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Chemically assisted sputter etching of permalloy using CO or CL2
J. Vac. Sci. Technol. A 4, 1841–1849 (1986)
https://doi.org/10.1116/1.573775
Bias‐induced stress transitions in sputtered TiN films
J. Vac. Sci. Technol. A 4, 1850–1854 (1986)
https://doi.org/10.1116/1.573776
Characterization of reactively magnetron sputtered hydrogenated amorphous silicon films
J. Vac. Sci. Technol. A 4, 1855–1860 (1986)
https://doi.org/10.1116/1.573777
Surface topography development on Teflon under keV Xe atom bombardment
J. Vac. Sci. Technol. A 4, 1861–1865 (1986)
https://doi.org/10.1116/1.573778
Studies of initial oxidation of nickel–chromium alloys: Surface annealing by hydrogen ion bombardment
J. Vac. Sci. Technol. A 4, 1866–1874 (1986)
https://doi.org/10.1116/1.573737
Reflection anisotropy in evaporated aluminum: Consequences for telescope mirror coatings
J. Vac. Sci. Technol. A 4, 1875–1878 (1986)
https://doi.org/10.1116/1.573738
Ejection of neutral and charged particles from CdTe and Cd0.96Mn0.04Te induced by pulsed laser irradiation
J. Vac. Sci. Technol. A 4, 1879–1883 (1986)
https://doi.org/10.1116/1.573739
A scanned microfocused neutral beam for use in secondary ion mass spectrometry
J. Vac. Sci. Technol. A 4, 1888–1892 (1986)
https://doi.org/10.1116/1.573741
Secondary ion mass spectroscopy analysis of moisture penetration of dielectric films
J. Vac. Sci. Technol. A 4, 1893–1896 (1986)
https://doi.org/10.1116/1.573742
Secondary ion mass spectrometry and Auger study of lithium niobate processing for integrated optics
J. Vac. Sci. Technol. A 4, 1897–1900 (1986)
https://doi.org/10.1116/1.573743
Relation between flow, power, and presence of carrier gas during plasma deposition of thin films
J. Vac. Sci. Technol. A 4, 1901–1904 (1986)
https://doi.org/10.1116/1.573744
A solution to boron contamination at the substrate/epilayer interface of silicon grown by molecular beam epitaxy
J. Vac. Sci. Technol. A 4, 1905–1907 (1986)
https://doi.org/10.1116/1.573745
Statistical treatment of anomalous energy spread in a charged particle beam
J. Vac. Sci. Technol. A 4, 1908–1912 (1986)
https://doi.org/10.1116/1.573746
Cleanup and gettering during the Beryllium Limiter Experiment in Impurity Study Experiment‐B
R. E. Clausing; L. Heatherly; J. von Seggern; K. G. Tschersich; R. C. Isler; P. K. Mioduszewski; J. E. Simpkins; R. A. Zuhr
J. Vac. Sci. Technol. A 4, 1933–1938 (1986)
https://doi.org/10.1116/1.573749
Bakeout controller for the use of helium closed‐cycle refrigerators in ultrahigh vacuum applications
J. Vac. Sci. Technol. A 4, 1939–1941 (1986)
https://doi.org/10.1116/1.573750
A variable temperature sample stage for the Cameca IMS 3F secondary ion microanalyzer
J. Vac. Sci. Technol. A 4, 1942–1943 (1986)
https://doi.org/10.1116/1.573751
A fast entry air‐lock‐compatible hot stage for the collection of Auger electron spectra at elevated temperatures
J. Vac. Sci. Technol. A 4, 1944–1945 (1986)
https://doi.org/10.1116/1.573752
An ultrahigh vacuum compatible fluorine atom source for gas–surface reaction studies
J. Vac. Sci. Technol. A 4, 1946–1947 (1986)
https://doi.org/10.1116/1.573753
Design of an ultralow coverage metal evaporator based on a geometric factor
J. Vac. Sci. Technol. A 4, 1949–1951 (1986)
https://doi.org/10.1116/1.573755
The use of polytetrafluoroethylene bearings in ultrahigh vacuum
J. Vac. Sci. Technol. A 4, 1951–1952 (1986)
https://doi.org/10.1116/1.573756
Correlations in pseudobinary alloys
J. Vac. Sci. Technol. A 4, 1965–1970 (1986)
https://doi.org/10.1116/1.574008
Structural studies of Cd0.95Zn0.05Te and Cd0.90Mn0.10Te under pressure
J. Vac. Sci. Technol. A 4, 1971–1973 (1986)
https://doi.org/10.1116/1.574009
The Ag/(Hg,Cd)Te and Al/(Hg,Cd)Te interfaces
J. Vac. Sci. Technol. A 4, 1977–1982 (1986)
https://doi.org/10.1116/1.574011
Summary Abstract: State characterization of the Hg1−xCdxTe/Photox SiO2 interface
J. Vac. Sci. Technol. A 4, 1983–1985 (1986)
https://doi.org/10.1116/1.574012
Gate‐controlled Hg1−xCdxTe photodiodes passivated with native sulfides
J. Vac. Sci. Technol. A 4, 1986–1991 (1986)
https://doi.org/10.1116/1.574013
Composition and growth mechanism of anodic oxide on Hg(1−x)CdxTe
J. Vac. Sci. Technol. A 4, 1992–1996 (1986)
https://doi.org/10.1116/1.574014
Electron beam induced Hg desorption and the electronic structure of the Hg depleted surface of Hg1−xCdxTe
J. Vac. Sci. Technol. A 4, 1997–2001 (1986)
https://doi.org/10.1116/1.574015
Bonding and stability in narrow‐gap ternary semiconductors for infrared applications
J. Vac. Sci. Technol. A 4, 2010–2013 (1986)
https://doi.org/10.1116/1.574017
Infrared photovoltaic detectors utilizing Hg1−xMnxTe and Hg1−x−yCdxMnyTe alloys
J. Vac. Sci. Technol. A 4, 2014–2018 (1986)
https://doi.org/10.1116/1.574018
The magnetic field influence on the photovoltaic effect in Mn alloyed semiconductors
J. Vac. Sci. Technol. A 4, 2019–2023 (1986)
https://doi.org/10.1116/1.574019
Properties of Hg1−xZnxTe grown by liquid‐phase epitaxy
J. Vac. Sci. Technol. A 4, 2024–2027 (1986)
https://doi.org/10.1116/1.574020
Photoreflectance study of Hg0.7Cd0.3Te and Cd1−xZnxTe: E1 transition
J. Vac. Sci. Technol. A 4, 2028–2033 (1986)
https://doi.org/10.1116/1.574021
Nonlinear optical characterization of Hg1−xCdxTe using two‐photon absorption techniques
J. Vac. Sci. Technol. A 4, 2034–2039 (1986)
https://doi.org/10.1116/1.574022
Variable magnetic field Hall effect measurements and analyses of high purity, Hg vacancy (p‐type) HgCdTe
J. Vac. Sci. Technol. A 4, 2040–2046 (1986)
https://doi.org/10.1116/1.574023
Characterization of impurities in p‐type HgCdTe by photo‐Hall techniques
J. Vac. Sci. Technol. A 4, 2047–2050 (1986)
https://doi.org/10.1116/1.574024
Infrared absorption spectroscopy of pure and Cu doped CdTe
J. Vac. Sci. Technol. A 4, 2051–2055 (1986)
https://doi.org/10.1116/1.574025
Noncontact electrical characterization of epitaxial HgCdTe
J. Vac. Sci. Technol. A 4, 2056–2060 (1986)
https://doi.org/10.1116/1.574026
Growth of HgCdTe and other Hg‐based films and multilayers by molecular beam epitaxy
J. Vac. Sci. Technol. A 4, 2061–2066 (1986)
https://doi.org/10.1116/1.574027
Molecular beam epitaxial growth and characterization of HgCdTe, HgZnTe, and HgMnTe on GaAs(100)
J. Vac. Sci. Technol. A 4, 2067–2071 (1986)
https://doi.org/10.1116/1.574028
Electrical properties of molecular beam epitaxy produced HgCdTe layers doped during growth
J. Vac. Sci. Technol. A 4, 2072–2076 (1986)
https://doi.org/10.1116/1.574029
Hall and electroreflectance studies of the effects of doping in mercury–cadmium telluride grown by molecular‐beam epitaxy
Paul M. Raccah; J. W. Garland; Z. Zhang; Amy H. M. Chu; J. Reno; I. K. Sou; M. Boukerche; J. P. Faurie
J. Vac. Sci. Technol. A 4, 2077–2080 (1986)
https://doi.org/10.1116/1.574030
Characterization of molecular beam epitaxially grown HgCdTe on CdTe and InSb buffer layers
J. Vac. Sci. Technol. A 4, 2081–2085 (1986)
https://doi.org/10.1116/1.574031
HgTe and CdTe epitaxial layers and HgTe–CdTe superlattices grown by laser molecular beam epitaxy
J. Vac. Sci. Technol. A 4, 2086–2090 (1986)
https://doi.org/10.1116/1.574032
Superlattices: Progress and prospects
J. Vac. Sci. Technol. A 4, 2091–2095 (1986)
https://doi.org/10.1116/1.574033
Present status of molecular beam epitaxial growth and properties of HgTe–CdTe superlattices
J. Vac. Sci. Technol. A 4, 2096–2100 (1986)
https://doi.org/10.1116/1.574034
Interdiffusion in HgTe–CdTe superlattices
J. Vac. Sci. Technol. A 4, 2101–2105 (1986)
https://doi.org/10.1116/1.574035
Infrared absorption measurement and analysis of HgTe–CdTe superlattices
J. P. Baukus; A. T. Hunter; O. J. Marsh; C. E. Jones; G. Y. Wu; S. R. Hetzler; T. C. McGill; J. P. Faurie
J. Vac. Sci. Technol. A 4, 2110–2113 (1986)
https://doi.org/10.1116/1.574037
(100) and (111) oriented superlattices of (Cd,Mn)Te on (100)GaAs
J. Vac. Sci. Technol. A 4, 2117–2119 (1986)
https://doi.org/10.1116/1.574039
Strain effects in Cd1−xMnxTe–CdTe superlattices
J. Vac. Sci. Technol. A 4, 2120–2125 (1986)
https://doi.org/10.1116/1.574040
Stimulated emission from Cd1−xMnxTe–CdTe heterostructures and Cd1−xMnxTe–Cd1−yMnyTe multiple quantum well structures
J. Vac. Sci. Technol. A 4, 2126–2131 (1986)
https://doi.org/10.1116/1.574041
Investigation of the two‐dimensional electron gas in HgCdTe by quantum Hall effect measurements
J. Vac. Sci. Technol. A 4, 2132–2136 (1986)
https://doi.org/10.1116/1.574042
Crystal orientation of CdTe film on GaAs by metal–organic chemical vapor deposition
J. Vac. Sci. Technol. A 4, 2137–2140 (1986)
https://doi.org/10.1116/1.574043
Epitaxial growth of CdTe on GaAs by molecular beam epitaxy
J. Vac. Sci. Technol. A 4, 2150–2152 (1986)
https://doi.org/10.1116/1.574045
Epitaxial CdTe films on GaAs/Si and GaAs substrates
J. Vac. Sci. Technol. A 4, 2153–2157 (1986)
https://doi.org/10.1116/1.574046
Evaluation of substrates for growth of HgCdTe by molecular beam epitaxy
J. Vac. Sci. Technol. A 4, 2158–2161 (1986)
https://doi.org/10.1116/1.574047
The growth of CdTe/GaAs heteroepitaxial films by metal–organic chemical vapor deposition
J. Vac. Sci. Technol. A 4, 2162–2168 (1986)
https://doi.org/10.1116/1.574048
Boron and indium ion‐implanted junctions in HgCdTe grown on CdTe and CdTe/Al2O3
J. Vac. Sci. Technol. A 4, 2169–2173 (1986)
https://doi.org/10.1116/1.574049
Effects of ion implantation on deep electron traps in Hg0.7Cd0.3Te
J. Vac. Sci. Technol. A 4, 2177–2180 (1986)
https://doi.org/10.1116/1.574051
The kinetics of tellurium precipitation in Hg0.8Cd0.2Te
J. Vac. Sci. Technol. A 4, 2181–2183 (1986)
https://doi.org/10.1116/1.574052
Tellurium precipitation in bulk‐grown CdxHg1−xTe
J. Vac. Sci. Technol. A 4, 2184–2189 (1986)
https://doi.org/10.1116/1.574053
A study of the defect structures in CdTe crystals using synchrotron x‐ray topography
J. Vac. Sci. Technol. A 4, 2190–2194 (1986)
https://doi.org/10.1116/1.574054
Effect of alloy disorder on deep levels in Hg1−xCdxTe
J. Vac. Sci. Technol. A 4, 2195–2199 (1986)
https://doi.org/10.1116/1.574055
Review of the status of quantum 1/ f noise in n+–p HgCdTe photodetectors and other devices
J. Vac. Sci. Technol. A 4, 2205–2216 (1986)
https://doi.org/10.1116/1.574057
Metal–organic chemical vapor deposition of mercury cadmium telluride epitaxial films
J. Vac. Sci. Technol. A 4, 2217–2225 (1986)
https://doi.org/10.1116/1.574058
Influence of layer thickness on the quality of mercury cadmium telluride epilayers grown by the interdiffused multilayer process
J. Vac. Sci. Technol. A 4, 2226–2229 (1986)
https://doi.org/10.1116/1.574059
The organometallic heteroepitaxy of CdTe and HgCdTe on GaAs substrates
J. Vac. Sci. Technol. A 4, 2230–2233 (1986)
https://doi.org/10.1116/1.574060
A comparison of CdTe grown on GaAs by molecular beam and organometallic vapor phase epitaxy
J. Vac. Sci. Technol. A 4, 2234–2238 (1986)
https://doi.org/10.1116/1.574061
Surface passivation approaches for silicon, germanium, and III–V semiconductors
Roel J. Theeuwes, Wilhelmus M. M. Kessels, et al.
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma
J. H. Deijkers, H. Thepass, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.