Issues

Letters

Chemical passivation of the perovskite layer and its real-time effect on the device performance in back-contact perovskite solar cells

In Special Collection: Organic, Inorganic, and Hybrid Halide Perovskite Thin Films

Askhat N. Jumabekov

J. Vac. Sci. Technol. A 38, 060401 (2020) https://doi.org/10.1116/6.0000481

Abstract

View articletitled, Chemical passivation of the perovskite layer and its real-time effect on the device performance in back-contact perovskite solar cells

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CHORUS

Interfacial modulation on single-crystalline aluminum films grown on GaAs by ErAs insertion

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Kedong Zhang; Rui Pan; Shunji Xia; Wangwei Zhang; Menglin Chang; Yuanfeng Ding; Chen Li; Yu Deng; Hong Lu; Yan-Feng Chen

J. Vac. Sci. Technol. A 38, 060402 (2020) https://doi.org/10.1116/6.0000530

Abstract

View articletitled, Interfacial modulation on single-crystalline aluminum films grown on GaAs by ErAs insertion

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Modified atomic layer deposition of MoS₂ thin films

In Special Collection: Atomic Layer Deposition (ALD)

Li Zeng; Nathaniel E. Richey; David W. Palm; Il-Kwon Oh; Jingwei Shi; Callisto Maclsaac; Thomas Jaramillo; Stacey F. Bent

J. Vac. Sci. Technol. A 38, 060403 (2020) https://doi.org/10.1116/6.0000641

Abstract

View articletitled, Modified atomic layer deposition of MoS₂ thin films

Supplementary Material

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CHORUS

Review Articles

Energy-dense Li metal anodes enabled by thin film electrolytes

Marina Maria Ioanniti; Fei Hu; Wyatt E. Tenhaeff

J. Vac. Sci. Technol. A 38, 060801 (2020) https://doi.org/10.1116/6.0000430

Abstract

View articletitled, Energy-dense Li metal anodes enabled by thin film electrolytes

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CHORUS

Review on recent progress in patterning phase change materials

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Meihua Shen; Thorsten Lill; Nick Altieri; John Hoang; Steven Chiou; Jim Sims; Andrew McKerrow; Rafal Dylewicz; Ernest Chen; Hamid Razavi; Jane P. Chang

J. Vac. Sci. Technol. A 38, 060802 (2020) https://doi.org/10.1116/6.0000336

Abstract

View articletitled, Review on recent progress in patterning phase change materials

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Physical and chemical vapor deposition methods applied to all-inorganic metal halide perovskites

In Special Collection: Organic, Inorganic, and Hybrid Halide Perovskite Thin Films

Sara Bonomi; Lorenzo Malavasi

J. Vac. Sci. Technol. A 38, 060803 (2020) https://doi.org/10.1116/6.0000568

Abstract

View articletitled, Physical and chemical vapor deposition methods applied to all-inorganic metal halide perovskites

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tert-butoxides as precursors for atomic layer deposition of alkali metal containing thin films

In Special Collection: Atomic Layer Deposition (ALD)

Henrik H. Sønsteby; Jon E. Bratvold; Veronica A.-L. K. Killi; Devika Choudhury; Jeffrey W. Elam; Helmer Fjellvåg; Ola Nilsen

J. Vac. Sci. Technol. A 38, 060804 (2020) https://doi.org/10.1116/6.0000589

Abstract

View articletitled, <em>tert</em>-butoxides as precursors for atomic layer deposition of alkali metal containing thin films

Supplementary Material

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CHORUS

Magnetron sputtering

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Stephen M. Rossnagel

J. Vac. Sci. Technol. A 38, 060805 (2020) https://doi.org/10.1116/6.0000594

Abstract

View articletitled, Magnetron sputtering

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Tutorials

Introductory guide to the application of XPS to epitaxial films and heterostructures

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Scott A. Chambers; Le Wang; Donald R. Baer

J. Vac. Sci. Technol. A 38, 061201 (2020) https://doi.org/10.1116/6.0000465

Abstract

View articletitled, Introductory guide to the application of XPS to epitaxial films and heterostructures

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Low-cost spectrum analyzer for trouble shooting noise sources in scanning probe microscopy

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Nicholas M. McQuillan; Amanda M. Larson; E. Charles H. Sykes

J. Vac. Sci. Technol. A 38, 061202 (2020) https://doi.org/10.1116/6.0000410

Abstract

View articletitled, Low-cost spectrum analyzer for trouble shooting noise sources in scanning probe microscopy

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CHORUS

Practical guide for curve fitting in x-ray photoelectron spectroscopy

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

George H. Major; Neal Fairley; Peter M. A. Sherwood; Matthew R. Linford; Jeff Terry; Vincent Fernandez; Kateryna Artyushkova

J. Vac. Sci. Technol. A 38, 061203 (2020) https://doi.org/10.1116/6.0000377

Abstract

View articletitled, Practical guide for curve fitting in x-ray photoelectron spectroscopy

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Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

George H. Major; Tahereh G. Avval; Behnam Moeini; Gabriele Pinto; Dhruv Shah; Varun Jain; Victoria Carver; William Skinner; Thomas R. Gengenbach; Christopher D. Easton; Alberto Herrera-Gomez; Tim S. Nunney; Donald R. Baer; Matthew R. Linford

J. Vac. Sci. Technol. A 38, 061204 (2020) https://doi.org/10.1116/6.0000685

Abstract

View articletitled, Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature

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Preface

30 years of the Nellie Yeoh Whetten Award - Celebrating the Women of the AVS

Special Topic Collection Commemorating the Career of John Coburn

Preface

ARTICLES

2-D Materials

Synthesis of edge-enriched WS₂ on high surface area WS₂ framework by atomic layer deposition for electrocatalytic hydrogen evolution reaction

In Special Collection: Atomic Layer Deposition (ALD)

Shashank Balasubramanyam; Matthew A. Bloodgood; Yue Zhang; Marcel A. Verheijen; Wilhelmus M. M. Kessels; Jan P. Hofmann; Ageeth A. Bol

J. Vac. Sci. Technol. A 38, 062201 (2020) https://doi.org/10.1116/6.0000563

Abstract

View articletitled, Synthesis of edge-enriched WS₂ on high surface area WS₂ framework by atomic layer deposition for electrocatalytic hydrogen evolution reaction

Supplementary Material

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First-principles study of phonon thermal transport in II–VI group graphenelike materials

Jianye Liu; Yinchang Zhao; Weiqiang Wang; Qi Zhong; Zhenhong Dai; Sheng Meng

J. Vac. Sci. Technol. A 38, 062202 (2020) https://doi.org/10.1116/6.0000376

Abstract

View articletitled, First-principles study of phonon thermal transport in II–VI group graphenelike materials

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Atomic Layer Deposition (ALD)

Carbon content control of silicon oxycarbide film with methane containing plasma

In Special Collection: Atomic Layer Deposition (ALD)

Seokhwi Song; Suhyeon Park; Chanwon Jung; Hyunwoo Park; Youngjoon Kim; Hyeongtag Jeon

J. Vac. Sci. Technol. A 38, 062401 (2020) https://doi.org/10.1116/6.0000210

Abstract

View articletitled, Carbon content control of silicon oxycarbide film with methane containing plasma

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Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation

In Special Collection: Atomic Layer Deposition (ALD)

Sonali N. Chopra; Martijn F. J. Vos; Marcel A. Verheijen; John G. Ekerdt; Wilhelmus M. M. Kessels; Adriaan J. M. Mackus

J. Vac. Sci. Technol. A 38, 062402 (2020) https://doi.org/10.1116/6.0000434

Abstract

View articletitled, Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation

Supplementary Material

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CHORUS

Thin-film encapsulation of Al₂O₃ multidensity layer structure prepared by spatial atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Hyunwoo Park; Seokyoon Shin; Hyeongsu Choi; Namgue Lee; Yeongtae Choi; Keunsik Kim; Hyeongtag Jeon

J. Vac. Sci. Technol. A 38, 062403 (2020) https://doi.org/10.1116/6.0000485

Abstract

View articletitled, Thin-film encapsulation of Al₂O₃ multidensity layer structure prepared by spatial atomic layer deposition

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Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi_xN films through composition tuning

In Special Collection: Atomic Layer Deposition (ALD)

Corbin Feit; Srishti Chugh; Ajit R. Dhamdhere; Hae Young Kim; Shaurya Dabas; Somilkumar J. Rathi; Niloy Mukherjee; Parag Banerjee

J. Vac. Sci. Technol. A 38, 062404 (2020) https://doi.org/10.1116/6.0000453

Abstract

View articletitled, Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi_xN films through composition tuning

Supplementary Material

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CHORUS

Ultrasonic atomization of titanium isopropoxide at room temperature for TiO₂ atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Moon-Hyung Jang; Yu Lei

J. Vac. Sci. Technol. A 38, 062405 (2020) https://doi.org/10.1116/6.0000464

Abstract

View articletitled, Ultrasonic atomization of titanium isopropoxide at room temperature for TiO₂ atomic layer deposition

Supplementary Material

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CHORUS

Resolving self-limiting growth in silicon nitride plasma enhanced atomic layer deposition with tris-dimethylamino silane precursor

In Special Collection: Atomic Layer Deposition (ALD)

Triratna Muneshwar; Ken Cadien

J. Vac. Sci. Technol. A 38, 062406 (2020) https://doi.org/10.1116/6.0000493

Abstract

View articletitled, Resolving self-limiting growth in silicon nitride plasma enhanced atomic layer deposition with tris-dimethylamino silane precursor

Supplementary Material

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Effect of N₂/H₂ plasma on the growth of InN thin films on sapphire by hollow-cathode plasma-assisted atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Mustafa Alevli; Nese Gungor

J. Vac. Sci. Technol. A 38, 062407 (2020) https://doi.org/10.1116/6.0000494

Abstract

View articletitled, Effect of N₂/H₂ plasma on the growth of InN thin films on sapphire by hollow-cathode plasma-assisted atomic layer deposition

Supplementary Material

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Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition

In Special Collection: Atomic Layer Deposition (ALD)

Gilbert B. Rayner, Jr.; Noel O’Toole; Jeffrey Shallenberger; Blaine Johs

J. Vac. Sci. Technol. A 38, 062408 (2020) https://doi.org/10.1116/6.0000454

Abstract

View articletitled, Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition

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On the response of gamma irradiation on atomic layer deposition-grown β-Ga₂O₃ films and Au-β-Ga₂O₃-Au deep ultraviolet solar-blind photodetectors

In Special Collection: Gallium Oxide Materials and Devices

Chun-Ying Huang; Guan-Yu Lin; Yen-Yang Liu; Fu-Yuan Chang; Pei-Te Lin; Feng-Hsuan Hsu; Yu-Hsiang Peng; Zi-Ling Huang; Tai-Yuan Lin; Jyh-Rong Gong

J. Vac. Sci. Technol. A 38, 062409 (2020) https://doi.org/10.1116/6.0000512

Abstract

View articletitled, On the response of gamma irradiation on atomic layer deposition-grown β-Ga₂O₃ films and Au-β-Ga₂O₃-Au deep ultraviolet solar-blind photodetectors

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Selective ALD of SiN using SiI₄ and NH₃: The effect of temperature, plasma treatment, and oxide underlayer

In Special Collection: Special Topic Collection on Area Selective Deposition

Han Wang; Bryan C. Hendrix; Thomas H. Baum

J. Vac. Sci. Technol. A 38, 062410 (2020) https://doi.org/10.1116/6.0000538

Abstract

View articletitled, Selective ALD of SiN using SiI₄ and NH₃: The effect of temperature, plasma treatment, and oxide underlayer

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Area-selective atomic layer deposition enabled by competitive adsorption

In Special Collection: Special Topic Collection on Area Selective Deposition

Taewon Suh; Yan Yang; Hae Won Sohn; Robert A. DiStasio, Jr.; James R. Engstrom

J. Vac. Sci. Technol. A 38, 062411 (2020) https://doi.org/10.1116/6.0000497

Abstract

View articletitled, Area-selective atomic layer deposition enabled by competitive adsorption

Supplementary Material

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CHORUS

Theoretical study of the adsorption of Lewis acids on MoS₂ in relation to atomic layer deposition of Al₂O₃

In Special Collection: Atomic Layer Deposition (ALD)

Victor M. Bermudez

J. Vac. Sci. Technol. A 38, 062412 (2020) https://doi.org/10.1116/6.0000467

Abstract

View articletitled, Theoretical study of the adsorption of Lewis acids on MoS₂ in relation to atomic layer deposition of Al₂O₃

Supplementary Material

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Atomic Layer Etching (ALE)

Mechanism of SiN etching rate fluctuation in atomic layer etching

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Akiko Hirata; Masanaga Fukasawa; Katsuhisa Kugimiya; Kojiro Nagaoka; Kazuhiro Karahashi; Satoshi Hamaguchi; Hayato Iwamoto

J. Vac. Sci. Technol. A 38, 062601 (2020) https://doi.org/10.1116/6.0000257

Abstract

View articletitled, Mechanism of SiN etching rate fluctuation in atomic layer etching

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Photovoltaics and Energy

Opto-electrical characterization of quaternary sputtered copper indium gallium selenide nanorods via glancing angle deposition

Matthew Brozak; Emad Badraddin; Tansel Karabacak; Thomas Walsh

J. Vac. Sci. Technol. A 38, 062801 (2020) https://doi.org/10.1116/6.0000382

Abstract

View articletitled, Opto-electrical characterization of quaternary sputtered copper indium gallium selenide nanorods via glancing angle deposition

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Plasma Science and Technology

Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH₃/Ar plasma

Takeshi Kitajima; Machiko Miyake; Ryo Katoh; Toshiki Nakano

J. Vac. Sci. Technol. A 38, 063001 (2020) https://doi.org/10.1116/6.0000405

Abstract

View articletitled, Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH₃/Ar plasma

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Effect of a low pressure low temperature hydrogen plasma on the work function of europium

Sofia Cristofaro; Roland Friedl; Ursel Fantz

J. Vac. Sci. Technol. A 38, 063002 (2020) https://doi.org/10.1116/6.0000461

Abstract

View articletitled, Effect of a low pressure low temperature hydrogen plasma on the work function of europium

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Deep GaN through-substrate via etching using Cl₂/BCl₃ inductively coupled plasma

Naoya Okamoto; Atsushi Takahashi; Yuichi Minoura; Yusuke Kumazaki; Shiro Ozaki; Toshihiro Ohki; Naoki Hara; Keiji Watanabe

J. Vac. Sci. Technol. A 38, 063003 (2020) https://doi.org/10.1116/6.0000526

Abstract

View articletitled, Deep GaN through-substrate via etching using Cl₂/BCl₃ inductively coupled plasma

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Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas

Priyanka Arora; Junghyun Cho; Rafael Cervantes; Vincent M. Donnelly

J. Vac. Sci. Technol. A 38, 063004 (2020) https://doi.org/10.1116/6.0000373

Abstract

View articletitled, Glow discharge-optical emission spectroscopy for <em>in situ</em> analysis of surfaces in plasmas

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Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Yashuang Zheng; Lijun Wang; Peter Bruggeman

J. Vac. Sci. Technol. A 38, 063005 (2020) https://doi.org/10.1116/6.0000575

Abstract

View articletitled, Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction

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Synthesis of large-area MoS₂ films by plasma-enhanced chemical film conversion of solution-processed ammonium tetrathiomolybdate

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Souvik Bhattacharya; Tianqi Liu; Zhipeng Ye; Rui He; R. Mohan Sankaran

J. Vac. Sci. Technol. A 38, 063006 (2020) https://doi.org/10.1116/6.0000599

Abstract

View articletitled, Synthesis of large-area MoS₂ films by plasma-enhanced chemical film conversion of solution-processed ammonium tetrathiomolybdate

Supplementary Material

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CHORUS

Cyclic approach for silicon nitride spacer etching in fin field-effect transistors and stacked nanowire devices

Olivier Pollet; Vincent Ah-Leung; Sebastien Barnola; Nicolas Posseme

J. Vac. Sci. Technol. A 38, 063007 (2020) https://doi.org/10.1116/6.0000584

Abstract

View articletitled, Cyclic approach for silicon nitride spacer etching in fin field-effect transistors and stacked nanowire devices

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Surfaces and Interfaces

Extreme-ultraviolet-induced carbon growth at contaminant pressures between 10⁻¹⁰ and 10⁻⁶ mbar: Experiment and model

Shannon B. Hill; Charles Tarrio; Robert F. Berg; Thomas B. Lucatorto

J. Vac. Sci. Technol. A 38, 063201 (2020) https://doi.org/10.1116/6.0000437

Abstract

View articletitled, Extreme-ultraviolet-induced carbon growth at contaminant pressures between 10⁻¹⁰ and 10⁻⁶ mbar: Experiment and model

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Sample handling, preparation and mounting for XPS and other surface analytical techniques

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Fred A. Stevie; Roberto Garcia; Jeffrey Shallenberger; John G. Newman; Carrie L. Donley

J. Vac. Sci. Technol. A 38, 063202 (2020) https://doi.org/10.1116/6.0000421

Abstract

View articletitled, Sample handling, preparation and mounting for XPS and other surface analytical techniques

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Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Mark H. Engelhard; Donald R. Baer; Alberto Herrera-Gomez; Peter M. A. Sherwood

J. Vac. Sci. Technol. A 38, 063203 (2020) https://doi.org/10.1116/6.0000359

Abstract

View articletitled, Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities

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Introduction to x-ray photoelectron spectroscopy

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Fred A. Stevie; Carrie L. Donley

J. Vac. Sci. Technol. A 38, 063204 (2020) https://doi.org/10.1116/6.0000412

Abstract

View articletitled, Introduction to x-ray photoelectron spectroscopy

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First-principles theoretical analysis and electron energy loss spectroscopy of vacancy defects in bulk and nonpolar (⁠$101¯$⁠) surface of GaN

Sanjay Nayak; Mit H. Naik; Manish Jain; Umesh V. Waghmare; Sonnada M. Shivaprasad

J. Vac. Sci. Technol. A 38, 063205 (2020) https://doi.org/10.1116/6.0000402

Abstract

View articletitled, First-principles theoretical analysis and electron energy loss spectroscopy of vacancy defects in bulk and nonpolar (<span class="inline-formula no-formula-id">⁠<span class="mathFormula"></span><math xmlns="http://www.w3.org/1998/Math/MathML"><mn xmlns="">10</mn><mover xmlns=""><mn>1</mn><mo accent="false">¯</mo></mover><mn xmlns=""></mn></math>⁠</span>) surface of GaN

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The chemistry and energetics of the interface between metal halide perovskite and atomic layer deposited metal oxides

In Special Collection: 30 years of the Nellie Yeoh Whetten Award &#x2014; Celebrating the Women of the AVS

Andrea E. A. Bracesco; Claire H. Burgess; Anna Todinova; Valerio Zardetto; Dibyashree Koushik; Wilhelmus M. M (Erwin) Kessels; Ilker Dogan; Christ H. L. Weijtens; Sjoerd Veenstra; Ronn Andriessen; Mariadriana Creatore

J. Vac. Sci. Technol. A 38, 063206 (2020) https://doi.org/10.1116/6.0000447

Abstract

View articletitled, The chemistry and energetics of the interface between metal halide perovskite and atomic layer deposited metal oxides

Supplementary Material

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Photoluminescence, thermoluminescence, and cathodoluminescence of optimized cubic Gd₂O₃:Bi phosphor powder

Mogahid H. M. Abdelrehman; Robin E. Kroon; Abdelrhman Yousif; Hassan A. A. Seed Ahmed; Hendrik C. Swart

J. Vac. Sci. Technol. A 38, 063207 (2020) https://doi.org/10.1116/6.0000567

Abstract

View articletitled, Photoluminescence, thermoluminescence, and cathodoluminescence of optimized cubic Gd₂O₃:Bi phosphor powder

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Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Benjamen P. Reed; David J. H. Cant; Steve J. Spencer; Abraham Jorge Carmona-Carmona; Adam Bushell; Alberto Herrera-Gómez; Akira Kurokawa; Andreas Thissen; Andrew G. Thomas; Andrew J. Britton; Andrzej Bernasik; Anne Fuchs; Arthur P. Baddorf; Bernd Bock; Bill Theilacker; Bin Cheng; David G. Castner; David J. Morgan; David Valley; Elizabeth A. Willneff; Emily F. Smith; Emmanuel Nolot; Fangyan Xie; Gilad Zorn; Graham C. Smith; Hideyuki Yasufuku; Jeffery L. Fenton; Jian Chen; Jonathan D. P. Counsell; Jörg Radnik; Karen J. Gaskell; Kateryna Artyushkova; Li Yang; Lulu Zhang; Makiho Eguchi; Marc Walker; Mariusz Hajdyła; Mateusz M. Marzec; Matthew R. Linford; Naoyoshi Kubota; Orlando Cortazar-Martínez; Paul Dietrich; Riki Satoh; Sven L. M. Schroeder; Tahereh G. Avval; Takaharu Nagatomi; Vincent Fernandez; Wayne Lake; Yasushi Azuma; Yusuke Yoshikawa; Alexander G. Shard

J. Vac. Sci. Technol. A 38, 063208 (2020) https://doi.org/10.1116/6.0000577

Abstract

View articletitled, Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene

Supplementary Material

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Al Kα XPS reference spectra of polyethylene for all instrument geometries

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Alexander G. Shard; Benjamen P. Reed

J. Vac. Sci. Technol. A 38, 063209 (2020) https://doi.org/10.1116/6.0000578

Abstract

View articletitled, Al Kα XPS reference spectra of polyethylene for all instrument geometries

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Enhancing nanostructured nickel-rich lithium-ion battery cathodes via surface stabilization

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Jin-Myoung Lim; Norman S. Luu; Kyu-Young Park; Mark T. Z. Tan; Sungkyu Kim; Julia R. Downing; Kai He; Vinayak P. Dravid; Mark C. Hersam

J. Vac. Sci. Technol. A 38, 063210 (2020) https://doi.org/10.1116/6.0000580

Abstract

View articletitled, Enhancing nanostructured nickel-rich lithium-ion battery cathodes via surface stabilization

Supplementary Material

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CHORUS

Thin Films

Topology of conductive clusters in sputtered high-quality VO₂ thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions

Cyril Koughia; Ozan Gunes; Chunzi Zhang; Shi-Jie Wen; Rick Wong; Qiaoqin Yang; Safa O. Kasap

J. Vac. Sci. Technol. A 38, 063401 (2020) https://doi.org/10.1116/6.0000443

Abstract

View articletitled, Topology of conductive clusters in sputtered high-quality VO₂ thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions

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Structural breakdown in high power GaN-on-GaN p-n diode devices stressed to failure

Prudhvi Peri; Kai Fu; Houqiang Fu; Yuji Zhao; David J. Smith

J. Vac. Sci. Technol. A 38, 063402 (2020) https://doi.org/10.1116/6.0000488

Abstract

View articletitled, Structural breakdown in high power GaN-on-GaN <em>p-n</em> diode devices stressed to failure

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CHORUS

Effect of duty cycle on the thermochromic properties of VO₂ thin-film fabricated by high power impulse magnetron sputtering

Pi-Chun Juan; Kuei-Chih Lin; Cheng-Li Lin; Wei-Fan Lin

J. Vac. Sci. Technol. A 38, 063403 (2020) https://doi.org/10.1116/6.0000409

Abstract

View articletitled, Effect of duty cycle on the thermochromic properties of VO₂ thin-film fabricated by high power impulse magnetron sputtering

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Effect of evaporation behavior of zinc tin phosphide alloys on the composition, structure, and photoconductive properties of their thin films

P. Sivakumar; P. Peranantham; V. V. Siva Kumar; K. Asokan; Y. L. Jeyachandran

J. Vac. Sci. Technol. A 38, 063404 (2020) https://doi.org/10.1116/6.0000570

Abstract

View articletitled, Effect of evaporation behavior of zinc tin phosphide alloys on the composition, structure, and photoconductive properties of their thin films

Supplementary Material

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Oblique angle initiated chemical vapor deposition for patterning film growth

Nicholas A. Welchert; Christine Cheng; Prathamesh Karandikar; Malancha Gupta

J. Vac. Sci. Technol. A 38, 063405 (2020) https://doi.org/10.1116/6.0000524

Abstract

View articletitled, Oblique angle initiated chemical vapor deposition for patterning film growth

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Heteroepitaxial growth of β-Ga₂O₃ films on SiC via molecular beam epitaxy

In Special Collection: Gallium Oxide Materials and Devices

Neeraj Nepal; D. Scott Katzer; Brian P. Downey; Virginia D. Wheeler; Luke O. Nyakiti; David F. Storm; Matthew T. Hardy; Jaime A. Freitas; Eric N. Jin; Diego Vaca; Luke Yates; Samuel Graham; Satish Kumar; David J. Meyer

J. Vac. Sci. Technol. A 38, 063406 (2020) https://doi.org/10.1116/6.0000452

Abstract

View articletitled, Heteroepitaxial growth of β-Ga₂O₃ films on SiC via molecular beam epitaxy

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XPS group array analysis of a combinatorial Ni-Ti-Co thin film library

Jonathan D. P. Counsell; Naila M. Al Hasan; Edward Walton; Tieren Gao; Huilong Hou; Ichiro Takeuchi

J. Vac. Sci. Technol. A 38, 063407 (2020) https://doi.org/10.1116/6.0000333

Abstract

View articletitled, XPS group array analysis of a combinatorial Ni-Ti-Co thin film library

Supplementary Material

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CHORUS

Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures

Niranjan Kumar; Vladimir A. Volodin; Ruslan M. Smertin; Pavel A. Yunin; Vladimir N. Polkovnoikov; Kalpataru Panda; Andrey N. Nechay; Nikolay I. Chkhalo

J. Vac. Sci. Technol. A 38, 063408 (2020) https://doi.org/10.1116/6.0000408

Abstract

View articletitled, Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures

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Raman scattering, emission, and deep defect evolution in ZnO:In thin films

Tetyana Torchynska; Brahim El Filali; Juan Antonio Jaramillo Gomez; Georgiy Polupan; Jorge Luis Ramírez García; Lyudmyla Shcherbyna

J. Vac. Sci. Technol. A 38, 063409 (2020) https://doi.org/10.1116/6.0000364

Abstract

View articletitled, Raman scattering, emission, and deep defect evolution in ZnO:In thin films

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Precursor selection in hybrid molecular beam epitaxy of alkaline-earth stannates

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Abhinav Prakash; Tianqi Wang; Rashmi Choudhary; Greg Haugstad; Wayne L. Gladfelter; Bharat Jalan

J. Vac. Sci. Technol. A 38, 063410 (2020) https://doi.org/10.1116/6.0000590

Abstract

View articletitled, Precursor selection in hybrid molecular beam epitaxy of alkaline-earth stannates

Supplementary Material

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CHORUS

Structure and behavior of ZrO₂-graphene-ZrO₂ stacks

Tauno Kahro; Helena Castán; Salvador Dueñas; Joonas Merisalu; Jekaterina Kozlova; Taivo Jõgiaas; Helle-Mai Piirsoo; Aarne Kasikov; Peeter Ritslaid; Hugo Mändar; Aivar Tarre; Aile Tamm; Kaupo Kukli

J. Vac. Sci. Technol. A 38, 063411 (2020) https://doi.org/10.1116/6.0000390

Abstract

View articletitled, Structure and behavior of ZrO₂-graphene-ZrO₂ stacks

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Controlled thin-film deposition of α or β Ga₂O₃ by ion-beam sputtering

In Special Collection: Gallium Oxide Materials and Devices

Martin Becker; Sebastian L. Benz; Limei Chen; Angelika Polity; Peter J. Klar; Sangam Chatterjee

J. Vac. Sci. Technol. A 38, 063412 (2020) https://doi.org/10.1116/6.0000619

Abstract

View articletitled, Controlled thin-film deposition of α or β Ga₂O₃ by ion-beam sputtering

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Interface-induced ferromagnetism in μ-Fe₂O₃/β-Ga₂O₃ superlattices

In Special Collection: Honoring Dr. Art Gossard's 85th Birthday and His Leadership in the Science and Technology of Molecular Beam Epitaxy

Elline C. Hettiaratchy; John S. Jamison; Binbin Wang; Núria Bagués; Rachel A. Guest; David W. McComb; Roberto C. Myers

J. Vac. Sci. Technol. A 38, 063413 (2020) https://doi.org/10.1116/6.0000612

Abstract

View articletitled, Interface-induced ferromagnetism in μ-Fe₂O₃/β-Ga₂O₃ superlattices

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CHORUS

Design and implementation of floating field ring edge termination on vertical geometry β-Ga₂O₃ rectifiers

In Special Collection: Gallium Oxide Materials and Devices

Ribhu Sharma; Minghan Xian; Mark E. Law; Marko Tadjer; Fan Ren; Stephen J. Pearton

J. Vac. Sci. Technol. A 38, 063414 (2020) https://doi.org/10.1116/6.0000693

Abstract

View articletitled, Design and implementation of floating field ring edge termination on vertical geometry β-Ga₂O₃ rectifiers

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CHORUS

Errata