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LETTERS

Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization

Triratna Muneshwar; Doug Barlage; Ken Cadien

J. Vac. Sci. Technol. A 37, 030601 (2019) https://doi.org/10.1116/1.5091944

Abstract

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Sticking probabilities of H₂O and Al(CH₃)₃ during atomic layer deposition of Al₂O₃ extracted from their impact on film conformality

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Karsten Arts; Vincent Vandalon; Riikka L. Puurunen; Mikko Utriainen; Feng Gao; Wilhelmus M. M. (Erwin) Kessels; Harm C. M. Knoops

J. Vac. Sci. Technol. A 37, 030908 (2019) https://doi.org/10.1116/1.5093620

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Letters

Scandium function in “scandate” thermionic cathodes: A microspot synchrotron radiation x-ray photoelectron spectroscopy study of co-adsorbed Ba-Sc-O on W(100)

Michael V. Mroz; Martin E. Kordesch; Jerzy T. Sadowski

J. Vac. Sci. Technol. A 37, 030602 (2019) https://doi.org/10.1116/1.5094258

Abstract

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Articles

Atomic Layer Deposition (ALD)

Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Jeffrey M. Woodward; Samantha G. Rosenberg; Alexander C. Kozen; Neeraj Nepal; Scooter D. Johnson; Christa Wagenbach; Andrew H. Rowley; Zachary R. Robinson; Howie Joress; Karl F. Ludwig, Jr.; Charles R. Eddy, Jr.

J. Vac. Sci. Technol. A 37, 030901 (2019) https://doi.org/10.1116/1.5081919

Abstract

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CHORUS

Evaluation of grating realized via pulse current electroplating combined with atomic layer deposition as an x-ray grating interferometer

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Tae-Eun Song; Seho Lee; Hee Han; Soonyoung Jung; Soo-Hyun Kim; Min Jun Kim; Seung Wook Lee; Chi Won Ahn

J. Vac. Sci. Technol. A 37, 030903 (2019) https://doi.org/10.1116/1.5080954

Abstract

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Growth characteristics of ZnO thin films produced via catalytic reaction-assisted chemical vapor deposition

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Taro Saito; Ryuta Iba; Shotaro Ono; Go Imada; Kanji Yasui

J. Vac. Sci. Technol. A 37, 030904 (2019) https://doi.org/10.1116/1.5079526

Abstract

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Formation of defects and impurities in MoS_x and their effect on electronic properties

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Yifan Nie; Ravi Agarwal; Sumeet C. Pandey; Gurtej S. Sandhu

J. Vac. Sci. Technol. A 37, 030905 (2019) https://doi.org/10.1116/1.5090237

Abstract

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Atomic layer deposition of amorphous tin-gallium oxide films

Fredrik Larsson; Jan Keller; Daniel Primetzhofer; Lars Riekehr; Marika Edoff; Tobias Törndahl

J. Vac. Sci. Technol. A 37, 030906 (2019) https://doi.org/10.1116/1.5092877

Abstract

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Penetration depth variation in atomic layer deposition on multiwalled carbon nanotube forests

David Kane; Robert Davis; Richard Vanfleet

J. Vac. Sci. Technol. A 37, 030907 (2019) https://doi.org/10.1116/1.5085051

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Quartz crystal microbalance study of precursor diffusion during molecular layer deposition using cyclic azasilane, maleic anhydride, and water

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Ling Ju; Vamseedhara Vemuri; Nicholas C. Strandwitz

J. Vac. Sci. Technol. A 37, 030909 (2019) https://doi.org/10.1116/1.5093509

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Interfaces

Thermally activated nucleation and growth of cobalt and nickel oxide nanoparticles on porous silica

In Special Collection: Special Topic Collection on Complex Oxides

Vijayakumar Murugesan; Michel Gray; Mond Guo; Heather Job; Libor Kovarik; Arun Devaraj; Suntharampillai Thevuthasan; Karthikeyan K. Ramasamy

J. Vac. Sci. Technol. A 37, 031101 (2019) https://doi.org/10.1116/1.5080448

Abstract

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Dislocation structures, interfacing, and magnetism in the $L 1_{}$ − $M n G a$ on $η$ _⊥− $M n_{3} N_{2}$ bilayer

J. P. Corbett; J. Guerrero-Sanchez; J. C. Gallagher; A.-O. Mandru; A. L. Richard; D. C. Ingram; F. Yang; N. Takeuchi; A. R. Smith

J. Vac. Sci. Technol. A 37, 031102 (2019) https://doi.org/10.1116/1.5081960

Abstract

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CHORUS

Photovoltaics and Energy

5f states with spin-orbit and crystal field splittings

J. G. Tobin

J. Vac. Sci. Technol. A 37, 031201 (2019) https://doi.org/10.1116/1.5087829

Abstract

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Comparative operando XPS studies of quasi-Fermi level splitting and open-circuit voltage in CZTSe/CdS and CIGS/CdS junctions and device structures

Glenn Teeter; Steven P. Harvey; Craig L. Perkins; Kannan Ramanathan; Ingrid L. Repins

J. Vac. Sci. Technol. A 37, 031202 (2019) https://doi.org/10.1116/1.5090345

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CHORUS

Plasma Science and Technology

Characterization of a pulsed low pressure argon discharge in a cylindrical magnetron reactor by plasma diagnostic and 3D plasma modeling

Stella Mathioudaki; Cédric Vandenabeele; Romain Tonneau; Andreas Pflug; Stéphane Lucas

J. Vac. Sci. Technol. A 37, 031301 (2019) https://doi.org/10.1116/1.5064690

Abstract

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Study of Ge-rich GeSbTe etching process with different halogen plasmas

Yann Canvel; Sébastien Lagrasta; Christelle Boixaderas; Sébastien Barnola; Yann Mazel; Eugénie Martinez

J. Vac. Sci. Technol. A 37, 031302 (2019) https://doi.org/10.1116/1.5089037

Abstract

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Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets

Jonathan Holburg; Matthias Müller; Klaus Mann; Stephan Wieneke

J. Vac. Sci. Technol. A 37, 031303 (2019) https://doi.org/10.1116/1.5089201

Abstract

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Plasma etching of high aspect ratio features in SiO₂ using Ar/C₄F₈/O₂ mixtures: A computational investigation

Shuo Huang; Chad Huard; Seungbo Shim; Sang Ki Nam; In-Cheol Song; Siqing Lu; Mark J. Kushner

J. Vac. Sci. Technol. A 37, 031304 (2019) https://doi.org/10.1116/1.5090606

Abstract

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Effect of water vapor on plasma processing at atmospheric pressure: Polymer etching and surface modification by an Ar/H₂O plasma jet

Pingshan Luan; V. S. Santosh K. Kondeti; Andrew J. Knoll; Peter J. Bruggeman; Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 37, 031305 (2019) https://doi.org/10.1116/1.5092272

Abstract

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CHORUS

Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMS: An atomistic simulation

Movaffaq Kateb; Hamidreza Hajihoseini; Jon Tomas Gudmundsson; Snorri Ingvarsson

J. Vac. Sci. Technol. A 37, 031306 (2019) https://doi.org/10.1116/1.5094429

Abstract

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Surfaces

Practical guides for x-ray photoelectron spectroscopy: First steps in planning, conducting, and reporting XPS measurements

Donald R. Baer; Kateryna Artyushkova; Christopher Richard Brundle; James E. Castle; Mark H. Engelhard; Karen J. Gaskell; John T. Grant; Richard T. Haasch; Matthew R. Linford; Cedric J. Powell; Alexander G. Shard; Peter M. A. Sherwood; Vincent S. Smentkowski

J. Vac. Sci. Technol. A 37, 031401 (2019) https://doi.org/10.1116/1.5065501

Abstract

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Thin Films

Electrical and optical properties of wide-gap n-type Sn₂Ta₂O₇ films

In Special Collection: Special Topic Collection on Complex Oxides

Shunichi Suzuki; Keishi Nishio; Naoto Kikuchi

J. Vac. Sci. Technol. A 37, 031501 (2019) https://doi.org/10.1116/1.5081991

Abstract

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Nanocrystalline tin oxide coatings on etched optical fiber Bragg grating for hydrogen sulfide detection

Bruno Rente; Alexandre Mello; Regina Allil; Marcelo M. Werneck; Sergio S. Camargo, Jr.

J. Vac. Sci. Technol. A 37, 031502 (2019) https://doi.org/10.1116/1.5083107

Abstract

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Phase transformation and light emission in Er-doped Si-rich HfO₂ films prepared by magnetron sputtering

Tetyana Torchynska; Brahim El Filali; Larysa Khomenkova; Xavier Portier; Fabrice Gourbilleau

J. Vac. Sci. Technol. A 37, 031503 (2019) https://doi.org/10.1116/1.5085143

Abstract

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Electron-electron interactions in nano-patterned La_0.3Sr_0.7MnO₃ thin films

In Special Collection: Special Topic Collection on Complex Oxides

Laurie E. Calvet; Guillaume Agnus; Philippe Lecoeur

J. Vac. Sci. Technol. A 37, 031504 (2019) https://doi.org/10.1116/1.5085669

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Effect of oxygen flow rate on the low temperature deposition of titanium monoxide thin films via electron beam evaporation

Mustafa Burak Cosar; Kerem Cagatay Icli; Macit Ozenbas

J. Vac. Sci. Technol. A 37, 031505 (2019) https://doi.org/10.1116/1.5082166

Abstract

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Strategy for simultaneously increasing both hardness and toughness in ZrB₂-rich Zr_1−xTa_xB_y thin films

Babak Bakhit; David L. J. Engberg; Jun Lu; Johanna Rosen; Hans Högberg; Lars Hultman; Ivan Petrov; J. E. Greene; Grzegorz Greczynski

J. Vac. Sci. Technol. A 37, 031506 (2019) https://doi.org/10.1116/1.5093170

Abstract

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Nanomechanical and microtribological properties of yttrium thin films for photocathode engineering

Esteban Broitman; Antonella Lorusso; Alessio Perrone; Vagelis Karoutsos; Nikolaos A. Vainos; Francisco Gontad

J. Vac. Sci. Technol. A 37, 031507 (2019) https://doi.org/10.1116/1.5088106

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Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process

In Special Collection: Special Topic Collection on Complex Oxides

Sascha Bönhardt; Kati Kühnel; Alireza M. Kia; Wenke Weinreich

J. Vac. Sci. Technol. A 37, 031508 (2019) https://doi.org/10.1116/1.5082275

Abstract

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Low temperature chemical vapor deposition of superconducting vanadium nitride thin films

Elham Mohimi; Zhejun V. Zhang; Justin L. Mallek; Sumeng Liu; Brian B. Trinh; Pralav P. Shetty; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 37, 031509 (2019) https://doi.org/10.1116/1.5088050

Abstract

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CHORUS

In situ investigation of as grown Cu(In,Ga)Se₂ thin films by means of photoemission spectroscopy

Wolfram Calvet; Bünyamin Ümsür; Alexander Steigert; Karsten Prietzel; Dieter Greiner; Christian A. Kaufmann; Thomas Unold; Martha Lux-Steiner; Iver Lauermann

J. Vac. Sci. Technol. A 37, 031510 (2019) https://doi.org/10.1116/1.5089412

Abstract

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Epitaxial growth and atomic arrangement in Fe₂CrO₄ on crystal symmetry matched (001) MgAl₂O₄

Mark D. Scafetta; Zhenzhong Yang; Steven R. Spurgeon; Mark E. Bowden; Tiffany C. Kaspar; Steven M. Heald; Scott A. Chambers

J. Vac. Sci. Technol. A 37, 031511 (2019) https://doi.org/10.1116/1.5093537

Abstract

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CHORUS

Kinetic model for color-center formation in TiO₂ film using femtosecond laser irradiation

In Special Collection: Special Topic Collection on Complex Oxides

Susumu Kato; Atsushi Sunahara; Masahiro Tsukamoto

J. Vac. Sci. Technol. A 37, 031512 (2019) https://doi.org/10.1116/1.5085822

Abstract

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Thickness dependent magneto-static and magneto-dynamic properties of CoFeB thin films

Anabil Gayen; Rajkumar Modak; Ananthakrishnan Srinivasan; Vallabhapurapu Vijaya Srinivasu; Perumal Alagarsamy

J. Vac. Sci. Technol. A 37, 031513 (2019) https://doi.org/10.1116/1.5091675

Abstract

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Reactive sputter deposition of WO₃ films by using two deposition methods

In Special Collection: Conference Collection: PACSURF 2018

Yoji Yasuda; Yoichi Hoshi; Shin-ichi Kobayashi; Takayuki Uchida; Yutaka Sawada; Meihan Wang; Hao Lei

J. Vac. Sci. Technol. A 37, 031514 (2019) https://doi.org/10.1116/1.5092863

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Optical properties of MoO₃/Ag/MoO₃ multilayer structures determined using spectroscopic ellipsometry

Dae Ho Jung; Hyeon Seob So; Hosun Lee; Jin-Yeong Park; Han-Ki Kim

J. Vac. Sci. Technol. A 37, 031515 (2019) https://doi.org/10.1116/1.5095958

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Resistivity and surface scattering of (0001) single crystal ruthenium thin films

Sameer S. Ezzat; Prabhu Doss Mani; Asim Khaniya; William Kaden; Daniel Gall; Katayun Barmak; Kevin R. Coffey

J. Vac. Sci. Technol. A 37, 031516 (2019) https://doi.org/10.1116/1.5093494

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CHORUS

Vacuum Science and Technology

Cryopumping of hydrogen on stainless steel in the temperature range between 7 and 18 K

Frederic Chill; Stefan Wilfert; Lars Bozyk

J. Vac. Sci. Technol. A 37, 031601 (2019) https://doi.org/10.1116/1.5086164

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Calibration of ultra-fine helium leak rates for leak testing of microelectromechanical systems

Hajime Yoshida; Kenta Arai

J. Vac. Sci. Technol. A 37, 031602 (2019) https://doi.org/10.1116/1.5090454

Abstract

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Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry

Patrick F. Egan; Jack A. Stone; Julia K. Scherschligt; Allan H. Harvey

J. Vac. Sci. Technol. A 37, 031603 (2019) https://doi.org/10.1116/1.5092185

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Review Articles

Status and prospects of plasma-assisted atomic layer deposition

In Special Collection: 2019 Special Collection on Atomic Layer Deposition (ALD)

Harm C. M. Knoops; Tahsin Faraz; Karsten Arts; Wilhelmus M. M. (Erwin) Kessels

J. Vac. Sci. Technol. A 37, 030902 (2019) https://doi.org/10.1116/1.5088582

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ERRATA

Erratum: “Epitaxial growth and electrical properties of VO₂ on [LaAlO₃]_0.3[Sr₂AlTaO₆]_0.7 (111) substrate” [J. Vac. Sci. Technol. A 36, 061506 (2018)]

Yang Liu; Shanyuan Niu; Thomas Orvis; Haimeng Zhang; Huan Zhao; Han Wang; Jayakanth Ravichandran

J. Vac. Sci. Technol. A 37, 033401 (2019) https://doi.org/10.1116/1.5093041

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LETTERS

Letters

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Atomic Layer Deposition (ALD)

Interfaces

Photovoltaics and Energy

Plasma Science and Technology

Surfaces

Thin Films

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Review Articles

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