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Volume 41, Issue 6

December 2023

All Issues

ISSN 0734-2101

EISSN 1520-8559

In this Issue

ARTICLES

ARTICLES

2-D Materials

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

T. Stach; A. Seif; A. Ambrosetti; P. L. Silvestrelli; U. Burghaus

J. Vac. Sci. Technol. A 41, 062201 (2023) https://doi.org/10.1116/6.0002948

Abstract

View articletitled, Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

Supplementary Material

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Anticorrosive coatings made from polydopamine modified graphitic C₃N₄ composites with synergistic anticorrosion effects

In Special Collection: Multifunctional Coatings and Surfaces

Lijuan Li; Hongrui Yao; Wenya Bi; Wanlu Fu; Na Wang

J. Vac. Sci. Technol. A 41, 062202 (2023) https://doi.org/10.1116/6.0002769

Abstract

View articletitled, Anticorrosive coatings made from polydopamine modified graphitic C3N4 composites with synergistic anticorrosion effects

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Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H₂/N₂/Ar plasma

Wangu Kang; Ji Sang Ahn; Jeong Hwan Han

J. Vac. Sci. Technol. A 41, 062401 (2023) https://doi.org/10.1116/6.0002970

Abstract

View articletitled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma

Supplementary Material

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Atomic Layer Etching (ALE)

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Azmain A. Hossain; Haozhe Wang; David S. Catherall; Martin Leung; Harm C. M. Knoops; James R. Renzas; Austin J. Minnich

J. Vac. Sci. Technol. A 41, 062601 (2023) https://doi.org/10.1116/6.0002965

Abstract

View articletitled, Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

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Epitaxial Growth of Materials

Solid-source metal-organic MBE for elemental Ir and Ru films

Sreejith Nair; Kyle Noordhoek; Dooyong Lee; Christopher J. Bartel; Bharat Jalan

J. Vac. Sci. Technol. A 41, 062701 (2023) https://doi.org/10.1116/6.0002955

Abstract

View articletitled, Solid-source metal-organic MBE for elemental Ir and Ru films

Supplementary Material

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Plasma Science and Technology

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Daisuke Ogawa; Keiji Nakamura

J. Vac. Sci. Technol. A 41, 063001 (2023) https://doi.org/10.1116/6.0002835

Abstract

View articletitled, Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

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Selective mask deposition using SiCl₄ plasma for highly selective etching process

Miyako Matsui; Makoto Miura; Kenichi Kuwahara

J. Vac. Sci. Technol. A 41, 063002 (2023) https://doi.org/10.1116/6.0002773

Abstract

View articletitled, Selective mask deposition using SiCl4 plasma for highly selective etching process

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Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

J. Zgheib; L. Berthelot; J. Tranchant; N. Ginot; M.-P. Besland; A. Caillard; T. Minea; A. Rhallabi; P.-Y. Jouan

J. Vac. Sci. Technol. A 41, 063003 (2023) https://doi.org/10.1116/6.0002857

Abstract

View articletitled, Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

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Surface Engineering and Coatings

Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium

Naoto Oishi; Tatsuya Yasuoka; Toshiyuki Kawaharamura; Noriko Nitta

J. Vac. Sci. Technol. A 41, 063101 (2023) https://doi.org/10.1116/6.0002878

Abstract

View articletitled, Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium

Supplementary Material

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Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Farzin Ghadami; Mohammad Amin Davoudabadi; Soheil Ghadami

J. Vac. Sci. Technol. A 41, 063102 (2023) https://doi.org/10.1116/6.0002951

Abstract

View articletitled, Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

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Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings

Yu Zheng; Peng Xu; Long Li; Qibin Liu; Shanzhu Guo

J. Vac. Sci. Technol. A 41, 063103 (2023) https://doi.org/10.1116/6.0002885

Abstract

View articletitled, Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings

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Self-joule heating assisted field emission following the Child–Langmuir law

Yoichiro Neo; Rikuto Oda; Jonghyun Moon

J. Vac. Sci. Technol. A 41, 063104 (2023) https://doi.org/10.1116/5.0159964

Abstract

View articletitled, Self-joule heating assisted field emission following the Child–Langmuir law

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Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings

Xin Li; Zixiang Zhou; Chenglei Wang; Haiqing Qin; Jijie Yang; Weijie Liu; Mulin Liang; Chong Liu; Hong Tan; Zhenjun Zhang

J. Vac. Sci. Technol. A 41, 063105 (2023) https://doi.org/10.1116/6.0002872

Abstract

View articletitled, Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings

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Surfaces and Interfaces

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al₂O₃/TiO₂ nanolaminates grown with different precursor purge times

In Special Collection: Atomic Layer Deposition (ALD)

Partha Sarathi Padhi; R. S. Ajimsha; S. K. Rai; Sushmita Bhartiya; Aniruddha Bose; Bidyadhar Das; Manoj Kumar Tiwari; Pankaj Misra

J. Vac. Sci. Technol. A 41, 063201 (2023) https://doi.org/10.1116/6.0002849

Abstract

View articletitled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

Supplementary Material

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Application of machine learning to spectrum and image data

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Satoka Aoyagi

J. Vac. Sci. Technol. A 41, 063202 (2023) https://doi.org/10.1116/6.0002858

Abstract

View articletitled, Application of machine learning to spectrum and image data

Supplementary Material

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Thermal transport and structural improvements due to annealing of wafer bonded β-Ga₂O₃|4H-SiC

In Special Collection: Gallium Oxide Materials and Devices

Michael E. Liao; Kenny Huynh; Zhe Cheng; Jingjing Shi; Samuel Graham; Mark S. Goorsky

J. Vac. Sci. Technol. A 41, 063203 (2023) https://doi.org/10.1116/6.0002693

Abstract

View articletitled, Thermal transport and structural improvements due to annealing of wafer bonded β-Ga2O3|4H-SiC

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Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Wil Gardner; David A. Winkler; David L. J. Alexander; Davide Ballabio; Benjamin W. Muir; Paul J. Pigram

J. Vac. Sci. Technol. A 41, 063204 (2023) https://doi.org/10.1116/6.0002788

Abstract

View articletitled, Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

Supplementary Material

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β-Ga₂O₃ orientation dependence of band offsets with SiO₂ and Al₂O₃

In Special Collection: Gallium Oxide Materials and Devices

Hsiao-Hsuan Wan; Jian-Sian Li; Chao-Ching Chiang; Xinyi Xia; David C. Hays; Fan Ren; Stephen J. Pearton

J. Vac. Sci. Technol. A 41, 063205 (2023) https://doi.org/10.1116/6.0003039

Abstract

View articletitled, β-Ga2O3 orientation dependence of band offsets with SiO2 and Al2O3

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Thin Films

Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array

Jing Yang; Linwei Wang; Zhang Chen; Zhongjun Xue; Shuwen Zhao; Dongzhou Ding

J. Vac. Sci. Technol. A 41, 063401 (2023) https://doi.org/10.1116/6.0002875

Abstract

View articletitled, Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array

Supplementary Material

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Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Faezeh A. F. Lahiji; Samiran Bairagi; Roger Magnusson; Mauricio A. Sortica; Daniel Primetzhofer; Erik Ekström; Biplab Paul; Arnaud le Febvrier; Per Eklund

J. Vac. Sci. Technol. A 41, 063402 (2023) https://doi.org/10.1116/6.0002914

Abstract

View articletitled, Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Supplementary Material

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Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

In Special Collection: Multifunctional Coatings and Surfaces

Jennifer Stefani Weber; Vanessa Piroli; Michael Cristian Goldbeck; Bruna Louise Perotti; Carla Daniela Boeira; Newton Kiyoshi Fukumasu; Alexandre Fassini Michels; Carlos Alejandro Figueroa

J. Vac. Sci. Technol. A 41, 063403 (2023) https://doi.org/10.1116/6.0002911

Abstract

View articletitled, Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

Supplementary Material

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Practical guide for curve fitting in x-ray photoelectron spectroscopy

Low-resistivity molybdenum obtained by atomic layer deposition

Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

ARTICLES

2-D Materials

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

Anticorrosive coatings made from polydopamine modified graphitic C₃N₄ composites with synergistic anticorrosion effects

Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H₂/N₂/Ar plasma

Atomic Layer Etching (ALE)

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Epitaxial Growth of Materials

Solid-source metal-organic MBE for elemental Ir and Ru films

Plasma Science and Technology

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Selective mask deposition using SiCl₄ plasma for highly selective etching process

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

Surface Engineering and Coatings

Competition between ion beam sputtering and self-organization of point defects for surface nanostructuring on germanium

Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings

Self-joule heating assisted field emission following the Child–Langmuir law

Tissue evolution and properties of plasma solid-state surface metallurgical TiCoCrNiWMo high-entropy alloy coatings

Surfaces and Interfaces

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al₂O₃/TiO₂ nanolaminates grown with different precursor purge times

Application of machine learning to spectrum and image data

Thermal transport and structural improvements due to annealing of wafer bonded β-Ga₂O₃|4H-SiC

Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

β-Ga₂O₃ orientation dependence of band offsets with SiO₂ and Al₂O₃

Thin Films

Full-angle high-reflection ultrathin composite film realizing high spatial resolution of scintillation crystal array

Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering

Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

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Issues

ARTICLES

2-D Materials

Atomic Layer Deposition (ALD)

Atomic Layer Etching (ALE)

Epitaxial Growth of Materials

Plasma Science and Technology

Surface Engineering and Coatings

Surfaces and Interfaces

Thin Films

RSS

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

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