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Consistency and reproducibility in atomic layer deposition
Synthetic approaches for growing zinc sulfide and zinc selenide colloidal nanocrystals
HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
Epitaxial integration of ferroelectric and conductive perovskites on silicon
Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry
Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
Surface plasmon driven near- and midinfrared photoconductivity in ligand-free ITO nanocrystal films
Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
Atomic layer etching of SiO2 for surface cleaning using ammonium fluorosilicate with CF4/NH3 plasma
Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant
Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism
Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide
Control of surface oxide formation in plasma-enhanced quasiatomic layer etching of tantalum nitride
Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
X-ray photoelectron spectroscopy study for band alignments of BaTiO3/Ga2O3 and In2O3/Ga2O3 heterostructures
Toward ultrafast, ultra-stable imaging arrays: Superlattice doping to enhance the performance of backside-illuminated 3D-hybridized silicon photodetectors
Vapor phase passivation of (100) germanium surfaces with HBr
Surface science of shape-selective metal nanocrystal synthesis from first-principles: Growth of Cu nanowires and nanocubes
Issues
March 2020
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ISSN 0734-2101
EISSN 1520-8559
Review Articles
Chemically vapor deposited polymer nanolayers for rapid and controlled permeation of molecules and ions
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 020801 (2020)
https://doi.org/10.1116/1.5132851
Plasma etching of wide bandgap and ultrawide bandgap semiconductors
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 020802 (2020)
https://doi.org/10.1116/1.5131343
Al-rich AlGaN based transistors
Albert G. Baca; Andrew M. Armstrong; Brianna A. Klein; Andrew A. Allerman; Erica A. Douglas; Robert J. Kaplar
J. Vac. Sci. Technol. A 38, 020803 (2020)
https://doi.org/10.1116/1.5129803
Consistency and reproducibility in atomic layer deposition
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 020804 (2020)
https://doi.org/10.1116/1.5140603
Synthetic approaches for growing zinc sulfide and zinc selenide colloidal nanocrystals
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 020805 (2020)
https://doi.org/10.1116/1.5141992
Investigating recent developments and applications of optical plasma spectroscopy: A review
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 020806 (2020)
https://doi.org/10.1116/1.5141844
Tutorials
International standardization and metrology as tools to address the comparability and reproducibility challenges in XPS measurements
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 021201 (2020)
https://doi.org/10.1116/1.5131074
ARTICLES
2-D Materials
Formation of MoS2 from elemental Mo and S using reactive molecular dynamics simulations
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 022201 (2020)
https://doi.org/10.1116/1.5128377
Atomic Layer Deposition (ALD)
AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Ismo T. S. Heikkinen; George Koutsourakis; Sauli Virtanen; Marko Yli-Koski; Sebastian Wood; Ville Vähänissi; Emma Salmi; Fernando A. Castro; Hele Savin
J. Vac. Sci. Technol. A 38, 022401 (2020)
https://doi.org/10.1116/1.5133896
HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022402 (2020)
https://doi.org/10.1116/1.5134135
Epitaxial integration of ferroelectric and conductive perovskites on silicon
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Edward L. Lin; Agham B. Posadas; Lu Zheng; Hsin Wei Wu; Pei-Yu Chen; Brennan M. Coffey; Keji Lai; Alexander A. Demkov; Davis J. Smith; John G. Ekerdt
J. Vac. Sci. Technol. A 38, 022403 (2020)
https://doi.org/10.1116/1.5134077
Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Ali Mahmoodinezhad; Christoph Janowitz; Franziska Naumann; Paul Plate; Hassan Gargouri; Karsten Henkel; Dieter Schmeißer; Jan Ingo Flege
J. Vac. Sci. Technol. A 38, 022404 (2020)
https://doi.org/10.1116/1.5134800
Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022405 (2020)
https://doi.org/10.1116/1.5128663
Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022406 (2020)
https://doi.org/10.1116/1.5131563
Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022407 (2020)
https://doi.org/10.1116/1.5135014
Atomic layer deposition of Nb-doped TiO2: Dopant incorporation and effect of annealing
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Wilhelmus J. H. (Willem-Jan) Berghuis; Jimmy Melskens; Bart Macco; Saravana Balaji Basuvalingam; Marcel A. Verheijen; Wilhelmus M. M. (Erwin) Kessels
J. Vac. Sci. Technol. A 38, 022408 (2020)
https://doi.org/10.1116/1.5134743
Atomic layer deposition of nitrogen incorporated molybdenum oxide: Unveiling carrier transport mechanism and its application in Li-ion battery
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022409 (2020)
https://doi.org/10.1116/1.5130606
Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Shinsuke Miyagawa; Kazuhiro Gotoh; Shohei Ogura; Markus Wilde; Yasuyoshi Kurokawa; Katsuyuki Fukutani; Noritaka Usami
J. Vac. Sci. Technol. A 38, 022410 (2020)
https://doi.org/10.1116/1.5134720
Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022411 (2020)
https://doi.org/10.1116/1.5134055
Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022412 (2020)
https://doi.org/10.1116/1.5134738
Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Margaret Wolf; Veronica Hayes; Cynthia R. Gerber; Philip G. Quardokus; Jose J. Ortiz-Garcia; Casey Plummer; Rebecca C. Quardokus
J. Vac. Sci. Technol. A 38, 022413 (2020)
https://doi.org/10.1116/1.5139672
Lutetium coating of nanoparticles by atomic layer deposition
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Josette L. T. M. Moret; Matthew B. E. Griffiths; Jeannine E. B. M. Frijns; Baukje E. Terpstra; Hubert T. Wolterbeek; Seán T. Barry; Antonia G. Denkova; J. Ruud van Ommen
J. Vac. Sci. Technol. A 38, 022414 (2020)
https://doi.org/10.1116/1.5134446
Effect of forming gas annealing on hydrogen content and surface morphology of titanium oxide coated crystalline silicon heterocontacts
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Yuta Nakagawa; Kazuhiro Gotoh; Markus Wilde; Shohei Ogura; Yasuyoshi Kurokawa; Katsuyuki Fukutani; Noritaka Usami
J. Vac. Sci. Technol. A 38, 022415 (2020)
https://doi.org/10.1116/1.5134719
Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022416 (2020)
https://doi.org/10.1116/1.5143896
A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022417 (2020)
https://doi.org/10.1116/1.5139631
Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022418 (2020)
https://doi.org/10.1116/1.5130727
Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
In Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 38, 022419 (2020)
https://doi.org/10.1116/1.5131087
Surface plasmon driven near- and midinfrared photoconductivity in ligand-free ITO nanocrystal films
J. Vac. Sci. Technol. A 38, 022420 (2020)
https://doi.org/10.1116/1.5139310
Atomic Layer Etching (ALE)
Effect of vacuum heat treatment on the oxidation kinetics of freestanding nanostructured NiCoCrAlY coatings deposited by high-velocity oxy-fuel spraying
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 022601 (2020)
https://doi.org/10.1116/1.5132416
Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022602 (2020)
https://doi.org/10.1116/1.5133953
Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022603 (2020)
https://doi.org/10.1116/1.5135911
Atomic layer etching of SiO2 for surface cleaning using ammonium fluorosilicate with CF4/NH3 plasma
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022604 (2020)
https://doi.org/10.1116/1.5132986
Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022605 (2020)
https://doi.org/10.1116/1.5134430
Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3)
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022606 (2020)
https://doi.org/10.1116/1.5134710
Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022607 (2020)
https://doi.org/10.1116/1.5140481
Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022608 (2020)
https://doi.org/10.1116/1.5135317
Control of surface oxide formation in plasma-enhanced quasiatomic layer etching of tantalum nitride
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 022609 (2020)
https://doi.org/10.1116/1.5140457
Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
Abdulrahman H. Basher; Marjan Krstić; Takae Takeuchi; Michiro Isobe; Tomoko Ito; Masato Kiuchi; Kazuhiro Karahashi; Wolfgang Wenzel; Satoshi Hamaguchi
J. Vac. Sci. Technol. A 38, 022610 (2020)
https://doi.org/10.1116/1.5127532
In operando x-ray photoelectron spectroscopy study of mechanism of atomic layer etching of cobalt
In Special Collection:
Special Topic Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 38, 022611 (2020)
https://doi.org/10.1116/1.5138989
Plasma Science and Technology
Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023001 (2020)
https://doi.org/10.1116/1.5132800
Atmospheric pressure microwave plasma for aluminum surface cleaning
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
J. Vac. Sci. Technol. A 38, 023002 (2020)
https://doi.org/10.1116/1.5132912
Particle-in-cell simulations and passive bulk model of collisional capacitive discharge
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023003 (2020)
https://doi.org/10.1116/1.5135575
Mechanism of highly selective SiO2 etching over Si3N4 using a cyclic process with BCl3 and fluorocarbon gas chemistries
J. Vac. Sci. Technol. A 38, 023004 (2020)
https://doi.org/10.1116/1.5129568
Electron emission from particles strongly affects the electron energy distribution in dusty plasmas
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023005 (2020)
https://doi.org/10.1116/1.5134706
Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heating
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
Zhengtao Wu; Olof Tengstrand; Babak Bakhit; Jun Lu; J. E. Greene; Lars Hultman; Ivan Petrov; Grzegorz Greczynski
J. Vac. Sci. Technol. A 38, 023006 (2020)
https://doi.org/10.1116/1.5140357
Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
In Special Collection:
Special Topic Collection Commemorating the Career of John Coburn
J. Vac. Sci. Technol. A 38, 023009 (2020)
https://doi.org/10.1116/1.5138189
Functionalization ratio of isocyanate groups on plasma-processed multiwalled carbon nanotubes
J. Vac. Sci. Technol. A 38, 023010 (2020)
https://doi.org/10.1116/1.5130487
Optical and mass spectrometric measurements of dissociation in low frequency, high density, remote source O2/Ar and NF3/Ar plasmas
J. Vac. Sci. Technol. A 38, 023011 (2020)
https://doi.org/10.1116/1.5126429
Surfaces and Interfaces
In situ x-ray photoelectron spectroscopy study of lithium carbonate removal from garnet-type solid-state electrolyte using ultra high vacuum techniques
Jessica C. Jones; Sathish Rajendran; Aparna Pilli; Veronica Lee; Natasha Chugh; Leela Mohana Reddy Arava; Jeffry A. Kelber
J. Vac. Sci. Technol. A 38, 023201 (2020)
https://doi.org/10.1116/1.5128102
X-ray photoelectron spectroscopy study for band alignments of BaTiO3/Ga2O3 and In2O3/Ga2O3 heterostructures
Yusong Zhi; Zeng Liu; Xia Wang; Sisi Li; Xiaolong Wang; Xulong Chu; Peigang Li; Daoyou Guo; Zhenping Wu; Weihua Tang
J. Vac. Sci. Technol. A 38, 023202 (2020)
https://doi.org/10.1116/1.5138715
Toward ultrafast, ultra-stable imaging arrays: Superlattice doping to enhance the performance of backside-illuminated 3D-hybridized silicon photodetectors
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023203 (2020)
https://doi.org/10.1116/1.5140979
Raw-to-repository characterization data conversion for repeatable, replicable, and reproducible measurements
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
Mineharu Suzuki; Hiroko Nagao; Yoshitomo Harada; Hiroshi Shinotsuka; Katsumi Watanabe; Akito Sasaki; Asahiko Matsuda; Koji Kimoto; Hideki Yoshikawa
J. Vac. Sci. Technol. A 38, 023204 (2020)
https://doi.org/10.1116/1.5128408
Effect of temperature on the amino acid-assisted formation of metal islands
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
Kennedy P. S. Boyd; Jesse A. Phillips; Maria A. Paszkowiak; Kassidy K. Everett; Emily A. Cook; Erin V. Iski
J. Vac. Sci. Technol. A 38, 023205 (2020)
https://doi.org/10.1116/1.5141754
High temperature microstructure evolution and thermal shock resistance of plasma sprayed Al2O3-ZrO2-CeO2 coatings
Ce-ce Zhao; Xiao-wen Sun; Xing-yu Wang; Yong Yang; Chen Zhang; Yan-wei Wang; Yu-duo Ma; Yu-hang Cui; Lei Wang; Yan-chun Dong; You Wang
J. Vac. Sci. Technol. A 38, 023206 (2020)
https://doi.org/10.1116/1.5131578
Practical guides for x-ray photoelectron spectroscopy: Analysis of polymers
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 023207 (2020)
https://doi.org/10.1116/1.5140587
Vapor phase passivation of (100) germanium surfaces with HBr
J. Vac. Sci. Technol. A 38, 023208 (2020)
https://doi.org/10.1116/1.5141941
Practical guide for inelastic mean free paths, effective attenuation lengths, mean escape depths, and information depths in x-ray photoelectron spectroscopy
In Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
J. Vac. Sci. Technol. A 38, 023209 (2020)
https://doi.org/10.1116/1.5141079
Surface science of shape-selective metal nanocrystal synthesis from first-principles: Growth of Cu nanowires and nanocubes
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023210 (2020)
https://doi.org/10.1116/1.5141995
Tip-induced deformation of polystyrene latex reference nanoparticles in atomic force microscopy
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023211 (2020)
https://doi.org/10.1116/1.5141749
Thin Films
Angular resolved mass-energy analysis of species emitted from a dc magnetron sputtered NiW-target
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
Martin Rausch; Stanislav Mráz; Patrice Kreiml; Megan J. Cordill; Jochen M. Schneider; Jörg Winkler; Christian Mitterer
J. Vac. Sci. Technol. A 38, 023401 (2020)
https://doi.org/10.1116/1.5138248
Tunable light emission from chemical vapor deposited two-dimensional MoSe2 by layer variation and S incorporation
J. Vac. Sci. Technol. A 38, 023402 (2020)
https://doi.org/10.1116/1.5124998
Low temperature oxidation behavior of Mo2BC coatings
In Special Collection:
Festschrift Honoring Dr. Steve Rossnagel
Jan-Ole Achenbach; Soheil Karimi Aghda; Marcus Hans; Daniel Primetzhofer; Damian M. Holzapfel; Danilo J. Miljanovic; Jochen M. Schneider
J. Vac. Sci. Technol. A 38, 023403 (2020)
https://doi.org/10.1116/1.5141993
Epitaxial growth of Bi2Se3 in the (0015) orientation on GaAs (001)
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
J. Vac. Sci. Technol. A 38, 023404 (2020)
https://doi.org/10.1116/1.5139905
Photoluminescence from carbon structures grown by inductively coupled plasma chemical vapor deposition
Arevik Musheghyan-Avetisyan; Frank Güell; Paulina R. Martínez-Alanis; Roger Amade; Joan Martí-González; Enric Bertran-Serra
J. Vac. Sci. Technol. A 38, 023405 (2020)
https://doi.org/10.1116/1.5140415
Numerical ellipsometry: Methods for selecting measurements and techniques for advanced analysis applied to β-gallium oxide
J. Vac. Sci. Technol. A 38, 023406 (2020)
https://doi.org/10.1116/1.5134790
Silver thin film deposited 3-dimensional gold nanorod arrays for plasmonic catalysis
J. Vac. Sci. Technol. A 38, 023407 (2020)
https://doi.org/10.1116/1.5130721
Comparative study of BeMgZnO/ZnO heterostructures on c-sapphire and GaN by molecular beam epitaxy
J. Vac. Sci. Technol. A 38, 023408 (2020)
https://doi.org/10.1116/1.5145206
Pervasive artifacts revealed from magnetometry measurements of rare earth-transition metal thin films
In Special Collection:
30 years of the Nellie Yeoh Whetten Award — Celebrating the Women of the AVS
Andrada-Oana Mandru; Oğuz Yıldırım; Miguel A. Marioni; Hartmut Rohrmann; Michael Heigl; Oana-Tereza Ciubotariu; Marcos Penedo; Xue Zhao; Manfred Albrecht; Hans J. Hug
J. Vac. Sci. Technol. A 38, 023409 (2020)
https://doi.org/10.1116/1.5135504
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
Thorsten Lill, Mingmei Wang, et al.
Surface passivation approaches for silicon, germanium, and III–V semiconductors
Roel J. Theeuwes, Wilhelmus M. M. Kessels, et al.
Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success
Brian C. Welch, Jeanne Casetta, et al.