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Issues

Volume 41, Issue 6
November 2023
Issue Cover
All Issues
ISSN 0734-2101
EISSN 1520-8559

Letters

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films Editor’s Pick
In Special Collection: Atomic Layer Deposition (ALD)
Femi Mathew; Nithin Poonkottil; Eduardo Solano; Dirk Poelman; Zeger Hens; Christophe Detavernier; Jolien Dendooven
J. Vac. Sci. Technol. A 41, 060401 (2023) https://doi.org/10.1116/6.0002993
View articletitled, Plasma-enhanced atomic layer deposition of crystalline Ga<sub>2</sub>S<sub>3</sub> thin films
Supplementary Material
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Review Articles

Materials characterization: Can artificial intelligence be used to address reproducibility challenges?
Miu Lun Lau; Abraham Burleigh; Jeff Terry; Min Long
J. Vac. Sci. Technol. A 41, 060801 (2023) https://doi.org/10.1116/6.0002809
View articletitled, Materials characterization: Can artificial intelligence be used to address reproducibility challenges?
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CHORUS

ARTICLES

2-D Materials
Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory
T. Stach; A. Seif; A. Ambrosetti; P. L. Silvestrelli; U. Burghaus
J. Vac. Sci. Technol. A 41, 062201 (2023) https://doi.org/10.1116/6.0002948
View articletitled, Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory
Supplementary Material
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Anticorrosive coatings made from polydopamine modified graphitic C3N4 composites with synergistic anticorrosion effects
In Special Collection: Multifunctional Coatings and Surfaces
Lijuan Li; Hongrui Yao; Wenya Bi; Wanlu Fu; Na Wang
J. Vac. Sci. Technol. A 41, 062202 (2023) https://doi.org/10.1116/6.0002769
View articletitled, Anticorrosive coatings made from polydopamine modified graphitic C<sub>3</sub>N<sub>4</sub> composites with synergistic anticorrosion effects
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Standing wave patterns in graphene systems studied using scanning tunneling spectroscopy Editor’s Pick
Won-Jun Jang; Min Hui Chang; Min Jeong Kang; Young Jae Song; Se-Jong Kahng
J. Vac. Sci. Technol. A 41, 062203 (2023) https://doi.org/10.1116/6.0003075
View articletitled, Standing wave patterns in graphene systems studied using scanning tunneling spectroscopy
Supplementary Material
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Atomic Layer Deposition (ALD)
Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma Editor’s Pick
Wangu Kang; Ji Sang Ahn; Jeong Hwan Han
J. Vac. Sci. Technol. A 41, 062401 (2023) https://doi.org/10.1116/6.0002970
View articletitled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma
Supplementary Material
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Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides
In Special Collection: Atomic Layer Deposition (ALD)
Sanghun Lee; Seunggi Seo; Woo-Jae Lee; Wontae Noh; Se-Hun Kwon; Il-Kwon Oh; Hyungjun Kim
J. Vac. Sci. Technol. A 41, 062402 (2023) https://doi.org/10.1116/6.0002880
View articletitled, Role of a surface hydroxyl group depending on growth temperature in atomic layer deposition of ternary oxides
Supplementary Material
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LixCoyOz thin-films deposition through thermal atomic layer deposition
In Special Collection: Atomic Layer Deposition (ALD)
Antoine Peisert; Noureddine Adjeroud; Damien Lenoble; Guillaume Lamblin
J. Vac. Sci. Technol. A 41, 062403 (2023) https://doi.org/10.1116/6.0002863
View articletitled, Li<sub>x</sub>Co<sub>y</sub>O<sub>z</sub> thin-films deposition through thermal atomic layer deposition
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Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition
In Special Collection: Atomic Layer Deposition (ALD)
Seokhwi Song; Eungju Kim; Kyunghoo Kim; Jangho Bae; Jinho Lee; Chang Hwa Jung; Hanjin Lim; Hyeongtag Jeon
J. Vac. Sci. Technol. A 41, 062404 (2023) https://doi.org/10.1116/6.0002901
View articletitled, Stabilization of the tetragonal phase in ZrO<sub>2</sub> thin films according to ozone concentration using atomic layer deposition
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Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H2S Editor’s Pick
In Special Collection: Atomic Layer Deposition (ALD)
Jinwoo Lee; Soo Hyun Lee; Bonggeun Shong
J. Vac. Sci. Technol. A 41, 062405 (2023) https://doi.org/10.1116/6.0003041
View articletitled, Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H<sub>2</sub>S
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Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition Editor’s Pick
In Special Collection: Atomic Layer Deposition (ALD)
Jong Hyeon Won; Hyeonhui Jo; Pil Ju Youn; Bo Keun Park; Taek-Mo Chung; Jeong Hwan Han
J. Vac. Sci. Technol. A 41, 062406 (2023) https://doi.org/10.1116/6.0003004
View articletitled, Ternary Ga–Sn–O and quaternary In–Ga–Sn–O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition
Supplementary Material
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Electrochromic properties of NiO films prepared by atomic layer deposition
Xi Su; Zexin Tu; Liwei Ji; Hao Wu; Hongxing Xu; Chang Liu
J. Vac. Sci. Technol. A 41, 062407 (2023) https://doi.org/10.1116/6.0003040
View articletitled, Electrochromic properties of NiO films prepared by atomic layer deposition
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Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal Editor’s Pick
In Special Collection: Atomic Layer Deposition (ALD)
Michael A. Collings; Marcel Junige; Andrew S. Cavanagh; Victor Wang; Andrew C. Kummel; Steven M. George
J. Vac. Sci. Technol. A 41, 062408 (2023) https://doi.org/10.1116/6.0002938
View articletitled, Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)<sub>3</sub> and effect of forming gas anneal
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Real-time artificial intelligence enhanced defect engineering in CeO2 nanostructures
Udit Kumar; Ayush Arunachalam; Corbin Feit; S. Novia Berriel; Kanad Basu; Parag Banerjee; Sudipta Seal
J. Vac. Sci. Technol. A 41, 062409 (2023) https://doi.org/10.1116/6.0002912
View articletitled, Real-time artificial intelligence enhanced defect engineering in CeO<sub>2</sub> nanostructures
Supplementary Material
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CHORUS
Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition
J. Montalvo-Urquizo; D. A. Mazón-Montijo; A. A. Ortíz-Atondo; A. L. Martínez-García; M. I. Mendivil-Palma; O. Y. Ramírez-Esquivel; Z. Montiel-González
J. Vac. Sci. Technol. A 41, 062410 (2023) https://doi.org/10.1116/6.0002829
View articletitled, Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition
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Germanium surface cleaning and ALD of a protective boron nitride overlayer
Olatomide B. Omolere; Qasim Adesope; Samar Alhowity; Tochi L. Agbara; Jeffry A. Kelber
J. Vac. Sci. Technol. A 41, 062411 (2023) https://doi.org/10.1116/6.0002928
View articletitled, Germanium surface cleaning and ALD of a protective boron nitride overlayer
Supplementary Material
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Al2O3 atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance Editor’s Pick
In Special Collection: Atomic Layer Deposition (ALD)
Jack T. Widmer; Steven M. George
J. Vac. Sci. Technol. A 41, 062412 (2023) https://doi.org/10.1116/6.0003085
View articletitled, Al<sub>2</sub>O<sub>3</sub> atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance
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CHORUS
Atomic Layer Etching (ALE)
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma Editor’s Pick
Azmain A. Hossain; Haozhe Wang; David S. Catherall; Martin Leung; Harm C. M. Knoops; James R. Renzas; Austin J. Minnich
J. Vac. Sci. Technol. A 41, 062601 (2023) https://doi.org/10.1116/6.0002965
View articletitled, Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF<sub>6</sub>/H<sub>2</sub> plasma
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CHORUS
Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy
In Special Collection: Atomic Layer Etching (ALE)
Joseph R. Vella; Qinzhen Hao; Vincent M. Donnelly; David B. Graves
J. Vac. Sci. Technol. A 41, 062602 (2023) https://doi.org/10.1116/6.0003011
View articletitled, Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy
Supplementary Material
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CHORUS
Epitaxial Growth of Materials
Solid-source metal-organic MBE for elemental Ir and Ru films
Sreejith Nair; Kyle Noordhoek; Dooyong Lee; Christopher J. Bartel; Bharat Jalan
J. Vac. Sci. Technol. A 41, 062701 (2023) https://doi.org/10.1116/6.0002955
View articletitled, Solid-source metal-organic MBE for elemental Ir and Ru films
Supplementary Material
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Evolution of β-Ga2O3 to γ-Ga2O3 solid-solution epitaxial films after high-temperature annealing Editor’s Pick
Kunyao Jiang; Jingyu Tang; Chengchao Xu; Kelly Xiao; Robert F. Davis; Lisa M. Porter
J. Vac. Sci. Technol. A 41, 062702 (2023) https://doi.org/10.1116/6.0002962
View articletitled, Evolution of <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> to <em><em>γ</em></em>-Ga<sub>2</sub>O<sub>3</sub> solid-solution epitaxial films after high-temperature annealing
Supplementary Material
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Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy
Joan Weng; Hyungki Shin; Simon Godin; Mohamed Oudah; Ronny Sutarto; Rebecca Pons; Bruce A. Davidson; Ke Zou
J. Vac. Sci. Technol. A 41, 062703 (2023) https://doi.org/10.1116/6.0003091
View articletitled, Ordered deficient perovskite La<sub>2/3</sub>TiO<sub>3</sub> films grown via molecular beam epitaxy
Supplementary Material
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Microscopic study of submonolayer nucleation characteristics during GaN (0001) homoepitaxial growth
Peng Su; Wensen Ai; Xuejiang Chen; Lijun Liu
J. Vac. Sci. Technol. A 41, 062704 (2023) https://doi.org/10.1116/6.0003115
View articletitled, Microscopic study of submonolayer nucleation characteristics during GaN (0001) homoepitaxial growth
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Ultrahigh density InGaN/GaN nanopyramid quantum dots for visible emissions with high quantum efficiency
Cheng Liu; Nikhil Pokharel; Qinchen Lin; Miguel A. Betancourt Ponce; Jian Sun; Dominic Lane; Thomas J. De Prinse; Nelson Tansu; Padma Gopalan; Chirag Gupta; Shubhra S. Pasayat; Luke J. Mawst
J. Vac. Sci. Technol. A 41, 062705 (2023) https://doi.org/10.1116/6.0002997
View articletitled, Ultrahigh density InGaN/GaN nanopyramid quantum dots for visible emissions with high quantum efficiency
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CHORUS
MOCVD grown ultraviolet microlight-emitting diodes with an InGaN/GaN/AlGaN active region design
Guangying Wang; Yuting Li; Cheng Liu; Qinchen Lin; Surjava Sanyal; Chirag Gupta; Shubhra S. Pasayat
J. Vac. Sci. Technol. A 41, 062706 (2023) https://doi.org/10.1116/6.0002996
View articletitled, MOCVD grown ultraviolet microlight-emitting diodes with an InGaN/GaN/AlGaN active region design
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Plasma Science and Technology
Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes
Daisuke Ogawa; Keiji Nakamura
J. Vac. Sci. Technol. A 41, 063001 (2023) https://doi.org/10.1116/6.0002835
View articletitled, Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes
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Selective mask deposition using SiCl4 plasma for highly selective etching process
Miyako Matsui; Makoto Miura; Kenichi Kuwahara
J. Vac. Sci. Technol. A 41, 063002 (2023) https://doi.org/10.1116/6.0002773
View articletitled, Selective mask deposition using SiCl<sub>4</sub> plasma for highly selective etching process
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Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
J. Zgheib; L. Berthelot; J. Tranchant; N. Ginot; M.-P. Besland; A. Caillard; T. Minea; A. Rhallabi; P.-Y. Jouan
J. Vac. Sci. Technol. A 41, 063003 (2023) https://doi.org/10.1116/6.0002857
View articletitled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge
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Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process
Tomoyuki Nonaka; Kazuo Takahashi; Akimi Uchida; Stefan Lundgaard; Osamu Tsuji
J. Vac. Sci. Technol. A 41, 063004 (2023) https://doi.org/10.1116/5.0158954
View articletitled, Effects of C<sub>4</sub>F<sub>8</sub> plasma polymerization film on etching profiles in the Bosch process
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CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
A. Písaříková; J. Olejníček; I. Venkrbcová; L. Nožka; S. Cichoň; A. Azinfar; R. Hippler; C. A. Helm; M. Mašláň; L. Machala; Z. Hubička
J. Vac. Sci. Technol. A 41, 063005 (2023) https://doi.org/10.1116/6.0002902
View articletitled, CuFeO<sub>2</sub> prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
Supplementary Material
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Oxygen plasma treatment of TeO2—B2O3 (boro-tellurite) thin films
Uğur Demirkol; Çağrı Durmuş; Tamer Akan
J. Vac. Sci. Technol. A 41, 063006 (2023) https://doi.org/10.1116/6.0002879
View articletitled, Oxygen plasma treatment of TeO<sub>2</sub>—B<sub>2</sub>O<sub>3</sub> (boro-tellurite) thin films
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Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals
Anjar Anggraini Harumningtyas; Tomoko Ito; Michiro Isobe; Lenka Zajíčková; Satoshi Hamaguchi
J. Vac. Sci. Technol. A 41, 063007 (2023) https://doi.org/10.1116/6.0002978
View articletitled, Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals
Supplementary Material
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CHORUS
Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target
M. Farahani; T. Kozák; A. D. Pajdarová; A. Bahr; H. Riedl; P. Zeman
J. Vac. Sci. Technol. A 41, 063008 (2023) https://doi.org/10.1116/6.0002944
View articletitled, Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbC<sub>x</sub> films from a compound target
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Significance of plasma-surface interactions in the etch behavior of low-k materials
Adam Pranda; Steven Grzeskowiak; Yu- Hao Tsai; Yusuke Yoshida; Eric Liu; Yun Han; Peter Biolsi; Ken Kobayashi; Nobuyuki Ikezawa
J. Vac. Sci. Technol. A 41, 063009 (2023) https://doi.org/10.1116/6.0003014
View articletitled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Surface Engineering and Coatings
Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium
Naoto Oishi; Tatsuya Yasuoka; Toshiyuki Kawaharamura; Noriko Nitta
J. Vac. Sci. Technol. A 41, 063101 (2023) https://doi.org/10.1116/6.0002878
View articletitled, Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium
Supplementary Material
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Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying
Farzin Ghadami; Mohammad Amin Davoudabadi; Soheil Ghadami
J. Vac. Sci. Technol. A 41, 063102 (2023) https://doi.org/10.1116/6.0002951
View articletitled, Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying
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Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings
Yu Zheng; Peng Xu; Long Li; Qibin Liu; Shanzhu Guo
J. Vac. Sci. Technol. A 41, 063103 (2023) https://doi.org/10.1116/6.0002885
View articletitled, Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings
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Self-joule heating assisted field emission following the Child–Langmuir law
Yoichiro Neo; Rikuto Oda; Jonghyun Moon
J. Vac. Sci. Technol. A 41, 063104 (2023) https://doi.org/10.1116/5.0159964
View articletitled, Self-joule heating assisted field emission following the Child–Langmuir law
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Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings
Xin Li; Zixiang Zhou; Chenglei Wang; Haiqing Qin; Jijie Yang; Weijie Liu; Mulin Liang; Chong Liu; Hong Tan; Zhenjun Zhang
J. Vac. Sci. Technol. A 41, 063105 (2023) https://doi.org/10.1116/6.0002872
View articletitled, Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings
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Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc Editor’s Pick
Yeliz Unutulmazsoy; Dmitry Kalanov; Kyunghwan Oh; Soheil Karimi Aghda; Jürgen W. Gerlach; Nils Braun; Frans Munnik; Andriy Lotnyk; Jochen M. Schneider; André Anders
J. Vac. Sci. Technol. A 41, 063106 (2023) https://doi.org/10.1116/6.0002927
View articletitled, Toward decoupling the effects of kinetic and potential ion energies: Ion flux dependent structural properties of thin (V,Al)N films deposited by pulsed filtered cathodic arc
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Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy
Canser Gül; Hülya Durmuş; Sevda Albayrak; Nilay Çömez
J. Vac. Sci. Technol. A 41, 063107 (2023) https://doi.org/10.1116/6.0002894
View articletitled, Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy
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High-mass metal ion irradiation enables growth of high-entropy sublattice nitride thin films from elemental targets Editor’s Pick
Vladyslav Rogoz; Oleksandr Pshyk; Bartosz Wicher; Justinas Palisaitis; Jun Lu; Daniel Primetzhofer; Ivan Petrov; Lars Hultman; Grzegorz Greczynski
J. Vac. Sci. Technol. A 41, 063108 (2023) https://doi.org/10.1116/6.0003065
View articletitled, High-mass metal ion irradiation enables growth of high-entropy sublattice nitride thin films from elemental targets
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Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering Editor’s Pick
Yiqun Feng; Tsai-Fu Chung; Chien-Nan Hsiao; Jia-Hong Huang
J. Vac. Sci. Technol. A 41, 063109 (2023) https://doi.org/10.1116/6.0003006
View articletitled, Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering
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Tribological behavior and wear mechanism of nanomultilayer AlCrN/AlTiSiN coatings at elevated temperatures
Baijun Xiao; Teng Fei Zhang
J. Vac. Sci. Technol. A 41, 063110 (2023) https://doi.org/10.1116/6.0003019
View articletitled, Tribological behavior and wear mechanism of nanomultilayer AlCrN/AlTiSiN coatings at elevated temperatures
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Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection Editor’s Pick
Jinn P. Chu; Yi-Jui Yeh; Chih-Yu Liu; Yi-Xiang Yang; Alfreda Krisna Altama; Ting-Hao Chang; Wei-Hung Chiang; Pakman Yiu; Kuo-Lun Tung
J. Vac. Sci. Technol. A 41, 063111 (2023) https://doi.org/10.1116/6.0003055
View articletitled, Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection
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Density functional theory calculations of mechanical and electronic properties of W1−xTaxN6, W1−xMoxN6, and Mo1−xTaxN6 (0 ≤ x ≤ 1) alloys in a hexagonal structure
S. R. Kandel; D. Gall; S. V. Khare
J. Vac. Sci. Technol. A 41, 063112 (2023) https://doi.org/10.1116/6.0002923
View articletitled, Density functional theory calculations of mechanical and electronic properties of W<sub>1−x</sub>Ta<sub>x</sub>N<sub>6</sub>, W<sub>1−x</sub>Mo<sub>x</sub>N<sub>6</sub>, and Mo<sub>1−x</sub>Ta<sub>x</sub>N<sub>6</sub> (0 ≤ x ≤ 1) alloys in a hexagonal structure
Supplementary Material
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CHORUS
Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
Ziyi Hu; Hua Shao; Junjie Li; Panpan Lai; Wenrui Wang; Chen Li; Qi Yan; Xiaobin He; Junfeng Li; Tao Yang; Rui Chen; Yayi Wei
J. Vac. Sci. Technol. A 41, 063113 (2023) https://doi.org/10.1116/6.0003032
View articletitled, Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
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Fabrication and characterization of a hybrid magnetic structure based on highly ordered metallic nanotube arrays
Alfreda Krisna Altama; Fanhua Kong; Natanael Ardi Sugiarto; Peikai Hsu; Shih-Yun Chen; Pakman Yiu; Jinn P. Chu
J. Vac. Sci. Technol. A 41, 063114 (2023) https://doi.org/10.1116/6.0003103
View articletitled, Fabrication and characterization of a hybrid magnetic structure based on highly ordered metallic nanotube arrays
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Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics
I. Campos-Silva; L. E. Castillo-Vela; I. Mejía-Caballero; J. L. Rosales-Lopez; M. Olivares-Luna; K. D. Chaparro-Pérez; F. P. Espino-Cortes; J. M. González-Carmona
J. Vac. Sci. Technol. A 41, 063115 (2023) https://doi.org/10.1116/6.0003167
View articletitled, Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics
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Surfaces and Interfaces
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times
In Special Collection: Atomic Layer Deposition (ALD)
Partha Sarathi Padhi; R. S. Ajimsha; S. K. Rai; Sushmita Bhartiya; Aniruddha Bose; Bidyadhar Das; Manoj Kumar Tiwari; Pankaj Misra
J. Vac. Sci. Technol. A 41, 063201 (2023) https://doi.org/10.1116/6.0002849
View articletitled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times
Supplementary Material
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Application of machine learning to spectrum and image data Editor’s Pick
Satoka Aoyagi
J. Vac. Sci. Technol. A 41, 063202 (2023) https://doi.org/10.1116/6.0002858
View articletitled, Application of machine learning to spectrum and image data
Supplementary Material
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Thermal transport and structural improvements due to annealing of wafer bonded β-Ga2O3|4H-SiC
In Special Collection: Gallium Oxide Materials and Devices
Michael E. Liao; Kenny Huynh; Zhe Cheng; Jingjing Shi; Samuel Graham; Mark S. Goorsky
J. Vac. Sci. Technol. A 41, 063203 (2023) https://doi.org/10.1116/6.0002693
View articletitled, Thermal transport and structural improvements due to annealing of wafer bonded β-Ga<sub>2</sub>O<sub>3</sub>|4H-SiC
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Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models
Wil Gardner; David A. Winkler; David L. J. Alexander; Davide Ballabio; Benjamin W. Muir; Paul J. Pigram
J. Vac. Sci. Technol. A 41, 063204 (2023) https://doi.org/10.1116/6.0002788
View articletitled, Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models
Supplementary Material
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β-Ga2O3 orientation dependence of band offsets with SiO2 and Al2O3
In Special Collection: Gallium Oxide Materials and Devices
Hsiao-Hsuan Wan; Jian-Sian Li; Chao-Ching Chiang; Xinyi Xia; David C. Hays; Fan Ren; Stephen J. Pearton
J. Vac. Sci. Technol. A 41, 063205 (2023) https://doi.org/10.1116/6.0003039
View articletitled, β-Ga<sub>2</sub>O<sub>3</sub> orientation dependence of band offsets with SiO<sub>2</sub> and Al<sub>2</sub>O<sub>3</sub>
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CHORUS
Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model
Alberto Herrera-Gomez; Dulce Maria Guzman-Bucio; Marisol Mayorga-Garay; Orlando Cortazar-Martinez
J. Vac. Sci. Technol. A 41, 063206 (2023) https://doi.org/10.1116/6.0002981
View articletitled, Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model
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Band-engineered LaFeO3–LaNiO3 thin film interfaces for electrocatalysis of water Editor’s Pick
Rajendra Paudel; Andricus R. Burton; Marcelo A. Kuroda; Byron H. Farnum; Ryan B. Comes
J. Vac. Sci. Technol. A 41, 063207 (2023) https://doi.org/10.1116/6.0002987
View articletitled, Band-engineered LaFeO<sub>3</sub>–LaNiO<sub>3</sub> thin film interfaces for electrocatalysis of water
Supplementary Material
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CHORUS
Multielectronic and multiatomic effects in the U O4,5 x-ray absorption spectroscopy of uranium dioxide
J. G. Tobin; H. Ramanantoanina; C. Daul; S.-W. Yu
J. Vac. Sci. Technol. A 41, 063208 (2023) https://doi.org/10.1116/6.0002969
View articletitled, Multielectronic and multiatomic effects in the U O<sub>4,5</sub> x-ray absorption spectroscopy of uranium dioxide
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CHORUS
Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization
Raquel Garza; Nathan Bartlett; Jameson Crouse; Andrew Herschberg; R. Mohan Sankaran; Md. Amzad Hossain; David N. Ruzic
J. Vac. Sci. Technol. A 41, 063209 (2023) https://doi.org/10.1116/6.0002980
View articletitled, Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization
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Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology
Esteban Broitman; Yuri Kadin; Predrag Andric
J. Vac. Sci. Technol. A 41, 063210 (2023) https://doi.org/10.1116/6.0003048
View articletitled, Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology
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Unveiling interface structure and polarity of wurtzite ZnO film epitaxially grown on a-plane sapphire substrate Editor’s Pick
Lu Lu; Weiwei Meng; Yingmin Wang; Jianbing Qiang; Shao-Bo Mi
J. Vac. Sci. Technol. A 41, 063211 (2023) https://doi.org/10.1116/6.0003163
View articletitled, Unveiling interface structure and polarity of wurtzite ZnO film epitaxially grown on <em>a</em>-plane sapphire substrate
Supplementary Material
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Thin Films
Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array
Jing Yang; Linwei Wang; Zhang Chen; Zhongjun Xue; Shuwen Zhao; Dongzhou Ding
J. Vac. Sci. Technol. A 41, 063401 (2023) https://doi.org/10.1116/6.0002875
View articletitled, Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array
Supplementary Material
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Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
Faezeh A. F. Lahiji; Samiran Bairagi; Roger Magnusson; Mauricio A. Sortica; Daniel Primetzhofer; Erik Ekström; Biplab Paul; Arnaud le Febvrier; Per Eklund
J. Vac. Sci. Technol. A 41, 063402 (2023) https://doi.org/10.1116/6.0002914
View articletitled, Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
Supplementary Material
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Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time
In Special Collection: Multifunctional Coatings and Surfaces
Jennifer Stefani Weber; Vanessa Piroli; Michael Cristian Goldbeck; Bruna Louise Perotti; Carla Daniela Boeira; Newton Kiyoshi Fukumasu; Alexandre Fassini Michels; Carlos Alejandro Figueroa
J. Vac. Sci. Technol. A 41, 063403 (2023) https://doi.org/10.1116/6.0002911
View articletitled, Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time
Supplementary Material
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Ion track formation and porosity in InSb induced by swift heavy ion irradiation Editor’s Pick
Taleb Alwadi; Christian Notthoff; Shankar Dutt; Jessica Wierbik; Nahid Afrin; Alexander Kiy; Patrick Kluth
J. Vac. Sci. Technol. A 41, 063404 (2023) https://doi.org/10.1116/6.0003007
View articletitled, Ion track formation and porosity in InSb induced by swift heavy ion irradiation
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Formation of thin films via cold-rolled/annealed nickel sputtering targets
Sixie Li; Ming Wen; Chuanjun Wang; Yiqing Wang; Yue Shen
J. Vac. Sci. Technol. A 41, 063405 (2023) https://doi.org/10.1116/6.0003033
View articletitled, Formation of thin films via cold-rolled/annealed nickel sputtering targets
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Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties
Hwan-Seok Seo; Taeyoon Lee; Hyungjun Kim; Ivan Petrov; J. E. Greene
J. Vac. Sci. Technol. A 41, 063406 (2023) https://doi.org/10.1116/6.0003072
View articletitled, Phase composition of polycrystalline HfN<sub>x</sub> (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties
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CHORUS
Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatings
Sunil Kumar Tiwari; Akula Umamaheswara Rao; Archana Singh Kharb; Vipin Chawla; Neha Sardana; Devesh Kumar Avasthi; Amit Kumar Chawla
J. Vac. Sci. Technol. A 41, 063407 (2023) https://doi.org/10.1116/6.0003022
View articletitled, Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni<sub>3</sub>Al coatings
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Ultrathin VO2 grown with oxygen plasma molecular beam epitaxy on TiO2 (001) and Al2O3 (0001)
Alyson Spitzig; Jennifer E. Hoffman; Jason D. Hoffman
J. Vac. Sci. Technol. A 41, 063408 (2023) https://doi.org/10.1116/6.0003096
View articletitled, Ultrathin VO<sub>2</sub> grown with oxygen plasma molecular beam epitaxy on TiO<sub>2</sub> (001) and Al<sub>2</sub>O<sub>3</sub> (0001)
Supplementary Material
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Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride
Hankyu Kim; Miso Kim; Bumsang Kim; Bonggeun Shong
J. Vac. Sci. Technol. A 41, 063409 (2023) https://doi.org/10.1116/6.0002966
View articletitled, Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride
Supplementary Material
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Effect of nitrogen pressure on the fabrication of AlCrFeCoNiCu0.5 high entropy nitride thin films via cathodic arc deposition
Tenghao Jiang; Hong Zhao; Kostadinos Tsoutas; Lixian Sun; Hongwei Liu; Yanping Liu; Fanjun Xu; Zhong Zheng; Marcela M. Bilek; Zongwen Liu
J. Vac. Sci. Technol. A 41, 063410 (2023) https://doi.org/10.1116/6.0003064
View articletitled, Effect of nitrogen pressure on the fabrication of AlCrFeCoNiCu<sub>0.5</sub> high entropy nitride thin films via cathodic arc deposition
Supplementary Material
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Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol
Yufan Li; Yong Zheng; Yuze Du; Xi Zhang; Wangwang Wang; Jin Lv
J. Vac. Sci. Technol. A 41, 063411 (2023) https://doi.org/10.1116/6.0003082
View articletitled, Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol
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Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron Editor’s Pick
Laurent Souqui; Hans Högberg; Henrik Pedersen
J. Vac. Sci. Technol. A 41, 063412 (2023) https://doi.org/10.1116/6.0003001
View articletitled, Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron
Supplementary Material
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Influence of nitrogen vacancies on the decomposition route and age hardening of wurtzite Ti1−xAlxNy thin films
J. Salamania; A. F. Farhadizadeh; K. M. Calamba Kwick; I. C. Schramm; T. W. Hsu; L. J. S. Johnson; L. Rogström; M. Odén
J. Vac. Sci. Technol. A 41, 063413 (2023) https://doi.org/10.1116/6.0003074
View articletitled, Influence of nitrogen vacancies on the decomposition route and age hardening of wurtzite Ti<sub>1−x</sub>Al<sub>x</sub>N<sub>y</sub> thin films
Supplementary Material
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Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films
Weilong Gao; Ruizhi Zhang; Jin Wang; Zihao Huang; Zhiguo Li; Yajun Fu; Guoqiang Luo; Rong Tu
J. Vac. Sci. Technol. A 41, 063414 (2023) https://doi.org/10.1116/6.0003066
View articletitled, Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films
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Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector
In-Kyu Jang; Hyung-Joo Lee; Dae-Kwang Kim; Lee-Ku Kwac; Sung Woon Cho
J. Vac. Sci. Technol. A 41, 063415 (2023) https://doi.org/10.1116/6.0002975
View articletitled, Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector
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Tutorials

Some considerations in nanoindentation measurement and analysis by atomic force microscopy Featured
Irit Rosenhek-Goldian; Sidney R. Cohen
J. Vac. Sci. Technol. A 41, 062801 (2023) https://doi.org/10.1116/6.0003136
View articletitled, Some considerations in nanoindentation measurement and analysis by atomic force microscopy
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Perspectives

Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective Featured
Paul S. Bagus; Connie J. Nelin; C. R. Brundle
J. Vac. Sci. Technol. A 41, 068501 (2023) https://doi.org/10.1116/6.0003081
View articletitled, Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective
Supplementary Material
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Surface passivation approaches for silicon, germanium, and III–V semiconductors
Roel J. Theeuwes, Wilhelmus M. M. Kessels, et al.
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma
J. H. Deijkers, H. Thepass, et al.
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
Thorsten Lill, Mingmei Wang, et al.
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