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March 2020
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ISSN 0734-2101
EISSN 1520-8559
Review Articles
Chemically vapor deposited polymer nanolayers for rapid and controlled permeation of molecules and ions
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 020801 (2020)
https://doi.org/10.1116/1.5132851
Plasma etching of wide bandgap and ultrawide bandgap semiconductors
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 020802 (2020)
https://doi.org/10.1116/1.5131343
Al-rich AlGaN based transistors
J. Vac. Sci. Technol. A 38, 020803 (2020)
https://doi.org/10.1116/1.5129803
Consistency and reproducibility in atomic layer deposition
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 020804 (2020)
https://doi.org/10.1116/1.5140603
Synthetic approaches for growing zinc sulfide and zinc selenide colloidal nanocrystals
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 020805 (2020)
https://doi.org/10.1116/1.5141992
Investigating recent developments and applications of optical plasma spectroscopy: A review
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 020806 (2020)
https://doi.org/10.1116/1.5141844
Tutorials
International standardization and metrology as tools to address the comparability and reproducibility challenges in XPS measurements
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 021201 (2020)
https://doi.org/10.1116/1.5131074
ARTICLES
2-D Materials
Formation of MoS2 from elemental Mo and S using reactive molecular dynamics simulations
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 022201 (2020)
https://doi.org/10.1116/1.5128377
Atomic Layer Deposition (ALD)
AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022401 (2020)
https://doi.org/10.1116/1.5133896
HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022402 (2020)
https://doi.org/10.1116/1.5134135
Epitaxial integration of ferroelectric and conductive perovskites on silicon
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022403 (2020)
https://doi.org/10.1116/1.5134077
Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022404 (2020)
https://doi.org/10.1116/1.5134800
Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022405 (2020)
https://doi.org/10.1116/1.5128663
Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022406 (2020)
https://doi.org/10.1116/1.5131563
Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022407 (2020)
https://doi.org/10.1116/1.5135014
Atomic layer deposition of Nb-doped TiO2: Dopant incorporation and effect of annealing
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022408 (2020)
https://doi.org/10.1116/1.5134743
Atomic layer deposition of nitrogen incorporated molybdenum oxide: Unveiling carrier transport mechanism and its application in Li-ion battery
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022409 (2020)
https://doi.org/10.1116/1.5130606
Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022410 (2020)
https://doi.org/10.1116/1.5134720
Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022411 (2020)
https://doi.org/10.1116/1.5134055
Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022412 (2020)
https://doi.org/10.1116/1.5134738
Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022413 (2020)
https://doi.org/10.1116/1.5139672
Lutetium coating of nanoparticles by atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022414 (2020)
https://doi.org/10.1116/1.5134446
Effect of forming gas annealing on hydrogen content and surface morphology of titanium oxide coated crystalline silicon heterocontacts
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022415 (2020)
https://doi.org/10.1116/1.5134719
Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022416 (2020)
https://doi.org/10.1116/1.5143896
A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022417 (2020)
https://doi.org/10.1116/1.5139631
Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022418 (2020)
https://doi.org/10.1116/1.5130727
Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022419 (2020)
https://doi.org/10.1116/1.5131087
Surface plasmon driven near- and midinfrared photoconductivity in ligand-free ITO nanocrystal films
J. Vac. Sci. Technol. A 38, 022420 (2020)
https://doi.org/10.1116/1.5139310
Atomic Layer Etching (ALE)
Effect of vacuum heat treatment on the oxidation kinetics of freestanding nanostructured NiCoCrAlY coatings deposited by high-velocity oxy-fuel spraying
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 022601 (2020)
https://doi.org/10.1116/1.5132416
Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022602 (2020)
https://doi.org/10.1116/1.5133953
Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022603 (2020)
https://doi.org/10.1116/1.5135911
Atomic layer etching of SiO2 for surface cleaning using ammonium fluorosilicate with CF4/NH3 plasma
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022604 (2020)
https://doi.org/10.1116/1.5132986
Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022605 (2020)
https://doi.org/10.1116/1.5134430
Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3)
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022606 (2020)
https://doi.org/10.1116/1.5134710
Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022607 (2020)
https://doi.org/10.1116/1.5140481
Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022608 (2020)
https://doi.org/10.1116/1.5135317
Control of surface oxide formation in plasma-enhanced quasiatomic layer etching of tantalum nitride
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022609 (2020)
https://doi.org/10.1116/1.5140457
Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022610 (2020)
https://doi.org/10.1116/1.5127532
In operando x-ray photoelectron spectroscopy study of mechanism of atomic layer etching of cobalt
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022611 (2020)
https://doi.org/10.1116/1.5138989
Plasma Science and Technology
Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023001 (2020)
https://doi.org/10.1116/1.5132800
Atmospheric pressure microwave plasma for aluminum surface cleaning
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 023002 (2020)
https://doi.org/10.1116/1.5132912
Particle-in-cell simulations and passive bulk model of collisional capacitive discharge
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023003 (2020)
https://doi.org/10.1116/1.5135575
Mechanism of highly selective SiO2 etching over Si3N4 using a cyclic process with BCl3 and fluorocarbon gas chemistries
J. Vac. Sci. Technol. A 38, 023004 (2020)
https://doi.org/10.1116/1.5129568
Electron emission from particles strongly affects the electron energy distribution in dusty plasmas
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023005 (2020)
https://doi.org/10.1116/1.5134706
Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heating
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 023006 (2020)
https://doi.org/10.1116/1.5140357
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes
J. Vac. Sci. Technol. A 38, 023007 (2020)
https://doi.org/10.1116/1.5125568
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism
J. Vac. Sci. Technol. A 38, 023008 (2020)
https://doi.org/10.1116/1.5125569
Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023009 (2020)
https://doi.org/10.1116/1.5138189
Functionalization ratio of isocyanate groups on plasma-processed multiwalled carbon nanotubes
J. Vac. Sci. Technol. A 38, 023010 (2020)
https://doi.org/10.1116/1.5130487
Optical and mass spectrometric measurements of dissociation in low frequency, high density, remote source O2/Ar and NF3/Ar plasmas
J. Vac. Sci. Technol. A 38, 023011 (2020)
https://doi.org/10.1116/1.5126429
Surfaces and Interfaces
X-ray photoelectron spectroscopy study for band alignments of BaTiO3/Ga2O3 and In2O3/Ga2O3 heterostructures
J. Vac. Sci. Technol. A 38, 023202 (2020)
https://doi.org/10.1116/1.5138715
Toward ultrafast, ultra-stable imaging arrays: Superlattice doping to enhance the performance of backside-illuminated 3D-hybridized silicon photodetectors
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023203 (2020)
https://doi.org/10.1116/1.5140979
Raw-to-repository characterization data conversion for repeatable, replicable, and reproducible measurements
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 023204 (2020)
https://doi.org/10.1116/1.5128408
Effect of temperature on the amino acid-assisted formation of metal islands
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023205 (2020)
https://doi.org/10.1116/1.5141754
High temperature microstructure evolution and thermal shock resistance of plasma sprayed Al2O3-ZrO2-CeO2 coatings
J. Vac. Sci. Technol. A 38, 023206 (2020)
https://doi.org/10.1116/1.5131578
Practical guides for x-ray photoelectron spectroscopy: Analysis of polymers
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 023207 (2020)
https://doi.org/10.1116/1.5140587
Vapor phase passivation of (100) germanium surfaces with HBr
J. Vac. Sci. Technol. A 38, 023208 (2020)
https://doi.org/10.1116/1.5141941
Practical guide for inelastic mean free paths, effective attenuation lengths, mean escape depths, and information depths in x-ray photoelectron spectroscopy
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 023209 (2020)
https://doi.org/10.1116/1.5141079
Surface science of shape-selective metal nanocrystal synthesis from first-principles: Growth of Cu nanowires and nanocubes
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023210 (2020)
https://doi.org/10.1116/1.5141995
Tip-induced deformation of polystyrene latex reference nanoparticles in atomic force microscopy
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023211 (2020)
https://doi.org/10.1116/1.5141749
Thin Films
Angular resolved mass-energy analysis of species emitted from a dc magnetron sputtered NiW-target
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 023401 (2020)
https://doi.org/10.1116/1.5138248
Tunable light emission from chemical vapor deposited two-dimensional MoSe2 by layer variation and S incorporation
J. Vac. Sci. Technol. A 38, 023402 (2020)
https://doi.org/10.1116/1.5124998
Low temperature oxidation behavior of Mo2BC coatings
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 023403 (2020)
https://doi.org/10.1116/1.5141993
Epitaxial growth of Bi2Se3 in the (0015) orientation on GaAs (001)
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023404 (2020)
https://doi.org/10.1116/1.5139905
Photoluminescence from carbon structures grown by inductively coupled plasma chemical vapor deposition
J. Vac. Sci. Technol. A 38, 023405 (2020)
https://doi.org/10.1116/1.5140415
Numerical ellipsometry: Methods for selecting measurements and techniques for advanced analysis applied to β-gallium oxide
J. Vac. Sci. Technol. A 38, 023406 (2020)
https://doi.org/10.1116/1.5134790
Silver thin film deposited 3-dimensional gold nanorod arrays for plasmonic catalysis
J. Vac. Sci. Technol. A 38, 023407 (2020)
https://doi.org/10.1116/1.5130721
Comparative study of BeMgZnO/ZnO heterostructures on c-sapphire and GaN by molecular beam epitaxy
J. Vac. Sci. Technol. A 38, 023408 (2020)
https://doi.org/10.1116/1.5145206
Pervasive artifacts revealed from magnetometry measurements of rare earth-transition metal thin films
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023409 (2020)
https://doi.org/10.1116/1.5135504