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Review Articles
Review of major technologies improving surface performances of Ti alloys for implant biomaterials
J. Vac. Sci. Technol. A 40, 030801 (2022)
https://doi.org/10.1116/6.0001801
Review of recent studies on nanoscale electrical junctions and contacts: Quantum tunneling, current crowding, and interface engineering
J. Vac. Sci. Technol. A 40, 030802 (2022)
https://doi.org/10.1116/6.0001724
Commemorating the Career of Pat Thiel
Preface
Preface for the special collection commemorating the career of Pat Thiel
In Special Collection:
Commemorating the Career of Pat Thiel
J. Vac. Sci. Technol. A 40, 031601 (2022)
https://doi.org/10.1116/6.0001807
ARTICLES
2-D Materials
Effect of substrate and substrate temperature on the deposition of MoS2 by radio frequency magnetron sputtering
J. Vac. Sci. Technol. A 40, 032201 (2022)
https://doi.org/10.1116/6.0001685
Selective vapor sensors with thin-film MoS2-coated optical fibers
Michael Motala; Lucas K. Beagle; Jason Lynch; David C. Moore; Peter R. Stevenson; Anna Benton; Ly D. Tran; Luke A. Baldwin; Drake Austin; Christopher Muratore; Deep Jariwala; Nicholas R. Glavin
J. Vac. Sci. Technol. A 40, 032202 (2022)
https://doi.org/10.1116/6.0001759
Atomic Layer Deposition (ALD)
Flexible atomic layer deposition system for coating porous materials
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 40, 032401 (2022)
https://doi.org/10.1116/6.0001679
Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device applications
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 40, 032402 (2022)
https://doi.org/10.1116/6.0001643
Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
In Special Collection:
Atomic Layer Deposition (ALD)
Daniela Fontecha; R. Blake Nuwayhid; Alexander C. Kozen; David M. Stewart; Gary W. Rubloff; Keith E. Gregorczyk
J. Vac. Sci. Technol. A 40, 032403 (2022)
https://doi.org/10.1116/6.0001752
Atomic Layer Etching (ALE)
Atomic layer etching of titanium nitride with surface modification by Cl radicals and rapid thermal annealing
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 40, 032601 (2022)
https://doi.org/10.1116/6.0001827
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 40, 032602 (2022)
https://doi.org/10.1116/6.0001630
Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 40, 032603 (2022)
https://doi.org/10.1116/6.0001616
Epitaxial Growth of Materials
Crystal structure analysis of stacking faults through scanning transmission electron microscopy of β-Ga2O3 (001) layer grown via halide vapor phase epitaxy
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 40, 032701 (2022)
https://doi.org/10.1116/6.0001799
Investigation of the growth mechanism and crystallographic structures of GaSb dots nucleation layer and GaSb thin film grown on Si(001) substrate by molecular beam epitaxy
Ryuto Machida; Ryusuke Toda; Shinsuke Hara; Issei Watanabe; Kouichi Akahane; Sachie Fujikawa; Akifumi Kasamatsu; Hiroki I. Fujishiro
J. Vac. Sci. Technol. A 40, 032703 (2022)
https://doi.org/10.1116/6.0001810
Photovoltaics and Energy
Assessing thermodynamical properties of Al1−xGaxSb alloys and optical modes for Al1−xGaxSb/GaAs epifilms and (AlSb)m/(GaSb)n superlattices
J. Vac. Sci. Technol. A 40, 032801 (2022)
https://doi.org/10.1116/6.0001611
Plasma Science and Technology
Comparative studies of cold/hot probe techniques for accurate plasma measurements
J. Vac. Sci. Technol. A 40, 033001 (2022)
https://doi.org/10.1116/6.0001461
Surfaces and Interfaces
Early stage nucleation mechanism for SiC(0001) surface epitaxial growth
J. Vac. Sci. Technol. A 40, 033201 (2022)
https://doi.org/10.1116/6.0001684
Optical constants of single-crystalline Ni(100) from 77 to 770 K from ellipsometry measurements
J. Vac. Sci. Technol. A 40, 033202 (2022)
https://doi.org/10.1116/6.0001763
Lamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystals
J. Vac. Sci. Technol. A 40, 033203 (2022)
https://doi.org/10.1116/6.0001771
Who were the founders of synchrotron radiation? Historical facts and misconceptions
In Special Collection:
Commemorating the Career of David Arthur Shirley
J. Vac. Sci. Technol. A 40, 033204 (2022)
https://doi.org/10.1116/6.0001686
Thorium model and weak 5f delocalization
J. G. Tobin; S. Nowak; S.-W. Yu; P. Roussel; R. Alonso-Mori; T. Kroll; D. Nordlund; T.-C. Weng; D. Sokaras
J. Vac. Sci. Technol. A 40, 033205 (2022)
https://doi.org/10.1116/6.0001754
Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage
In Special Collection:
Commemorating the Career of David Arthur Shirley
J. Vac. Sci. Technol. A 40, 033206 (2022)
https://doi.org/10.1116/6.0001816
Thin Films
Phase transition behavior in nanostructured VO2 with M1, M2, and R phases observed via temperature-dependent XRD measurements
J. Vac. Sci. Technol. A 40, 033401 (2022)
https://doi.org/10.1116/6.0001705
Phase evolution and morphology in Cu-In-Ga sputtered precursors
Isaac K. Lam; Kyeongchan Moon; Sina Soltanmohammad; Gregory M. Hanket; Woo Kyoung Kim; William N. Shafarman
J. Vac. Sci. Technol. A 40, 033402 (2022)
https://doi.org/10.1116/6.0001712
Evolving surface morphology during epitaxy of NiO on Ag(001)
J. Vac. Sci. Technol. A 40, 033403 (2022)
https://doi.org/10.1116/6.0001446
Chemical vapor deposition of sp2-boron nitride films on Al2O3 (0001), , , and substrates
J. Vac. Sci. Technol. A 40, 033404 (2022)
https://doi.org/10.1116/6.0001672
Effect of interface roughness on the tribo-corrosion behavior of diamond like carbon coatings on titanium alloy
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 40, 033405 (2022)
https://doi.org/10.1116/6.0001657
All-dry free radical polymerization inside nanopores: Ion-milling-enabled coating thickness profiling revealed “necking” phenomena
J. Vac. Sci. Technol. A 40, 033406 (2022)
https://doi.org/10.1116/6.0001718
Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species
In Special Collection:
Functional Coatings
J. Vac. Sci. Technol. A 40, 033407 (2022)
https://doi.org/10.1116/6.0001700
Relationship between local coordinates and thermal conductivity in amorphous carbon
J. Vac. Sci. Technol. A 40, 033408 (2022)
https://doi.org/10.1116/6.0001744
Properties of gallium oxide thin films grown by ion beam sputter deposition at room temperature
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 40, 033409 (2022)
https://doi.org/10.1116/6.0001825
Magnetron sputtered NiAl/TiBx multilayer thin films
In Special Collection:
Functional Coatings
Tomasz Wojcik; Vincent Ott; Sedat Özbilen; Harald Leiste; Sven Ulrich; Paul Heinz Mayrhofer; Helmut Riedl; Michael Stueber
J. Vac. Sci. Technol. A 40, 033410 (2022)
https://doi.org/10.1116/6.0001734
Experimental analysis of folic acid adsorption on TiO2 thin-films
J. Vac. Sci. Technol. A 40, 033411 (2022)
https://doi.org/10.1116/6.0001762
Optical dielectric properties of HfO2-based films
J. Vac. Sci. Technol. A 40, 033412 (2022)
https://doi.org/10.1116/6.0001651
Structure evolution and mechanical properties of co-sputtered Zr-Al-B2 thin films
Tomáš Fiantok; Viktor Šroba; Nikola Koutná; Vitalii Izai; Tomáš Roch; Martin Truchlý; Marek Vidiš; Leonid Satrapinskyy; Štefan Nagy; Branislav Grančič; Peter Kúš; Marián Mikula
J. Vac. Sci. Technol. A 40, 033414 (2022)
https://doi.org/10.1116/6.0001802
Modification of β-gallium oxide electronic properties by irradiation with high-energy electrons
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 40, 033416 (2022)
https://doi.org/10.1116/6.0001821
Energy storage performance in lead-free antiferroelectric 0.92(Bi0.54Na0.46)TiO3-0.08BaTiO3 ultrathin films by pulsed laser deposition
José de Jesús Serralta-Macías; Rodolfo Antonio Rodriguez-Davila; Manuel Quevedo-Lopez; Daniel Olguín; Santos Jesús Castillo; Chadwin D. Young; José Martin Yáñez-Limón
J. Vac. Sci. Technol. A 40, 033417 (2022)
https://doi.org/10.1116/6.0001755