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Strengths of plasmon satellites in XPS: Real-time cumulant approach

In Special Collection: Commemorating the Career of Charles S. Fadley

John J. Rehr; Joshua J. Kas

J. Vac. Sci. Technol. A 39, 060401 (2021) https://doi.org/10.1116/6.0001173

Abstract

View articletitled, Strengths of plasmon satellites in XPS: Real-time cumulant approach

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CHORUS

Atomically resolved interface structures of vacuum-deposited Pt on SnO₂(110), (101), and (111)

Yoshihiro Chida; Naoto Todoroki; Toshimasa Wadayama

J. Vac. Sci. Technol. A 39, 060402 (2021) https://doi.org/10.1116/6.0001348

Abstract

View articletitled, Atomically resolved interface structures of vacuum-deposited Pt on SnO2(110), (101), and (111)

Supplementary Material

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Formation, evolution, and prevention of thermally induced defects on germanium and silicon upon high-temperature vacuum annealing

Taeyeong Kim; Mun Goung Jeong; Bong Jae Lee; Jungchul Lee

J. Vac. Sci. Technol. A 39, 060403 (2021) https://doi.org/10.1116/6.0001308

Abstract

View articletitled, Formation, evolution, and prevention of thermally induced defects on germanium and silicon upon high-temperature vacuum annealing

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Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)

In Special Collection: Commemorating the Career of Pat Thiel

Kennedy P. S. Boyd; Emily A. Cook; Maria A. Paszkowiak; Erin V. Iski

J. Vac. Sci. Technol. A 39, 060404 (2021) https://doi.org/10.1116/6.0001396

Abstract

View articletitled, Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)

Supplementary Material

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CHORUS

In situ ellipsometry aided rapid ALD process development and parameter space visualization of cerium oxide nanofilms

Udit Kumar; Corbin Feit; S. Novia Berriel; Ayush Arunachalam; Tamil Selvan Sakthivel; Kanad Basu; Parag Banerjee; Sudipta Seal

J. Vac. Sci. Technol. A 39, 060405 (2021) https://doi.org/10.1116/6.0001329

Abstract

View articletitled, In situ ellipsometry aided rapid ALD process development and parameter space visualization of cerium oxide nanofilms

Supplementary Material

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Review Articles

Diffusion of dopants and impurities in β-Ga₂O₃

In Special Collection: Gallium Oxide Materials and Devices

Ribhu Sharma; Mark E. Law; Fan Ren; Alexander Y. Polyakov; Stephen J. Pearton

J. Vac. Sci. Technol. A 39, 060801 (2021) https://doi.org/10.1116/6.0001307

Abstract

View articletitled, Diffusion of dopants and impurities in β-Ga2O3

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CHORUS

High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy

In Special Collection: Commemorating the Career of Charles S. Fadley

Julien E. Rault; Cheng-Tai Kuo; Henrique P. Martins; Giuseppina Conti; Slavomír Nemšák

J. Vac. Sci. Technol. A 39, 060802 (2021) https://doi.org/10.1116/6.0001289

Abstract

View articletitled, High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy

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Atomic scale friction properties of confined water layers

In Special Collection: Commemorating the Career of Pat Thiel

Tae Won Go; Dooho Lee; Woosuk Choi; Jeong Young Park

J. Vac. Sci. Technol. A 39, 060803 (2021) https://doi.org/10.1116/6.0001384

Abstract

View articletitled, Atomic scale friction properties of confined water layers

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ARTICLES

2-D Materials

Experimental and theoretical investigation of the formation of two-dimensional Fe silicate on Pd(111)

In Special Collection: Commemorating the Career of Pat Thiel

Nassar Doudin; Kayahan Saritas; Sohrab Ismail-Beigi; Eric I. Altman

J. Vac. Sci. Technol. A 39, 062201 (2021) https://doi.org/10.1116/6.0001397

Abstract

View articletitled, Experimental and theoretical investigation of the formation of two-dimensional Fe silicate on Pd(111)

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CHORUS

Atomic Layer Deposition (ALD)

Influence of annealing temperature of nickel oxide as hole transport layer applied for inverted perovskite solar cells

In Special Collection: Atomic Layer Deposition (ALD)

Ka-Te Chen; Chia-Hsun Hsu; Fang-Bin Ren; Can Wang; Peng Gao; Wan-Yu Wu; Shui-Yang Lien; Wen-Zhang Zhu

J. Vac. Sci. Technol. A 39, 062401 (2021) https://doi.org/10.1116/6.0001191

Abstract

View articletitled, Influence of annealing temperature of nickel oxide as hole transport layer applied for inverted perovskite solar cells

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Plasma-enhanced atomic layer deposition: Correlating $O_{2}$ plasma parameters and species to blister formation and conformal film growth

In Special Collection: Atomic Layer Deposition (ALD)

Andreas Werbrouck; Kevin Van de Kerckhove; Diederik Depla; Dirk Poelman; Philippe F. Smet; Jolien Dendooven; Christophe Detavernier

J. Vac. Sci. Technol. A 39, 062402 (2021) https://doi.org/10.1116/6.0001094

Abstract

View articletitled, Plasma-enhanced atomic layer deposition: Correlating <math xmlns="http://www.w3.org/1998/Math/MathML"> <mrow xmlns=""> <msub> <mi mathvariant="normal">O</mi> <mn>2</mn></msub></mrow></math> plasma parameters and species to blister formation and conformal film growth

Supplementary Material

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Innovative remote plasma source for atomic layer deposition for GaN devices

In Special Collection: Atomic Layer Deposition (ALD)

Harm C. M. Knoops; Karsten Arts; Jan W. Buiter; Luca Matteo Martini; Richard Engeln; Dilini Tania Hemakumara; Michael Powell; Wilhelmus M. M. (Erwin) Kessels; Chris J. Hodson; Aileen O’Mahony

J. Vac. Sci. Technol. A 39, 062403 (2021) https://doi.org/10.1116/6.0001318

Abstract

View articletitled, Innovative remote plasma source for atomic layer deposition for GaN devices

Supplementary Material

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Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

In Special Collection: Atomic Layer Deposition (ALD)

Angel Yanguas-Gil; Joseph A. Libera; Jeffrey W. Elam

J. Vac. Sci. Technol. A 39, 062404 (2021) https://doi.org/10.1116/6.0001212

Abstract

View articletitled, Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

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Influence of HfO₂ and SiO₂ interfacial layers on the characteristics of n-GaN/HfSiO_x capacitors using plasma-enhanced atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Toshihide Nabatame; Erika Maeda; Mari Inoue; Masafumi Hirose; Yoshihiro Irokawa; Akihiko Ohi; Naoki Ikeda; Takashi Onaya; Koji Shiozaki; Ryota Ochi; Tamotsu Hashizume; Yasuo Koide

J. Vac. Sci. Technol. A 39, 062405 (2021) https://doi.org/10.1116/6.0001334

Abstract

View articletitled, Influence of HfO2 and SiO2 interfacial layers on the characteristics of n-GaN/HfSiOx capacitors using plasma-enhanced atomic layer deposition

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Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

In Special Collection: Commemorating the Career of Pat Thiel

Ali Mahmoodinezhad; Carlos Morales; Franziska Naumann; Paul Plate; Robert Meyer; Christoph Janowitz; Karsten Henkel; Małgorzata Kot; Marvin Hartwig Zoellner; Christian Wenger; Jan Ingo Flege

J. Vac. Sci. Technol. A 39, 062406 (2021) https://doi.org/10.1116/6.0001375

Abstract

View articletitled, Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

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Atomic layer deposition of lithium metaphosphate from H₃PO₄ and P₄O₁₀ facilitated via direct liquid injection: Experiment and theory

In Special Collection: Atomic Layer Deposition (ALD)

Ivan Kundrata; Antónia Mošková; Martin Moško; Matej Mičušík; Edmund Dobročka; Karol Fröhlich

J. Vac. Sci. Technol. A 39, 062407 (2021) https://doi.org/10.1116/6.0001255

Abstract

View articletitled, Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory

Supplementary Material

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Atomic Layer Etching (ALE)

Stoichiometry tuning of TaN films through ion treatment: Molecular dynamics study

Jaipal Methary; Rajesh Sathiyanarayanan; Rui Li; Phillip J. Stout

J. Vac. Sci. Technol. A 39, 062601 (2021) https://doi.org/10.1116/6.0001251

Abstract

View articletitled, Stoichiometry tuning of TaN films through ion treatment: Molecular dynamics study

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Deposit and etchback approach for ultrathin Al₂O₃ films with low pinhole density using atomic layer deposition and atomic layer etching

In Special Collection: Atomic Layer Etching (ALE)

Jonas C. Gertsch; Emanuele Sortino; Victor M. Bright; Steven M. George

J. Vac. Sci. Technol. A 39, 062602 (2021) https://doi.org/10.1116/6.0001340

Abstract

View articletitled, Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching

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Photovoltaics and Energy

Optimization of three-dimensional metamaterials for terahertz energy harvesting

In Special Collection: Commemorating the Career of Pat Thiel

Shendu Yang; Zachary Thacker; Evan Allison; Patrick Pinhero

J. Vac. Sci. Technol. A 39, 062801 (2021) https://doi.org/10.1116/6.0001106

Abstract

View articletitled, Optimization of three-dimensional metamaterials for terahertz energy harvesting

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CHORUS

Plasma Science and Technology

Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas

Oleksandr Polonskyi; Torge Hartig; Joshua R. Uzarski; Michael J. Gordon

J. Vac. Sci. Technol. A 39, 063001 (2021) https://doi.org/10.1116/6.0001148

Abstract

View articletitled, Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas

Supplementary Material

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Erosion of focus rings in capacitively coupled plasma etching reactors

Xifeng Wang; Hyunjae Lee; Sang Ki Nam; Mark J. Kushner

J. Vac. Sci. Technol. A 39, 063002 (2021) https://doi.org/10.1116/6.0001225

Abstract

View articletitled, Erosion of focus rings in capacitively coupled plasma etching reactors

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Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms

In Special Collection: Functional Coatings

Artem Shelemin; Oleg Zabeida; Jolanta-Ewa Klemberg-Sapieha; Ludvik Martinu

J. Vac. Sci. Technol. A 39, 063003 (2021) https://doi.org/10.1116/6.0001291

Abstract

View articletitled, Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms

Supplementary Material

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Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges

Li Wang; Peter Hartmann; Zoltán Donkó; Yuan-Hong Song; Julian Schulze

J. Vac. Sci. Technol. A 39, 063004 (2021) https://doi.org/10.1116/6.0001327

Abstract

View articletitled, Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges

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Comparison of CO and CO₂ rf plasma treatment of SnO₂ nanoparticles for gas sensing materials

In Special Collection: Commemorating the Career of Pat Thiel

Kimberly A. M. Hiyoto; Erin P. Stuckert; Ellen R. Fisher

J. Vac. Sci. Technol. A 39, 063005 (2021) https://doi.org/10.1116/6.0001326

Abstract

View articletitled, Comparison of CO and CO2 rf plasma treatment of SnO2 nanoparticles for gas sensing materials

Supplementary Material

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CHORUS

Surfaces and Interfaces

Substitutional Co-mediated island-edge decoration in Co/Cu(001): A kinetic Monte Carlo study

Marvin A. Albao

J. Vac. Sci. Technol. A 39, 063201 (2021) https://doi.org/10.1116/6.0001323

Abstract

View articletitled, Substitutional Co-mediated island-edge decoration in Co/Cu(001): A kinetic Monte Carlo study

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Exploration of the nonideal behavior observed in engineered, multilayer MgO/Ag/MgO photocathodes

In Special Collection: Commemorating the Career of Charles S. Fadley

ZhengRong Lee; Linda Spentzouris; Manfred Mascheck; Jeff Terry

J. Vac. Sci. Technol. A 39, 063202 (2021) https://doi.org/10.1116/6.0001136

Abstract

View articletitled, Exploration of the nonideal behavior observed in engineered, multilayer MgO/Ag/MgO photocathodes

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CHORUS

Limitations in the structural determination of a close-packed overlayer

In Special Collection: Commemorating the Career of David Arthur Shirley

J. G. Tobin

J. Vac. Sci. Technol. A 39, 063203 (2021) https://doi.org/10.1116/6.0001320

Abstract

View articletitled, Limitations in the structural determination of a close-packed overlayer

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CHORUS

Electronic surface reconstruction of TiO₂ nanocrystals revealed by resonant inelastic x-ray scattering

In Special Collection: Commemorating the Career of Charles S. Fadley

Cheng-Hao Chuang; Chieh-Ming Chen; Yu-Cheng Shao; Ping-Hung Yeh; Chih-Ming Chang; Way-Faung Pong; Mukes Kapilashrami; Per-Anders Glans; Sheraz Gul; Gongming Wang; Yat Li; Jin Zhang; Jun Miyawaki; Hideharu Niwa; Yoshihisa Harada; Jin-Ming Chen; Jinghua Guo

J. Vac. Sci. Technol. A 39, 063204 (2021) https://doi.org/10.1116/6.0001247

Abstract

View articletitled, Electronic surface reconstruction of TiO2 nanocrystals revealed by resonant inelastic x-ray scattering

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CHORUS

Applications of the National Institute of Standards and Technology (NIST) database for the simulation of electron spectra for surface analysis for quantitative x-ray photoelectron spectroscopy of nanostructures

In Special Collection: Commemorating the Career of Charles S. Fadley

Wolfgang S. M. Werner; Cedric J. Powell

J. Vac. Sci. Technol. A 39, 063205 (2021) https://doi.org/10.1116/6.0001261

Abstract

View articletitled, Applications of the National Institute of Standards and Technology (NIST) database for the simulation of electron spectra for surface analysis for quantitative x-ray photoelectron spectroscopy of nanostructures

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Shake loss intensities in x-ray photoelectron spectroscopy: Theory, experiment, and atomic composition accuracy for MgO and related compounds

In Special Collection: Commemorating the Career of Charles S. Fadley

Paul S. Bagus; C. R. Brundle; B. Vincent Crist

J. Vac. Sci. Technol. A 39, 063206 (2021) https://doi.org/10.1116/6.0001188

Abstract

View articletitled, Shake loss intensities in x-ray photoelectron spectroscopy: Theory, experiment, and atomic composition accuracy for MgO and related compounds

Supplementary Material

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Band offsets at metalorganic chemical vapor deposited β-(Al_xGa_1−x)₂O₃/β-Ga₂O₃ interfaces—Crystalline orientation dependence

In Special Collection: Gallium Oxide Materials and Devices

A F M Anhar Uddin Bhuiyan; Zixuan Feng; Hsien-Lien Huang; Lingyu Meng; Jinwoo Hwang; Hongping Zhao

J. Vac. Sci. Technol. A 39, 063207 (2021) https://doi.org/10.1116/6.0001260

Abstract

View articletitled, Band offsets at metalorganic chemical vapor deposited β-(AlxGa1−x)2O3/β-Ga2O3 interfaces—Crystalline orientation dependence

Supplementary Material

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Hard x-ray photoelectron spectroscopy at a soft x-ray source: Present and future perspectives of hard x-ray photoelectron spectroscopy at BESSY II

In Special Collection: Commemorating the Career of Charles S. Fadley

Roberto Félix; Mihaela Gorgoi; Regan G. Wilks; Marcus Bär

J. Vac. Sci. Technol. A 39, 063208 (2021) https://doi.org/10.1116/6.0001184

Abstract

View articletitled, Hard x-ray photoelectron spectroscopy at a soft x-ray source: Present and future perspectives of hard x-ray photoelectron spectroscopy at BESSY II

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Investigating the magnetic and atomic interface configuration for a model Fe/CrN bilayer system

Khan Alam; Rodrigo Ponce-Pérez; Kai Sun; Andrew Foley; Noboru Takeuchi; Arthur R. Smith

J. Vac. Sci. Technol. A 39, 063209 (2021) https://doi.org/10.1116/6.0001267

Abstract

View articletitled, Investigating the magnetic and atomic interface configuration for a model Fe/CrN bilayer system

Supplementary Material

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CHORUS

Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering

Raivathari M. Singhania; Henry Price; Vaneck Y. Kounga; Benjamin Davis; Philipp Brüner; Ryan Thorpe; David J. Hynek; Judy J. Cha; Nicholas C. Strandwitz

J. Vac. Sci. Technol. A 39, 063210 (2021) https://doi.org/10.1116/6.0001164

Abstract

View articletitled, Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering

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CHORUS

Comparison of 2D crystals formed by dissociative adsorption of fluorinated and nonfluorinated alkyl iodides on Cu(111)

In Special Collection: Commemorating the Career of Pat Thiel

Tedros A. Balema; Amanda M. Larson; Yicheng Wang; Dipna A. Patel; Krishna Kumar; E. Charles H. Sykes

J. Vac. Sci. Technol. A 39, 063211 (2021) https://doi.org/10.1116/6.0001316

Abstract

View articletitled, Comparison of 2D crystals formed by dissociative adsorption of fluorinated and nonfluorinated alkyl iodides on Cu(111)

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Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)

In Special Collection: Commemorating the Career of Pat Thiel

Rachael G. Farber; Sarah A. Willson; S. J. Sibener

J. Vac. Sci. Technol. A 39, 063212 (2021) https://doi.org/10.1116/6.0001374

Abstract

View articletitled, Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)

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CHORUS

Evolution of metastable phases during Mg metal corrosion: An in situ cryogenic x-ray photoelectron spectroscopy study

In Special Collection: Commemorating the Career of Charles S. Fadley

Vaithiyalingam Shutthanandan; Abraham Martinez; Tamas Varga; Arun Devaraj; Swadipta Roy; Elizabeth Stephens; Olga A. Marina; Suntharampillai Thevuthasan; Vijayakumar Murugesan; Vineet Joshi

J. Vac. Sci. Technol. A 39, 063213 (2021) https://doi.org/10.1116/6.0001305

Abstract

View articletitled, Evolution of metastable phases during Mg metal corrosion: An in situ cryogenic x-ray photoelectron spectroscopy study

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CHORUS

Elucidating interactions of the epoxide ring on Pt(111) by comparing reaction pathways of propylene oxide and 1-epoxy-3-butene

In Special Collection: Commemorating the Career of Pat Thiel

William N. Porter; Zhexi Lin; Jingguang G. Chen

J. Vac. Sci. Technol. A 39, 063214 (2021) https://doi.org/10.1116/6.0001370

Abstract

View articletitled, Elucidating interactions of the epoxide ring on Pt(111) by comparing reaction pathways of propylene oxide and 1-epoxy-3-butene

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CHORUS

Deep level defect spectroscopies of complex oxide surfaces and interfaces

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Jun Zhang; Kyle McNicholas; Snjezana Balaz; Zhao Quan Zeng; Darrell Schlom; Leonard J. Brillson

J. Vac. Sci. Technol. A 39, 063215 (2021) https://doi.org/10.1116/6.0001339

Abstract

View articletitled, Deep level defect spectroscopies of complex oxide surfaces and interfaces

Supplementary Material

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CHORUS

Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se₂ interface

In Special Collection: Commemorating the Career of Charles S. Fadley

Dirk Hauschild; Ralph Steininger; Dimitrios Hariskos; Wolfram Witte; Sven Tougaard; Clemens Heske; Lothar Weinhardt

J. Vac. Sci. Technol. A 39, 063216 (2021) https://doi.org/10.1116/6.0001336

Abstract

View articletitled, Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se2 interface

Supplementary Material

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General method for predicting ZnO–metal interface termination: Extension of the method for Al₂O₃–metal systems

Michiko Yoshitake

J. Vac. Sci. Technol. A 39, 063217 (2021) https://doi.org/10.1116/6.0001312

Abstract

View articletitled, General method for predicting ZnO–metal interface termination: Extension of the method for Al2O3–metal systems

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Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

Yukio Fujiwara; Naoaki Saito

J. Vac. Sci. Technol. A 39, 063218 (2021) https://doi.org/10.1116/6.0001431

Abstract

View articletitled, Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

Supplementary Material

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High-pressure cell to study the catalytic behavior of bulk samples and surface deposited mass-selected nanoclusters at atmospheric conditions

Julian Baranyai; Florian Neuberger; Torben Schmidt; Rolf Schäfer

J. Vac. Sci. Technol. A 39, 063219 (2021) https://doi.org/10.1116/6.0001341

Abstract

View articletitled, High-pressure cell to study the catalytic behavior of bulk samples and surface deposited mass-selected nanoclusters at atmospheric conditions

Supplementary Material

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Surprising stability of polar (001) surfaces of the Mott insulator GdTiO₃

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Karthik Krishnaswamy; Anderson Janotti; Lars Bjaalie; Chris G. Van de Walle

J. Vac. Sci. Technol. A 39, 063220 (2021) https://doi.org/10.1116/6.0001313

Abstract

View articletitled, Surprising stability of polar (001) surfaces of the Mott insulator GdTiO3

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CHORUS

Infrared reflection spectroscopy of adsorbed intermediates in real time during chemical vapor deposition of oxides

Zhejun V. Zhang; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 39, 063221 (2021) https://doi.org/10.1116/6.0001328

Abstract

View articletitled, Infrared reflection spectroscopy of adsorbed intermediates in real time during chemical vapor deposition of oxides

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CHORUS

Evaluation of the accuracy of stopping and range of ions in matter simulations through secondary ion mass spectrometry and Rutherford backscattering spectrometry for low energy heavy ion implantation

In Special Collection: Commemorating the Career of Pat Thiel

Michael Titze; Jose L. Pacheco; Todd Byers; Stuart B. Van Deusen; Daniel L. Perry; Duncan Weathers; Edward S. Bielejec

J. Vac. Sci. Technol. A 39, 063222 (2021) https://doi.org/10.1116/6.0001406

Abstract

View articletitled, Evaluation of the accuracy of stopping and range of ions in matter simulations through secondary ion mass spectrometry and Rutherford backscattering spectrometry for low energy heavy ion implantation

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CHORUS

Thin Films

High resolution synchrotron extended x-ray absorption fine structure and infrared spectroscopy analysis of MBE grown CdTe/InSb epifilms

Devki N. Talwar; Na Lu; Ian T. Ferguson; Zhe Chuan Feng

J. Vac. Sci. Technol. A 39, 063401 (2021) https://doi.org/10.1116/6.0001145

Abstract

View articletitled, High resolution synchrotron extended x-ray absorption fine structure and infrared spectroscopy analysis of MBE grown CdTe/InSb epifilms

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Impact of ion species on ion beam sputtered Ta₂O₅ layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

Wjatscheslaw Sakiew; Philippe Schwerdtner; Marco Jupé; Andreas Pflug; Detlev Ristau

J. Vac. Sci. Technol. A 39, 063402 (2021) https://doi.org/10.1116/6.0001224

Abstract

View articletitled, Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

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Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors

Johan G. Hulkko; Katalin Böőr; Ren Qiu; Olof Bäcke; Mats Boman; Mats Halvarsson; Erik Lindahl

J. Vac. Sci. Technol. A 39, 063403 (2021) https://doi.org/10.1116/6.0001093

Abstract

View articletitled, Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors

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Improving the abrasive wear resistance of biomass briquetting machine components using cathodic arc physical vapor deposition coatings: A comparative study

Pooja Miryalkar; Sekhar Chavitlo; Nitin Tandekar; Krishna Valleti

J. Vac. Sci. Technol. A 39, 063404 (2021) https://doi.org/10.1116/6.0001228

Abstract

View articletitled, Improving the abrasive wear resistance of biomass briquetting machine components using cathodic arc physical vapor deposition coatings: A comparative study

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Nitrogen ion-implanted resistive regions for edge termination of vertical Ga₂O₃ rectifiers

In Special Collection: Gallium Oxide Materials and Devices

Xinyi Xia; Minghan Xian; Chaker Fares; Ribhu Sharma; Mark E. Law; Fan Ren; Stephen J. Pearton

J. Vac. Sci. Technol. A 39, 063405 (2021) https://doi.org/10.1116/6.0001347

Abstract

View articletitled, Nitrogen ion-implanted resistive regions for edge termination of vertical Ga2O3 rectifiers

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CHORUS

Interface quality in GaSb/AlSb short period superlattices

Md Nazmul Alam; Joseph R. Matson; Patrick Sohr; Joshua D. Caldwell; Stephanie Law

J. Vac. Sci. Technol. A 39, 063406 (2021) https://doi.org/10.1116/6.0001290

Abstract

View articletitled, Interface quality in GaSb/AlSb short period superlattices

Supplementary Material

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CHORUS

Experimental study of transport properties of Weyl semimetal LaAlGe thin films grown by molecular beam epitaxy

In Special Collection: Topological Materials

Niraj Bhattarai; Andrew W. Forbes; Christopher Gassen; Raghad S. H. Saqat; Ian L. Pegg; John Philip

J. Vac. Sci. Technol. A 39, 063407 (2021) https://doi.org/10.1116/6.0001306

Abstract

View articletitled, Experimental study of transport properties of Weyl semimetal LaAlGe thin films grown by molecular beam epitaxy

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Systematic compositional analysis of sputter-deposited boron-containing thin films

In Special Collection: Functional Coatings

Babak Bakhit; Daniel Primetzhofer; Eduardo Pitthan; Mauricio A. Sortica; Eleni Ntemou; Johanna Rosen; Lars Hultman; Ivan Petrov; Grzegorz Greczynski

J. Vac. Sci. Technol. A 39, 063408 (2021) https://doi.org/10.1116/6.0001234

Abstract

View articletitled, Systematic compositional analysis of sputter-deposited boron-containing thin films

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Influence of chemical vapor precursor flow rate on the structure and thermal stability of phase-modulated VSiCN/Ag coatings

Forest C. Thompson; Frank M. Kustas; Kent E. Coulter; Grant A. Crawford

J. Vac. Sci. Technol. A 39, 063409 (2021) https://doi.org/10.1116/6.0001302

Abstract

View articletitled, Influence of chemical vapor precursor flow rate on the structure and thermal stability of phase-modulated VSiCN/Ag coatings

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Improved growth quality of epitaxial ZnTe thin films on Si (111) wafer with ZnSe buffer layer

Xiaolong Zhu; Jianqiang Wu; Qimin Hu; Xia Hao; Wei Li; Cai Liu; Rong Su

J. Vac. Sci. Technol. A 39, 063410 (2021) https://doi.org/10.1116/6.0001257

Abstract

View articletitled, Improved growth quality of epitaxial ZnTe thin films on Si (111) wafer with ZnSe buffer layer

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Gas source molecular epitaxy of Ge_1−ySn_y materials and devices using high order Ge₄H₁₀ and Ge₅H₁₂ hydrides

Chi Xu; Ting Hu; Dhruve A. Ringwala; José Menéndez; John Kouvetakis

J. Vac. Sci. Technol. A 39, 063411 (2021) https://doi.org/10.1116/6.0001253

Abstract

View articletitled, Gas source molecular epitaxy of Ge1−ySny materials and devices using high order Ge4H10 and Ge5H12 hydrides

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Growth of the intrinsic superlattice material Bi₄Se₃ by DC magnetron sputtering: Layered to faceted growth

In Special Collection: Topological Materials

Joseph P. Corbett; Margaret M. Brown; Tobin C. Muratore; Ryan P. Laing; Jeff L. Brown; Jay A. Gupta; Amber N. Reed

J. Vac. Sci. Technol. A 39, 063412 (2021) https://doi.org/10.1116/6.0001359

Abstract

View articletitled, Growth of the intrinsic superlattice material Bi4Se3 by DC magnetron sputtering: Layered to faceted growth

Supplementary Material

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Comments

Comment on “Underlying simplicity of 5f unoccupied electronic structure” [J. Vac. Sci. Technol. A 39, 043205 (2021)]

J. G. Tobin; S. Nowak; S.-W. Yu; P. Roussel; R. Alonso-Mori; T. Kroll; D. Nordlund; T.-C. Weng; D. Sokaras

J. Vac. Sci. Technol. A 39, 066001 (2021) https://doi.org/10.1116/6.0001315

Extract

View articletitled, Comment on “Underlying simplicity of 5f unoccupied electronic structure” [J. Vac. Sci. Technol. A 39, 043205 (2021)]

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CHORUS

Errata

Erratum: “Atomic layer deposition of high purity Ga₂O₃ films using liquid pentamethylcyclopentadienyl gallium and combinations of H₂O and O₂ plasma” [J. Vac. Sci. Technol. A 38, 022412 (2020)]

Fumikazu Mizutani; Shintaro Higashi; Mari Inoue; Toshihide Nabatame

J. Vac. Sci. Technol. A 39, 067001 (2021) https://doi.org/10.1116/6.0001493

Extract

View articletitled, Erratum: “Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma” [J. Vac. Sci. Technol. A 38, 022412 (2020)]

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