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Review Articles

Emergent phenomena at oxide interfaces studied with standing-wave photoelectron spectroscopy

In Special Collection: Commemorating the Career of Charles S. Fadley

Cheng-Tai Kuo; Giuseppina Conti; Julien E. Rault; Claus M. Schneider; Slavomír Nemšák; Alexander X. Gray

J. Vac. Sci. Technol. A 40, 020801 (2022) https://doi.org/10.1116/6.0001584

Abstract

View articletitled, Emergent phenomena at oxide interfaces studied with standing-wave photoelectron spectroscopy

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CHORUS

Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes

In Special Collection: Commemorating the Career of Charles S. Fadley

Gerd Schönhense; Hans-Joachim Elmers

J. Vac. Sci. Technol. A 40, 020802 (2022) https://doi.org/10.1116/6.0001500

Abstract

View articletitled, Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes

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Optoelectronic properties of transparent oxide semiconductor ASnO₃ (A = Ba, Sr, and Ca) epitaxial films and thin film transistors

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Anup V. Sanchela; Mian Wei; Hai Jun Cho; Hiromichi Ohta

J. Vac. Sci. Technol. A 40, 020803 (2022) https://doi.org/10.1116/6.0001474

Abstract

View articletitled, Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistors

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Deep level defect states in β-, α-, and ɛ-Ga₂O₃ crystals and films: Impact on device performance

In Special Collection: Gallium Oxide Materials and Devices

Alexander Y. Polyakov; Vladimir I. Nikolaev; Eugene B. Yakimov; Fan Ren; Stephen J. Pearton; Jihyun Kim

J. Vac. Sci. Technol. A 40, 020804 (2022) https://doi.org/10.1116/6.0001701

Abstract

View articletitled, Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance

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CHORUS

Commemorating the Career of Charles S. Fadley

Preface

Preface for the special topic collection commemorating the career of Charles S. Fadley

In Special Collection: Commemorating the Career of Charles S. Fadley

Gregory S. Herman; Suntharampillai Thevuthasan; Thuy T. Tran

J. Vac. Sci. Technol. A 40, 021601 (2022) https://doi.org/10.1116/6.0001715

Extract

View articletitled, Preface for the special topic collection commemorating the career of Charles S. Fadley

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ARTICLES

2-D Materials

Spherical-periodic order and relevant short-range structural units in simple crystal structures

In Special Collection: Commemorating the Career of Pat Thiel

Shuang Zhang; Chuang Dong; Peter Häussler

J. Vac. Sci. Technol. A 40, 022201 (2022) https://doi.org/10.1116/6.0001535

Abstract

View articletitled, Spherical-periodic order and relevant short-range structural units in simple crystal structures

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Atomic Layer Deposition (ALD)

Reaction mechanism studies on atomic layer deposition process of AlF₃

In Special Collection: Atomic Layer Deposition (ALD)

Heta-Elisa Nieminen; Mikko Ritala

J. Vac. Sci. Technol. A 40, 022401 (2022) https://doi.org/10.1116/6.0001624

Abstract

View articletitled, Reaction mechanism studies on atomic layer deposition process of AlF3

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Atomic layer deposition of GdF₃ thin films

In Special Collection: Atomic Layer Deposition (ALD)

Elisa Atosuo; Kenichiro Mizohata; Miika Mattinen; Miia Mäntymäki; Marko Vehkamäki; Markku Leskelä; Mikko Ritala

J. Vac. Sci. Technol. A 40, 022402 (2022) https://doi.org/10.1116/6.0001629

Abstract

View articletitled, Atomic layer deposition of GdF3 thin films

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Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursors

In Special Collection: Atomic Layer Deposition (ALD)

Pauline Dill; Xiang Ren; Helen Hintersatz; Mathias Franz; Doreen Dentel; Christoph Tegenkamp; Susann Ebert

J. Vac. Sci. Technol. A 40, 022403 (2022) https://doi.org/10.1116/6.0001514

Abstract

View articletitled, Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursors

Supplementary Material

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Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Nese Gungor; Mustafa Alevli

J. Vac. Sci. Technol. A 40, 022404 (2022) https://doi.org/10.1116/6.0001498

Abstract

View articletitled, Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition

Supplementary Material

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Room-temperature and high-quality HfO₂/SiO₂ gate stacked film grown by neutral beam enhanced atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Beibei Ge; Daisuke Ohori; Yi-Ho Chen; Takuya Ozaki; Kazuhiko Endo; Yiming Li; Jenn-Hwan Tarng; Seiji Samukawa

J. Vac. Sci. Technol. A 40, 022405 (2022) https://doi.org/10.1116/6.0001607

Abstract

View articletitled, Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition

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High wet-etch resistance SiO₂ films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane

In Special Collection: Atomic Layer Deposition (ALD)

Su Min Hwang; Harrison Sejoon Kim; Dan N. Le; Akshay Sahota; Jaebeom Lee; Yong Chan Jung; Sang Woo Kim; Si Joon Kim; Rino Choi; Jinho Ahn; Byung Keun Hwang; Xiaobing Zhou; Jiyoung Kim

J. Vac. Sci. Technol. A 40, 022406 (2022) https://doi.org/10.1116/6.0001519

Abstract

View articletitled, High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane

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Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene

In Special Collection: Atomic Layer Deposition (ALD)

Atilla C. Varga; Seán T. Barry

J. Vac. Sci. Technol. A 40, 022407 (2022) https://doi.org/10.1116/6.0001595

Abstract

View articletitled, Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene

Supplementary Material

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Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

In Special Collection: Atomic Layer Deposition (ALD)

Kazuki Yoshida; Issei Nagata; Kentaro Saito; Masanori Miura; Kensaku Kanomata; Bashir Ahmmad; Shigeru Kubota; Fumihiko Hirose

J. Vac. Sci. Technol. A 40, 022408 (2022) https://doi.org/10.1116/6.0001622

Abstract

View articletitled, Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

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Atomic Layer Etching (ALE)

Spontaneous etching of B₂O₃ by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory

In Special Collection: Atomic Layer Etching (ALE)

Austin M. Cano; Suresh Kondati Natarajan; Jonathan L. Partridge; Simon D. Elliott; Steven M. George

J. Vac. Sci. Technol. A 40, 022601 (2022) https://doi.org/10.1116/6.0001542

Abstract

View articletitled, Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory

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Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination

In Special Collection: Atomic Layer Etching (ALE)

Yebin Lee; Yongjae Kim; Jiwon Son; Heeyeop Chae

J. Vac. Sci. Technol. A 40, 022602 (2022) https://doi.org/10.1116/6.0001603

Abstract

View articletitled, Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination

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Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

In Special Collection: Atomic Layer Etching (ALE)

Andreas Fischer; Aaron Routzahn; Ryan J. Gasvoda; Jim Sims; Thorsten Lill

J. Vac. Sci. Technol. A 40, 022603 (2022) https://doi.org/10.1116/6.0001691

Abstract

View articletitled, Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching

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Origin of enhanced thermal atomic layer etching of amorphous HfO₂

In Special Collection: Atomic Layer Etching (ALE)

Rita Mullins; José Julio Gutiérrez Moreno; Michael Nolan

J. Vac. Sci. Technol. A 40, 022604 (2022) https://doi.org/10.1116/6.0001614

Abstract

View articletitled, Origin of enhanced thermal atomic layer etching of amorphous HfO2

Supplementary Material

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Surfaces and Interfaces

Surface-to-bulk core level shift in CoFe₂O₄ thin films

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Arjun Subedi; Detian Yang; Yu Yun; Xiaoshan Xu; Peter A. Dowben

J. Vac. Sci. Technol. A 40, 023201 (2022) https://doi.org/10.1116/6.0001436

Abstract

View articletitled, Surface-to-bulk core level shift in CoFe2O4 thin films

Supplementary Material

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CHORUS

Influence of the carrier wafer during GaN etching in Cl₂ plasma

Thibaut Meyer; Camille Petit-Etienne; Erwine Pargon

J. Vac. Sci. Technol. A 40, 023202 (2022) https://doi.org/10.1116/6.0001478

Abstract

View articletitled, Influence of the carrier wafer during GaN etching in Cl2 plasma

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Many-body effects for the Mg 2s XPS of MgO

In Special Collection: Commemorating the Career of David Arthur Shirley

Paul S. Bagus; Connie J. Nelin; C. R. Brundle; B. Vincent Crist

J. Vac. Sci. Technol. A 40, 023203 (2022) https://doi.org/10.1116/6.0001655

Abstract

View articletitled, Many-body effects for the Mg 2s XPS of MgO

Supplementary Material

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Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lithium batteries

In Special Collection: Commemorating the Career of Pat Thiel

Florian Buchner; Katrin Forster-Tonigold; Tim Bolter; Alexander Rampf; Jens Klein; Axel Groß; R. Jürgen Behm

J. Vac. Sci. Technol. A 40, 023204 (2022) https://doi.org/10.1116/6.0001658

Abstract

View articletitled, Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lithium batteries

Supplementary Material

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Sulfur-enhanced dynamics of coinage metal(111) surfaces: Step edges versus terraces as locations for metal-sulfur complex formation

In Special Collection: Commemorating the Career of Pat Thiel

Da-Jiang Liu; James W. Evans

J. Vac. Sci. Technol. A 40, 023205 (2022) https://doi.org/10.1116/6.0001408

Abstract

View articletitled, Sulfur-enhanced dynamics of coinage metal(111) surfaces: Step edges versus terraces as locations for metal-sulfur complex formation

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CHORUS

Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Giada Franceschi; Michael Schmid; Ulrike Diebold; Michele Riva

J. Vac. Sci. Technol. A 40, 023206 (2022) https://doi.org/10.1116/6.0001704

Abstract

View articletitled, Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces

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Atomic step disorder on polycrystalline surfaces leads to spatially inhomogeneous work functions

Morgann Berg; Sean W. Smith; David A. Scrymgeour; Michael T. Brumbach; Ping Lu; Sara M. Dickens; Joseph R. Michael; Taisuke Ohta; Ezra Bussmann; Harold P. Hjalmarson; Peter A. Schultz; Paul G. Clem; Matthew M. Hopkins; Christopher H. Moore

J. Vac. Sci. Technol. A 40, 023207 (2022) https://doi.org/10.1116/6.0001729

Abstract

View articletitled, Atomic step disorder on polycrystalline surfaces leads to spatially inhomogeneous work functions

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Thin Films

Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films

Sen Chen; Xiangyu Zhang; Bowen Liu; Zhongwei Liu

J. Vac. Sci. Technol. A 40, 023401 (2022) https://doi.org/10.1116/6.0001578

Abstract

View articletitled, Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films

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High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Jeyanthinath Mayandi; Matthias Schrade; Ponniah Vajeeston; Marit Stange; Anna M. Lind; Martin F. Sunding; Jonas Deuermeier; Elvira Fortunato; Ole M. Løvvik; Alexander G. Ulyashin; Spyros Diplas; Patricia A. Carvalho; Terje G. Finstad

J. Vac. Sci. Technol. A 40, 023402 (2022) https://doi.org/10.1116/6.0001394

Abstract

View articletitled, High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Supplementary Material

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Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates

In Special Collection: Celebrating the Early Career Professionals Contributing to the Advancement of Thin Films, Surfaces, Interfaces, and Plasmas

Diana K. LaFollette; Kinsey L. Canova; Zhejun V. Zhang; John R. Abelson

J. Vac. Sci. Technol. A 40, 023403 (2022) https://doi.org/10.1116/6.0001562

Abstract

View articletitled, Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates

Supplementary Material

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CHORUS

Photoactivated Ru chemical vapor deposition using (η³-allyl)Ru(CO)₃X (X = Cl, Br, I): From molecular adsorption to Ru thin film deposition

In Special Collection: Commemorating the Career of Pat Thiel

Bryan G. Salazar; Christopher R. Brewer; Lisa McElwee-White; Amy V. Walker

J. Vac. Sci. Technol. A 40, 023404 (2022) https://doi.org/10.1116/6.0001490

Abstract

View articletitled, Photoactivated Ru chemical vapor deposition using (η3-allyl)Ru(CO)3X (X = Cl, Br, I): From molecular adsorption to Ru thin film deposition

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CHORUS

Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition

In Special Collection: Commemorating the Career of Pat Thiel

Solomon T. Oyakhire; Hayrensa Ablat; Nathaniel E. Richey; Stacey F. Bent

J. Vac. Sci. Technol. A 40, 023405 (2022) https://doi.org/10.1116/6.0001505

Abstract

View articletitled, Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition

Supplementary Material

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CHORUS

Magnetic transition behavior in epitaxial Fe₄₇Rh₄₇Pd₆ films

Hideo Sato; Neha Pachauri; Sahar Keshavarz; Chhatra R. Joshi; Hwachol Lee; Gary J. Mankey; Patrick LeClair

J. Vac. Sci. Technol. A 40, 023406 (2022) https://doi.org/10.1116/6.0001573

Abstract

View articletitled, Magnetic transition behavior in epitaxial Fe47Rh47Pd6 films

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CHORUS

Preparation of Nd_1.85Ce_0.15CuO₄ superconducting thin film by pulsed laser deposition

Jiqiang Jia; Chen Liu; Mengjiao Guo; Li Lei

J. Vac. Sci. Technol. A 40, 023407 (2022) https://doi.org/10.1116/6.0001540

Abstract

View articletitled, Preparation of Nd1.85Ce0.15CuO4 superconducting thin film by pulsed laser deposition

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Tunable alignment of liquid crystals between anisotropic polyacrylamide thin layer

Dong-Wook Lee; Dong-Hyun Kim; Jin-Young Oh; Dae-Shik Seo

J. Vac. Sci. Technol. A 40, 023408 (2022) https://doi.org/10.1116/6.0001695

Abstract

View articletitled, Tunable alignment of liquid crystals between anisotropic polyacrylamide thin layer

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Flow-modulated deposition of sp²-boron nitride using diborane and ammonia on chemomechanically polished (0001) 4H-SiC substrates

Philip M. Jean-Remy; Matthew J. Cabral; Robert F. Davis

J. Vac. Sci. Technol. A 40, 023409 (2022) https://doi.org/10.1116/6.0001698

Abstract

View articletitled, Flow-modulated deposition of sp2-boron nitride using diborane and ammonia on chemomechanically polished (0001) 4H-SiC substrates

Supplementary Material

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Partial densities of states from x-ray absorption and Auger electron spectroscopy: Use of core-hole memory

In Special Collection: Commemorating the Career of David Arthur Shirley

Eric L. Shirley; C. Weiland; J. C. Woicik

J. Vac. Sci. Technol. A 40, 023410 (2022) https://doi.org/10.1116/6.0001432

Abstract

View articletitled, Partial densities of states from x-ray absorption and Auger electron spectroscopy: Use of core-hole memory

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CHORUS

Errata

Erratum: “Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” [J. Vac. Sci. Technol. A 39, 043408 (2021)]

Leonid Yu. Beliaev; Evgeniy Shkondin; Andrei V. Lavrinenko; Osamu Takayama

J. Vac. Sci. Technol. A 40, 027001 (2022) https://doi.org/10.1116/6.0001574

Extract

View articletitled, Erratum: “Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” [J. Vac. Sci. Technol. A 39, 043408 (2021)]

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Issues

Cover Image

Review Articles

Commemorating the Career of Charles S. Fadley

Preface

ARTICLES

2-D Materials

Atomic Layer Deposition (ALD)

Atomic Layer Etching (ALE)

Surfaces and Interfaces

Thin Films

Errata

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