Issues

Letters

Achieving ultrahigh etching selectivity of SiO₂ over Si₃N₄ and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors

Kang-Yi Lin; Chen Li; Sebastian Engelmann; Robert L. Bruce; Eric A. Joseph; Dominik Metzler; Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 36, 040601 (2018) https://doi.org/10.1116/1.5035291

Abstract

View articletitled, Achieving ultrahigh etching selectivity of SiO₂ over Si₃N₄ and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors

Open the PDF for in another window

Hard TiN₂ dinitride films prepared by magnetron sputtering

Jindřich Musil; Martin Jaroš; Šimon Kos; Radomír Čerstvý; Stanislav Haviar

J. Vac. Sci. Technol. A 36, 040602 (2018) https://doi.org/10.1116/1.5038555

Abstract

View articletitled, Hard TiN₂ dinitride films prepared by magnetron sputtering

Open the PDF for in another window

Review Articles

Review Article: Quantum-based vacuum metrology at the National Institute of Standards and Technology

Julia Scherschligt; James A. Fedchak; Zeeshan Ahmed; Daniel S. Barker; Kevin Douglass; Stephen Eckel; Edward Hanson; Jay Hendricks; Nikolai Klimov; Thomas Purdy; Jacob Ricker; Robinjeet Singh; Jack Stone

J. Vac. Sci. Technol. A 36, 040801 (2018) https://doi.org/10.1116/1.5033568

Abstract

View articletitled, Review Article: Quantum-based vacuum metrology at the National Institute of Standards and Technology

Open the PDF for in another window

Photovoltaics and Energy

Efficient p-i-n inorganic CsPbI₃ perovskite solar cell deposited using layer-by-layer vacuum deposition

Ranjith Kottokkaran; Harshavardhan A. Gaonkar; Behrang Bagheri; Vikram L. Dalal

J. Vac. Sci. Technol. A 36, 041201 (2018) https://doi.org/10.1116/1.5029253

Abstract

View articletitled, Efficient p-i-n inorganic CsPbI₃ perovskite solar cell deposited using layer-by-layer vacuum deposition

Open the PDF for in another window

Plasma Science and Technology

Helium plasma modification of Si and Si₃N₄ thin films for advanced etch processes

Vahagn Martirosyan; Emilie Despiau-Pujo; Jerome Dubois; Gilles Cunge; Olivier Joubert

J. Vac. Sci. Technol. A 36, 041301 (2018) https://doi.org/10.1116/1.5025152

Abstract

View articletitled, Helium plasma modification of Si and Si₃N₄ thin films for advanced etch processes

Open the PDF for in another window

Determination of rotational and vibrational temperatures of CH in CH₄ plasmas

Tara L. Van Surksum; Joshua M. Blechle; Ellen R. Fisher

J. Vac. Sci. Technol. A 36, 041302 (2018) https://doi.org/10.1116/1.5031889

Abstract

View articletitled, Determination of rotational and vibrational temperatures of CH in CH₄ plasmas

Supplementary Material

Open the PDF for in another window

Sputtering of Si by Ar: A binary collision approach based on quantum-mechanical cross sections

Alexander P. Palov; Gabriel G. Balint-Kurti; Ekaterina N. Voronina; Tatyana V. Rakhimova

J. Vac. Sci. Technol. A 36, 041303 (2018) https://doi.org/10.1116/1.5027387

Abstract

View articletitled, Sputtering of Si by Ar: A binary collision approach based on quantum-mechanical cross sections

Open the PDF for in another window

Surfaces

Homeotropic alignment behavior of liquid crystal molecules on self-assembled monolayers with fluorinated alkyl chain

Seok-Gon Hwang; Hong-Gyu Park; Mu-Hun Park; Sang-Geon Park

J. Vac. Sci. Technol. A 36, 041401 (2018) https://doi.org/10.1116/1.5028327

Abstract

View articletitled, Homeotropic alignment behavior of liquid crystal molecules on self-assembled monolayers with fluorinated alkyl chain

Open the PDF for in another window

Multiple water layers on AnO₂ {111}, {110}, and {100} surfaces (An = U, Pu): A computational study

Bengt E. Tegner; Nikolas Kaltsoyannis

J. Vac. Sci. Technol. A 36, 041402 (2018) https://doi.org/10.1116/1.5028210

Abstract

View articletitled, Multiple water layers on AnO₂ {111}, {110}, and {100} surfaces (An = U, Pu): A computational study

Supplementary Material

Open the PDF for in another window

Preventing carbon contamination of Ge (001) during atomic layer deposition with a barium-based Zintl layer

Shen Hu; John G. Ekerdt

J. Vac. Sci. Technol. A 36, 041403 (2018) https://doi.org/10.1116/1.5029918

Abstract

View articletitled, Preventing carbon contamination of Ge (001) during atomic layer deposition with a barium-based Zintl layer

Open the PDF for in another window

CHORUS

Comparison of ZnO surface modification with gas-phase propiolic acid at high and medium vacuum conditions

Mahsa Konh; Chuan He; Zhengxin Li; Shi Bai; Elena Galoppini; Lars Gundlach; Andrew V. Teplyakov

J. Vac. Sci. Technol. A 36, 041404 (2018) https://doi.org/10.1116/1.5031945

Abstract

View articletitled, Comparison of ZnO surface modification with gas-phase propiolic acid at high and medium vacuum conditions

Supplementary Material

Open the PDF for in another window

CHORUS

Thin Films

Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity

Yafeng Zhu; Fangsen Li; Rong Huang; Tong Liu; Yanfei Zhao; Yang Shen; Jian Zhang; An Dingsun; Yun Guo

J. Vac. Sci. Technol. A 36, 041501 (2018) https://doi.org/10.1116/1.5025557

Abstract

View articletitled, Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity

Supplementary Material

Open the PDF for in another window

Impact of the sequence of precursor introduction on the growth and properties of atomic layer deposited Al-doped ZnO films

Harold Le Tulzo; Nathanaelle Schneider; Daniel Lincot; Gilles Patriarche; Frédérique Donsanti

J. Vac. Sci. Technol. A 36, 041502 (2018) https://doi.org/10.1116/1.5030990

Abstract

View articletitled, Impact of the sequence of precursor introduction on the growth and properties of atomic layer deposited Al-doped ZnO films

Open the PDF for in another window

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Saravana Balaji Basuvalingam; Bart Macco; Harm C. M. Knoops; Jimmy Melskens; Wilhelmus M. M. (Erwin) Kessels; Ageeth A. Bol

J. Vac. Sci. Technol. A 36, 041503 (2018) https://doi.org/10.1116/1.5034097

Abstract

View articletitled, Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Open the PDF for in another window

Study on the mechanisms of formation of aluminized diffusion coatings on a Ni-base superalloy using different pack aluminization procedures

Ederson Pauletti; Ana Sofia Clímaco Monteiro d'Oliveira

J. Vac. Sci. Technol. A 36, 041504 (2018) https://doi.org/10.1116/1.5026272

Abstract

View articletitled, Study on the mechanisms of formation of aluminized diffusion coatings on a Ni-base superalloy using different pack aluminization procedures

Open the PDF for in another window

Initial nucleation stage in photo-CVD of GeH₄ on SiO₂ substrate monitored by real-time spectroscopic ellipsometry and photo reflectance: Accurate determination of incubation time

Housei Akazawa

J. Vac. Sci. Technol. A 36, 041505 (2018) https://doi.org/10.1116/1.5040380

Abstract

View articletitled, Initial nucleation stage in photo-CVD of GeH₄ on SiO₂ substrate monitored by real-time spectroscopic ellipsometry and photo reflectance: Accurate determination of incubation time

Open the PDF for in another window

Revisitation of the structure zone model based on the investigation of the structure and properties of Ti, Zr, and Hf thin films deposited at 70–600 °C using DC magnetron sputtering

Eiji Kusano

J. Vac. Sci. Technol. A 36, 041506 (2018) https://doi.org/10.1116/1.5036555

Abstract

View articletitled, Revisitation of the structure zone model based on the investigation of the structure and properties of Ti, Zr, and Hf thin films deposited at 70–600 °C using DC magnetron sputtering

Open the PDF for in another window

Area selective CVD of metallic films from molybdenum, iron, and ruthenium carbonyl precursors: Use of ammonia to inhibit nucleation on oxide surfaces

Elham Mohimi; Zhejun V. Zhang; Sumeng Liu; Justin L. Mallek; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 36, 041507 (2018) https://doi.org/10.1116/1.5023236

Abstract

View articletitled, Area selective CVD of metallic films from molybdenum, iron, and ruthenium carbonyl precursors: Use of ammonia to inhibit nucleation on oxide surfaces

Supplementary Material

Open the PDF for in another window

CHORUS

Vacuum Science and Technology

Smallest microhouse in the world, assembled on the facet of an optical fiber by origami and welded in the μRobotex nanofactory

Jean-Yves Rauch; Olivier Lehmann; Patrick Rougeot; Joel Abadie; Joel Agnus; Miguel. Angel Suarez

J. Vac. Sci. Technol. A 36, 041601 (2018) https://doi.org/10.1116/1.5020128

Abstract

View articletitled, Smallest microhouse in the world, assembled on the facet of an optical fiber by origami and welded in the μRobotex nanofactory

Open the PDF for in another window

History of very thick film and bulk sample group IIIB, IVB, VB, and rare earth materials for various vacuum applications

James L. Provo

J. Vac. Sci. Technol. A 36, 041602 (2018) https://doi.org/10.1116/1.5038880

Abstract

View articletitled, History of very thick film and bulk sample group IIIB, IVB, VB, and rare earth materials for various vacuum applications

Open the PDF for in another window

New leak element based on graphene oxide membranes

Donghui Meng; Rongxin Yan; Guohua Ren; Lichen Sun; Lina Wang; Chongwu Guo; Li Wang; Rongping Shao; Yong Wang; Wei Sun

J. Vac. Sci. Technol. A 36, 041603 (2018) https://doi.org/10.1116/1.5035347

Abstract

View articletitled, New leak element based on graphene oxide membranes

Open the PDF for in another window

Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Articles

Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Andrea Illiberi; Ilias Katsouras; Sasa Gazibegovic; Brian Cobb; Elida Nekovic; Willem van Boekel; Corne Frijters; Joris Maas; Fred Roozeboom; Yves Creyghton; Paul Poodt; Gerwin Gelinck

J. Vac. Sci. Technol. A 36, 04F401 (2018) https://doi.org/10.1116/1.5008464

Abstract

View articletitled, Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors

Open the PDF for in another window

Interferometry of plasma bursts in helium atmospheric-pressure plasma jets

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Vladimir Samara; Sylwia Ptasinska

J. Vac. Sci. Technol. A 36, 04F402 (2018) https://doi.org/10.1116/1.5023113

Abstract

View articletitled, Interferometry of plasma bursts in helium atmospheric-pressure plasma jets

Supplementary Material

Open the PDF for in another window

CHORUS

Conversion of CO₂ in a packed-bed dielectric barrier discharge reactor

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Atindra M. Banerjee; Joel Billinger; Karen J. Nordheden; Floran J. J. Peeters

J. Vac. Sci. Technol. A 36, 04F403 (2018) https://doi.org/10.1116/1.5024400

Abstract

View articletitled, Conversion of CO₂ in a packed-bed dielectric barrier discharge reactor

Open the PDF for in another window

Special Issue on Atmospheric Pressure Plasmas: Chemistry and Material Interactions

Articles

Atmospheric pressure plasma jet: A facile method to modify the intimal surface of polymeric tubular conduits

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Bernabe S. Tucker; Paul A. Baker; Kunning G. Xu; Yogesh K. Vohra; Vinoy Thomas

J. Vac. Sci. Technol. A 36, 04F404 (2018) https://doi.org/10.1116/1.5023259

Abstract

View articletitled, Atmospheric pressure plasma jet: A facile method to modify the intimal surface of polymeric tubular conduits

Open the PDF for in another window

CHORUS

Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Tam Nguyen; Eduardo Hernandez; Vincent M. Donnelly; Demetre J. Economou

J. Vac. Sci. Technol. A 36, 04F406 (2018) https://doi.org/10.1116/1.5023693

Abstract

View articletitled, Excitation mechanisms in a nonequilibrium helium plasma jet emerging in ambient air at 1 atm

Open the PDF for in another window

CHORUS

Estimating the number density and energy distribution of electrons in a cold atmospheric plasma using optical emission spectroscopy

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Venu Anand; Aswathi Nair; Anbuselvan Karur Karunapathy Nagendirakumar; Mohan Rao Gowravaram

J. Vac. Sci. Technol. A 36, 04F407 (2018) https://doi.org/10.1116/1.5023107

Abstract

View articletitled, Estimating the number density and energy distribution of electrons in a cold atmospheric plasma using optical emission spectroscopy

Supplementary Material

Open the PDF for in another window

Article

Maghemite thin films prepared using atmospheric-pressure plasma annealing

In Special Collection: Special Issue on Atmospheric Pressure Plasmas: Chemistry & Material Interactions

Hong-Ying Chen; Shun-Hsiang Yang

J. Vac. Sci. Technol. A 36, 04F405 (2018) https://doi.org/10.1116/1.5023144

Abstract

View articletitled, Maghemite thin films prepared using atmospheric-pressure plasma annealing

Open the PDF for in another window