Volume 43 Issue 1 | Journal of Vacuum Science & Technology A

Skip Nav Destination

ARTICLES

2-D Materials

Modeling the effects of electron irradiation on graphene drums using the local activation model

Ibikunle Ojo; Thineth Bandara Jayamaha Hitihamilage; Jacob Hardin; Anil Pudasaini; Roberto Gonzalez; Jiang Yan; Jingbiao Cui; Jose Perez

J. Vac. Sci. Technol. A 43, 012201 (2025) https://doi.org/10.1116/6.0004098

Abstract

View articletitled, Modeling the effects of electron irradiation on graphene drums using the local activation model

Open the PDF for in another window

CHORUS

Lattice kinetic Monte Carlo method on fractal growth of transition metal dichalcogenides

Xuejiang Chen; Yishan Lin; Wensen Ai; Xinyao Zhang

J. Vac. Sci. Technol. A 43, 012202 (2025) https://doi.org/10.1116/6.0004104

Abstract

View articletitled, Lattice kinetic Monte Carlo method on fractal growth of transition metal dichalcogenides

Open the PDF for in another window

Atomic Layer Deposition (ALD)

Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization

In Special Collection: Atomic Layer Deposition (ALD)

Sujin Kwon; Bonggeun Shong

J. Vac. Sci. Technol. A 43, 012401 (2025) https://doi.org/10.1116/6.0004143

Abstract

View articletitled, Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization

Open the PDF for in another window

Low temperature growth of single-phase and preferentially oriented ɛ-Ga₂O₃ films on sapphire substrates via atomic layer deposition

Xiangtai Liu; Jiayang Wang; Lu Jin; Jiao Fu; Qin Lu; Shaoqing Wang; Yifan Jia; Zhan Wang; Yunhe Guan; Haifeng Chen

J. Vac. Sci. Technol. A 43, 012402 (2025) https://doi.org/10.1116/6.0004048

Abstract

View articletitled, Low temperature growth of single-phase and preferentially oriented ɛ-Ga2O3 films on sapphire substrates via atomic layer deposition

Open the PDF for in another window

Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

In Special Collection: Atomic Layer Deposition (ALD)

Seung-Ho Seo; Donggeon Shin; Cha-Hee Kim; Keun-Tae Jeong; Yeongjong Lee; Daehyun Kim; Hyun Koock Shin; Won-Jun Lee

J. Vac. Sci. Technol. A 43, 012403 (2025) https://doi.org/10.1116/6.0004013

Abstract

View articletitled, Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies

Open the PDF for in another window

Modeling scale-up of particle coating by atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Angel Yanguas-Gil; Jeffrey W. Elam

J. Vac. Sci. Technol. A 43, 012404 (2025) https://doi.org/10.1116/6.0004006

Abstract

View articletitled, Modeling scale-up of particle coating by atomic layer deposition

Open the PDF for in another window

Atomic Layer Etching (ALE)

Comparisons of atomic layer etching of silicon in Cl₂ and HBr-containing plasmas

In Special Collection: Atomic Layer Etching (ALE)

Mahmoud A. I. Elgarhy; Qinzhen Hao; Heejung Kim; Sang Ki Nam; Song-Yun Kang; Vincent M. Donnelly

J. Vac. Sci. Technol. A 43, 012601 (2025) https://doi.org/10.1116/6.0004092

Abstract

View articletitled, Comparisons of atomic layer etching of silicon in Cl2 and HBr-containing plasmas

Open the PDF for in another window

Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties

In Special Collection: Atomic Layer Etching (ALE)

Wen-Hsi Lee; Edward Kuo; Chia-Nung Hung; Tai-Chen Kuo

J. Vac. Sci. Technol. A 43, 012602 (2025) https://doi.org/10.1116/6.0004040

Abstract

View articletitled, Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties

Open the PDF for in another window

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

In Special Collection: Atomic Layer Etching (ALE)

Andreas Kounis-Melas; Joseph R. Vella; Athanassios Z. Panagiotopoulos; David B. Graves

J. Vac. Sci. Technol. A 43, 012603 (2025) https://doi.org/10.1116/6.0004027

Abstract

View articletitled, Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

Open the PDF for in another window

CHORUS

Epitaxial Growth of Materials

kV-class Ga₂O₃ vertical rectifiers fabricated on 4-in. diameter substrates

In Special Collection: Gallium Oxide Materials and Devices

Jian-Sian Li; Chao-Ching Chiang; Hsiao-Hsuan Wan; Fan Ren; Yu-Te Liao; Stephen J. Pearton

J. Vac. Sci. Technol. A 43, 012701 (2025) https://doi.org/10.1116/6.0004141

Abstract

View articletitled, kV-class Ga2O3 vertical rectifiers fabricated on 4-in. diameter substrates

Open the PDF for in another window

Molecular dynamics investigation of heteroepitaxial growth of quaternary AlInGaN on wurtzite-GaN surface along [0001] direction

Anuj Debnath; Chandan K. Das

J. Vac. Sci. Technol. A 43, 012702 (2025) https://doi.org/10.1116/6.0004113

Abstract

View articletitled, Molecular dynamics investigation of heteroepitaxial growth of quaternary AlInGaN on wurtzite-GaN surface along [0001] direction

Open the PDF for in another window

Photovoltaics and Energy

Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature

In Special Collection: Commemorating the Career of Gerry Lucovsky

Stefan Zollner; Carlos A. Armenta; Sonam Yadav; José Menéndez

J. Vac. Sci. Technol. A 43, 012801 (2025) https://doi.org/10.1116/6.0003929

Abstract

View articletitled, Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature

Open the PDF for in another window

Internal chemical potential in mixed covalent-ionic photosensitive systems

In Special Collection: Commemorating the Career of Gerry Lucovsky

Małgorzata Kot; Karsten Henkel; Dieter Schmeißer

J. Vac. Sci. Technol. A 43, 012802 (2025) https://doi.org/10.1116/6.0004179

Abstract

View articletitled, Internal chemical potential in mixed covalent-ionic photosensitive systems

Open the PDF for in another window

Plasma Science and Technology

On the use of pulsed DC bias for etching high aspect ratio features

Xingyi Shi; Samaneh Sadighi; Shahid Rauf; Han Luo; Jun-Chieh Wang; Jason Kenney; Jean-Paul Booth; Daniil Marinov; Mickaël Foucher; Nishant Sirse

J. Vac. Sci. Technol. A 43, 013001 (2025) https://doi.org/10.1116/6.0003943

Abstract

View articletitled, On the use of pulsed DC bias for etching high aspect ratio features

Open the PDF for in another window

Characterization of the ion angle distribution function in low-pressure plasmas using a micro-electromechanical system

M. Melzer; K. Meinel; C. Stoeckel; T. Hemke; T. Mussenbrock; S. Zimmermann

J. Vac. Sci. Technol. A 43, 013002 (2025) https://doi.org/10.1116/6.0004034

Abstract

View articletitled, Characterization of the ion angle distribution function in low-pressure plasmas using a micro-electromechanical system

Open the PDF for in another window

Etching and fluorination of yttrium oxide (Y₂O₃) irradiated with fluorine ions or radicals

Hojun Kang; Tomoko Ito; Junghwan Um; Hikaru Kokura; Sungil Cho; Hyunjung Park; Kazuhiro Karahashi; Satoshi Hamaguchi

J. Vac. Sci. Technol. A 43, 013003 (2025) https://doi.org/10.1116/6.0004137

Abstract

View articletitled, Etching and fluorination of yttrium oxide (Y2O3) irradiated with fluorine ions or radicals

Open the PDF for in another window

Selective etching of ruthenium using electron beam-irradiation and Ar/O₂/CF₄ remote plasma-based surface functionalization: Comparisons to tantalum

Yudong Li; Hubertus Marbach; Christian Preischl; Michael Budach; Daniel Rhinow; Klaus Edinger; Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 43, 013004 (2025) https://doi.org/10.1116/6.0003978

Abstract

View articletitled, Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum

Open the PDF for in another window

Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection

Minghan Yan; Tianxiang Zhang; Yanli Peng; Hao Wu; Shali Yang

J. Vac. Sci. Technol. A 43, 013005 (2025) https://doi.org/10.1116/6.0004088

Abstract

View articletitled, Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection

Open the PDF for in another window

Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation

Zach Zajo; David S. L. Mui; Ji Zhu; Mark Kawaguchi; Eric S. G. Shaqfeh

J. Vac. Sci. Technol. A 43, 013006 (2025) https://doi.org/10.1116/6.0004155

Abstract

View articletitled, Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation

Open the PDF for in another window

Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation

Zach Zajo; David S. L. Mui; Ji Zhu; Yusef Shari’ati; Mark Kawaguchi; Eric S. G. Shaqfeh

J. Vac. Sci. Technol. A 43, 013007 (2025) https://doi.org/10.1116/6.0004156

Abstract

View articletitled, Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation

Open the PDF for in another window

Surface Engineering and Coatings

Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells

In Special Collection: Multifunctional Coatings and Surfaces

Paramita Bhattacharyya; Brahim Ahammou; Clarissa White; Fahmida Azmi; Graham Carlow; Rafael Kleiman; Peter Mascher

J. Vac. Sci. Technol. A 43, 013101 (2025) https://doi.org/10.1116/6.0003977

Abstract

View articletitled, Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells

Open the PDF for in another window

Microstructure and improved corrosion properties of TP347H stainless steel via vacuum cladding high-entropy alloy coating

Changsheng Zhai; Fang Xie; Xi Zhang; Hui Li; Xin Zhang; Xijin Hua; Sainan Jiang; Xingchao Li

J. Vac. Sci. Technol. A 43, 013102 (2025) https://doi.org/10.1116/6.0004126

Abstract

View articletitled, Microstructure and improved corrosion properties of TP347H stainless steel via vacuum cladding high-entropy alloy coating

Open the PDF for in another window

Lead-free dielectric thin films: Synthesis of Ag(Nb_1−xTa_x)O₃ via reactive dc magnetron sputtering

In Special Collection: Multifunctional Coatings and Surfaces

L. Kölbl; M. Mehrabi; T. Griesser; F. Munnik; C. Mitterer

J. Vac. Sci. Technol. A 43, 013103 (2025) https://doi.org/10.1116/6.0004162

Abstract

View articletitled, Lead-free dielectric thin films: Synthesis of Ag(Nb1−xTax)O3 via reactive dc magnetron sputtering

Open the PDF for in another window

Effect of Mg content on corrosion resistance of Zn-11Al-XMg coatings

Wenbin Jiang; Yuting Wan; Liang Qi; Zhen Ge; Jinbing Hu; Zhou Li

J. Vac. Sci. Technol. A 43, 013104 (2025) https://doi.org/10.1116/6.0004068

Abstract

View articletitled, Effect of Mg content on corrosion resistance of Zn-11Al-XMg coatings

Open the PDF for in another window

Luminescent silicon nanocrystals capped with naturally occurring ligands

In Special Collection: Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials

Benjamin J. Stacy; Loc Ngo; Kara Nagasaki; Brian A. Korgel

J. Vac. Sci. Technol. A 43, 013105 (2025) https://doi.org/10.1116/6.0004101

Abstract

View articletitled, Luminescent silicon nanocrystals capped with naturally occurring ligands

Open the PDF for in another window

CHORUS

Research on microstructure and high-temperature wear properties of laser cladding iron-based coatings

Haiyang Long; Xiaoshuo Li; Haijiang Shi; Zhen Dong; Fuhai Li; Xingchen Yan; Zhanshan Ma; Bochao Wang; Tao Wang; Yanfeng Wang; Xueyong Li

J. Vac. Sci. Technol. A 43, 013106 (2025) https://doi.org/10.1116/6.0004151

Abstract

View articletitled, Research on microstructure and high-temperature wear properties of laser cladding iron-based coatings

Open the PDF for in another window

Surfaces and Interfaces

In situ calorimetric temperature measurements of Cu, Cr, Ti targets during DC magnetron sputtering

Leonid R. Shaginyan; Mikhail I. Mironov; Anatoly I. Kuzmichev

J. Vac. Sci. Technol. A 43, 013201 (2025) https://doi.org/10.1116/6.0003994

Abstract

View articletitled, In situ calorimetric temperature measurements of Cu, Cr, Ti targets during DC magnetron sputtering

Open the PDF for in another window

3D numerical modeling and simulation of β-Ga₂O₃ crystal growth by edge-defined film-fed growth method

In Special Collection: Gallium Oxide Materials and Devices

Junlan Wang; Zaoyang Li; Chao Qi; Lijun Liu

J. Vac. Sci. Technol. A 43, 013202 (2025) https://doi.org/10.1116/6.0004170

Abstract

View articletitled, 3D numerical modeling and simulation of β-Ga2O3 crystal growth by edge-defined film-fed growth method

Open the PDF for in another window

Thin Films

Layer thickness dependent interface strengthening of nanolayered W/NbMoTaW medium-entropy alloys

Y. W. Zhang; Y. J. Ma; L. Wang; J. Cheng; Z. Y. Zhang; X. C. Shen; X. Hua; G. J. Li; Z. H. Cao

J. Vac. Sci. Technol. A 43, 013401 (2025) https://doi.org/10.1116/6.0004067

Abstract

View articletitled, Layer thickness dependent interface strengthening of nanolayered W/NbMoTaW medium-entropy alloys

Open the PDF for in another window

Trimethylboron as a precursor for boron phosphide plasma deposition at low temperature

Alina Maksimova; Alexander Uvarov; Demid Kirilenko; Artem Baranov; Ekaterina Vyacheslavova; Alexander Gudovskikh; Jean-Paul Kleider

J. Vac. Sci. Technol. A 43, 013402 (2025) https://doi.org/10.1116/6.0004065

Abstract

View articletitled, Trimethylboron as a precursor for boron phosphide plasma deposition at low temperature

Open the PDF for in another window

Effect of the buffer layer on the energy storage performance of Pb_0.97La_0.02Zr_0.5Sn_0.5O₃ thin film

Xin Liu; Jiawei Wang; Zhongshuai Liang; Weidong Zhao; Ruizhi Wang; Yiwei Tong; Yonghong Cheng

J. Vac. Sci. Technol. A 43, 013403 (2025) https://doi.org/10.1116/6.0004172

Abstract

View articletitled, Effect of the buffer layer on the energy storage performance of Pb0.97La0.02Zr0.5Sn0.5O3 thin film

Open the PDF for in another window

Effect of nitrogen partial pressure on the structural and mechanical properties of (MoNbTaW)N thin films deposited by DC magnetron sputtering

Saikumar Katta; Bharath Kumar Bandla; Sudharshan Phani Pardasaradhi; Venkata Girish Kotnur

J. Vac. Sci. Technol. A 43, 013404 (2025) https://doi.org/10.1116/6.0004124

Abstract

View articletitled, Effect of nitrogen partial pressure on the structural and mechanical properties of (MoNbTaW)N thin films deposited by DC magnetron sputtering

Open the PDF for in another window

Influence of Sb content on carrier transport and thermoelectric properties of flexible Bi–Sb films

Zhihao Ben; Guihong Song; Yu Chen; Yusheng Wu; Junhua You

J. Vac. Sci. Technol. A 43, 013405 (2025) https://doi.org/10.1116/6.0004097

Abstract

View articletitled, Influence of Sb content on carrier transport and thermoelectric properties of flexible Bi–Sb films

Open the PDF for in another window

Preparation and characterization of high-quality Bi_1−xSb_x thin films: A sputtering deposition approach

G. G. de Almeida; A. M. H. de Andrade; M. A. Tumelero

J. Vac. Sci. Technol. A 43, 013406 (2025) https://doi.org/10.1116/6.0004109

Abstract

View articletitled, Preparation and characterization of high-quality Bi1−xSbx thin films: A sputtering deposition approach

Open the PDF for in another window

Perspectives

Perspective on breakdown in Ga₂O₃ vertical rectifiers

In Special Collection: Gallium Oxide Materials and Devices

Jian-Sian Li; Chao-Ching Chiang; Hsiao-Hsuan Wan; Fan Ren; Yu-Te Liao; Stephen J. Pearton

J. Vac. Sci. Technol. A 43, 018501 (2025) https://doi.org/10.1116/6.0004146

Abstract

View articletitled, Perspective on breakdown in Ga2O3 vertical rectifiers

Open the PDF for in another window

Issues

Cover Image

ARTICLES

2-D Materials

Atomic Layer Deposition (ALD)

Atomic Layer Etching (ALE)

Epitaxial Growth of Materials

Photovoltaics and Energy

Plasma Science and Technology

Surface Engineering and Coatings

Surfaces and Interfaces

Thin Films

Perspectives

RSS

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only