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Selective functionalization of partially etched SiN_x to enhance SiO₂ to SiN_x etch selectivity

In Special Collection: Celebrating the Early Career Professionals Contributing to the Advancement of Thin Films, Surfaces, Interfaces, and Plasmas

Ryan J. Gasvoda; Xue Wang; Prabhat Kumar; Eric A. Hudson; Sumit Agarwal

J. Vac. Sci. Technol. A 39, 050401 (2021) https://doi.org/10.1116/6.0001110

Abstract

View articletitled, Selective functionalization of partially etched SiNx to enhance SiO2 to SiNx etch selectivity

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Review Articles

Functional plasma-sprayed hydroxylapatite coatings for medical application: Clinical performance requirements and key property enhancement

In Special Collection: Functional Coatings

Robert B. Heimann

J. Vac. Sci. Technol. A 39, 050801 (2021) https://doi.org/10.1116/6.0001132

Abstract

View articletitled, Functional plasma-sprayed hydroxylapatite coatings for medical application: Clinical performance requirements and key property enhancement

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Perspectives

Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition

Henrik Pedersen; Seán T. Barry; Jonas Sundqvist

J. Vac. Sci. Technol. A 39, 051001 (2021) https://doi.org/10.1116/6.0001125

Abstract

View articletitled, Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition

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ARTICLES

2-D Materials

Preparation and electronic structure of the WSe₂/graphene/NiSe_x/Ni(111) heterostructure

In Special Collection: Commemorating the Career of Charles S. Fadley

Roberto Sant; Mattia Cattelan; Stefano Agnoli; Gaetano Granozzi

J. Vac. Sci. Technol. A 39, 052201 (2021) https://doi.org/10.1116/6.0001134

Abstract

View articletitled, Preparation and electronic structure of the WSe2/graphene/NiSex/Ni(111) heterostructure

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Atomic Layer Deposition (ALD)

Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices

In Special Collection: Atomic Layer Deposition (ALD)

Emanuel Knehr; Mario Ziegler; Sven Linzen; Konstantin Ilin; Patrick Schanz; Jonathan Plentz; Marco Diegel; Heidemarie Schmidt; Evgeni Il’ichev; Michael Siegel

J. Vac. Sci. Technol. A 39, 052401 (2021) https://doi.org/10.1116/6.0001126

Abstract

View articletitled, Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices

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Improved properties of atomic layer deposited ruthenium via postdeposition annealing

In Special Collection: Atomic Layer Deposition (ALD)

Michael Hayes; Melanie A. Jenkins; Jacob Woodruff; Daniel F. Moser; Charles L. Dezelah; John F. Conley, Jr.

J. Vac. Sci. Technol. A 39, 052402 (2021) https://doi.org/10.1116/6.0001078

Abstract

View articletitled, Improved properties of atomic layer deposited ruthenium via postdeposition annealing

Supplementary Material

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CHORUS

Plasma-enhanced atomic layer deposition of SiO₂ film using capacitively coupled Ar/O₂ plasmas: A computational investigation

In Special Collection: Atomic Layer Deposition (ALD)

Chenhui Qu; Yukinori Sakiyama; Pulkit Agarwal; Mark J. Kushner

J. Vac. Sci. Technol. A 39, 052403 (2021) https://doi.org/10.1116/6.0001121

Abstract

View articletitled, Plasma-enhanced atomic layer deposition of SiO2 film using capacitively coupled Ar/O2 plasmas: A computational investigation

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Direct-simulation Monte Carlo modeling of reactor-scale gas-dynamic phenomena in a multiwafer atomic-layer deposition batch reactor

In Special Collection: Atomic Layer Deposition (ALD)

Sudharshanaraj Thiruppathiraj; Seung-Min Ryu; Jiho Uh; Laxminarayan L. Raja

J. Vac. Sci. Technol. A 39, 052404 (2021) https://doi.org/10.1116/6.0000993

Abstract

View articletitled, Direct-simulation Monte Carlo modeling of reactor-scale gas-dynamic phenomena in a multiwafer atomic-layer deposition batch reactor

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Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor

In Special Collection: Atomic Layer Deposition (ALD)

Tyler J. Myers; Steven M. George

J. Vac. Sci. Technol. A 39, 052405 (2021) https://doi.org/10.1116/6.0001162

Abstract

View articletitled, Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor

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Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate

In Special Collection: Atomic Layer Deposition (ALD)

Pauline Dill; Florian Pachel; Christian Militzer; Alexander Held; Georg Puchas; Stefan Knohl; Walter Krenkel; Christoph Tegenkamp; Werner Andreas Goedel

J. Vac. Sci. Technol. A 39, 052406 (2021) https://doi.org/10.1116/6.0001193

Abstract

View articletitled, Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate

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Impact of trimethylaluminum exposure time on the mechanical properties of single-cycle atomic layer deposition modified cellulosic nanopaper

In Special Collection: Atomic Layer Deposition (ALD)

Yi Li; Mark D. Losego

J. Vac. Sci. Technol. A 39, 052407 (2021) https://doi.org/10.1116/6.0001198

Abstract

View articletitled, Impact of trimethylaluminum exposure time on the mechanical properties of single-cycle atomic layer deposition modified cellulosic nanopaper

Supplementary Material

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CHORUS

Effect of O₂ plasma exposure time during atomic layer deposition of amorphous gallium oxide

In Special Collection: Atomic Layer Deposition (ALD)

Hanno Kröncke; Florian Maudet; Sourish Banerjee; Jürgen Albert; Sven Wiesner; Veeresh Deshpande; Catherine Dubourdieu

J. Vac. Sci. Technol. A 39, 052408 (2021) https://doi.org/10.1116/6.0001207

Abstract

View articletitled, Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide

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Atomic Layer Etching (ALE)

Atomic layer etching of Si₃N₄ with high selectivity to SiO₂ and poly-Si

In Special Collection: Atomic Layer Etching (ALE)

Nobuya Miyoshi; Kazunori Shinoda; Hiroyuki Kobayashi; Masaru Kurihara; Yutaka Kouzuma; Masaru Izawa

J. Vac. Sci. Technol. A 39, 052601 (2021) https://doi.org/10.1116/6.0001179

Abstract

View articletitled, Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si

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Photovoltaics and Energy

Numerical ellipsometry: A method for selecting a near-minimal infrared measurement set for β-gallium oxide

In Special Collection: Gallium Oxide Materials and Devices

Frank K. Urban, III; David Barton; Mathias Schubert

J. Vac. Sci. Technol. A 39, 052801 (2021) https://doi.org/10.1116/6.0001002

Abstract

View articletitled, Numerical ellipsometry: A method for selecting a near-minimal infrared measurement set for β-gallium oxide

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Plasma Science and Technology

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum; Ellen R. Fisher

J. Vac. Sci. Technol. A 39, 053001 (2021) https://doi.org/10.1116/6.0001080

Abstract

View articletitled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Supplementary Material

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CHORUS

Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching

Clint D. Frye; Scott B. Donald; Catherine Reinhardt; Lars F. Voss; Sara E. Harrison

J. Vac. Sci. Technol. A 39, 053002 (2021) https://doi.org/10.1116/6.0001123

Abstract

View articletitled, Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching

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Surfaces and Interfaces

Oxygen-induced surface reconstructions on curved Ag(111)

In Special Collection: Commemorating the Career of Pat Thiel

Marie E. Turano; Ludo B. F. Juurlink; Maxwell Z. Gillum; Elizabeth A. Jamka; George Hildebrandt; Faith Lewis; Daniel R. Killelea

J. Vac. Sci. Technol. A 39, 053201 (2021) https://doi.org/10.1116/6.0001167

Abstract

View articletitled, Oxygen-induced surface reconstructions on curved Ag(111)

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CHORUS

Operando study of the preferential growth of SiO₂ during the dry thermal oxidation of Si_0.60Ge_0.40(001) by ambient pressure x-ray photoelectron spectroscopy

In Special Collection: Commemorating the Career of Charles S. Fadley

Shane P. Lorona; J. Trey Diulus; Jo E. Bergevin; Rafik Addou; Gregory S. Herman

J. Vac. Sci. Technol. A 39, 053202 (2021) https://doi.org/10.1116/6.0001174

Abstract

View articletitled, Operando study of the preferential growth of SiO2 during the dry thermal oxidation of Si0.60Ge0.40(001) by ambient pressure x-ray photoelectron spectroscopy

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CHORUS

Correlating surface stoichiometry and termination in SrTiO₃ films grown by hybrid molecular beam epitaxy

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Suresh Thapa; Sydney R. Provence; Devin Jessup; Jason Lapano; Matthew Brahlek; Jerzy T. Sadowski; Petra Reinke; Wencan Jin; Ryan B. Comes

J. Vac. Sci. Technol. A 39, 053203 (2021) https://doi.org/10.1116/6.0001159

Abstract

View articletitled, Correlating surface stoichiometry and termination in SrTiO3 films grown by hybrid molecular beam epitaxy

Supplementary Material

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CHORUS

Depth profile reconstruction of YCrO₃/CaMnO₃ superlattices by near total reflection hard x-ray photoelectron spectroscopy

In Special Collection: Commemorating the Career of Charles S. Fadley

Léo Cambou; Jin-Hong Lee; Manuel Bibes; Alexandre Gloter; Jean-Pascal Rueff

J. Vac. Sci. Technol. A 39, 053204 (2021) https://doi.org/10.1116/6.0001113

Abstract

View articletitled, Depth profile reconstruction of YCrO3/CaMnO3 superlattices by near total reflection hard x-ray photoelectron spectroscopy

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Cinnamaldehyde adsorption and thermal decomposition on copper surfaces

In Special Collection: Commemorating the Career of Pat Thiel

Bo Chen; Rodrigo Ponce; Jonathan Guerrero-Sánchez; Noboru Takeuchi; Francisco Zaera

J. Vac. Sci. Technol. A 39, 053205 (2021) https://doi.org/10.1116/6.0001192

Abstract

View articletitled, Cinnamaldehyde adsorption and thermal decomposition on copper surfaces

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CHORUS

Nonadiabatic localization of H₂ in the field of two external positive tip charges

In Special Collection: Commemorating the Career of Charles S. Fadley

W. Schattke; M. A. Van Hove; R. Díez Muiño

J. Vac. Sci. Technol. A 39, 053206 (2021) https://doi.org/10.1116/6.0001138

Abstract

View articletitled, Nonadiabatic localization of H2 in the field of two external positive tip charges

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Observations of the Ag(3 × 1) phase on Ge(111)

In Special Collection: Commemorating the Career of Charles S. Fadley

Cory H. Mullet; Anna L. Rosen; Shirley Chiang

J. Vac. Sci. Technol. A 39, 053207 (2021) https://doi.org/10.1116/6.0001183

Abstract

View articletitled, Observations of the Ag(3 × 1) phase on Ge(111)

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X-ray spectroscopic identification of strain and structure-based resonances in a series of saturated carbon-cage molecules: Adamantane, twistane, octahedrane, and cubane

In Special Collection: Commemorating the Career of Charles S. Fadley

Trevor M. Willey; Jonathan R. I. Lee; Daniel Brehmer; Oscar A. Paredes Mellone; Lasse Landt; Peter R. Schreiner; Andrey A. Fokin; Boryslav A. Tkachenko; Armin de Meijere; Sergei Kozhushkov; Anthony W. van Buuren

J. Vac. Sci. Technol. A 39, 053208 (2021) https://doi.org/10.1116/6.0001150

Abstract

View articletitled, X-ray spectroscopic identification of strain and structure-based resonances in a series of saturated carbon-cage molecules: Adamantane, twistane, octahedrane, and cubane

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Hierarchical colloid-based lithography for wettability tuning of semiconductor surfaces

Pavel Shapturenka; Pauline Gaillard; Lesley Chan; Oleksandr Polonskyi; Michael J. Gordon

J. Vac. Sci. Technol. A 39, 053209 (2021) https://doi.org/10.1116/6.0001122

Abstract

View articletitled, Hierarchical colloid-based lithography for wettability tuning of semiconductor surfaces

Supplementary Material

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Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures

In Special Collection: Commemorating the Career of Charles S. Fadley

Olivier Renault; Hokwon Kim; Dumitru Dumcenco; Dmitrii Unuchek; Nicolas Chevalier; Maxime Gay; Andras Kis; Neal Fairley

J. Vac. Sci. Technol. A 39, 053210 (2021) https://doi.org/10.1116/6.0001135

Abstract

View articletitled, Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures

Supplementary Material

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Surface study of Pt-3d transition metal alloys, Pt₃M (M = Ti, V), under CO oxidation reaction with ambient pressure x-ray photoelectron spectroscopy

In Special Collection: Commemorating the Career of Charles S. Fadley

Moonjung Jung; Dongwoo Kim; Hojoon Lim; Minsik Seo; Geonhwa Kim; Lucía Pérez Ramírez; Fabrice Bournel; Jean-Jacques Gallet; Ki-Jeong Kim; Bongjin Simon Mun

J. Vac. Sci. Technol. A 39, 053211 (2021) https://doi.org/10.1116/6.0001194

Abstract

View articletitled, Surface study of Pt-3d transition metal alloys, Pt3M (M = Ti, V), under CO oxidation reaction with ambient pressure x-ray photoelectron spectroscopy

Supplementary Material

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Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching

Clarence Y. Chan; Shunya Namiki; Jennifer K. Hite; Michael A. Mastro; Syed B. Qadri; Xiuling Li

J. Vac. Sci. Technol. A 39, 053212 (2021) https://doi.org/10.1116/6.0001231

Abstract

View articletitled, Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching

Supplementary Material

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CHORUS

Thin Films

Role of hydrogen species in promoting photoluminescence from Eu³⁺-doped ZnO thin films via bandgap excitation

Housei Akazawa

J. Vac. Sci. Technol. A 39, 053401 (2021) https://doi.org/10.1116/6.0001141

Abstract

View articletitled, Role of hydrogen species in promoting photoluminescence from Eu3+-doped ZnO thin films via bandgap excitation

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Localized phase transition of TiO₂ thin films induced by sub-bandgap laser irradiation

In Special Collection: Honoring Dr. Scott Chambers’ 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films

Syeed E. Ahmed; Violet M. Poole; John Igo; Yi Gu; Matthew D. McCluskey

J. Vac. Sci. Technol. A 39, 053402 (2021) https://doi.org/10.1116/6.0001088

Abstract

View articletitled, Localized phase transition of TiO2 thin films induced by sub-bandgap laser irradiation

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CHORUS

Titanium monoxide and titanium dioxide thin film formation by magnetron sputtering and its thermodynamic model

Sergey V. Bulyarskiy; Daria A. Koiva; Vladislav S. Belov; Elena V. Zenova; Grigory А. Rudakov; Georgy G. Gusarov

J. Vac. Sci. Technol. A 39, 053403 (2021) https://doi.org/10.1116/6.0001065

Abstract

View articletitled, Titanium monoxide and titanium dioxide thin film formation by magnetron sputtering and its thermodynamic model

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Synthesis of model sodium sulfide films

In Special Collection: Celebrating the Early Career Professionals Contributing to the Advancement of Thin Films, Surfaces, Interfaces, and Plasmas

Rebecca D. McAuliffe; Victoria Petrova; Matthew J. McDermott; Jameson Landon Tyler; Ethan C. Self; Kristin A. Persson; Ping Liu; Gabriel M. Veith

J. Vac. Sci. Technol. A 39, 053404 (2021) https://doi.org/10.1116/6.0001069

Abstract

View articletitled, Synthesis of model sodium sulfide films

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CHORUS

Temperature dependent performance of ITO Schottky contacts on β-Ga₂O₃

In Special Collection: Gallium Oxide Materials and Devices

Xinyi Xia; Minghan Xian; Chaker Fares; Fan Ren; Marko Tadjer; Stephen J. Pearton

J. Vac. Sci. Technol. A 39, 053405 (2021) https://doi.org/10.1116/6.0001211

Abstract

View articletitled, Temperature dependent performance of ITO Schottky contacts on β-Ga2O3

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CHORUS

Epitaxial film growth by thermal laser evaporation

Dong Yeong Kim; Jochen Mannhart; Wolfgang Braun

J. Vac. Sci. Technol. A 39, 053406 (2021) https://doi.org/10.1116/6.0001177

Abstract

View articletitled, Epitaxial film growth by thermal laser evaporation

Supplementary Material

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Growth of topological insulator Bi₂Se₃ particles on GaAs via droplet epitaxy

Sivakumar Vishnuvardhan Mambakkam; Saadia Nasir; Wilder Acuna; Joshua M. O. Zide; Stephanie Law

J. Vac. Sci. Technol. A 39, 053407 (2021) https://doi.org/10.1116/6.0001157

Abstract

View articletitled, Growth of topological insulator Bi2Se3 particles on GaAs via droplet epitaxy

Supplementary Material

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CHORUS

Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

In Special Collection: Atomic Layer Deposition (ALD)

Md. Istiaque Chowdhury; Mark Sowa; Kylie E. Van Meter; Tomas F. Babuska; Tomas Grejtak; Alexander C. Kozen; Brandon A. Krick; Nicholas C. Strandwitz

J. Vac. Sci. Technol. A 39, 053408 (2021) https://doi.org/10.1116/6.0001175

Abstract

View articletitled, Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

Supplementary Material

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Properties of secondary ions in ion beam sputtering of Ga₂O₃

In Special Collection: Gallium Oxide Materials and Devices

Dmitry Kalanov; André Anders; Carsten Bundesmann

J. Vac. Sci. Technol. A 39, 053409 (2021) https://doi.org/10.1116/6.0001204

Abstract

View articletitled, Properties of secondary ions in ion beam sputtering of Ga2O3

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Chirality-induced zigzag domain wall in in-plane magnetized ultrathin films

In Special Collection: Commemorating the Career of Charles S. Fadley

Gong Chen; MacCallum Robertson; Heeyoung Kwon; Changyeon Won; Andreas K. Schmid; Kai Liu

J. Vac. Sci. Technol. A 39, 053410 (2021) https://doi.org/10.1116/6.0001170

Abstract

View articletitled, Chirality-induced zigzag domain wall in in-plane magnetized ultrathin films

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CHORUS

In-line electronic and structural characterization of reactively sputtered Cu-Co-Mn black spinel oxides

Anna Krammer; Maxime Lagier; Andreas Schüler

J. Vac. Sci. Technol. A 39, 053411 (2021) https://doi.org/10.1116/6.0001120

Abstract

View articletitled, In-line electronic and structural characterization of reactively sputtered Cu-Co-Mn black spinel oxides

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Capacitive β-Ga₂O₃ solar-blind photodetector with graphene electrode

In Special Collection: Gallium Oxide Materials and Devices

Ayeong Kim; Geonyeop Lee; Jihyun Kim

J. Vac. Sci. Technol. A 39, 053412 (2021) https://doi.org/10.1116/6.0001217

Abstract

View articletitled, Capacitive β-Ga2O3 solar-blind photodetector with graphene electrode

Supplementary Material

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Errata

Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)₂ on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]

Abdulrahman H. Basher; Marjan Krstić; Karin Fink; Tomoko Ito; Kazuhiro Karahashi; Wolfgang Wenzel; Satoshi Hamaguchi

J. Vac. Sci. Technol. A 39, 057001 (2021) https://doi.org/10.1116/6.0001319

Extract

View articletitled, Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]

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Issues

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Letters

Review Articles

Perspectives

ARTICLES

2-D Materials

Atomic Layer Deposition (ALD)

Atomic Layer Etching (ALE)

Photovoltaics and Energy

Plasma Science and Technology

Surfaces and Interfaces

Thin Films

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