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On the limitations of thermal atomic layer deposition of InN using ammonia
Masked-assisted radial-segmented target pulsed-laser deposition: A novel method for area-selective deposition using pulsed-laser deposition
Targeted synthesis of predicted metastable compounds using modulated elemental reactants
In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning
Molecular beam epitaxy of KTaO3
Dry etching in the presence of physisorption of neutrals at lower temperatures
Type-II band alignment for atomic layer deposited HfSiO4 on α-Ga2O3
On the possible nature of deep centers in Ga2O3
Stabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperature
Letters
On the limitations of thermal atomic layer deposition of InN using ammonia
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 41, 020401 (2023)
https://doi.org/10.1116/6.0002355
Review Articles
Masked-assisted radial-segmented target pulsed-laser deposition: A novel method for area-selective deposition using pulsed-laser deposition
In Special Collection:
Area Selective Deposition
J. Vac. Sci. Technol. A 41, 020801 (2023)
https://doi.org/10.1116/6.0002275
Plasma-assisted gas-phase aggregation of clusters for functional nanomaterials
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 020802 (2023)
https://doi.org/10.1116/6.0002374
ARTICLES
2-D Materials
Feasibility study of dative bond formation for bilayer silicon growth under excessive strain
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 022201 (2023)
https://doi.org/10.1116/6.0002222
Photoresponse of O2 plasma treated WS2 monolayers synthesized by chemical vapor deposition
J. Vac. Sci. Technol. A 41, 022202 (2023)
https://doi.org/10.1116/6.0002202
Targeted synthesis of predicted metastable compounds using modulated elemental reactants
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 022203 (2023)
https://doi.org/10.1116/6.0002260
Atomic Layer Deposition (ALD)
In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 41, 022401 (2023)
https://doi.org/10.1116/6.0002312
Atomic layer deposition of Cu2O using copper acetylacetonate
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 41, 022402 (2023)
https://doi.org/10.1116/6.0002238
Reversible alteration of 3D printed polymer properties via infiltration of alumina by atomic layer deposition
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 41, 022403 (2023)
https://doi.org/10.1116/6.0002397
Atomic Layer Etching (ALE)
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning
J. Vac. Sci. Technol. A 41, 022601 (2023)
https://doi.org/10.1116/6.0002139
Pulsed laser induced atomic layer etching of silicon
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 41, 022602 (2023)
https://doi.org/10.1116/6.0002399
Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 41, 022603 (2023)
https://doi.org/10.1116/6.0002255
Epitaxial Growth of Materials
Sn-modified BaTiO3 thin film with enhanced polarization
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 022701 (2023)
https://doi.org/10.1116/6.0002208
Photoluminescence spectroscopy of Cr3+ in β-Ga2O3 and (Al0.1Ga0.9)2O3
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 41, 022702 (2023)
https://doi.org/10.1116/6.0002340
Molecular beam epitaxy of KTaO3
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 022703 (2023)
https://doi.org/10.1116/6.0002223
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration
In Special Collection:
Papers from the 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)
J. Vac. Sci. Technol. A 41, 022704 (2023)
https://doi.org/10.1116/6.0002316
Plasma Science and Technology
Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions
J. Vac. Sci. Technol. A 41, 023001 (2023)
https://doi.org/10.1116/6.0002380
Characterization of neutral species in an NH3-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies
J. Vac. Sci. Technol. A 41, 023002 (2023)
https://doi.org/10.1116/6.0002247
Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces
J. Vac. Sci. Technol. A 41, 023003 (2023)
https://doi.org/10.1116/6.0002381
Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages
J. Vac. Sci. Technol. A 41, 023004 (2023)
https://doi.org/10.1116/6.0002242
Dry etching in the presence of physisorption of neutrals at lower temperatures
J. Vac. Sci. Technol. A 41, 023005 (2023)
https://doi.org/10.1116/6.0002230
Surface Engineering and Coatings
Thermal versus radiation-assisted defect annealing in β-Ga2O3
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 41, 023101 (2023)
https://doi.org/10.1116/6.0002388
Oxidation behavior of a cathodic arc evaporated Cr0.69Ta0.20B0.11N coating
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023102 (2023)
https://doi.org/10.1116/6.0002356
Achieving high tribological and corrosion performances via a new approach: Al2O3/CrN duplex coatings
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023103 (2023)
https://doi.org/10.1116/6.0002212
Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023104 (2023)
https://doi.org/10.1116/6.0002358
Composition, structure, and mechanical properties of cathodic arc deposited Cr-rich Cr-N coatings
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023105 (2023)
https://doi.org/10.1116/6.0002366
Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023106 (2023)
https://doi.org/10.1116/6.0002341
Surfaces and Interfaces
Ultrawide bandgap vertical β-(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β-Ga2O3 substrates
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 41, 023201 (2023)
https://doi.org/10.1116/6.0002265
Hydrogen molecule adsorption and sensing on lanthanide (La) doped/decorated carbon nanotube and graphene structures
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023202 (2023)
https://doi.org/10.1116/6.0002229
Impact of process anneals on high-k/β-Ga2O3 interfaces and capacitance
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 41, 023203 (2023)
https://doi.org/10.1116/6.0002264
XPS characterization of a PuGa-7 at. % alloy
J. Vac. Sci. Technol. A 41, 023204 (2023)
https://doi.org/10.1116/6.0002365
Type-II band alignment for atomic layer deposited HfSiO4 on α-Ga2O3
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 41, 023205 (2023)
https://doi.org/10.1116/6.0002453
Thin Films
On the possible nature of deep centers in Ga2O3
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 41, 023401 (2023)
https://doi.org/10.1116/6.0002307
Structural, magnetic, and transport properties of Co2CrAl epitaxial thin film
J. Vac. Sci. Technol. A 41, 023402 (2023)
https://doi.org/10.1116/6.0002251
Magnetic phase diagram mapping in Fe1−xRhx composition-spread thin films
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 023403 (2023)
https://doi.org/10.1116/6.0002220
Optical studies of pure and (Cu, Co) doped nickel zinc ferrite films deposited on quartz substrate
J. Vac. Sci. Technol. A 41, 023404 (2023)
https://doi.org/10.1116/6.0002262
Stabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperature
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 023405 (2023)
https://doi.org/10.1116/6.0002227
Multiple superconducting transitions in α-Sn/β-Sn mixed films grown by molecular beam epitaxy
In Special Collection:
Thin Film Deposition for Materials Discovery
J. Vac. Sci. Technol. A 41, 023406 (2023)
https://doi.org/10.1116/6.0002273
Radio-frequency magnetron sputter deposition of ultrathick boron carbide films
J. Vac. Sci. Technol. A 41, 023407 (2023)
https://doi.org/10.1116/6.0002211
Describing mechanical damage evolution through in situ electrical resistance measurements
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023408 (2023)
https://doi.org/10.1116/6.0002362
Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 41, 023409 (2023)
https://doi.org/10.1116/6.0002371
Structure evolution and mechanical properties of Al-alloyed tantalum diboride films prepared by magnetron sputtering co-deposition
J. Vac. Sci. Technol. A 41, 023410 (2023)
https://doi.org/10.1116/6.0002390
