Skip Nav Destination

Issues

Select Year

Issue

Letters

7.5 kV, 6.2 GW cm⁻² NiO/β-Ga₂O₃ vertical rectifiers with on–off ratio greater than 10¹³

In Special Collection: Gallium Oxide Materials and Devices

Jian-Sian Li; Chao-Ching Chiang; Xinyi Xia; Hsiao-Hsuan Wan; Fan Ren; S. J. Pearton

J. Vac. Sci. Technol. A 41, 030401 (2023) https://doi.org/10.1116/6.0002580

Abstract

View articletitled, 7.5 kV, 6.2 GW cm−2 NiO/β-Ga2O3 vertical rectifiers with on–off ratio greater than 1013

Open the PDF for in another window

Limiting reagent conditions to control inorganic loading in AlO_x–PET hybrid fabrics created through vapor-phase infiltration

Emily K. McGuinness; Haley V. Manno; Kira Pyronneau; Benjamin C. Jean; Nicole R. McClelland; Mark D. Losego

J. Vac. Sci. Technol. A 41, 030402 (2023) https://doi.org/10.1116/6.0002534

Abstract

View articletitled, Limiting reagent conditions to control inorganic loading in AlOx–PET hybrid fabrics created through vapor-phase infiltration

Supplementary Material

Open the PDF for in another window

CHORUS

Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition

Jing-Jia Huang; Christian Militzer; Charles A. Wijayawardhana; Urban Forsberg; Henrik Pedersen

J. Vac. Sci. Technol. A 41, 030403 (2023) https://doi.org/10.1116/6.0002461

Abstract

View articletitled, Superconformal silicon carbide coatings via precursor pulsed chemical vapor deposition

Open the PDF for in another window

Review Articles

Influence of local chemical environment and external perturbations of porphyrins on surfaces

José J. Ortiz-Garcia; Rebecca C. Quardokus

J. Vac. Sci. Technol. A 41, 030801 (2023) https://doi.org/10.1116/6.0002401

Abstract

View articletitled, Influence of local chemical environment and external perturbations of porphyrins on surfaces

Open the PDF for in another window

ARTICLES

Atomic Layer Deposition (ALD)

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

In Special Collection: Atomic Layer Deposition (ALD)

Clémence Badie; Héloïse Tissot; Beniamino Sciacca; Maïssa K. Barr; Julien Bachmann; Christophe Vallée; Gaël Gautier; Thomas Defforge; Vincent Astie; Jean-Manuel Decams; Mikhael Bechelany; Lionel Santinacci

J. Vac. Sci. Technol. A 41, 032401 (2023) https://doi.org/10.1116/6.0002288

Abstract

View articletitled, Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Supplementary Material

Open the PDF for in another window

Area selective atomic layer deposition of SnO₂ as an etch resist in fluorine based processes

In Special Collection: Atomic Layer Deposition (ALD)

Xin Yang; Himamshu Nallan; Brennan M. Coffey; John G. Ekerdt

J. Vac. Sci. Technol. A 41, 032402 (2023) https://doi.org/10.1116/6.0002429

Abstract

View articletitled, Area selective atomic layer deposition of SnO2 as an etch resist in fluorine based processes

Open the PDF for in another window

Surface functionalization of microporous carbon fibers by vapor phase methods for CO₂ capture

In Special Collection: Atomic Layer Deposition (ALD)

Stephan Prünte; Gerben van Straaten; Dries van Eyck; Oscar Diaz-Morales; Jeroen Van Dijck; Hans de Neve; Mariadriana Creatore

J. Vac. Sci. Technol. A 41, 032403 (2023) https://doi.org/10.1116/6.0002419

Abstract

View articletitled, Surface functionalization of microporous carbon fibers by vapor phase methods for CO2 capture

Supplementary Material

Open the PDF for in another window

Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

In Special Collection: Area Selective Deposition

Kaat Van Dongen; Rachel A. Nye; Jan-Willem J. Clerix; Claudia Sixt; Danilo De Simone; Annelies Delabie

J. Vac. Sci. Technol. A 41, 032404 (2023) https://doi.org/10.1116/6.0002347

Abstract

View articletitled, Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

Supplementary Material

Open the PDF for in another window

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Adnan Mohammad; Krishna D. Joshi; Dhan Rana; Saidjafarzoda Ilhom; Barrett Wells; Brian Willis; Boris Sinkovic; A. K. Okyay; Necmi Biyikli

J. Vac. Sci. Technol. A 41, 032405 (2023) https://doi.org/10.1116/6.0002383

Abstract

View articletitled, Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Supplementary Material

Open the PDF for in another window

In situ analysis of nucleation reactions during TiCl₄/H₂O atomic layer deposition on SiO₂ and H-terminated Si surfaces treated with a silane small molecule inhibitor

In Special Collection: Atomic Layer Deposition (ALD)

Jan-Willem J. Clerix; Golnaz Dianat; Annelies Delabie; Gregory N. Parsons

J. Vac. Sci. Technol. A 41, 032406 (2023) https://doi.org/10.1116/6.0002493

Abstract

View articletitled, In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor

Open the PDF for in another window

Control by atomic layer deposition over the chemical composition of nickel cobalt oxide for the oxygen evolution reaction

In Special Collection: Atomic Layer Deposition (ALD)

Renee T. M. van Limpt; Marek Lavorenti; Marcel A. Verheijen; Mihalis N. Tsampas; Mariadriana Creatore

J. Vac. Sci. Technol. A 41, 032407 (2023) https://doi.org/10.1116/6.0002414

Abstract

View articletitled, Control by atomic layer deposition over the chemical composition of nickel cobalt oxide for the oxygen evolution reaction

Supplementary Material

Open the PDF for in another window

Vapor-phase grafting of functional silanes on atomic layer deposited Al₂O₃

Vepa Rozyyev; Rahul Shevate; Rajesh Pathak; Julia G. Murphy; Anil U. Mane; S. J. Sibener; Jeffrey W. Elam

J. Vac. Sci. Technol. A 41, 032408 (2023) https://doi.org/10.1116/6.0002364

Abstract

View articletitled, Vapor-phase grafting of functional silanes on atomic layer deposited Al2O3

Supplementary Material

Open the PDF for in another window

CHORUS

Atomic layer deposition of MoO_x thin films using Mo(ⁱPrCp)₂H₂ and O₃

Ethan Hendrix; Ben M. Garland; Vamseedhara Vemuri; Nicholas C. Strandwitz

J. Vac. Sci. Technol. A 41, 032409 (2023) https://doi.org/10.1116/6.0002436

Abstract

View articletitled, Atomic layer deposition of MoOx thin films using Mo(iPrCp)2H2 and O3

Open the PDF for in another window

Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film

Toshihiko Iwao; Tsung-Hsuan Yang; Gyeong S. Hwang; Peter L. G. Ventzek

J. Vac. Sci. Technol. A 41, 032410 (2023) https://doi.org/10.1116/6.0002499

Abstract

View articletitled, Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film

Open the PDF for in another window

Atomic Layer Etching (ALE)

Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution

In Special Collection: Atomic Layer Etching (ALE)

Antoine Pacco; Teppei Nakano; Shota Iwahata; Akihisa Iwasaki; Efrain Altamirano Sanchez

J. Vac. Sci. Technol. A 41, 032601 (2023) https://doi.org/10.1116/6.0002404

Abstract

View articletitled, Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution

Supplementary Material

Open the PDF for in another window

Atomic layer etching of gallium nitride using fluorine-based chemistry

In Special Collection: Atomic Layer Etching (ALE)

Lamiae Hamraoui; Tinghui Zhang; Angela Crespi; Philippe Lefaucheux; Thomas Tillocher; Mohamed Boufnichel; Rémi Dussart

J. Vac. Sci. Technol. A 41, 032602 (2023) https://doi.org/10.1116/6.0002452

Abstract

View articletitled, Atomic layer etching of gallium nitride using fluorine-based chemistry

Open the PDF for in another window

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

In Special Collection: Atomic Layer Etching (ALE)

Jessica A. Murdzek; Ann Lii-Rosales; Steven M. George

J. Vac. Sci. Technol. A 41, 032603 (2023) https://doi.org/10.1116/6.0002488

Abstract

View articletitled, Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Supplementary Material

Open the PDF for in another window

Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study

In Special Collection: Atomic Layer Etching (ALE)

Romel Hidayat; Khabib Khumaini; Hye-Lee Kim; Tanzia Chowdhury; Tirta Rona Mayangsari; Seongjae Cho; Byungchul Cho; Sangjoon Park; Jongwan Jung; Won-Jun Lee

J. Vac. Sci. Technol. A 41, 032604 (2023) https://doi.org/10.1116/6.0002433

Abstract

View articletitled, Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study

Supplementary Material

Open the PDF for in another window

Real-time monitoring of atomic layer etching in Cl₂/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

In Special Collection: Atomic Layer Etching (ALE)

Qinzhen Hao; Pilbum Kim; Sang Ki Nam; Song-Yun Kang; Vincent M. Donnelly

J. Vac. Sci. Technol. A 41, 032605 (2023) https://doi.org/10.1116/6.0002482

Abstract

View articletitled, Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

Open the PDF for in another window

Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF₆ plasma and Al(CH₃)₃

Haozhe Wang; Azmain Hossain; David Catherall; Austin J. Minnich

J. Vac. Sci. Technol. A 41, 032606 (2023) https://doi.org/10.1116/6.0002476

Abstract

View articletitled, Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF6 plasma and Al(CH3)3

Open the PDF for in another window

Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness

In Special Collection: Atomic Layer Etching (ALE)

J. A. Michaels; N. Delegan; Y. Tsaturyan; J. R. Renzas; D. D. Awschalom; J. G. Eden; F. J. Heremans

J. Vac. Sci. Technol. A 41, 032607 (2023) https://doi.org/10.1116/6.0002447

Abstract

View articletitled, Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness

Supplementary Material

Open the PDF for in another window

CHORUS

Epitaxial Growth of Materials

NiO/β-(Al_xGa_1−x)₂O₃/Ga₂O₃ heterojunction lateral rectifiers with reverse breakdown voltage >7 kV

In Special Collection: Gallium Oxide Materials and Devices

Hsiao-Hsuan Wan; Jian-Sian Li; Chao-Ching Chiang; Xinyi Xia; Fan Ren; Hannah N. Masten; James Spencer Lundh; Joseph A. Spencer; Fikadu Alema; Andrei Osinsky; Alan G. Jacobs; Karl Hobart; Marko J. Tadjer; S. J. Pearton

J. Vac. Sci. Technol. A 41, 032701 (2023) https://doi.org/10.1116/6.0002393

Abstract

View articletitled, NiO/β-(AlxGa1−x)2O3/Ga2O3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV

Open the PDF for in another window

Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition

Rong Chen; Zilian Qi; Yingfei Xiong; Yicheng Li; Xiaodong Zhang; Kun Cao

J. Vac. Sci. Technol. A 41, 032702 (2023) https://doi.org/10.1116/6.0002386

Abstract

View articletitled, Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition

Supplementary Material

Open the PDF for in another window

InAs quantum emitters at telecommunication wavelengths grown by droplet epitaxy

In Special Collection: Papers from the 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)

Margaret A. Stevens; Wayne McKenzie; Gerald Baumgartner; Joel Q. Grim; Samuel G. Carter; Allan S. Bracker

J. Vac. Sci. Technol. A 41, 032703 (2023) https://doi.org/10.1116/6.0002572

Abstract

View articletitled, InAs quantum emitters at telecommunication wavelengths grown by droplet epitaxy

Open the PDF for in another window

Epitaxial growth of atomically thin Ga₂Se₂ films on c-plane sapphire substrates

In Special Collection: Papers from the 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)

Mingyu Yu; Lottie Murray; Matthew Doty; Stephanie Law

J. Vac. Sci. Technol. A 41, 032704 (2023) https://doi.org/10.1116/6.0002446

Abstract

View articletitled, Epitaxial growth of atomically thin Ga2Se2 films on c-plane sapphire substrates

Supplementary Material

Open the PDF for in another window

Transport and trap states in proton irradiated ultra-thick κ-Ga₂O₃

In Special Collection: Gallium Oxide Materials and Devices

A. Y. Polyakov; V. I. Nikolaev; A. I. Pechnikov; E. B. Yakimov; P. B. Lagov; I. V. Shchemerov; A. A. Vasilev; A. I. Kochkova; A. V. Chernykh; In-Hwan Lee; S. J. Pearton

J. Vac. Sci. Technol. A 41, 032705 (2023) https://doi.org/10.1116/6.0002673

Abstract

View articletitled, Transport and trap states in proton irradiated ultra-thick κ-Ga2O3

Supplementary Material

Open the PDF for in another window

CHORUS

Plasma Science and Technology

Ion velocity distribution functions across a plasma meniscus

D. Caron; R. John; E. E. Scime; T. E. Steinberger

J. Vac. Sci. Technol. A 41, 033001 (2023) https://doi.org/10.1116/6.0002439

Abstract

View articletitled, Ion velocity distribution functions across a plasma meniscus

Open the PDF for in another window

Role of SiCl₄ addition in CH₃F/O₂ based chemistry for Si₃N₄ etching selectively to SiO₂, SiCO, and Si

François Boulard; Valentin Bacquié; Aurélien Tavernier; Nicolas Possémé

J. Vac. Sci. Technol. A 41, 033002 (2023) https://doi.org/10.1116/6.0002434

Abstract

View articletitled, Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si

Open the PDF for in another window

Enhancement of discharge and mechanical properties of ta-C films by pulse-enhanced cathodic arc deposition

In Special Collection: Functional Coatings

Benfu Wang; Xiubo Tian; Jian Hu; Chunzhi Gong; Xiangli Liu; Jin Li

J. Vac. Sci. Technol. A 41, 033003 (2023) https://doi.org/10.1116/6.0002352

Abstract

View articletitled, Enhancement of discharge and mechanical properties of ta-C films by pulse-enhanced cathodic arc deposition

Open the PDF for in another window

Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices

O. Fesiienko; C. Petit-Etienne; M. Darnon; A. Soltani; H. Maher; E. Pargon

J. Vac. Sci. Technol. A 41, 033004 (2023) https://doi.org/10.1116/6.0002339

Abstract

View articletitled, Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices

Open the PDF for in another window

Study on etch characteristics of magnetic tunnel junction materials using rf-biased H₂/NH₃ reactive ion beam

In Special Collection: Celebrating the Achievements and Life of Joe Greene

Ye Eun Kim; Doo San Kim; Yun Jong Jang; Hong Seong Gil; Ho Seop Jeon; Jong Woo Hong; In Ho Kim; Cheol Kim; Jeong-Heon Park; Geun Young Yeom

J. Vac. Sci. Technol. A 41, 033005 (2023) https://doi.org/10.1116/6.0002465

Abstract

View articletitled, Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam

Open the PDF for in another window

Neutral transport during etching of high aspect ratio features

Theodoros Panagopoulos; Thorsten Lill

J. Vac. Sci. Technol. A 41, 033006 (2023) https://doi.org/10.1116/6.0002468

Abstract

View articletitled, Neutral transport during etching of high aspect ratio features

Open the PDF for in another window

In situ diagnostics of the Si etching structures profile in ICP SF₆/C₄F₈ plasma: Macrostructures

Artem Osipov; Alina Gagaeva; Anastasia Speshilova; Armenak Osipov; Yakov Enns; Alexey Kazakin; Ekaterina Endiiarova; Roman Kornilov; Sergey Alexandrov

J. Vac. Sci. Technol. A 41, 033007 (2023) https://doi.org/10.1116/6.0002427

Abstract

View articletitled, In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures

Open the PDF for in another window

Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Yuhua Xiao; Joel Brandon; Joshua Morsell; Sang Ki Nam; KiHo Bae; Jang-Yeob Lee; Steven Shannon

J. Vac. Sci. Technol. A 41, 033008 (2023) https://doi.org/10.1116/6.0002496

Abstract

View articletitled, Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma

Open the PDF for in another window

Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

M. Renner; J. Fischer; H. Hajihoseini; J. T. Gudmundsson; M. Rudolph; D. Lundin

J. Vac. Sci. Technol. A 41, 033009 (2023) https://doi.org/10.1116/6.0002555

Abstract

View articletitled, Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

Open the PDF for in another window

Surface Engineering and Coatings

Influence of γ'_N and ɛ'_N phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing

Jeet Vijay Sah; Pravin Kumari Dwivedi; Subroto Mukherjee; Ghanshyam Jhala; Alphonsa Joseph

J. Vac. Sci. Technol. A 41, 033101 (2023) https://doi.org/10.1116/6.0002346

Abstract

View articletitled, Influence of γ'N and ɛ'N phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing

Open the PDF for in another window

Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS₂ coating

Ming Cao; Lan Zhao

J. Vac. Sci. Technol. A 41, 033102 (2023) https://doi.org/10.1116/6.0002360

Abstract

View articletitled, Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS2 coating

Open the PDF for in another window

Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells

In Special Collection: Functional Coatings

Rebeca F. B. de O. Correia; Aline G. Sampaio; Noala V. M. Milhan; Ariel Capote; Holger Gerdes; Kristina Lachmann; Vladimir J. Trava-Airoldi; Cristiane Yumi Koga-Ito; Ralf Bandorf

J. Vac. Sci. Technol. A 41, 033103 (2023) https://doi.org/10.1116/6.0002354

Abstract

View articletitled, Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells

Open the PDF for in another window

Influence of the etching process on the coating performance in dry tribological contacts

In Special Collection: Functional Coatings

K. Bobzin; C. Kalscheuer; M. Carlet; C. Schulze

J. Vac. Sci. Technol. A 41, 033104 (2023) https://doi.org/10.1116/6.0002363

Abstract

View articletitled, Influence of the etching process on the coating performance in dry tribological contacts

Open the PDF for in another window

Tribological behavior of WC/WCN/CNx coatings deposited by high power impulse magnetron sputtering

L. Flores-Cova; E. Broitman; O. Jimenez; M. Flores-Martínez

J. Vac. Sci. Technol. A 41, 033105 (2023) https://doi.org/10.1116/6.0002421

Abstract

View articletitled, Tribological behavior of WC/WCN/CNx coatings deposited by high power impulse magnetron sputtering

Open the PDF for in another window

Hydrophobic Si nanopillar array coated with few-layer MoS₂ films for surface-enhanced Raman scattering

Tsung-Shine Ko; Yen-Lun Chen; Jiann Shieh; Szu-Hung Chen; Jing-Yang Syu; Guan-Long Chen

J. Vac. Sci. Technol. A 41, 033106 (2023) https://doi.org/10.1116/6.0002589

Abstract

View articletitled, Hydrophobic Si nanopillar array coated with few-layer MoS2 films for surface-enhanced Raman scattering

Open the PDF for in another window

Improvement of antibacterial activity and mechanical properties of titanium alloy by TiAlN/Ag gradient multilayer coatings

Xianglin Fang; Rong Tu; Jiawei Liu; Honglian Dai; Long Zheng; Shaobo Zhu; Song Zhang; Takashi Goto

J. Vac. Sci. Technol. A 41, 033107 (2023) https://doi.org/10.1116/6.0002552

Abstract

View articletitled, Improvement of antibacterial activity and mechanical properties of titanium alloy by TiAlN/Ag gradient multilayer coatings

Open the PDF for in another window

Surfaces and Interfaces

Adapting FEFF to 5f angular momentum coupling

J. G. Tobin; S.-W. Yu

J. Vac. Sci. Technol. A 41, 033201 (2023) https://doi.org/10.1116/6.0002420

Abstract

View articletitled, Adapting FEFF to 5f angular momentum coupling

Open the PDF for in another window

Branched nozzle oblique angle flow for initiated chemical vapor deposition

Nicholas A. Welchert; Jay V. Swarup; Rohan S. Gupta; Malancha Gupta

J. Vac. Sci. Technol. A 41, 033202 (2023) https://doi.org/10.1116/6.0002349

Abstract

View articletitled, Branched nozzle oblique angle flow for initiated chemical vapor deposition

Supplementary Material

Open the PDF for in another window

Effects of adventitious impurity adsorption on oxygen interstitial injection rates from submerged TiO₂(110) and ZnO(0001) surfaces

Heonjae Jeong; Edmund G. Seebauer

J. Vac. Sci. Technol. A 41, 033203 (2023) https://doi.org/10.1116/6.0002467

Abstract

View articletitled, Effects of adventitious impurity adsorption on oxygen interstitial injection rates from submerged TiO2(110) and ZnO(0001) surfaces

Supplementary Material

Open the PDF for in another window

Measurements and model of UV-induced oxidation of aluminum

Robert F. Berg; Charles Tarrio; Thomas B. Lucatorto

J. Vac. Sci. Technol. A 41, 033204 (2023) https://doi.org/10.1116/6.0002432

Abstract

View articletitled, Measurements and model of UV-induced oxidation of aluminum

Open the PDF for in another window

Transient photocapacitance spectroscopy of deep-levels in (001) β-Ga₂O₃

In Special Collection: Gallium Oxide Materials and Devices

Fenfen Fenda Florena; Aboulaye Traoré; Takeaki Sakurai

J. Vac. Sci. Technol. A 41, 033205 (2023) https://doi.org/10.1116/6.0002378

Abstract

View articletitled, Transient photocapacitance spectroscopy of deep-levels in (001) β-Ga2O3

Open the PDF for in another window

Design of InGaN-ZnSnGa₂N₄ quantum wells for high-efficiency amber light emitting diodes

Kaitian Zhang; Chenxi Hu; Vijay Gopal Thirupakuzi Vangipuram; Kathleen Kash; Hongping Zhao

J. Vac. Sci. Technol. A 41, 033206 (2023) https://doi.org/10.1116/6.0002524

Abstract

View articletitled, Design of InGaN-ZnSnGa2N4 quantum wells for high-efficiency amber light emitting diodes

Open the PDF for in another window

Controlling electron beam induced deposition of iron from Fe(CO)₅: Inhibition of autocatalytic growth by NH₃ and reactivation by electron irradiation

Petra Martinović; Lars Barnewitz; Markus Rohdenburg; Petra Swiderek

J. Vac. Sci. Technol. A 41, 033207 (2023) https://doi.org/10.1116/6.0002306

Abstract

View articletitled, Controlling electron beam induced deposition of iron from Fe(CO)5: Inhibition of autocatalytic growth by NH3 and reactivation by electron irradiation

Supplementary Material

Open the PDF for in another window

Thin Films

Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile

Songyou Lian; Antonie J. Fourie; Jiangyong Wang; Hendrik C. Swart; Jacobus Johannes Terblans

J. Vac. Sci. Technol. A 41, 033401 (2023) https://doi.org/10.1116/6.0002400

Abstract

View articletitled, Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile

Open the PDF for in another window

Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading

In Special Collection: Functional Coatings

S. Altaf Husain; P. Kreiml; P.-O. Renault; C. Mitterer; M. J. Cordill; D. Faurie

J. Vac. Sci. Technol. A 41, 033403 (2023) https://doi.org/10.1116/6.0002348

Abstract

View articletitled, Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading

Open the PDF for in another window

Effects of processing parameters on the morphologies of complex sesquioxide thin films

Sofia K. Pinzon; James A. Valdez; Vancho Kocevski; J. K. Baldwin; Blas P. Uberuaga; Cortney R. Kreller; Benjamin K. Derby

J. Vac. Sci. Technol. A 41, 033404 (2023) https://doi.org/10.1116/6.0002398

Abstract

View articletitled, Effects of processing parameters on the morphologies of complex sesquioxide thin films

Supplementary Material

Open the PDF for in another window

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

In Special Collection: Functional Coatings

Xin Zhang; Xiu-bo Tian; Chun-zhi Gong; Xiang-li Liu; Jin Li

J. Vac. Sci. Technol. A 41, 033405 (2023) https://doi.org/10.1116/6.0002353

Abstract

View articletitled, Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Open the PDF for in another window

Physical properties of Zn-Sn-N films governed by the Zn/(Zn + Sn) ratio

JunYan Ren; LingYan Liang; Xiaohan Liu; Hongtao Cao

J. Vac. Sci. Technol. A 41, 033406 (2023) https://doi.org/10.1116/6.0002454

Abstract

View articletitled, Physical properties of Zn-Sn-N films governed by the Zn/(Zn + Sn) ratio

Supplementary Material

Open the PDF for in another window

Using metal precursors to passivate oxides for area selective deposition

In Special Collection: Area Selective Deposition

Kinsey L. Canova; Laurent Souqui; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 41, 033407 (2023) https://doi.org/10.1116/6.0002413

Abstract

View articletitled, Using metal precursors to passivate oxides for area selective deposition

Supplementary Material

Open the PDF for in another window

Nanostructured MoS₂ thin films: Effect of substrate temperature on microstructure, optical, and electrical properties

Onur Alev; Eda Goldenberg

J. Vac. Sci. Technol. A 41, 033408 (2023) https://doi.org/10.1116/6.0002627

Abstract

View articletitled, Nanostructured MoS2 thin films: Effect of substrate temperature on microstructure, optical, and electrical properties

Open the PDF for in another window

Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications

In Special Collection: Functional Coatings

Paramita Bhattacharyya; Brahim Ahammou; Fahmida Azmi; Rafael Kleiman; Peter Mascher

J. Vac. Sci. Technol. A 41, 033409 (2023) https://doi.org/10.1116/6.0002357

Abstract

View articletitled, Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications

Open the PDF for in another window

Errata

Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]

Artem Shelemin; Oleg Zabeida; Jolanta-Ewa Klemberg-Sapieha; Ludvik Martinu

J. Vac. Sci. Technol. A 41, 033402 (2023) https://doi.org/10.1116/6.0002558

Extract

View articletitled, Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]

Open the PDF for in another window

Perspectives

Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)

In Special Collection: Reproducibility Challenges and Solutions II with a Focus on Surface and Interface Analysis

J. Vac. Sci. Technol. A 41, 038501 (2023) https://doi.org/10.1116/6.0002437

Abstract

View articletitled, Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)

Open the PDF for in another window

Issues

Cover Image

Letters

Review Articles

ARTICLES

Atomic Layer Deposition (ALD)

Atomic Layer Etching (ALE)

Epitaxial Growth of Materials

Plasma Science and Technology

Surface Engineering and Coatings

Surfaces and Interfaces

Thin Films

Errata

Perspectives

RSS

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only