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Letters

Evaluating hydrophobic recovery of N₂ and H₂O(g) plasma modified silk fibroin films aged at ambient and elevated temperatures

Ashley N. Keobounnam; Chase Lenert-Mondou; Alexzandria Kubik; Morgan J. Hawker

J. Vac. Sci. Technol. A 41, 050401 (2023) https://doi.org/10.1116/6.0002803

Abstract

View articletitled, Evaluating hydrophobic recovery of N2 and H2O(g) plasma modified silk fibroin films aged at ambient and elevated temperatures

Supplementary Material

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Extending area selective deposition of ruthenium onto 3D SiO₂-Si multilayer stacks

Kartik Sondhi; Rahul Sharangpani; Roshan Tirukkonda; Joyeeta Nag; Xing-Cai Guo; Michael A. Gribelyuk; Raghuveer S. Makala; Senaka Kanakamedala

J. Vac. Sci. Technol. A 41, 050402 (2023) https://doi.org/10.1116/6.0002860

Abstract

View articletitled, Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks

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Review Articles

Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

In Special Collection: Atomic Layer Deposition (ALD)

Nicholas A. Strnad; Daniel M. Potrepka; Brendan M. Hanrahan; Glen R. Fox; Ronald G. Polcawich; Jeffrey S. Pulskamp; Ryan R. Knight; Ryan Q. Rudy

J. Vac. Sci. Technol. A 41, 050801 (2023) https://doi.org/10.1116/6.0002431

Abstract

View articletitled, Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

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Challenges in porosity characterization of thin films: Cross-evaluation of different techniques

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Mikhail R. Baklanov; Konstantin P. Mogilnikov; Alexey S. Vishnevskiy

J. Vac. Sci. Technol. A 41, 050802 (2023) https://doi.org/10.1116/6.0002793

Abstract

View articletitled, Challenges in porosity characterization of thin films: Cross-evaluation of different techniques

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ARTICLES

2-D Materials

Chemical conversion of MoS₂ thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements

J. Patouillard; R. Gassilloud; F. Mercier; A. Mantoux; R. Boichot; A. Crisci; M. Bernard; N. Gauthier; S. Cadot; C. Raynaud; F. Gianesello; E. Blanquet

J. Vac. Sci. Technol. A 41, 052201 (2023) https://doi.org/10.1116/6.0002678

Abstract

View articletitled, Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements

Supplementary Material

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Atomic Layer Deposition (ALD)

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Heli Seppänen; Igor Prozheev; Christoffer Kauppinen; Sami Suihkonen; Kenichiro Mizohata; Harri Lipsanen

J. Vac. Sci. Technol. A 41, 052401 (2023) https://doi.org/10.1116/6.0002705

Abstract

View articletitled, Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

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Low-resistivity molybdenum obtained by atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Kees van der Zouw; Bernhard Y. van der Wel; Antonius A. I. Aarnink; Rob A. M. Wolters; Dirk J. Gravesteijn; Alexey Y. Kovalgin

J. Vac. Sci. Technol. A 41, 052402 (2023) https://doi.org/10.1116/6.0002804

Abstract

View articletitled, Low-resistivity molybdenum obtained by atomic layer deposition

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Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Nickolas Ashburn; Xiuyao Lang; Sumeet Pandey; Steven Wolf; Steve Kramer; John Smythe; Gurtej Sandhu; Charles Winter; Andrew C. Kummel; Kyeongjae Cho

J. Vac. Sci. Technol. A 41, 052403 (2023) https://doi.org/10.1116/6.0002840

Abstract

View articletitled, Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Supplementary Material

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Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

Jake Soares; Wesley Jen; John D. Hues; Drew Lysne; Jesse Wensel; Steven M. Hues; Elton Graugnard

J. Vac. Sci. Technol. A 41, 052404 (2023) https://doi.org/10.1116/6.0002811

Abstract

View articletitled, Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

Supplementary Material

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Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Sanjie Liu; Yangfeng Li; Qing Liu; Jiayou Tao; Xinhe Zheng

J. Vac. Sci. Technol. A 41, 052405 (2023) https://doi.org/10.1116/6.0002639

Abstract

View articletitled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

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Atomic Layer Etching (ALE)

Quasiatomic layer etching of silicon nitride enhanced by low temperature

In Special Collection: Atomic Layer Etching (ALE)

Daniel N. Shanks; Rania K. Ahmed; John D. Femi-Oyetoro; Matthew R. Dickie; Andrew D. Beyer; Frank Greer

J. Vac. Sci. Technol. A 41, 052601 (2023) https://doi.org/10.1116/6.0002846

Abstract

View articletitled, Quasiatomic layer etching of silicon nitride enhanced by low temperature

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Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study

Omesh Dhar Dwivedi; Yuri Barsukov; Sierra Jubin; Joseph R. Vella; Igor Kaganovich

J. Vac. Sci. Technol. A 41, 052602 (2023) https://doi.org/10.1116/6.0002841

Abstract

View articletitled, Orientation-dependent etching of silicon by fluorine molecules: A quantum chemistry computational study

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Epitaxial Growth of Materials

Variation in thermal stability of Ge_1−xSn_x films for infrared device applications

In Special Collection: Papers from the 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)

Amanda N. Lemire; Kevin A. Grossklaus; Thomas E. Vandervelde

J. Vac. Sci. Technol. A 41, 052701 (2023) https://doi.org/10.1116/6.0002680

Abstract

View articletitled, Variation in thermal stability of Ge1−xSnx films for infrared device applications

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Recombination mechanism of heavily Be-doped GaAsN by time-resolved photoluminescence

In Special Collection: Papers from the 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)

Takashi Tsukasaki; Hisashi Sumikura; Takuma Fujimoto; Miki Fujita; Toshiki Makimoto

J. Vac. Sci. Technol. A 41, 052702 (2023) https://doi.org/10.1116/6.0002522

Abstract

View articletitled, Recombination mechanism of heavily Be-doped GaAsN by time-resolved photoluminescence

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Jahn–Teller-driven phase segregation in Mn_xCo_3−xO₄ spinel thin films

Miles D. Blanchet; Bethany E. Matthews; Steven R. Spurgeon; Steve M. Heald; Tamara Isaacs-Smith; Ryan B. Comes

J. Vac. Sci. Technol. A 41, 052703 (2023) https://doi.org/10.1116/6.0002329

Abstract

View articletitled, Jahn–Teller-driven phase segregation in MnxCo3−xO4 spinel thin films

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MBE growth of In_0.53Ga_0.47Sb on In_0.53Ga_0.47As/InP substrates using the interfacial misfit dislocation arrays

In Special Collection: Papers from the 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)

Fatih F. Ince; Mega Frost; Subhashree Seth; Darryl Shima; Thomas J. Rotter; Ganesh Balakrishnan

J. Vac. Sci. Technol. A 41, 052704 (2023) https://doi.org/10.1116/6.0002681

Abstract

View articletitled, MBE growth of In0.53Ga0.47Sb on In0.53Ga0.47As/InP substrates using the interfacial misfit dislocation arrays

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Enhanced structural and optical properties of semipolar (⁠ $11 \bar{2} 2$ ⁠) AlGaN film with insertion of AlN/AlGaN superlattice

In Special Collection: 55 Years of Metalorganic Chemical Vapor Deposition (MOCVD)

Xuguang Luo; Xiong Zhang; Ruiting Fang; Lin Chen; Shenyu Xu; Jia Cui; Zhiyi Lou; Yifeng Xu; Shuchang Wang; Guohua Hu

J. Vac. Sci. Technol. A 41, 052705 (2023) https://doi.org/10.1116/6.0002870

Abstract

View articletitled, Enhanced structural and optical properties of semipolar (⁠ <math xmlns="http://www.w3.org/1998/Math/MathML"> <mrow xmlns=""> <mn>11</mn> <mrow> <mover> <mn>2</mn> <mo stretchy="false">¯</mo></mover></mrow> <mn>2</mn></mrow></math>⁠) AlGaN film with insertion of AlN/AlGaN superlattice

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Impacts of specific element-treated three-dimensional GaN layer on characteristics of nonpolar a-plane GaN film

In Special Collection: 55 Years of Metalorganic Chemical Vapor Deposition (MOCVD)

Yifeng Xu; Xiong Zhang; Ruiting Fang; Xuguang Luo; Lin Chen; Shenyu Xu; Zhiyi Lou; Jia Cui; Guohua Hu

J. Vac. Sci. Technol. A 41, 052706 (2023) https://doi.org/10.1116/6.0002834

Abstract

View articletitled, Impacts of specific element-treated three-dimensional GaN layer on characteristics of nonpolar a-plane GaN film

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Vertical NiO/β-Ga₂O₃ rectifiers grown by metalorganic chemical vapor deposition

Hsiao-Hsuan Wan; Jian-Sian Li; Chao-Ching Chiang; Fan Ren; Timothy Jinsoo Yoo; Honggyu Kim; Andrei Osinsky; Fikadu Alema; Stephen J. Pearton

J. Vac. Sci. Technol. A 41, 052707 (2023) https://doi.org/10.1116/6.0002884

Abstract

View articletitled, Vertical NiO/β-Ga2O3 rectifiers grown by metalorganic chemical vapor deposition

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Photovoltaics and Energy

Design of a custom vapor transport co-deposition system for scalable production of perovskite solar cells

Ella Wassweiler; Anurag Panda; Tamar Kadosh; Thienan Nguyen; Wan-Ju Hsu; Emma Pettit; Russell J. Holmes; Harry Tuller; Vladimir Bulovic

J. Vac. Sci. Technol. A 41, 052801 (2023) https://doi.org/10.1116/6.0002668

Abstract

View articletitled, Design of a custom vapor transport co-deposition system for scalable production of perovskite solar cells

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Plasma Science and Technology

Plasma deposited carbon containing zirconia films as thermal barriers

Vitali Bedarev; Philipp A. Maaß; Anna Thewes; Marc Böke; Achim von Keudell

J. Vac. Sci. Technol. A 41, 053001 (2023) https://doi.org/10.1116/6.0002745

Abstract

View articletitled, Plasma deposited carbon containing zirconia films as thermal barriers

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Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma; Quan-Zhi Zhang; Dao-Man Han; Zi-Lan Xiong; Ming Gao; You-Nian Wang

J. Vac. Sci. Technol. A 41, 053002 (2023) https://doi.org/10.1116/6.0002585

Abstract

View articletitled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

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Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon; Jae-Won Lee; Ho-Won Lee; Yeong-Min Lim; Jiwon Jung; Chin-Wook Chung

J. Vac. Sci. Technol. A 41, 053003 (2023) https://doi.org/10.1116/6.0002790

Abstract

View articletitled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

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Process optimization for shallow trench isolation etch using computational models

Shuo Huang; Prem Panneerchelvam; Chad M. Huard; Shyam Sridhar; Peter L. G. Ventzek; Mark D. Smith

J. Vac. Sci. Technol. A 41, 053004 (2023) https://doi.org/10.1116/6.0002838

Abstract

View articletitled, Process optimization for shallow trench isolation etch using computational models

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Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching

Benjamin Fontaine; Christelle Boixaderas; Jérôme Dubois; Pascal Gouraud; Arnaud Rival; Nicolas Posseme

J. Vac. Sci. Technol. A 41, 053005 (2023) https://doi.org/10.1116/6.0002751

Abstract

View articletitled, Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching

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Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography

Bo Cao; Rui Li; Zhiyuan Cao; Haomin Li; Liqiong Sun; Yingsan Geng; Jianhua Wang; Zhenxing Wang

J. Vac. Sci. Technol. A 41, 053006 (2023) https://doi.org/10.1116/6.0002876

Abstract

View articletitled, Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography

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Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

Changyong Oh; Hyeong Wook Kim; Myeong Woo Ju; Jun Ho Song; Bo Sung Kim

J. Vac. Sci. Technol. A 41, 053007 (2023) https://doi.org/10.1116/6.0002798

Abstract

View articletitled, Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

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Surface Engineering and Coatings

Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31

In Special Collection: Functional Coatings

Yinghe Ma; Jinhui Mei; Junxin Ouyang; Peng Wu; Sai Wang; Jianguo Yang; Yanming He; Wenjian Zheng; Huaxin Li; Chuanyang Lu; Sendong Ren; Jianping Xu; Paul K. Chu

J. Vac. Sci. Technol. A 41, 053101 (2023) https://doi.org/10.1116/6.0002687

Abstract

View articletitled, Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31

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Simulation studies of floating field plate in β-Ga₂O₃ power devices and modules

In Special Collection: Gallium Oxide Materials and Devices

Zhao Han; Guangwei Xu; Xueqiang Xiang; Weibing Hao; Yuanbiao Li; Xuanze Zhou; Xiaobing Yan; Shibing Long

J. Vac. Sci. Technol. A 41, 053102 (2023) https://doi.org/10.1116/6.0002650

Abstract

View articletitled, Simulation studies of floating field plate in β-Ga2O3 power devices and modules

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Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation

Ruibin Duan; Miao Tian; Yuxin Li; Peikang Bai; Zhanyong Zhao; Jianhong Wang; Shouzheng Wei

J. Vac. Sci. Technol. A 41, 053103 (2023) https://doi.org/10.1116/6.0002791

Abstract

View articletitled, Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation

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Characterization of a broad beam Kaufman-type ion source operated with CHF₃ and O₂

Gregor Dornberg; Erik Rohkamm; Peter Birtel; Frank Scholze; Frank Frost

J. Vac. Sci. Technol. A 41, 053104 (2023) https://doi.org/10.1116/6.0002766

Abstract

View articletitled, Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2

Supplementary Material

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Comparative study of the microspot splitting characteristics of direct-current and pulsed cathodic vacuum arc

Ke Zhang; Wenchang Lang; Hao Du; Zhijie Chen; Xinlei Wei; Xianghong Wang; Bin Gao

J. Vac. Sci. Technol. A 41, 053105 (2023) https://doi.org/10.1116/6.0002786

Abstract

View articletitled, Comparative study of the microspot splitting characteristics of direct-current and pulsed cathodic vacuum arc

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Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

In Special Collection: Functional Coatings

Gilad Zorn; Joshua Salisbury; Jae-Hyuk Her; Rachel Rose; Patrick Shower

J. Vac. Sci. Technol. A 41, 053106 (2023) https://doi.org/10.1116/6.0002805

Abstract

View articletitled, Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

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Effect of oxidation time on the structure and properties of Ti–25Nb–3Zr–2Sn–3Mo titanium alloy microarc oxide film layer

Cenyi Wang; Mei Yang; Jingyi Wang; Jie Wang; Yuhang Feng; Xiaohong Wang; Yang Li; Yuan Zhang

J. Vac. Sci. Technol. A 41, 053107 (2023) https://doi.org/10.1116/6.0002771

Abstract

View articletitled, Effect of oxidation time on the structure and properties of Ti–25Nb–3Zr–2Sn–3Mo titanium alloy microarc oxide film layer

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Attempt of TiZrVCrAl coating on aerospace bearings—Lower friction coefficient in oil–liquid mixed media

Jiahe Wang; Qunfeng Zeng; Wanjun He; Zhao Wang; Zekun Ning; Chenjie Zheng; Zeming Pang; Xunkai Wei

J. Vac. Sci. Technol. A 41, 053108 (2023) https://doi.org/10.1116/6.0002843

Abstract

View articletitled, Attempt of TiZrVCrAl coating on aerospace bearings—Lower friction coefficient in oil–liquid mixed media

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Tailoring of Mg and MgLi thin-film corrosion rates with dielectric barrier discharge plasma treatment

In Special Collection: Papers from the Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2022)

Lisa Hanke; Torge Hartig; Felix Weisheit; Tim Tjardts; Tim Pogoda; Franz Faupel; Eckhard Quandt

J. Vac. Sci. Technol. A 41, 053109 (2023) https://doi.org/10.1116/6.0002783

Abstract

View articletitled, Tailoring of Mg and MgLi thin-film corrosion rates with dielectric barrier discharge plasma treatment

Supplementary Material

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Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides

Rahel Heesemann; Isa Bettermann; Roshan Paul; Milena Rey; Thomas Gries; Lilin Feng; Ulrich Schwaneberg; Claus Hummelsheim

J. Vac. Sci. Technol. A 41, 053110 (2023) https://doi.org/10.1116/6.0002776

Abstract

View articletitled, Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides

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Graphite oxide synthetized by pulsed laser ablation technique used as an antifouling coating to inhibit CaCO₃ scale on stainless steel surfaces

Juan P. Cuenca-Vargas; Juan D. Lopez-Vargas; Andre A. Drummond; Marcelo M. Werneck; Dante F. Franceschini; Sergio S. Camargo

J. Vac. Sci. Technol. A 41, 053111 (2023) https://doi.org/10.1116/6.0002833

Abstract

View articletitled, Graphite oxide synthetized by pulsed laser ablation technique used as an antifouling coating to inhibit CaCO3 scale on stainless steel surfaces

Supplementary Material

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Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Lena Patterer; Sabrina Kollmann; Teresa de los Arcos; Leonie Jende; Soheil Karimi Aghda; Damian M. Holzapfel; Sameer A. Salman; Stanislav Mráz; Guido Grundmeier; Jochen M. Schneider

J. Vac. Sci. Technol. A 41, 053112 (2023) https://doi.org/10.1116/6.0002921

Abstract

View articletitled, Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate

Supplementary Material

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Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Brahim Ahammou; Paramita Bhattacharyya; Christophe Levallois; Fahmida Azmi; Jean-Pierre Landesman; Peter Mascher

J. Vac. Sci. Technol. A 41, 053113 (2023) https://doi.org/10.1116/6.0002896

Abstract

View articletitled, Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

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Surfaces and Interfaces

Investigating wet chemical oxidation methods to form SiO₂ interlayers for self-aligned Pt-HfO₂-Si gate stacks

Amy C. Brummer; Siddharth Kurup; Daniel Aziz; Michael A. Filler; Eric M. Vogel

J. Vac. Sci. Technol. A 41, 053201 (2023) https://doi.org/10.1116/6.0002762

Abstract

View articletitled, Investigating wet chemical oxidation methods to form SiO2 interlayers for self-aligned Pt-HfO2-Si gate stacks

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Deposition and characterization of α-Fe₂O₃/Pd thin films for neutron reflectometry studies

Hanyu Wang; Ethan C. Self; Sadhvikas J. Addamane; Christopher M. Rouleau; Ryan R. Wixom; Katie L. Browning; Gabriel M. Veith; Liyuan Liang; James F. Browning

J. Vac. Sci. Technol. A 41, 053202 (2023) https://doi.org/10.1116/6.0002717

Abstract

View articletitled, Deposition and characterization of α-Fe2O3/Pd thin films for neutron reflectometry studies

Supplementary Material

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High quality β-Ga₂O₃ bulk crystals, grown by edge-defined film-fed growth method: Growth features, structural, and thermal properties

In Special Collection: Gallium Oxide Materials and Devices

Dmitrii A. Bauman; Dmitrii Iu. Panov; Vladislav A. Spiridonov; Arina V. Kremleva; Aleksei V. Asach; Ekaterina V. Tambulatova; A. V. Sakharov; Alexey E. Romanov

J. Vac. Sci. Technol. A 41, 053203 (2023) https://doi.org/10.1116/6.0002644

Abstract

View articletitled, High quality β-Ga2O3 bulk crystals, grown by edge-defined film-fed growth method: Growth features, structural, and thermal properties

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Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

N. Sano; A. Bellew; P. Blenkinsopp

J. Vac. Sci. Technol. A 41, 053204 (2023) https://doi.org/10.1116/6.0002864

Abstract

View articletitled, Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application

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In situ plasmonic tip preparation and validation techniques for scanning tunneling microscopy

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Benjamen N. Taber; Matthew L. Neill; Trevor N. Thom; Octavia D. Clapp; Vartkess Ara Apkarian; Joonhee Lee

J. Vac. Sci. Technol. A 41, 053205 (2023) https://doi.org/10.1116/6.0002807

Abstract

View articletitled, In situ plasmonic tip preparation and validation techniques for scanning tunneling microscopy

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Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Faegheh S. Sajjadian; Laura Galleni; Kevin M. Dorney; Dhirendra P. Singh; Fabian Holzmeier; Michiel J. van Setten; Stefan De Gendt; Thierry Conard

J. Vac. Sci. Technol. A 41, 053206 (2023) https://doi.org/10.1116/6.0002808

Abstract

View articletitled, Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials

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ToF-SIMS in battery research: Advantages, limitations, and best practices

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Teo Lombardo; Felix Walther; Christine Kern; Yannik Moryson; Timo Weintraut; Anja Henss; Marcus Rohnke

J. Vac. Sci. Technol. A 41, 053207 (2023) https://doi.org/10.1116/6.0002850

Abstract

View articletitled, ToF-SIMS in battery research: Advantages, limitations, and best practices

Supplementary Material

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Atomic layer deposition of Al₂O₃ interlayer for improving AlN growth on silicon substrates

Rony Saha; Jonathan Anderson; Mark W. Holtz; Edwin L. Piner

J. Vac. Sci. Technol. A 41, 053208 (2023) https://doi.org/10.1116/6.0002760

Abstract

View articletitled, Atomic layer deposition of Al2O3 interlayer for improving AlN growth on silicon substrates

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Plasmonic black coatings with broadband absorption for space applications

Hanjörg Wagner; Valentin Ripka; Andrea Dellith; Jan Dellith; Florian Wittkämper; Uwe Hübner; Mario Ziegler

J. Vac. Sci. Technol. A 41, 053209 (2023) https://doi.org/10.1116/6.0002821

Abstract

View articletitled, Plasmonic black coatings with broadband absorption for space applications

Supplementary Material

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VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO₂ nanoparticles using ToF-SIMS

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

J. Vac. Sci. Technol. A 41, 053210 (2023) https://doi.org/10.1116/6.0002814

Abstract

View articletitled, VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS

Supplementary Material

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Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

Jeong Won Kim; Ansoon Kim; Hui Ung Hwang; Jun Hyung Kim; Seungwook Choi; Norbert Koch; Dongguen Shin; Zhijuan Zhao; Fen Liu; Minki Choi; Kyu Myung Lee; Yongsup Park

J. Vac. Sci. Technol. A 41, 053211 (2023) https://doi.org/10.1116/6.0002852

Abstract

View articletitled, Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study

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Thin Films

Optical, surface, and structural studies of InN thin films grown on sapphire by molecular beam epitaxy

Zhe Chuan Feng; Deng Xie; Manika Tun Nafisa; Hao-Hsiung Lin; Weijie Lu; Jin-Ming Chen; Jeffrey Yiin; Kuei-Hsien Chen; Li-Chyong Chen; Benjamin Klein; Ian T. Ferguson

J. Vac. Sci. Technol. A 41, 053401 (2023) https://doi.org/10.1116/6.0002665

Abstract

View articletitled, Optical, surface, and structural studies of InN thin films grown on sapphire by molecular beam epitaxy

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Stages of self-arrangement in growth of nanostructured graphene films related to the flow of ionized species during plasma-enhanced chemical vapor deposition

Algimantas Lukša; Viktorija Nargelienė; Marius Treideris; Virginijus Bukauskas; Martynas Talaikis; Arūnas Šetkus

J. Vac. Sci. Technol. A 41, 053402 (2023) https://doi.org/10.1116/6.0002694

Abstract

View articletitled, Stages of self-arrangement in growth of nanostructured graphene films related to the flow of ionized species during plasma-enhanced chemical vapor deposition

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Low-temperature, single-source, chemical vapor deposition of molybdenum nitride thin films

In Special Collection: 55 Years of Metalorganic Chemical Vapor Deposition (MOCVD)

Michael A. Land; Justin T. Lomax; Seán T. Barry

J. Vac. Sci. Technol. A 41, 053403 (2023) https://doi.org/10.1116/6.0002830

Abstract

View articletitled, Low-temperature, single-source, chemical vapor deposition of molybdenum nitride thin films

Supplementary Material

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(AlCrNiTiZr)N_x high-entropy nitride coatings with enhanced hardness via tailoring N₂ flow rates for anti-wear applications

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Jia Zheng; Cunxiu Zhang; Jingchuan Li; Junyi Chen; Yifan Dong; Sam Zhang; Jian Zhang; Deen Sun

J. Vac. Sci. Technol. A 41, 053404 (2023) https://doi.org/10.1116/6.0002837

Abstract

View articletitled, (AlCrNiTiZr)Nx high-entropy nitride coatings with enhanced hardness via tailoring N2 flow rates for anti-wear applications

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Room temperature magnetron sputtering and laser annealing of ultrathin amorphous sulfur-rich MoS_x films

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Spencer Gellerup; Corey L. Arnold; Christopher Muratore; Nicholas R. Glavin; Nigel D. Shepherd; Andrey A. Voevodin

J. Vac. Sci. Technol. A 41, 053405 (2023) https://doi.org/10.1116/6.0002544

Abstract

View articletitled, Room temperature magnetron sputtering and laser annealing of ultrathin amorphous sulfur-rich MoSx films

Supplementary Material

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Performance and stability of Al-doped HfGaO thin-film transistors deposited by vapor cooling condensation system

In Special Collection: Gallium Oxide Materials and Devices

Hsin-Ying Lee; Guo-Long Zhu; Ching-Ting Lee

J. Vac. Sci. Technol. A 41, 053406 (2023) https://doi.org/10.1116/6.0002826

Abstract

View articletitled, Performance and stability of Al-doped HfGaO thin-film transistors deposited by vapor cooling condensation system

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Reactive plasma sputtering deposition of polycrystalline GaN thin films on silicon substrates at room temperature

Lakshman Srinivasan; Cyril Jadaud; François Silva; Jean-Charles Vanel; Jean-Luc Maurice; Erik Johnson; Pere Roca i Cabarrocas; Karim Ouaras

J. Vac. Sci. Technol. A 41, 053407 (2023) https://doi.org/10.1116/6.0002718

Abstract

View articletitled, Reactive plasma sputtering deposition of polycrystalline GaN thin films on silicon substrates at room temperature

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Observable color change of Cu₂O–Mo–Zr composite films based on rapid oxidation at room temperature and thin film interference behavior

Haoge Zhang; Pengyan Shi; Yuanjiang Lv; Haoliang Sun; Guangxin Wang

J. Vac. Sci. Technol. A 41, 053408 (2023) https://doi.org/10.1116/6.0002774

Abstract

View articletitled, Observable color change of Cu2O–Mo–Zr composite films based on rapid oxidation at room temperature and thin film interference behavior

Supplementary Material

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Effect of the growth orientation on the physical properties of Sr₂CoNbO₆ thin films

Ajay Kumar; Ramcharan Meena; M. Miryala; K. Ueno; Rajendra S. Dhaka

J. Vac. Sci. Technol. A 41, 053409 (2023) https://doi.org/10.1116/6.0002728

Abstract

View articletitled, Effect of the growth orientation on the physical properties of Sr2CoNbO6 thin films

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Effect of local pressure difference caused by argon flow on properties of DLC films on rubber

Haoran Zeng; Jiaqi Liu; Tao Yang; Qiaoyuan Deng; Feng Wen

J. Vac. Sci. Technol. A 41, 053410 (2023) https://doi.org/10.1116/6.0002806

Abstract

View articletitled, Effect of local pressure difference caused by argon flow on properties of DLC films on rubber

Supplementary Material

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Study of the structure, structural transition, interface model, and magnetic moments of CrN grown on MgO(001) by molecular beam epitaxy

Khan Alam; Rodrigo Ponce-Pérez; Kai Sun; Andrew Foley; Noboru Takeuchi; Arthur R. Smith

J. Vac. Sci. Technol. A 41, 053411 (2023) https://doi.org/10.1116/6.0002546

Abstract

View articletitled, Study of the structure, structural transition, interface model, and magnetic moments of CrN grown on MgO(001) by molecular beam epitaxy

Supplementary Material

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Growth of SrMoO₃ thin films by suboxide molecular beam epitaxy

In Special Collection: Special Topic Collection Commemorating the Career of Frederick J. Walker

Tatiana Kuznetsova; Joseph Roth; Jason Lapano; Alexej Pogrebnyakov; Roman Engel-Herbert

J. Vac. Sci. Technol. A 41, 053412 (2023) https://doi.org/10.1116/6.0002853

Abstract

View articletitled, Growth of SrMoO3 thin films by suboxide molecular beam epitaxy

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Low temperature preparation of YSZ-based thin-film limiting current type oxygen sensor

Yuping Jiang; Jingsong Zhang; Dawei Yan; Wei Tang; Jin Wang; Linhong Cao; Yajun Fu; Lin Shu

J. Vac. Sci. Technol. A 41, 053413 (2023) https://doi.org/10.1116/6.0002907

Abstract

View articletitled, Low temperature preparation of YSZ-based thin-film limiting current type oxygen sensor

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Theoretical studies of magnetic domain phase diagrams from micromagnetic simulation

Dao-Jing Huang; Yi-Sheng Lai; Yen-Hsun Su

J. Vac. Sci. Technol. A 41, 053414 (2023) https://doi.org/10.1116/6.0002865

Abstract

View articletitled, Theoretical studies of magnetic domain phase diagrams from micromagnetic simulation

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Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Smita G. Rao; Pascal Manuel Illgner; Robert Boyd; Gyula Nagy; Philippe Djemia; Daniel Primetzhofer; Ivan Petrov; Arnaud le Febvrier; Per Eklund

J. Vac. Sci. Technol. A 41, 053415 (2023) https://doi.org/10.1116/6.0002947

Abstract

View articletitled, Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering

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