Issues

LETTERS

Particle behavior and its contribution to film growth in a remote silane plasma

Yeonwon Kim; Kazunori Koga; Masaharu Shiratani

J. Vac. Sci. Technol. A 36, 050601 (2018) https://doi.org/10.1116/1.5037539

Abstract

View articletitled, Particle behavior and its contribution to film growth in a remote silane plasma

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Letters

Estimating the thermochemical properties of trimethylaluminum for thin-film processing applications

Raymond A. Adomaitis

J. Vac. Sci. Technol. A 36, 050602 (2018) https://doi.org/10.1116/1.5045342

Abstract

View articletitled, Estimating the thermochemical properties of trimethylaluminum for thin-film processing applications

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CHORUS

Review Articles

Review Article: Gas and vapor sorption measurements using electronic beam balances

David L. Minnick; Tugba Turnaoglu; Maria Alejandra Rocha; Mark B. Shiflett

J. Vac. Sci. Technol. A 36, 050801 (2018) https://doi.org/10.1116/1.5044552

Abstract

View articletitled, Review Article: Gas and vapor sorption measurements using electronic beam balances

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Plasma Science and Technology

Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO₂/Si

Takeshi Kitajima; Ryosuke Kage; Toshiki Nakano

J. Vac. Sci. Technol. A 36, 051301 (2018) https://doi.org/10.1116/1.5037652

Abstract

View articletitled, Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO₂/Si

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Tunable resistivity in ink-jet printed electrical structures on paper by plasma conversion of particle-free, stabilizer-free silver inks

Yongkun Sui; Souvik Ghosh; Christopher Miller; Daphne Pappas; R. Mohan Sankaran; Christian A. Zorman

J. Vac. Sci. Technol. A 36, 051302 (2018) https://doi.org/10.1116/1.5042459

Abstract

View articletitled, Tunable resistivity in ink-jet printed electrical structures on paper by plasma conversion of particle-free, stabilizer-free silver inks

Supplementary Material

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CHORUS

Silicon nitride-capped silicon nanocrystals via a nonthermal dual-plasma synthesis approach

Rajib Mandal; Kyle O’Shea; Rebecca Anthony

J. Vac. Sci. Technol. A 36, 051303 (2018) https://doi.org/10.1116/1.5039352

Abstract

View articletitled, Silicon nitride-capped silicon nanocrystals via a nonthermal dual-plasma synthesis approach

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Surfaces

In situ XPS study on atomic layer etching of Fe thin film using Cl₂ and acetylacetone

In Special Collection: 2018 Special Collection on Atomic Layer Etching (ALE)

Xi Lin; Meixi Chen; Anderson Janotti; Robert Opila

J. Vac. Sci. Technol. A 36, 051401 (2018) https://doi.org/10.1116/1.5039517

Abstract

View articletitled, <em>In situ</em> XPS study on atomic layer etching of Fe thin film using Cl₂ and acetylacetone

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CHORUS

Thin Films

Postdeposition annealing on VO₂ films for resistive random-access memory selection devices

Heewoo Lim; Haewon Cho; Hyunjung Kim; Namgue Lee; Seokyoon Shin; Chanwon Jung; Hyunjun Kim; Kyungpil Lim; Hyeongtag Jeon

J. Vac. Sci. Technol. A 36, 051501 (2018) https://doi.org/10.1116/1.5021082

Abstract

View articletitled, Postdeposition annealing on VO₂ films for resistive random-access memory selection devices

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Atomic layer deposition of CeO₂ using a heteroleptic cyclopentadienyl-amidinate precursor

Maryam Golalikhani; Trevor James; Peter Van Buskirk; Wontae Noh; Jooho Lee; Ziyun Wang; Jeffrey F. Roeder

J. Vac. Sci. Technol. A 36, 051502 (2018) https://doi.org/10.1116/1.5026405

Abstract

View articletitled, Atomic layer deposition of CeO₂ using a heteroleptic cyclopentadienyl-amidinate precursor

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CHORUS

Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy

David R. Boris; Virginia R. Anderson; Neeraj Nepal; Scooter D. Johnson; Zachary R. Robinson; Alexander C. Kozen; Charles R. Eddy, Jr.; Scott G. Walton

J. Vac. Sci. Technol. A 36, 051503 (2018) https://doi.org/10.1116/1.5034247

Abstract

View articletitled, Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy

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Conformal MgO film grown at high rate at low temperature by forward-directed chemical vapor deposition

Tushar K. Talukdar; Sumeng Liu; Zhejun Zhang; Frank Harwath; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 36, 051504 (2018) https://doi.org/10.1116/1.5040855

Abstract

View articletitled, Conformal MgO film grown at high rate at low temperature by forward-directed chemical vapor deposition

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CHORUS

Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor

Igor Krylov; Ekaterina Zoubenko; Kamira Weinfeld; Yaron Kauffmann; Xianbin Xu; Dan Ritter; Moshe Eizenberg

J. Vac. Sci. Technol. A 36, 051505 (2018) https://doi.org/10.1116/1.5035422

Abstract

View articletitled, Obtaining low resistivity (∼100 <em>μ</em>Ω cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor

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Annealing of thin “Tincone” films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

Kevin Van de Kerckhove; Jolien Dendooven; Christophe Detavernier

J. Vac. Sci. Technol. A 36, 051506 (2018) https://doi.org/10.1116/1.5038867

Abstract

View articletitled, Annealing of thin “Tincone” films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

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Gas-cluster ion sputtering: Effect on organic layer morphology

Christopher M. Goodwin; Zachary E. Voras; Thomas P. Beebe, Jr.

J. Vac. Sci. Technol. A 36, 051507 (2018) https://doi.org/10.1116/1.5044643

Abstract

View articletitled, Gas-cluster ion sputtering: Effect on organic layer morphology

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CHORUS

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

In Special Collection: 2018 Special Collection on Atomic Layer Deposition (ALD)

Perttu Sippola; Alexander Pyymaki Perros; Oili M. E. Ylivaara; Helena Ronkainen; Jaakko Julin; Xuwen Liu; Timo Sajavaara; Jarkko Etula; Harri Lipsanen; Riikka L. Puurunen

J. Vac. Sci. Technol. A 36, 051508 (2018) https://doi.org/10.1116/1.5038856

Abstract

View articletitled, Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Supplementary Material

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Effect of ozone concentration on atomic layer deposited tin oxide

Hyunwoo Park; Joohyun Park; Seokyoon Shin; Giyul Ham; Hyeongsu Choi; Seungjin Lee; Namgue Lee; Sejin Kwon; Minwook Bang; Juhyun Lee; Bumsik Kim; Hyeongtag Jeon

J. Vac. Sci. Technol. A 36, 051509 (2018) https://doi.org/10.1116/1.5027550

Abstract

View articletitled, Effect of ozone concentration on atomic layer deposited tin oxide

Supplementary Material

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Reactivity of heterogeneous surfaces: Modeling precursor–surface interaction using absorbing Markov chains

Angel Yanguas-Gil

J. Vac. Sci. Technol. A 36, 051510 (2018) https://doi.org/10.1116/1.5034178

Abstract

View articletitled, Reactivity of heterogeneous surfaces: Modeling precursor–surface interaction using absorbing Markov chains

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CHORUS

Atmospheric spatial atomic layer deposition of ZnOS buffer layers for flexible Cu(In,Ga)Se₂ solar cells

Andrea Illiberi; Corne Frijters; Marta Ruth; David Bremaud; Paul Poodt; Fred Roozeboom; Pieter Jan Bolt

J. Vac. Sci. Technol. A 36, 051511 (2018) https://doi.org/10.1116/1.5040457

Abstract

View articletitled, Atmospheric spatial atomic layer deposition of ZnOS buffer layers for flexible Cu(In,Ga)Se₂ solar cells

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Growth and mechanical properties of 111-oriented V_0.5Mo_0.5N_x/Al₂O₃(0001) thin films

Hanna Kindlund; Jun Lu; Esteban Broitman; Ivan Petrov; J. E. Greene; Jens Birch; Lars Hultman

J. Vac. Sci. Technol. A 36, 051512 (2018) https://doi.org/10.1116/1.5045048

Abstract

View articletitled, Growth and mechanical properties of 111-oriented V_0.5Mo_0.5N_x/Al₂O₃(0001) thin films

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Superconformal coating and filling of deep trenches by chemical vapor deposition with forward-directed fluxes

Tushar K. Talukdar; Wenjiao B. Wang; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 36, 051513 (2018) https://doi.org/10.1116/1.5038100

Abstract

View articletitled, Superconformal coating and filling of deep trenches by chemical vapor deposition with forward-directed fluxes

Supplementary Material

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CHORUS

Vacuum Science and Technology

Oxygen-free palladium/titanium coating, a novel nonevaporable getter coating with an activation temperature of 133 °C

Tetsuya Miyazawa; Masashi Kurihara; Shinya Ohno; Naoya Terashima; Yuto Natsui; Hiroo Kato; Yoshihiro Kato; Ayako Hashimoto; Takashi Kikuchi; Kazuhiko Mase

J. Vac. Sci. Technol. A 36, 051601 (2018) https://doi.org/10.1116/1.5037023

Abstract

View articletitled, Oxygen-free palladium/titanium coating, a novel nonevaporable getter coating with an activation temperature of 133 °C

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Special Issue on 2D Materials

Articles

Review Article: Hydrogenated graphene: A user’s guide

In Special Collection: Special Issue on 2D Materials

Keith E. Whitener, Jr.

J. Vac. Sci. Technol. A 36, 05G401 (2018) https://doi.org/10.1116/1.5034433

Abstract

View articletitled, Review Article: Hydrogenated graphene: A user’s guide

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Thermal recrystallization of short-range ordered WS₂ films

In Special Collection: Special Issue on 2D Materials

Markus H. Heyne; Jean-François de Marneffe; Iuliana Radu; Erik C. Neyts; Stefan De Gendt

J. Vac. Sci. Technol. A 36, 05G501 (2018) https://doi.org/10.1116/1.5036654

Abstract

View articletitled, Thermal recrystallization of short-range ordered WS₂ films

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Nano-optical imaging of monolayer MoSe₂-WSe₂ lateral heterostructure with subwavelength domains

In Special Collection: Special Issue on 2D Materials

Wenjin Xue; Prasana K. Sahoo; Jiru Liu; Haonan Zong; Xiaoyi Lai; Sharad Ambardar; Dmitri V. Voronine

J. Vac. Sci. Technol. A 36, 05G502 (2018) https://doi.org/10.1116/1.5035437

Abstract

View articletitled, Nano-optical imaging of monolayer MoSe₂-WSe₂ lateral heterostructure with subwavelength domains

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CHORUS

Nitrogen acceptor in 2H-polytype synthetic MoS₂ assessed by multifrequency electron spin resonance

In Special Collection: Special Issue on 2D Materials

Ben Schoenaers; Andre Stesmans; Valery V. Afanas’ev

J. Vac. Sci. Technol. A 36, 05G503 (2018) https://doi.org/10.1116/1.5034447

Abstract

View articletitled, Nitrogen acceptor in 2H-polytype synthetic MoS₂ assessed by multifrequency electron spin resonance

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Fabrication and characterization of transparent conducting reduced graphene oxide/Ag nanowires/ZnO:Ga composite thin films on flexible substrates

In Special Collection: Special Issue on 2D Materials

Ching-Tian Chou; Fang-Hsing Wang

J. Vac. Sci. Technol. A 36, 05G504 (2018) https://doi.org/10.1116/1.5035155

Abstract

View articletitled, Fabrication and characterization of transparent conducting reduced graphene oxide/Ag nanowires/ZnO:Ga composite thin films on flexible substrates

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Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication

In Special Collection: Special Issue on 2D Materials

Javier Arias-Zapata; Djawhar Ferrah; Hasan-al Mehedi; Gilles Cunge; Marc Zelsmann

J. Vac. Sci. Technol. A 36, 05G505 (2018) https://doi.org/10.1116/1.5035333

Abstract

View articletitled, Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication

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Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO₂ and 2D substrates

In Special Collection: Special Issue on 2D Materials

Dheyaa Alameri; Leonidas E. Ocola; Irma Kuljanishvili

J. Vac. Sci. Technol. A 36, 05G506 (2018) https://doi.org/10.1116/1.5036533

Abstract

View articletitled, Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO₂ and 2D substrates

Supplementary Material

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CHORUS

Growth of S-doped MoO₂ nanosheets with a controlled bandgap by chemical vapor deposition

In Special Collection: Special Issue on 2D Materials

Long Feng; Hui Yan; Rukang Zhang; Jiwen Liu

J. Vac. Sci. Technol. A 36, 05G507 (2018) https://doi.org/10.1116/1.5027148

Abstract

View articletitled, Growth of S-doped MoO₂ nanosheets with a controlled bandgap by chemical vapor deposition

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Microwave imaging of etching-induced surface impedance modulation of graphene monolayer

In Special Collection: Special Issue on 2D Materials

Zhonghang Ji; Joshua Myers; Kathleen Brockdorf; Nick Engel; Shin Mou; Hong Huang; Yan Zhuang

J. Vac. Sci. Technol. A 36, 05G508 (2018) https://doi.org/10.1116/1.5035417

Abstract

View articletitled, Microwave imaging of etching-induced surface impedance modulation of graphene monolayer

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CHORUS

Controlling the morphology of ultrathin MoS₂/MoO₂ nanosheets grown by chemical vapor deposition

In Special Collection: Special Issue on 2D Materials

Zongliang Guo; Zhiming Xiao; Aixiang Wei; Yu Zhao; Jun Liu

J. Vac. Sci. Technol. A 36, 05G509 (2018) https://doi.org/10.1116/1.5035346

Abstract

View articletitled, Controlling the morphology of ultrathin MoS₂/MoO₂ nanosheets grown by chemical vapor deposition

Supplementary Material

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