Issues

Letters

Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Angel Yanguas-Gil

J. Vac. Sci. Technol. A 38, 030401 (2020) https://doi.org/10.1116/1.5141355

Abstract

View articletitled, Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition

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Evaluation of alternatives to paraffin for antirelaxation coatings

Jovian Lazare; Nyesa Enakaya; John L. Lyons

J. Vac. Sci. Technol. A 38, 030402 (2020) https://doi.org/10.1116/6.0000061

Abstract

View articletitled, Evaluation of alternatives to paraffin for antirelaxation coatings

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Review Articles

New development of nanoscale spectroscopy using scanning probe microscope

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Khant Minn; Blake Birmingham; Zhenrong Zhang

J. Vac. Sci. Technol. A 38, 030801 (2020) https://doi.org/10.1116/1.5142029

Abstract

View articletitled, New development of nanoscale spectroscopy using scanning probe microscope

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CHORUS

New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

John R. Abelson; Gregory S. Girolami

J. Vac. Sci. Technol. A 38, 030802 (2020) https://doi.org/10.1116/6.0000035

Abstract

View articletitled, New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

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CHORUS

Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Taewook Nam; Seunggi Seo; Hyungjun Kim

J. Vac. Sci. Technol. A 38, 030803 (2020) https://doi.org/10.1116/6.0000068

Abstract

View articletitled, Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides

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Perspectives

Surface properties and interactions of transition metal oxide nanoparticles: A perspective on sustainability

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Jenny K. Hedlund Orbeck; Robert J. Hamers

J. Vac. Sci. Technol. A 38, 031001 (2020) https://doi.org/10.1116/1.5141853

Abstract

View articletitled, Surface properties and interactions of transition metal oxide nanoparticles: A perspective on sustainability

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Misconceptions in interpretation of nitrogen chemistry from x-ray photoelectron spectra

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Kateryna Artyushkova

J. Vac. Sci. Technol. A 38, 031002 (2020) https://doi.org/10.1116/1.5135923

Abstract

View articletitled, Misconceptions in interpretation of nitrogen chemistry from x-ray photoelectron spectra

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Uranium and arsenic unregulated water issues on Navajo lands

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Jani C. Ingram; Lindsey Jones; Jonathan Credo; Tommy Rock

J. Vac. Sci. Technol. A 38, 031003 (2020) https://doi.org/10.1116/1.5142283

Abstract

View articletitled, Uranium and arsenic unregulated water issues on Navajo lands

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Inside the mysterious world of plasma: A process engineer’s perspective

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Keren J. Kanarik

J. Vac. Sci. Technol. A 38, 031004 (2020) https://doi.org/10.1116/1.5141863

Abstract

View articletitled, Inside the mysterious world of plasma: A process engineer’s perspective

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Perspectives from research on metal-semiconductor contacts: Examples from Ga₂O₃, SiC, (nano)diamond, and SnS

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Lisa M. Porter; Jenifer R. Hajzus

J. Vac. Sci. Technol. A 38, 031005 (2020) https://doi.org/10.1116/1.5144502

Abstract

View articletitled, Perspectives from research on metal-semiconductor contacts: Examples from Ga₂O₃, SiC, (nano)diamond, and SnS

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Tutorials

Guide to making XPS measurements on nanoparticles

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Donald R. Baer

J. Vac. Sci. Technol. A 38, 031201 (2020) https://doi.org/10.1116/1.5141419

Abstract

View articletitled, Guide to making XPS measurements on nanoparticles

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Tutorial on forming through-silicon vias

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Susan L. Burkett; Matthew B. Jordan; Rebecca P. Schmitt; Lyle A. Menk; Andrew E. Hollowell

J. Vac. Sci. Technol. A 38, 031202 (2020) https://doi.org/10.1116/6.0000026

Abstract

View articletitled, Tutorial on forming through-silicon vias

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Role of consistent terminology in XPS reproducibility

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Donald R. Baer; Alexander G. Shard

J. Vac. Sci. Technol. A 38, 031203 (2020) https://doi.org/10.1116/6.0000016

Abstract

View articletitled, Role of consistent terminology in XPS reproducibility

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XPS guide: Charge neutralization and binding energy referencing for insulating samples

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Donald R. Baer; Kateryna Artyushkova; Hagai Cohen; Christopher D. Easton; Mark Engelhard; Thomas R. Gengenbach; Grzegorz Greczynski; Paul Mack; David J. Morgan; Adam Roberts

J. Vac. Sci. Technol. A 38, 031204 (2020) https://doi.org/10.1116/6.0000057

Abstract

View articletitled, XPS guide: Charge neutralization and binding energy referencing for insulating samples

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ARTICLES

2-D Materials

MoS₂-supported Au₃₁ for CO hydrogenation: A first-principle study

In Special Collection: 30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS

Tao Jiang; Duy Le; Talat S. Rahman

J. Vac. Sci. Technol. A 38, 032201 (2020) https://doi.org/10.1116/1.5142853

Abstract

View articletitled, MoS₂-supported Au₃₁ for CO hydrogenation: A first-principle study

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Atomic Layer Deposition (ALD)

Epitaxial growth of high-k Ba_xSr_1−xTiO₃ thin films on SrTiO₃ (001) substrates by atomic layer deposition

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Thanh Tung Le; John G. Ekerdt

J. Vac. Sci. Technol. A 38, 032401 (2020) https://doi.org/10.1116/1.5139908

Abstract

View articletitled, Epitaxial growth of high-<em>k</em> Ba<em>_x</em>Sr_{1−<em>x</em>}TiO₃ thin films on SrTiO₃ (001) substrates by atomic layer deposition

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XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta₂O₅ thin films onto p-Si substrates

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Spyridon Korkos; Nikolaos J. Xanthopoulos; Martha A. Botzakaki; Charalampos Drivas; Styliani Kennou; Spyridon Ladas; Anastasios Travlos; Stavroula N. Georga; Christoforos A. Krontiras

J. Vac. Sci. Technol. A 38, 032402 (2020) https://doi.org/10.1116/1.5134764

Abstract

View articletitled, XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta₂O₅ thin films onto p-Si substrates

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Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Igor Krylov; Yuanshen Qi; Valentina Korchnoy; Kamira Weinfeld; Moshe Eizenberg; Eilam Yalon

J. Vac. Sci. Technol. A 38, 032403 (2020) https://doi.org/10.1116/6.0000028

Abstract

View articletitled, Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition

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Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Seung-Min Han; Dip K. Nandi; Yong-Hwan Joo; Toshiyuki Shigetomi; Kazuharu Suzuki; Shunichi Nabeya; Ryosuke Harada; Soo-Hyun Kim

J. Vac. Sci. Technol. A 38, 032404 (2020) https://doi.org/10.1116/1.5134696

Abstract

View articletitled, Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu

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Enhanced resistive switching characteristics of HfO_x insulator fabricated by atomic layer deposition and La(NO₃)₃·6H₂O solution as catalytic oxidant

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Yong Chan Jung; In-Sung Park; Sejong Seong; Taehoon Lee; Seon Yong Kim; Jinho Ahn

J. Vac. Sci. Technol. A 38, 032405 (2020) https://doi.org/10.1116/1.5134828

Abstract

View articletitled, Enhanced resistive switching characteristics of HfO_x insulator fabricated by atomic layer deposition and La(NO₃)₃·6H₂O solution as catalytic oxidant

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Low temperature ALD growth optimization of ZnO, TiO₂, and Al₂O₃ to be used as a buffer layer in perovskite solar cells

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Pravakar P. Rajbhandari; Tara P. Dhakal

J. Vac. Sci. Technol. A 38, 032406 (2020) https://doi.org/10.1116/1.5139247

Abstract

View articletitled, Low temperature ALD growth optimization of ZnO, TiO₂, and Al₂O₃ to be used as a buffer layer in perovskite solar cells

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CHORUS

Atomic layer deposition of amorphous antimony sulfide (a-Sb₂S₃) as semiconductor sensitizer in extremely thin absorber solar cell

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Neha Mahuli; Debabrata Halder; Ankan Paul; Shaibal K. Sarkar

J. Vac. Sci. Technol. A 38, 032407 (2020) https://doi.org/10.1116/6.0000031

Abstract

View articletitled, Atomic layer deposition of amorphous antimony sulfide (a-Sb₂S₃) as semiconductor sensitizer in extremely thin absorber solar cell

Supplementary Material

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Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Masaki Hirayama; Akinobu Teramoto; Shigetoshi Sugawa

J. Vac. Sci. Technol. A 38, 032408 (2020) https://doi.org/10.1116/6.0000021

Abstract

View articletitled, Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

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Correlation between SiO₂ growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Erika Maeda; Toshihide Nabatame; Masafumi Hirose; Mari Inoue; Akihiko Ohi; Naoki Ikeda; Hajime Kiyono

J. Vac. Sci. Technol. A 38, 032409 (2020) https://doi.org/10.1116/6.0000078

Abstract

View articletitled, Correlation between SiO₂ growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor

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Nanolaminated Al₂O₃/HfO₂ dielectrics for silicon carbide based devices

In Special Collection: Special Topic Collection on Atomic Layer Deposition (ALD)

Raffaella Lo Nigro; Emanuela Schilirò; Patrick Fiorenza; Fabrizio Roccaforte

J. Vac. Sci. Technol. A 38, 032410 (2020) https://doi.org/10.1116/1.5134662

Abstract

View articletitled, Nanolaminated Al₂O₃/HfO₂ dielectrics for silicon carbide based devices

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Synthesis and integration of thin film solid state electrolytes for 3D Li-ion microbatteries

In Special Collection: 30 years of the Nellie Yeoh Whetten Award &#x2014; Celebrating the Women of the AVS

Ryan Sheil; Jane P. Chang

J. Vac. Sci. Technol. A 38, 032411 (2020) https://doi.org/10.1116/1.5142859

Abstract

View articletitled, Synthesis and integration of thin film solid state electrolytes for 3D Li-ion microbatteries

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Atomic layer deposition of thermoelectric layered cobalt oxides

In Special Collection: Atomic Layer Deposition (ALD)

Dirk J. Hagen; Maarit Karppinen

J. Vac. Sci. Technol. A 38, 032412 (2020) https://doi.org/10.1116/6.0000166

Abstract

View articletitled, Atomic layer deposition of thermoelectric layered cobalt oxides

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Atomic Layer Etching (ALE)

Selective atomic layer etching of HfO₂ over silicon by precursor and substrate-dependent selective deposition

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Kang-Yi Lin; Chen Li; Sebastian Engelmann; Robert L. Bruce; Eric A. Joseph; Dominik Metzler; Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 38, 032601 (2020) https://doi.org/10.1116/1.5143247

Abstract

View articletitled, Selective atomic layer etching of HfO₂ over silicon by precursor and substrate-dependent selective deposition

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Comparative study of two atomic layer etching processes for GaN

In Special Collection: Special Topic Collection on Atomic Layer Etching (ALE)

Cédric Mannequin; Christophe Vallée; Katsuhiro Akimoto; Thierry Chevolleau; Christophe Durand; Christian Dussarrat; Takashi Teramoto; Etienne Gheeraert; Henri Mariette

J. Vac. Sci. Technol. A 38, 032602 (2020) https://doi.org/10.1116/1.5134130

Abstract

View articletitled, Comparative study of two atomic layer etching processes for GaN

Supplementary Material

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Atomic-layer etching of GaN by using an HBr neutral beam

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Daisuke Ohori; Takahiro Sawada; Kenta Sugawara; Masaya Okada; Ken Nakata; Kazutaka Inoue; Daisuke Sato; Hideyuki Kurihara; Seiji Samukawa

J. Vac. Sci. Technol. A 38, 032603 (2020) https://doi.org/10.1116/6.0000126

Abstract

View articletitled, Atomic-layer etching of GaN by using an HBr neutral beam

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Plasma Science and Technology

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si₃N₄ and Si etching

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Chen Li; Valery Godyak; Thorsten Hofmann; Klaus Edinger; Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 38, 033001 (2020) https://doi.org/10.1116/1.5143537

Abstract

View articletitled, Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si₃N₄ and Si etching

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CHORUS

Isotropic dry etching of Si selectively to Si_0.7Ge_0.3 for CMOS sub-10 nm applications

Sana Rachidi; Alain Campo; Virginie Loup; Christian Vizioz; Jean-Michel Hartmann; Sébastien Barnola; Nicolas Posseme

J. Vac. Sci. Technol. A 38, 033002 (2020) https://doi.org/10.1116/1.5143118

Abstract

View articletitled, Isotropic dry etching of Si selectively to Si_0.7Ge_0.3 for CMOS sub-10 nm applications

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Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

Stella Mathioudaki; Cédric R. Vandenabeele; Romain Tonneau; Andreas Pflug; Jonathan Tennyson; Stéphane Lucas

J. Vac. Sci. Technol. A 38, 033003 (2020) https://doi.org/10.1116/1.5142913

Abstract

View articletitled, Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

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Silicon nitride spacer etching selectively to silicon using CH₃F/O₂/He/SiCl₄ plasma

Nicolas Possémé; Maxime Garcia-Barros; Christian Arvet; Olivier Pollet; François Leverd; Sébastien Barnola

J. Vac. Sci. Technol. A 38, 033004 (2020) https://doi.org/10.1116/1.5145158

Abstract

View articletitled, Silicon nitride spacer etching selectively to silicon using CH₃F/O₂/He/SiCl₄ plasma

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Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Askar A. Rezvanov; Andrey V. Miakonkikh; Dmitry S. Seregin; Alexey S. Vishnevskiy; Konstantin A. Vorotilov; Konstantin V. Rudenko; Mikhail R. Baklanov

J. Vac. Sci. Technol. A 38, 033005 (2020) https://doi.org/10.1116/1.5143417

Abstract

View articletitled, Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics

Supplementary Material

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Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Luxherta Buzi; Hiroyuki Miyazoe; Matthew. P. Sagianis; Nathan Marchack; John M. Papalia; Sebastian. U. Engelmann

J. Vac. Sci. Technol. A 38, 033006 (2020) https://doi.org/10.1116/1.5143032

Abstract

View articletitled, Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

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Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Christophe Vallée; Marceline Bonvalot; Samia Belahcen; Taguhi Yeghoyan; Moustapha Jaffal; Rémi Vallat; Ahmad Chaker; Gautier Lefèvre; Sylvain David; Ahmad Bsiesy; Nicolas Possémé; Rémy Gassilloud; Agnès Granier

J. Vac. Sci. Technol. A 38, 033007 (2020) https://doi.org/10.1116/1.5140841

Abstract

View articletitled, Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

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Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Nils Brenning; Alexandre Butler; Hamidreza Hajihoseini; Martin Rudolph; Michael A. Raadu; Jon Tomas Gudmundsson; Tiberiu Minea; Daniel Lundin

J. Vac. Sci. Technol. A 38, 033008 (2020) https://doi.org/10.1116/6.0000079

Abstract

View articletitled, Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength

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Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Hamidreza Hajihoseini; Martin Čada; Zdenek Hubička; Selen Ünaldi; Michael A. Raadu; Nils Brenning; Jon Tomas Gudmundsson; Daniel Lundin

J. Vac. Sci. Technol. A 38, 033009 (2020) https://doi.org/10.1116/1.5145292

Abstract

View articletitled, Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

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Gas-phase diagnostic studies of H₂ and CH₄ inductively coupled plasmas

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Tara L. Van Surksum; Ellen R. Fisher

J. Vac. Sci. Technol. A 38, 033010 (2020) https://doi.org/10.1116/6.0000090

Abstract

View articletitled, Gas-phase diagnostic studies of H₂ and CH₄ inductively coupled plasmas

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CHORUS

Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Kyunghwan Oh; Dmitry Kalanov; André Anders; Carsten Bundesmann

J. Vac. Sci. Technol. A 38, 033011 (2020) https://doi.org/10.1116/6.0000037

Abstract

View articletitled, Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions

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O^·, H^·, and ^·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

V. S. Santosh K. Kondeti; Yashuang Zheng; Pingshan Luan; Gottlieb S. Oehrlein; Peter J. Bruggeman

J. Vac. Sci. Technol. A 38, 033012 (2020) https://doi.org/10.1116/6.0000123

Abstract

View articletitled, O^·, H^·, and ^·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet

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CHORUS

Directionally resolved measurements of momentum transport in sputter plumes as a critical test for simulations

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Mathis Klette; Manuel Maas; Thomas Trottenberg; Holger Kersten

J. Vac. Sci. Technol. A 38, 033013 (2020) https://doi.org/10.1116/6.0000109

Abstract

View articletitled, Directionally resolved measurements of momentum transport in sputter plumes as a critical test for simulations

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Photovoltaics and Energy

New approach for an industrial low-temperature roll-to-roll CI(G)Se hybrid sputter coevaporation deposition process

Nikolaus Weinberger; David Stock; Christian Alexander Kaufmann; Tim Kodalle; Marc D. Heinemann; Daniel Huber; Martina Harnisch; Andreas Zimmermann; Georg N. Strauss; Roman Lackner

J. Vac. Sci. Technol. A 38, 033201 (2020) https://doi.org/10.1116/1.5142830

Abstract

View articletitled, New approach for an industrial low-temperature roll-to-roll CI(G)Se hybrid sputter coevaporation deposition process

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Fundamentals, impedance, and performance of solid-state Li-metal microbatteries

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

John Collins; Joel P. de Souza; Yun Seog Lee; Adele Pacquette; John M. Papalia; Douglas M. Bishop; Teodor Todorov; Mahadevaiyer Krishnan; Eric Joseph; John Rozen; Devendra Sadana

J. Vac. Sci. Technol. A 38, 033212 (2020) https://doi.org/10.1116/6.0000097

Abstract

View articletitled, Fundamentals, impedance, and performance of solid-state Li-metal microbatteries

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Surfaces and Interfaces

Ablation of piezoelectric polyvinylidene fluoride with a 193 nm excimer laser

Jeffrey Elloian; Jeffrey Sherman; Tiago Costa; Chen Shi; Kenneth Shepard

J. Vac. Sci. Technol. A 38, 033202 (2020) https://doi.org/10.1116/1.5142494

Abstract

View articletitled, Ablation of piezoelectric polyvinylidene fluoride with a 193 nm excimer laser

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CHORUS

Impact of interface materials on side permeation in indirect encapsulation of organic electronics

Ankit Kumar Singh; Wen-Fang Chou; Xiaojia Jia; Cheng-Yin Wang; Canek Fuentes-Hernandez; Bernard Kippelen; Samuel Graham

J. Vac. Sci. Technol. A 38, 033203 (2020) https://doi.org/10.1116/1.5140665

Abstract

View articletitled, Impact of interface materials on side permeation in indirect encapsulation of organic electronics

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Practical guide for x-ray photoelectron spectroscopy: Applications to the study of catalysts

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Philip R. Davies; David J. Morgan

J. Vac. Sci. Technol. A 38, 033204 (2020) https://doi.org/10.1116/1.5140747

Abstract

View articletitled, Practical guide for x-ray photoelectron spectroscopy: Applications to the study of catalysts

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Spatially controlled stem cell differentiation via morphogen gradients: A comparison of static and dynamic microfluidic platforms

In Special Collection: 30 years of the Nellie Yeoh Whetten Award &#x2014; Celebrating the Women of the AVS

Kiara W. Cui; Leeya Engel; Carolyn E. Dundes; Tina C. Nguyen; Kyle M. Loh; Alexander R. Dunn

J. Vac. Sci. Technol. A 38, 033205 (2020) https://doi.org/10.1116/1.5142012

Abstract

View articletitled, Spatially controlled stem cell differentiation via morphogen gradients: A comparison of static and dynamic microfluidic platforms

Supplementary Material

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Achieving reproducible data: Examples from surface analysis in semiconductor technology

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Thierry Conard; Anja Vanleenhove; Paul van der Heide

J. Vac. Sci. Technol. A 38, 033206 (2020) https://doi.org/10.1116/1.5140746

Abstract

View articletitled, Achieving reproducible data: Examples from surface analysis in semiconductor technology

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Modularity optimization for enhancing edge detection in microstructural features using 3D atomic chemical scale imaging

Arpan Mukherjee; Scott Broderick; Krishna Rajan

J. Vac. Sci. Technol. A 38, 033207 (2020) https://doi.org/10.1116/1.5143017

Abstract

View articletitled, Modularity optimization for enhancing edge detection in microstructural features using 3D atomic chemical scale imaging

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CHORUS

Contact potential induced carrier localization in nanometer-thin Cu/Ru, Cu/Co, and Cu/Mo superlattices

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Jiyoon Jessica Kim; Gwo-Ching Wang; Toh-Ming Lu; Tung-Sheng Kuan

J. Vac. Sci. Technol. A 38, 033208 (2020) https://doi.org/10.1116/1.5142826

Abstract

View articletitled, Contact potential induced carrier localization in nanometer-thin Cu/Ru, Cu/Co, and Cu/Mo superlattices

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Thermal induced depletion of cationic vacancies in NiO thin films evidenced by x-ray absorption spectroscopy at the O 1s threshold

Alejandro Gutiérrez; Guillermo Domínguez-Cañizares; Stefan Krause; Daniel Díaz-Fernández; Leonardo Soriano

J. Vac. Sci. Technol. A 38, 033209 (2020) https://doi.org/10.1116/6.0000080

Abstract

View articletitled, Thermal induced depletion of cationic vacancies in NiO thin films evidenced by x-ray absorption spectroscopy at the O 1s threshold

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Vapor phase infiltration of aluminum oxide into benzocyclobutene-based polymer dielectrics to increase adhesion strength to thin film metal interconnects

Shreya Dwarakanath; Pulugurtha Markondeya Raj; Neha Kondekar; Mark D. Losego; Rao Tummala

J. Vac. Sci. Technol. A 38, 033210 (2020) https://doi.org/10.1116/1.5141475

Abstract

View articletitled, Vapor phase infiltration of aluminum oxide into benzocyclobutene-based polymer dielectrics to increase adhesion strength to thin film metal interconnects

Supplementary Material

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Uncertainties in photoemission peak fitting accounting for the covariance with background parameters

In Special Collection: Special Topic Collection: Reproducibility Challenges and Solutions

Alberto Herrera-Gomez

J. Vac. Sci. Technol. A 38, 033211 (2020) https://doi.org/10.1116/1.5143132

Abstract

View articletitled, Uncertainties in photoemission peak fitting accounting for the covariance with background parameters

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Effect of undercoordinated Ag(111) defect sites on the adsorption of ethanol

In Special Collection: 30 years of the Nellie Yeoh Whetten Award &#x2014; Celebrating the Women of the AVS

Daniel A. Schlosser; Dariia Yehorova; Hasan Kaleem; Eric M. Maxwell; Jordon S. Baker; Maxwell Z. Gillum; Maria C. DePonte; Kendra Letchworth-Weaver; Ashleigh E. Baber

J. Vac. Sci. Technol. A 38, 033213 (2020) https://doi.org/10.1116/1.5142020

Abstract

View articletitled, Effect of undercoordinated Ag(111) defect sites on the adsorption of ethanol

Supplementary Material

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Thin Films

Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH₃

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Zhejun V. Zhang; Sumeng Liu; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 38, 033401 (2020) https://doi.org/10.1116/1.5144501

Abstract

View articletitled, Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH₃

Supplementary Material

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CHORUS

Chemical vapor deposition of metallic films using plasma electrons as reducing agents

In Special Collection: Special Topic Collection Commemorating the Career of John Coburn

Hama Nadhom; Daniel Lundin; Polla Rouf; Henrik Pedersen

J. Vac. Sci. Technol. A 38, 033402 (2020) https://doi.org/10.1116/1.5142850

Abstract

View articletitled, Chemical vapor deposition of metallic films using plasma electrons as reducing agents

Supplementary Material

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Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO₂ using oxygen ions

Thomas Amelal; Lukas Pietzonka; Erik Rohkamm; Carsten Bundesmann

J. Vac. Sci. Technol. A 38, 033403 (2020) https://doi.org/10.1116/1.5142911

Abstract

View articletitled, Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO₂ using oxygen ions

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Low temperature platinum chemical vapor deposition on functionalized self-assembled monolayers

In Special Collection: 30 years of the Nellie Yeoh Whetten Award &#x2014; Celebrating the Women of the AVS

Bryan G. Salazar; Hanwen Liu; Amy V. Walker; Lisa McElwee-White

J. Vac. Sci. Technol. A 38, 033404 (2020) https://doi.org/10.1116/6.0000087

Abstract

View articletitled, Low temperature platinum chemical vapor deposition on functionalized self-assembled monolayers

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CHORUS

Improved epitaxial growth of TbAs film on III–V semiconductors

In Special Collection: Celebrating 40 Years of the AVS Peter Mark Award

Yuejing Wang; James Bork; Stephanie Law; Joshua M. O. Zide

J. Vac. Sci. Technol. A 38, 033405 (2020) https://doi.org/10.1116/1.5144999

Abstract

View articletitled, Improved epitaxial growth of TbAs film on III–V semiconductors

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CHORUS

Epitaxial metals for interconnects beyond Cu

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Katayun Barmak; Sameer Ezzat; Ryan Gusley; Atharv Jog; Sit Kerdsongpanya; Asim Khaniya; Erik Milosevic; William Richardson; Kadir Sentosun; Amirali Zangiabadi; Daniel Gall; William E. Kaden; Eduardo R. Mucciolo; Patrick K. Schelling; Alan C. West; Kevin R. Coffey

J. Vac. Sci. Technol. A 38, 033406 (2020) https://doi.org/10.1116/6.0000018

Abstract

View articletitled, Epitaxial metals for interconnects beyond Cu

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CHORUS

Simultaneous realization of infrared-light switching and high visible-light transmittance in extremely thin VO₂ films grown on ZnO-nanorods buffered glasses

Tatsuro Fukuzumi; Fei Chen; Kunio Okimura; Iwao Yamaguchi; Tetsuo Tsuchiya

J. Vac. Sci. Technol. A 38, 033407 (2020) https://doi.org/10.1116/1.5142212

Abstract

View articletitled, Simultaneous realization of infrared-light switching and high visible-light transmittance in extremely thin VO₂ films grown on ZnO-nanorods buffered glasses

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Structure evolution and mechanical properties of hard tantalum diboride films

Viktor Šroba; Tomáš Fiantok; Martin Truchlý; Tomáš Roch; Miroslav Zahoran; Branislav Grančič; Peter Švec, Jr.; Štefan Nagy; Vitalii Izai; Peter Kúš; Marián Mikula

J. Vac. Sci. Technol. A 38, 033408 (2020) https://doi.org/10.1116/6.0000155

Abstract

View articletitled, Structure evolution and mechanical properties of hard tantalum diboride films

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Bixbyite-Ta₂N₂O film prepared by HiPIMS and postdeposition annealing: Structure and properties

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

J. Čapek; Š. Batková; M. Matas; Š. Kos; T. Kozák; S. Haviar; J. Houška; J. Schusser; J. Minár; F. Dvořák; P. Zeman

J. Vac. Sci. Technol. A 38, 033409 (2020) https://doi.org/10.1116/6.0000066

Abstract

View articletitled, Bixbyite-Ta₂N₂O film prepared by HiPIMS and postdeposition annealing: Structure and properties

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Nb-doped TiO₂ coatings developed by high power impulse magnetron sputtering-chemical vapor deposition hybrid deposition process

In Special Collection: Festschrift Honoring Dr. Steve Rossnagel

Justyna Kulczyk-Malecka; David Donaghy; Brice Delfour-Peyrethon; Matthew Werner; Paul R. Chalker; James W. Bradley; Peter J. Kelly

J. Vac. Sci. Technol. A 38, 033410 (2020) https://doi.org/10.1116/6.0000118

Abstract

View articletitled, Nb-doped TiO₂ coatings developed by high power impulse magnetron sputtering-chemical vapor deposition hybrid deposition process

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Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia

Ramazan O. Apaydin; Arnoud J. Onnink; Xingyu Liu; Antonius A. I. Aarnink; Michel P. de Jong; Dirk J. Gravesteijn; Alexey Y. Kovalgin

J. Vac. Sci. Technol. A 38, 033411 (2020) https://doi.org/10.1116/6.0000132

Abstract

View articletitled, Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia

Supplementary Material

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Epitaxial to axiotaxial texture evolution in endotaxial MnP films grown on GaP (100)

Nima Nateghi; Samuel Lambert-Milot; Remo A. Masut

J. Vac. Sci. Technol. A 38, 033412 (2020) https://doi.org/10.1116/6.0000024

Abstract

View articletitled, Epitaxial to axiotaxial texture evolution in endotaxial MnP films grown on GaP (100)

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Synthesis of AlO_x thin films by atmospheric-pressure mist chemical vapor deposition for surface passivation and electrical insulator layers

Arifuzzaman Rajib; Karim Md Enamul; Shunji Kurosu; Tomofumi Ukai; Masahide Tokuda; Yasuhiko Fujii; Tatsuro Hanajiri; Ryo Ishikawa; Keiji Ueno; Hajime Shirai

J. Vac. Sci. Technol. A 38, 033413 (2020) https://doi.org/10.1116/1.5143273

Abstract

View articletitled, Synthesis of AlO<em>_x</em> thin films by atmospheric-pressure mist chemical vapor deposition for surface passivation and electrical insulator layers

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Ammonia assisted low temperature growth of In₂O₃ (111) epitaxial films on c-sapphire substrates by chemical vapor deposition technique

Santosh Kumar Yadav; Souvik Das; Nivedita Prasad; Barun K. Barick; Simran Arora; Dayanand S. Sutar; Subhabrata Dhar

J. Vac. Sci. Technol. A 38, 033414 (2020) https://doi.org/10.1116/6.0000038

Abstract

View articletitled, Ammonia assisted low temperature growth of In₂O₃ (111) epitaxial films on c-sapphire substrates by chemical vapor deposition technique

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Comments

Application of FEFF analyses to actinide 5f systems

J. G. Tobin; D. Sokaras

J. Vac. Sci. Technol. A 38, 036001 (2020) https://doi.org/10.1116/6.0000215

Abstract

View articletitled, Application of FEFF analyses to actinide 5f systems

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Errata