1116/1.576594
Analysis of time‐of‐flight spectra
J. Vac. Sci. Technol. A 8, 3141–3145 (1990)
https://doi.org/10.1116/1.576597
Ion beam assisted coating and surface modification with plasma source ion implantation
J. Vac. Sci. Technol. A 8, 3146–3151 (1990)
https://doi.org/10.1116/1.576598
Sputtering of excited‐state potassium atoms from electron‐bombarded KBr crystals
J. Vac. Sci. Technol. A 8, 3152–3156 (1990)
https://doi.org/10.1116/1.576599
Surface‐defect formation in graphite targets during magnetron sputtering
J. Vac. Sci. Technol. A 8, 3157–3162 (1990)
https://doi.org/10.1116/1.576600
Morphology and crystal orientation of chromium thin films deposited by ion plating
J. Vac. Sci. Technol. A 8, 3163–3167 (1990)
https://doi.org/10.1116/1.576601
Formation of cubic boron nitride films by arc‐like plasma‐enhanced ion plating method
J. Vac. Sci. Technol. A 8, 3168–3174 (1990)
https://doi.org/10.1116/1.576602
Deposition by etching‐enhanced reactive sputtering: A new high‐rate deposition method for SiO2 and TiO2
J. Vac. Sci. Technol. A 8, 3175–3178 (1990)
https://doi.org/10.1116/1.576603
High‐rate sputter deposition of SiO2 and TiO2 films for optical applications
J. Vac. Sci. Technol. A 8, 3179–3185 (1990)
https://doi.org/10.1116/1.576604
A further study of the state of residual stress in TiN films made by physical vapor deposition methods
J. Vac. Sci. Technol. A 8, 3186–3193 (1990)
https://doi.org/10.1116/1.576605
Optical second‐harmonic generation study of Si and Ge deposition on Si(001)
J. Vac. Sci. Technol. A 8, 3194–3197 (1990)
https://doi.org/10.1116/1.576606
Yields, sensitivities, and natural line shapes of Auger lines. I. Ag, Si, Al, Mg, and Cu
J. Vac. Sci. Technol. A 8, 3198–3204 (1990)
https://doi.org/10.1116/1.576563
Photoemission study of the negative electron affinity surfaces of O/Cs/Si(001)2×1 and O/K/Si(001)2×1
J. Vac. Sci. Technol. A 8, 3205–3209 (1990)
https://doi.org/10.1116/1.576564
Slow positron annihilation spectroscopy and electron microscopy of electron beam evaporated cobalt and nickel silicides
J. Vac. Sci. Technol. A 8, 3210–3217 (1990)
https://doi.org/10.1116/1.576565
Segregation of Ca ions at the MgO(001) surface studied by neutral beam incidence ion scattering spectroscopy
J. Vac. Sci. Technol. A 8, 3218–3223 (1990)
https://doi.org/10.1116/1.576566
Infrared characterization of methanol adsorbed on Cu(110)
J. Vac. Sci. Technol. A 8, 3224–3228 (1990)
https://doi.org/10.1116/1.576567
Desorption studies of hydrogen and carbon monoxide from nickel surfaces using thermal desorption spectroscopy
J. Vac. Sci. Technol. A 8, 3229–3236 (1990)
https://doi.org/10.1116/1.576568
Methyl radical formation from filament pyrolysis of acetylene and acetylene/hydrogen mixtures within quartz tubes
J. Vac. Sci. Technol. A 8, 3237–3240 (1990)
https://doi.org/10.1116/1.576569
Backstreaming of a perfluorinated polyether pump oil—an x‐ray photoelectron spectroscopy study
J. Vac. Sci. Technol. A 8, 3241–3243 (1990)
https://doi.org/10.1116/1.576570
An electrostatic quadrupole deflector for mass spectrometer applications
J. Vac. Sci. Technol. A 8, 3244–3246 (1990)
https://doi.org/10.1116/1.576571
Fiber optic sensor for substrate temperature monitoring
J. Vac. Sci. Technol. A 8, 3247–3250 (1990)
https://doi.org/10.1116/1.576572
Studies of the electrical and interface properties of the metal contacts to CuInSe2 single crystals
J. Vac. Sci. Technol. A 8, 3251–3254 (1990)
https://doi.org/10.1116/1.576573
Photoluminescence studies in ZnxCd1−xTe single crystals
J. Vac. Sci. Technol. A 8, 3255–3259 (1990)
https://doi.org/10.1116/1.576574
Optical properties of electron‐beam evaporated TiO2 films deposited in an ionized oxygen medium
J. Vac. Sci. Technol. A 8, 3260–3264 (1990)
https://doi.org/10.1116/1.576575
An anomalous diffusion barrier case: The Hg1−xCdxTe/Yb/Ag junction
J. Vac. Sci. Technol. A 8, 3265–3273 (1990)
https://doi.org/10.1116/1.576576
Evaluation of the stopping depth of nonradiative recombination centers in Al0.5Ga0.5As by Ar+ ion beam sputtering by photoluminescence measurements
J. Vac. Sci. Technol. A 8, 3274–3278 (1990)
https://doi.org/10.1116/1.576577
Anticipated performance of achromatic quadrupole focusing systems when used with liquid metal ion sources
J. Vac. Sci. Technol. A 8, 3279–3283 (1990)
https://doi.org/10.1116/1.576578
Microstructure of yttria‐stabilized zirconia overcoats for thin film recording media
J. Vac. Sci. Technol. A 8, 3289–3294 (1990)
https://doi.org/10.1116/1.576580
Interplay of erosion and redeposition processes in seed cone formation
J. Vac. Sci. Technol. A 8, 3295–3299 (1990)
https://doi.org/10.1116/1.576581
Nonresonant multiphoton ionization of rare gases
Kiyohide Kokubun; Shingo Ichimura; Hiroko Hashizume; Hazime Shimizu; Yoshiro Oowadano; Yuji Matsumoto; Kazuhiro Endo
J. Vac. Sci. Technol. A 8, 3310–3313 (1990)
https://doi.org/10.1116/1.576584
Thomson space charge in D–T gas
J. Vac. Sci. Technol. A 8, 3314–3318 (1990)
https://doi.org/10.1116/1.576541
Uniform liquid‐fuel layer produced in a cryogenic inertial fusion target by a time‐dependent thermal gradient
R. Q. Gram; M. D. Wittman; C. Immesoete; H. Kim; R. S. Craxton; N. Sampat; S. Swales; G. Pien; J. M. Soures; H. Kong
J. Vac. Sci. Technol. A 8, 3319–3323 (1990)
https://doi.org/10.1116/1.576542
Computer‐assisted microballoon selection for inertial confinement fusion targets
J. Vac. Sci. Technol. A 8, 3324–3326 (1990)
https://doi.org/10.1116/1.576543
New method for calculating the molecular flux from an inclined Knudsen cell
J. Vac. Sci. Technol. A 8, 3327–3332 (1990)
https://doi.org/10.1116/1.576544
Low outgassing and anticorrosive metal surface treatment for ultrahigh vacuum equipment
J. Vac. Sci. Technol. A 8, 3337–3340 (1990)
https://doi.org/10.1116/1.576546
Sensitivity variation of Bayard–Alpert gauges with and without closed grids from 10−4 to 1 Pa
J. Vac. Sci. Technol. A 8, 3341–3344 (1990)
https://doi.org/10.1116/1.576547
Indirect band gap in α‐ZrO2
J. Vac. Sci. Technol. A 8, 3345–3346 (1990)
https://doi.org/10.1116/1.576548
Comment on ‘‘aluminum deposition on polyimides: The effect of in situ ion bombardment’’
J. Vac. Sci. Technol. A 8, 3347–3349 (1990)
https://doi.org/10.1116/1.576549
The absence of contamination of mercury from a stainless steel molecular beam epitaxy mercury source
J. Vac. Sci. Technol. A 8, 3352–3354 (1990)
https://doi.org/10.1116/1.576551
X‐ray photoelectron spectroscopy peak assignment for perfluoropolyether oils
J. Vac. Sci. Technol. A 8, 3354–3356 (1990)
https://doi.org/10.1116/1.576552
The decomposition of formic acid on Pd(100)
J. Vac. Sci. Technol. A 8, 3357–3360 (1990)
https://doi.org/10.1116/1.576553
A simple method for the determination of the angle of incidence for low‐energy electrons
J. Vac. Sci. Technol. A 8, 3363–3364 (1990)
https://doi.org/10.1116/1.576555
Probe position controller for plasma parameter measurement in vacuum
J. Vac. Sci. Technol. A 8, 3364–3368 (1990)
https://doi.org/10.1116/1.576556
A 20–350 K variable‐temperature sample holder with sample interchangeability
J. Vac. Sci. Technol. A 8, 3368–3370 (1990)
https://doi.org/10.1116/1.576557
A fiberepoxy vacuum vessel with thin walls
J. Vac. Sci. Technol. A 8, 3370–3371 (1990)
https://doi.org/10.1116/1.576558
Test of a visible/near‐ultraviolet transmitting, coherent fiber‐optic bundle for ultrahigh‐vacuum applications
J. Vac. Sci. Technol. A 8, 3371–3372 (1990)
https://doi.org/10.1116/1.576559
Erratum: Physical and chemical properties of the anodic oxide/HgCdTe interface [J. Vac. Sci. Technol. A 7, 474 (1989)]
J. Vac. Sci. Technol. A 8, 3373 (1990)
https://doi.org/10.1116/1.576560
Scanning tunneling microscopy and spectroscopy of thin metal films on the GaAs(110) surface
J. Vac. Sci. Technol. A 8, 3379–3385 (1990)
https://doi.org/10.1116/1.576562
Microfabrication of cantilever styli for the atomic force microscope
J. Vac. Sci. Technol. A 8, 3386–3396 (1990)
https://doi.org/10.1116/1.576520
Quantitative surface analysis at atomic resolution, atom‐probe field ion microscopy
J. Vac. Sci. Technol. A 8, 3397–3404 (1990)
https://doi.org/10.1116/1.576521
Adsorption of boron on Si(111): Physics, chemistry, and atomic‐scale electronic devices
J. Vac. Sci. Technol. A 8, 3405–3411 (1990)
https://doi.org/10.1116/1.576522
Low‐energy electron diffraction intensity analysis of the atomic geometry of p(1×1) monolayers of bismuth on GaAs(110)
J. Vac. Sci. Technol. A 8, 3412–3416 (1990)
https://doi.org/10.1116/1.576523
Slippage of simple liquid films adsorbed on silver and gold substrates
J. Vac. Sci. Technol. A 8, 3417–3420 (1990)
https://doi.org/10.1116/1.576524
Surface segregation of Pt–Rh alloys
J. Vac. Sci. Technol. A 8, 3421–3424 (1990)
https://doi.org/10.1116/1.576525
Time‐resolved reaction studies on the atomic scale: NO and CO adsorption on stepped Rh surfaces
J. Vac. Sci. Technol. A 8, 3432–3436 (1990)
https://doi.org/10.1116/1.576527
Characterization of the Pd/a‐Al2O3 supported cluster system
J. Vac. Sci. Technol. A 8, 3437–3442 (1990)
https://doi.org/10.1116/1.576528
Surface reconstructions induced by thin overlayers of indium on Si(111)
J. Vac. Sci. Technol. A 8, 3443–3448 (1990)
https://doi.org/10.1116/1.576529
Nanomechanics of a Au–Ir contact using a bidirectional atomic force microscope
J. Vac. Sci. Technol. A 8, 3449–3454 (1990)
https://doi.org/10.1116/1.576530
Quasicrystalline phases and rational approximants obtained from vapor deposited Al–Mn thin films
J. Vac. Sci. Technol. A 8, 3455–3459 (1990)
https://doi.org/10.1116/1.576531
Investigation of In contacts on atomically clean GaAs(110) surfaces
J. Vac. Sci. Technol. A 8, 3460–3465 (1990)
https://doi.org/10.1116/1.576532
Synthesis and structural properties of ion‐beam sputtered Cu/Ni multilayers
J. Vac. Sci. Technol. A 8, 3466–3469 (1990)
https://doi.org/10.1116/1.576533
Scanning tunneling microscope observations of MgO fracture surfaces
J. Vac. Sci. Technol. A 8, 3470–3478 (1990)
https://doi.org/10.1116/1.576534
The surface electronic structure and scanning tunneling microscopy of WTe2
J. Vac. Sci. Technol. A 8, 3484–3487 (1990)
https://doi.org/10.1116/1.577106
Electronic states of an amorphous semiconductor cluster system: Ge on C
J. Vac. Sci. Technol. A 8, 3488–3492 (1990)
https://doi.org/10.1116/1.576536
Raman scattering of amorphous germanium clusters and ultrathin films
J. Vac. Sci. Technol. A 8, 3493–3495 (1990)
https://doi.org/10.1116/1.576537
Chemical reaction dynamics of F atom reaction with the dimer reconstructed Si{100}(2×1) surface
J. Vac. Sci. Technol. A 8, 3496–3501 (1990)
https://doi.org/10.1116/1.576538
Surface force measurements on picometer and piconewton scales
J. Vac. Sci. Technol. A 8, 3502–3505 (1990)
https://doi.org/10.1116/1.576539
Growth mechanisms of Si and Ge epitaxial films on the dimer reconstructed Si{100} surface via molecular dynamics
J. Vac. Sci. Technol. A 8, 3506–3511 (1990)
https://doi.org/10.1116/1.576540
Externally strained Si(100) observed with scanning tunneling microscopy
J. Vac. Sci. Technol. A 8, 3512–3515 (1990)
https://doi.org/10.1116/1.576498
Growth of multidimensional superlattices using step array templates: Evolution of the terrace size distribution
J. Vac. Sci. Technol. A 8, 3516–3519 (1990)
https://doi.org/10.1116/1.576499
Surface photovoltage on Si(111)‐(7×7) probed by optically pumped scanning tunneling microscopy
J. Vac. Sci. Technol. A 8, 3524–3530 (1990)
https://doi.org/10.1116/1.576501
Molecular dynamics simulations of metal adsorbates on metal surfaces: Rh on Ag(100)
J. Vac. Sci. Technol. A 8, 3531–3536 (1990)
https://doi.org/10.1116/1.576502
Modification of tantalum surfaces by scanning tunneling microscopy in an electrochemical cell
J. Vac. Sci. Technol. A 8, 3537–3541 (1990)
https://doi.org/10.1116/1.576503
Local order, epitaxy, and electronic structure of the Bi/III–V semiconductor interfaces
J. Vac. Sci. Technol. A 8, 3542–3547 (1990)
https://doi.org/10.1116/1.576504
The use of splines to analyze scanning tunneling microscopy data
J. Vac. Sci. Technol. A 8, 3548–3554 (1990)
https://doi.org/10.1116/1.576505
Compact scanning tunneling microscope with easy‐to‐construct X–Z inertial sample translation
J. Vac. Sci. Technol. A 8, 3555–3557 (1990)
https://doi.org/10.1116/1.576506
Platinum/iridium tips with controlled geometry for scanning tunneling microscopy
J. Vac. Sci. Technol. A 8, 3558–3562 (1990)
https://doi.org/10.1116/1.576507
Lithographic studies of an e‐beam resist in a vacuum scanning tunneling microscope
J. Vac. Sci. Technol. A 8, 3563–3569 (1990)
https://doi.org/10.1116/1.576508
On the electrochemical etching of tips for scanning tunneling microscopy
J. P. Ibe; P. P. Bey, Jr.; S. L. Brandow; R. A. Brizzolara; N. A. Burnham; D. P. DiLella; K. P. Lee; C. R. K. Marrian; R. J. Colton
J. Vac. Sci. Technol. A 8, 3570–3575 (1990)
https://doi.org/10.1116/1.576509
Vacuum microtriode characteristics
J. Vac. Sci. Technol. A 8, 3581–3585 (1990)
https://doi.org/10.1116/1.576510
Electrical properties, stability, and applications of ultrathin porous Pt films on SiO2
J. Vac. Sci. Technol. A 8, 3591–3597 (1990)
https://doi.org/10.1116/1.576512
A new theory for the anisotropic etching of silicon and some underdeveloped chemical micromachining concepts
J. Vac. Sci. Technol. A 8, 3598–3605 (1990)
https://doi.org/10.1116/1.576513
Thin films for micromechanical sensors
J. Vac. Sci. Technol. A 8, 3606–3613 (1990)
https://doi.org/10.1116/1.576514
Principles in design and microfabrication of variable‐capacitance side‐drive motors
J. Vac. Sci. Technol. A 8, 3614–3624 (1990)
https://doi.org/10.1116/1.576515