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Practical guides for x-ray photoelectron spectroscopy: Quantitative XPS
Comprehensive characterization of copper oxide atomic layer deposition using water or ozone with enhanced bis-(dimethylamino-2-propoxide) copper delivery
Area-selective atomic layer deposition of molybdenum oxide
Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and water
In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals
Patterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processing
Fabrication of crystal plane oriented trenches in gallium nitride using SF6 + Ar dry etching and wet etching post-treatment
Experimental determination of electron attenuation lengths in complex materials by means of epitaxial film growth: Advantages and challenges
Letters
Cyclic etching of copper thin films using HBr and Ar gases
J. Vac. Sci. Technol. A 38, 040401 (2020)
https://doi.org/10.1116/6.0000218
Review Articles
The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 040801 (2020)
https://doi.org/10.1116/6.0000145
In vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctions
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 040802 (2020)
https://doi.org/10.1116/1.5141078
Thin film deposition research and its impact on microelectronics scaling
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 040803 (2020)
https://doi.org/10.1116/6.0000230
In situ, in vivo, and in operando imaging and spectroscopy of liquids using microfluidics in vacuum
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 040804 (2020)
https://doi.org/10.1116/1.5144499
Perspectives
X-ray photoelectron spectroscopy: A perspective on quantitation accuracy for composition analysis of homogeneous materials
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 041001 (2020)
https://doi.org/10.1116/1.5143897
Tutorials
Practical guides for x-ray photoelectron spectroscopy: Quantitative XPS
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 041201 (2020)
https://doi.org/10.1116/1.5141395
ARTICLES
2-D Materials
3D-printed and injection molded polymer matrix composites with 2D layered materials
J. Vac. Sci. Technol. A 38, 042201 (2020)
https://doi.org/10.1116/6.0000121
Atomic Layer Deposition (ALD)
Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042401 (2020)
https://doi.org/10.1116/6.0000152
Antioxidation protection for Ce metal by atomic layer deposition upon air exposure
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042402 (2020)
https://doi.org/10.1116/6.0000223
Comprehensive characterization of copper oxide atomic layer deposition using water or ozone with enhanced bis-(dimethylamino-2-propoxide) copper delivery
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042403 (2020)
https://doi.org/10.1116/6.0000248
Plasmonic nanocomposites of zinc oxide and titanium nitride
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042404 (2020)
https://doi.org/10.1116/1.5142858
Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042405 (2020)
https://doi.org/10.1116/6.0000212
Area-selective atomic layer deposition of molybdenum oxide
In Special Collection:
Special Topic Collection on Area Selective Deposition
J. Vac. Sci. Technol. A 38, 042406 (2020)
https://doi.org/10.1116/6.0000219
Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and water
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042407 (2020)
https://doi.org/10.1116/6.0000053
Structural and optical properties of (Zn,Mn)O thin films prepared by atomic layer deposition
In Special Collection:
Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 042408 (2020)
https://doi.org/10.1116/6.0000141
Atomic Layer Etching (ALE)
Causes of anisotropy in thermal atomic layer etching of nanostructures
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 042601 (2020)
https://doi.org/10.1116/6.0000261
In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 042602 (2020)
https://doi.org/10.1116/6.0000124
Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 042603 (2020)
https://doi.org/10.1116/6.0000190
Patterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processing
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 042604 (2020)
https://doi.org/10.1116/6.0000191
Plasma Science and Technology
Effect of frequency and applied voltage of an atmospheric-pressure dielectric-barrier discharge on breakdown and hydroxyl-radical generation with a liquid electrode
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 043001 (2020)
https://doi.org/10.1116/6.0000125
Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 043002 (2020)
https://doi.org/10.1116/6.0000134
On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand
J. Vac. Sci. Technol. A 38, 043004 (2020)
https://doi.org/10.1116/6.0000196
Atomic layer etching of metals with anisotropy, specificity, and selectivity
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 043005 (2020)
https://doi.org/10.1116/6.0000225
Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation
J. Vac. Sci. Technol. A 38, 043006 (2020)
https://doi.org/10.1116/6.0000233
Role of physisorption in atomic layer etching of silicon nitride
In Special Collection:
Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 043007 (2020)
https://doi.org/10.1116/6.0000154
Surfaces and Interfaces
Role of organic molecules in enabling modern technology
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 043201 (2020)
https://doi.org/10.1116/6.0000099
Utilizing plasma modified SnO2 paper gas sensors to better understand gas-surface interactions at low temperatures
J. Vac. Sci. Technol. A 38, 043202 (2020)
https://doi.org/10.1116/6.0000029
Fabrication of crystal plane oriented trenches in gallium nitride using SF6 + Ar dry etching and wet etching post-treatment
J. Vac. Sci. Technol. A 38, 043204 (2020)
https://doi.org/10.1116/6.0000120
Procedure which allows the performance and calibration of an XPS instrument to be checked rapidly and frequently
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 043206 (2020)
https://doi.org/10.1116/6.0000224
Thin Films
Slowing DNA translocation through a solid-state nanopore by applying hydrophobic microchannel-guided walls
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 043401 (2020)
https://doi.org/10.1116/6.0000182
Chemical vapor deposition of sp2-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatments
J. Vac. Sci. Technol. A 38, 043402 (2020)
https://doi.org/10.1116/1.5145287
Reduction of unintentional Si doping in β-Ga2O3 grown via plasma-assisted molecular beam epitaxy
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 38, 043403 (2020)
https://doi.org/10.1116/6.0000086
Assessment of atomic layer deposited TiO2 photocatalytic self-cleaning by quartz crystal microbalance
J. Vac. Sci. Technol. A 38, 043404 (2020)
https://doi.org/10.1116/6.0000198
Carbon impurity concentrations in BaSnO3 films grown by molecular beam epitaxy using a tin oxide source
J. Vac. Sci. Technol. A 38, 043405 (2020)
https://doi.org/10.1116/6.0000122
Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 043406 (2020)
https://doi.org/10.1116/6.0000244
Effects of deposition environment and temperature on photoluminescence, particle morphology, and crystal structure of pulsed laser deposited Ga2O3 thin films
In Special Collection:
Gallium Oxide Materials and Devices
J. Vac. Sci. Technol. A 38, 043407 (2020)
https://doi.org/10.1116/6.0000013
High power impulse magnetron sputtering of diamond-like carbon coatings
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 043408 (2020)
https://doi.org/10.1116/6.0000070
Experimental determination of electron attenuation lengths in complex materials by means of epitaxial film growth: Advantages and challenges
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 043409 (2020)
https://doi.org/10.1116/6.0000291
