Issues

Review Articles

Group III selenides: Controlling dimensionality, structure, and properties through defects and heteroepitaxial growth

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Marjorie A. Olmstead; Fumio S. Ohuchi

J. Vac. Sci. Technol. A 39, 020801 (2021) https://doi.org/10.1116/6.0000598

Abstract

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CHORUS

Quantum dot lasers—History and future prospects

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Justin C. Norman; Richard P. Mirin; John E. Bowers

J. Vac. Sci. Technol. A 39, 020802 (2021) https://doi.org/10.1116/6.0000768

Abstract

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From NiSi₂ experiments to density functional theory calculations: How the Schottky barrier mystery was solved

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Raymond T. Tung

J. Vac. Sci. Technol. A 39, 020803 (2021) https://doi.org/10.1116/6.0000689

Abstract

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True hero of the trade: On the critical contributions of Art Gossard to modern device techonology

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Aaron J. Muhowski; Alec M. Skipper; Stephen D. March; Mark J. W. Rodwell; Seth R. Bank

J. Vac. Sci. Technol. A 39, 020804 (2021) https://doi.org/10.1116/6.0000792

Abstract

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Perspectives

Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al₂O₃ by trimethylaluminum

In Special Collection: Atomic Layer Deposition (ALD)

Tyler J. Myers; Austin M. Cano; Diane K. Lancaster; Joel W. Clancey; Steven M. George

J. Vac. Sci. Technol. A 39, 021001 (2021) https://doi.org/10.1116/6.0000680

Abstract

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Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Josiah Yarbrough; Alex B. Shearer; Stacey F. Bent

J. Vac. Sci. Technol. A 39, 021002 (2021) https://doi.org/10.1116/6.0000840

Abstract

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Special Topic Collection: Reproducibility Challenges and Solutions

Preface

Introduction to topical collection: Reproducibility challenges and solutions with a focus on guides to XPS analysis

Donald R. Baer; Gary E. McGuire; Kateryna Artyushkova; Christopher D. Easton; Mark H. Engelhard; Alexander G. Shard

J. Vac. Sci. Technol. A 39, 021601 (2021) https://doi.org/10.1116/6.0000873

Extract

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ARTICLES

Atomic Layer Deposition (ALD)

Thermal ranges and figures of merit for gold-containing precursors for atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Matthew B. E. Griffiths; Zachary S. Dubrawski; Peter G. Gordon; Marcel Junige; Seán T. Barry

J. Vac. Sci. Technol. A 39, 022401 (2021) https://doi.org/10.1116/6.0000707

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Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

In Special Collection: Special Topic Collection on Area Selective Deposition

Petro Deminskyi; Ali Haider; Hamit Eren; Talha M. Khan; Necmi Biyikli

J. Vac. Sci. Technol. A 39, 022402 (2021) https://doi.org/10.1116/6.0000701

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Atomic layer deposition of hafnium and zirconium oxyfluoride thin films

In Special Collection: Atomic Layer Deposition (ALD)

Neha Mahuli; Andrew S. Cavanagh; Steven M. George

J. Vac. Sci. Technol. A 39, 022403 (2021) https://doi.org/10.1116/6.0000731

Abstract

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Atomic layer deposition of TbF₃ thin films

In Special Collection: Atomic Layer Deposition (ALD)

Elisa Atosuo; Juha Ojala; Mikko J. Heikkilä; Miika Mattinen; Kenichiro Mizohata; Jyrki Räisänen; Markku Leskelä; Mikko Ritala

J. Vac. Sci. Technol. A 39, 022404 (2021) https://doi.org/10.1116/6.0000790

Abstract

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Evaluation of TiO₂ and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications

In Special Collection: Atomic Layer Deposition (ALD)

Halil I. Akyildiz; Sumeyye Diler; Shafiqul Islam

J. Vac. Sci. Technol. A 39, 022405 (2021) https://doi.org/10.1116/6.0000761

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Real-time in situ process monitoring and characterization of GaN films grown on Si (100) by low-temperature hollow-cathode plasma-atomic layer deposition using trimethylgallium and N₂/H₂ plasma

In Special Collection: Atomic Layer Deposition (ALD)

Deepa Shukla; Adnan Mohammad; Saidjafarzoda Ilhom; Brian G. Willis; Ali Kemal Okyay; Necmi Biyikli

J. Vac. Sci. Technol. A 39, 022406 (2021) https://doi.org/10.1116/6.0000706

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Atomic Layer Etching (ALE)

Atomic layer etching of GaN using Cl₂ and He or Ar plasma

In Special Collection: Atomic Layer Etching (ALE)

Simon Ruel; Patricia Pimenta-Barros; Frédéric Le Roux; Nicolas Chauvet; Michel Massardier; Philippe Thoueille; Shirley Tan; Daniel Shin; François Gaucher; Nicolas Posseme

J. Vac. Sci. Technol. A 39, 022601 (2021) https://doi.org/10.1116/6.0000830

Abstract

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Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism

In Special Collection: Atomic Layer Etching (ALE)

Aziz I. Abdulagatov; Varun Sharma; Jessica A. Murdzek; Andrew S. Cavanagh; Steven M. George

J. Vac. Sci. Technol. A 39, 022602 (2021) https://doi.org/10.1116/6.0000834

Abstract

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CHORUS

In silico design of a thermal atomic layer etch process of cobalt

In Special Collection: Atomic Layer Etching (ALE)

Suresh Kondati Natarajan; Michael Nolan; Patrick Theofanis; Charles Mokhtarzadeh; Scott B. Clendenning

J. Vac. Sci. Technol. A 39, 022603 (2021) https://doi.org/10.1116/6.0000804

Abstract

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Photovoltaics and Energy

Highly crystalline methylammonium lead iodide films: Phase transition from tetragonal to cubic structure by thermal annealing

In Special Collection: Organic, Inorganic, and Hybrid Halide Perovskite Thin Films

Shyju Thankaraj salammal; Vengatesh Panneerselvam; Karthik Kumar Chinnakutti; Paulraj Manidurai; Kuppusami Parasuraman

J. Vac. Sci. Technol. A 39, 022801 (2021) https://doi.org/10.1116/6.0000635

Abstract

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Controlling conduction band alignment and carrier concentration in gallium-doped magnesium zinc oxide by reactive cosputtering

Gavin Yeung; Colin A. Wolden

J. Vac. Sci. Technol. A 39, 022802 (2021) https://doi.org/10.1116/6.0000784

Abstract

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Plasma Science and Technology

Atmospheric pressure plasma reduction of copper oxide to copper metal

Joyce Lee; Thomas S. Williams; Robert F. Hicks

J. Vac. Sci. Technol. A 39, 023001 (2021) https://doi.org/10.1116/6.0000704

Abstract

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Epitaxial growth of 3C-SiC film by microwave plasma chemical vapor deposition in H₂-CH₄-SiH₄ mixtures: Optical emission spectroscopy study

V. Yu. Yurov; V. G. Ralchenko; A. K. Martyanov; I. A. Antonova; V. S. Sedov; A. A. Khomich; V. V. Voronov; S. S. Savin; M. Y. Shevchenko; A. P. Bolshakov

J. Vac. Sci. Technol. A 39, 023002 (2021) https://doi.org/10.1116/6.0000745

Abstract

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Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen

Dren Qerimi; Ivan Shchelkanov; Gianluca Panici; Arihant Jain; James Wagner; David N. Ruzic

J. Vac. Sci. Technol. A 39, 023003 (2021) https://doi.org/10.1116/6.0000786

Abstract

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Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system

Dren Qerimi; Gianluca Panici; Arihant Jain; Daniel Jacobson; David N. Ruzic

J. Vac. Sci. Technol. A 39, 023004 (2021) https://doi.org/10.1116/6.0000787

Abstract

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Surfaces and Interfaces

Novel in situ sensing surface forces apparatus for measuring gold versus gold, hydrophobic, and biophysical interactions

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Valentina Wieser; Pierluigi Bilotto; Ulrich Ramach; Hui Yuan; Kai Schwenzfeier; Hsiu-Wei Cheng; Markus Valtiner

J. Vac. Sci. Technol. A 39, 023201 (2021) https://doi.org/10.1116/6.0000611

Abstract

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Surface wettability of silicon nanopillar array structures fabricated by biotemplate ultimate top-down processes

Sou Takeuchi; Daisuke Ohori; Masahiro Sota; Teruhisa Ishida; Yiming Li; Jenn-Hwan Tarng; Kazuhiko Endo; Seiji Samukawa

J. Vac. Sci. Technol. A 39, 023202 (2021) https://doi.org/10.1116/6.0000770

Abstract

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Atomic structure of CsBr thin films on Ag (111)

Shivani Varshney; Jun Nogami

J. Vac. Sci. Technol. A 39, 023203 (2021) https://doi.org/10.1116/6.0000808

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Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica

In Special Collection: Special Topic Collection on Area Selective Deposition

Marcel Junige; Steven M. George

J. Vac. Sci. Technol. A 39, 023204 (2021) https://doi.org/10.1116/6.0000769

Abstract

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Monolayer attenuation length of low-energy electrons in Gd and Tb

Karen Göhler; Anke B. Schmidt; Markus Donath

J. Vac. Sci. Technol. A 39, 023205 (2021) https://doi.org/10.1116/6.0000754

Abstract

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Thin Films

Electron conducting Ag₂Te nanowire/polymer thermoelectric thin films

Tabitha Sutch; Jared M. Allred; Greg Szulczewski

J. Vac. Sci. Technol. A 39, 023401 (2021) https://doi.org/10.1116/6.0000690

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Analysis of ErAs nanoparticle surface grown using a two-step modified diffusion length process

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Yuanchang Zhang; Kurt G. Eyink; Madelyn Hill; Brittany Urwin; Krishnamurthy Mahalingam

J. Vac. Sci. Technol. A 39, 023402 (2021) https://doi.org/10.1116/6.0000636

Abstract

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X-ray photoelectron spectroscopy analysis of TiB_x (1.3 ≤ x ≤ 3.0) thin films

Niklas Hellgren; Grzegorz Greczynski; Mauricio A. Sortica; Ivan Petrov; Lars Hultman; Johanna Rosen

J. Vac. Sci. Technol. A 39, 023403 (2021) https://doi.org/10.1116/6.0000789

Abstract

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Interface structure and luminescence properties of epitaxial PbSe films on InAs(111)A

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Brian B. Haidet; Leland Nordin; Aaron J. Muhowski; Kevin D. Vallejo; Eamonn T. Hughes; Jarod Meyer; Paul J. Simmonds; Daniel Wasserman; Kunal Mukherjee

J. Vac. Sci. Technol. A 39, 023404 (2021) https://doi.org/10.1116/6.0000774

Abstract

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CHORUS

Impact of Cr₂O₃ additives on the gas-sensitive properties of β-Ga₂O₃ thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors

In Special Collection: Gallium Oxide Materials and Devices

Aleksei V. Almaev; Evgeny V. Chernikov; Vadim V. Novikov; Bogdan O. Kushnarev; Nikita N. Yakovlev; Ekaterina V. Chuprakova; Vladimir L. Oleinik; Anastasiya D. Lozinskaya; Daniela S. Gogova

J. Vac. Sci. Technol. A 39, 023405 (2021) https://doi.org/10.1116/6.0000723

Abstract

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Preferential sputtering of metal oxide mixture thin films

Mathias Mende; Florian Carstens; Henrik Ehlers; Detlev Ristau

J. Vac. Sci. Technol. A 39, 023406 (2021) https://doi.org/10.1116/6.0000799

Abstract

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Material properties and performance of ErAs:In(Al)GaAs photoconductors for 1550 nm laser operation

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

U. Nandi; M. Mohammadi; H. Lu; J. Norman; A. C. Gossard; L. Alff; S. Preu

J. Vac. Sci. Technol. A 39, 023407 (2021) https://doi.org/10.1116/6.0000773

Abstract

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Multi-technique investigation of Ni-doped ZnO thin films on sapphire by metalorganic chemical vapor deposition

Jiwei Chen; Jiabin Wang; Vishal Saravade; Ian T. Ferguson; Weiguo Hu; Zhe Chuan Feng; Lingyu Wan

J. Vac. Sci. Technol. A 39, 023408 (2021) https://doi.org/10.1116/6.0000816

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Molecular beam epitaxy of polar III-nitride resonant tunneling diodes

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Jimy Encomendero; SM Islam; Debdeep Jena; Huili Grace Xing

J. Vac. Sci. Technol. A 39, 023409 (2021) https://doi.org/10.1116/6.0000775

Abstract

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Effects of electrochemical potentiostatic activation on carrier transport in AlGaN-based deep-ultraviolet light-emitting diodes

Dong Yeong Kim; Hyunwoong Kang; Koh Eun Lee; Rak Jun Choi; June Key Lee; Jaehee Cho

J. Vac. Sci. Technol. A 39, 023410 (2021) https://doi.org/10.1116/6.0000827

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Two-step growth of β-Ga₂O₃ films on (100) diamond via low pressure chemical vapor deposition

In Special Collection: Gallium Oxide Materials and Devices

Md Rezaul Karim; Zhaoying Chen; Zixuan Feng; Hsien-Lien Huang; Jared M. Johnson; Marko J. Tadjer; Jinwoo Hwang; Hongping Zhao

J. Vac. Sci. Technol. A 39, 023411 (2021) https://doi.org/10.1116/6.0000854

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Design of Ga₂O₃ modulation doped field effect transistors

In Special Collection: Gallium Oxide Materials and Devices

Michael A. Mastro; Marko J. Tadjer; Jihyun Kim; Fan Ren; Stephen J. Pearton

J. Vac. Sci. Technol. A 39, 023412 (2021) https://doi.org/10.1116/6.0000825

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CHORUS

Sticking coefficients of selenium and tellurium

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Derrick S. H. Liu; Maria Hilse; Roman Engel-Herbert

J. Vac. Sci. Technol. A 39, 023413 (2021) https://doi.org/10.1116/6.0000736

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CHORUS

Ultrasmooth cobalt films on SiO₂ by chemical vapor deposition using a nucleation promoter and a growth inhibitor

In Special Collection: Special Topic Collection on Area Selective Deposition

Zhejun V. Zhang; Sumeng Liu; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 39, 023414 (2021) https://doi.org/10.1116/6.0000688

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CHORUS

Selective chemical vapor deposition of HfB₂ on Al₂O₃ over SiO₂ and the acceleration of nucleation on SiO₂ by pretreatment with Hf[N(CH₃)₂]₄

In Special Collection: Special Topic Collection on Area Selective Deposition

Zhejun V. Zhang; Sumeng Liu; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 39, 023415 (2021) https://doi.org/10.1116/6.0000691

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Errata