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Volume 41, Issue 6

December 2023

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ISSN 0734-2101

EISSN 1520-8559

In this Issue

ARTICLES

ARTICLES

2-D Materials

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

T. Stach; A. Seif; A. Ambrosetti; P. L. Silvestrelli; U. Burghaus

J. Vac. Sci. Technol. A 41, 062201 (2023) https://doi.org/10.1116/6.0002948

Abstract

View articletitled, Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

Supplementary Material

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Anticorrosive coatings made from polydopamine modified graphitic C₃N₄ composites with synergistic anticorrosion effects

Lijuan Li; Hongrui Yao; Wenya Bi; Wanlu Fu; Na Wang

J. Vac. Sci. Technol. A 41, 062202 (2023) https://doi.org/10.1116/6.0002769

Abstract

View articletitled, Anticorrosive coatings made from polydopamine modified graphitic C3N4 composites with synergistic anticorrosion effects

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Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H₂/N₂/Ar plasma

Wangu Kang; Ji Sang Ahn; Jeong Hwan Han

J. Vac. Sci. Technol. A 41, 062401 (2023) https://doi.org/10.1116/6.0002970

Abstract

View articletitled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma

Supplementary Material

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Plasma Science and Technology

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Daisuke Ogawa; Keiji Nakamura

J. Vac. Sci. Technol. A 41, 063001 (2023) https://doi.org/10.1116/6.0002835

Abstract

View articletitled, Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

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Selective mask deposition using SiCl₄ plasma for highly selective etching process

Miyako Matsui; Makoto Miura; Kenichi Kuwahara

J. Vac. Sci. Technol. A 41, 063002 (2023) https://doi.org/10.1116/6.0002773

Abstract

View articletitled, Selective mask deposition using SiCl4 plasma for highly selective etching process

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Surface Engineering and Coatings

Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium

Naoto Oishi; Tatsuya Yasuoka; Toshiyuki Kawaharamura; Noriko Nitta

J. Vac. Sci. Technol. A 41, 063101 (2023) https://doi.org/10.1116/6.0002878

Abstract

View articletitled, Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium

Supplementary Material

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Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Farzin Ghadami; Mohammad Amin Davoudabadi; Soheil Ghadami

J. Vac. Sci. Technol. A 41, 063102 (2023) https://doi.org/10.1116/6.0002951

Abstract

View articletitled, Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

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Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings

Yu Zheng; Peng Xu; Long Li; Qibin Liu; Shanzhu Guo

J. Vac. Sci. Technol. A 41, 063103 (2023) https://doi.org/10.1116/6.0002885

Abstract

View articletitled, Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings

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Self-joule heating assisted field emission following the Child–Langmuir law

Yoichiro Neo; Rikuto Oda; Jonghyun Moon

J. Vac. Sci. Technol. A 41, 063104 (2023) https://doi.org/10.1116/5.0159964

Abstract

View articletitled, Self-joule heating assisted field emission following the Child–Langmuir law

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Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings

Xin Li; Zixiang Zhou; Chenglei Wang; Haiqing Qin; Jijie Yang; Weijie Liu; Mulin Liang; Chong Liu; Hong Tan; Zhenjun Zhang

J. Vac. Sci. Technol. A 41, 063105 (2023) https://doi.org/10.1116/6.0002872

Abstract

View articletitled, Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings

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Surfaces and Interfaces

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al₂O₃/TiO₂ nanolaminates grown with different precursor purge times

In Special Collection: Atomic Layer Deposition (ALD)

Partha Sarathi Padhi; R. S. Ajimsha; S. K. Rai; Sushmita Bhartiya; Aniruddha Bose; Bidyadhar Das; Manoj Kumar Tiwari; Pankaj Misra

J. Vac. Sci. Technol. A 41, 063201 (2023) https://doi.org/10.1116/6.0002849

Abstract

View articletitled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

Supplementary Material

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Application of machine learning to spectrum and image data

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Satoka Aoyagi

J. Vac. Sci. Technol. A 41, 063202 (2023) https://doi.org/10.1116/6.0002858

Abstract

View articletitled, Application of machine learning to spectrum and image data

Supplementary Material

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Thermal transport and structural improvements due to annealing of wafer bonded β-Ga₂O₃|4H-SiC

In Special Collection: Gallium Oxide Materials and Devices

Michael E. Liao; Kenny Huynh; Zhe Cheng; Jingjing Shi; Samuel Graham; Mark S. Goorsky

J. Vac. Sci. Technol. A 41, 063203 (2023) https://doi.org/10.1116/6.0002693

Abstract

View articletitled, Thermal transport and structural improvements due to annealing of wafer bonded β-Ga2O3|4H-SiC

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Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Wil Gardner; David A. Winkler; David L. J. Alexander; Davide Ballabio; Benjamin W. Muir; Paul J. Pigram

J. Vac. Sci. Technol. A 41, 063204 (2023) https://doi.org/10.1116/6.0002788

Abstract

View articletitled, Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

Supplementary Material

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β-Ga₂O₃ orientation dependence of band offsets with SiO₂ and Al₂O₃

Hsiao-Hsuan Wan; Jian-Sian Li; Chao-Ching Chiang; Xinyi Xia; David C. Hays; Fan Ren; Stephen J. Pearton

J. Vac. Sci. Technol. A 41, 063205 (2023) https://doi.org/10.1116/6.0003039

Abstract

View articletitled, β-Ga2O3 orientation dependence of band offsets with SiO2 and Al2O3

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Thin Films

Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array

Jing Yang; Linwei Wang; Zhang Chen; Zhongjun Xue; Shuwen Zhao; Dongzhou Ding

J. Vac. Sci. Technol. A 41, 063401 (2023) https://doi.org/10.1116/6.0002875

Abstract

View articletitled, Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array

Supplementary Material

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Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Faezeh A. F. Lahiji; Samiran Bairagi; Roger Magnusson; Mauricio A. Sortica; Daniel Primetzhofer; Erik Ekström; Biplab Paul; Arnaud le Febvrier; Per Eklund

J. Vac. Sci. Technol. A 41, 063402 (2023) https://doi.org/10.1116/6.0002914

Abstract

View articletitled, Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Supplementary Material

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Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

Jennifer Stefani Weber; Vanessa Piroli; Michael Cristian Goldbeck; Bruna Louise Perotti; Carla Daniela Boeira; Newton Kiyoshi Fukumasu; Alexandre Fassini Michels; Carlos Alejandro Figueroa

J. Vac. Sci. Technol. A 41, 063403 (2023) https://doi.org/10.1116/6.0002911

Abstract

View articletitled, Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

Supplementary Material

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ARTICLES

2-D Materials

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

Anticorrosive coatings made from polydopamine modified graphitic C₃N₄ composites with synergistic anticorrosion effects

Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H₂/N₂/Ar plasma

Plasma Science and Technology

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Selective mask deposition using SiCl₄ plasma for highly selective etching process

Surface Engineering and Coatings

Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium

Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings

Self-joule heating assisted field emission following the Child–Langmuir law

Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings

Surfaces and Interfaces

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al₂O₃/TiO₂ nanolaminates grown with different precursor purge times

Application of machine learning to spectrum and image data

Thermal transport and structural improvements due to annealing of wafer bonded β-Ga₂O₃|4H-SiC

Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

β-Ga₂O₃ orientation dependence of band offsets with SiO₂ and Al₂O₃

Thin Films

Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array

Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

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Issues

ARTICLES

2-D Materials

Atomic Layer Deposition (ALD)

Plasma Science and Technology

Surface Engineering and Coatings

Surfaces and Interfaces

Thin Films

RSS

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

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