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Letters

Bound nuclear spin states of H₂ in an anisotropic potential induced by a stepped metal surface

Elvis F. Arguelles; Hideaki Kasai

J. Vac. Sci. Technol. A 36, 030601 (2018) https://doi.org/10.1116/1.5023158

Abstract

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Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al₂O₃(0001) thin films

Angel Aleman; Chao Li; Hicham Zaid; Hanna Kindlund; Joshua Fankhauser; Sergey V. Prikhodko; Mark S. Goorsky; Suneel Kodambaka

J. Vac. Sci. Technol. A 36, 030602 (2018) https://doi.org/10.1116/1.5021609

Abstract

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Selective anisotropic etching of GaN over AlGaN for very thin films

Joel C. Wong; Miroslav Micovic; David F. Brown; Isaac Khalaf; Adam Williams; Andrea Corrion

J. Vac. Sci. Technol. A 36, 030603 (2018) https://doi.org/10.1116/1.5012530

Abstract

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CHORUS

Controlling the B/Ti ratio of TiB_x thin films grown by high-power impulse magnetron sputtering

Babak Bakhit; Ivan Petrov; J. E. Greene; Lars Hultman; Johanna Rosén; Grzegorz Greczynski

J. Vac. Sci. Technol. A 36, 030604 (2018) https://doi.org/10.1116/1.5026445

Abstract

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Review Articles

Review Article: Challenge in determining the crystal structure of epitaxial 0001 oriented sp²-BN films

Mikhail Chubarov; Hans Högberg; Anne Henry; Henrik Pedersen

J. Vac. Sci. Technol. A 36, 030801 (2018) https://doi.org/10.1116/1.5024314

Abstract

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Review Article: Recommended practice for calibrating vacuum gauges of the ionization type

James A. Fedchak; Patrick J. Abbott; Jay H. Hendricks; Paul C. Arnold; Neil T. Peacock

J. Vac. Sci. Technol. A 36, 030802 (2018) https://doi.org/10.1116/1.5025060

Abstract

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Interfaces

Band alignment at the CdTe/InSb (001) heterointerface

Xingye Wang; Calli Campbell; Yong-Hang Zhang; Robert J. Nemanich

J. Vac. Sci. Technol. A 36, 031101 (2018) https://doi.org/10.1116/1.5022799

Abstract

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CHORUS

Photovoltaics and Energy

Copper-induced recrystallization and interdiffusion of CdTe/ZnTe thin films

Yegor Samoilenko; Ali Abbas; J. Michael Walls; Colin A. Wolden

J. Vac. Sci. Technol. A 36, 031201 (2018) https://doi.org/10.1116/1.5023501

Abstract

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CHORUS

Plasma Science and Technology

Etch considerations for directed self-assembly patterning using capacitively coupled plasma

Vinayak Rastogi; Peter L. G. Ventzek; Alok Ranjan

J. Vac. Sci. Technol. A 36, 031301 (2018) https://doi.org/10.1116/1.5004648

Abstract

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Noninvasive electrical plasma monitoring method using reactor substrates as alternative current-sensing electrodes

Ji-Hwan Park; Chin-Wook Chung

J. Vac. Sci. Technol. A 36, 031302 (2018) https://doi.org/10.1116/1.5017944

Abstract

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New insight into desorption step by Ar⁺ ion-bombardment during the atomic layer etching of silicon

Sonam D. Sherpa; Peter L. G. Ventzek; Myungsuk Lee; Gyeong S. Hwang; Alok Ranjan

J. Vac. Sci. Technol. A 36, 031303 (2018) https://doi.org/10.1116/1.5016530

Abstract

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Mass spectrometric method for estimating dissociation rates in hydrogen discharge plasmas

A. Cotter; Alexander Stowell; John Carlson; James R. Doyle

J. Vac. Sci. Technol. A 36, 031304 (2018) https://doi.org/10.1116/1.5020723

Abstract

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Comparisons of NF₃ plasma-cleaned Y₂O₃, YOF, and YF₃ chamber coatings during silicon etching in Cl₂ plasmas

Tianyu Ma; Tyler List; Vincent M. Donnelly

J. Vac. Sci. Technol. A 36, 031305 (2018) https://doi.org/10.1116/1.5026777

Abstract

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Native oxide removal from Ge surfaces by hydrogen plasma

Yuanxia Zheng; Jason Lapano; G. Bruce Rayner, Jr.; Roman Engel-Herbert

J. Vac. Sci. Technol. A 36, 031306 (2018) https://doi.org/10.1116/1.5020966

Abstract

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CHORUS

Surfaces

Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001)

Jesús Redondo; Mykola Telychko; Pavel Procházka; Martin Konečný; Jan Berger; Martin Vondráček; Jan Čechal; Pavel Jelínek; Martin Švec

J. Vac. Sci. Technol. A 36, 031401 (2018) https://doi.org/10.1116/1.5008977

Abstract

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Deposition and characterization of nickel gallium thin films

Shidong He; Andrew J. Pfau; John Trey Diulus; Gustavo H. Albuquerque; Gregory S. Herman

J. Vac. Sci. Technol. A 36, 031402 (2018) https://doi.org/10.1116/1.5023688

Abstract

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CHORUS

Effects of the generated functional groups by PECVD on adhesiveness of adipose derived mesenchymal stem cells

Sungyool Kwon; Wonjin Ban; Hyuna Lim; Youngsik Seo; Heonyong Park; Eun-Joo Kim; Yong Ki Cho; Sang Gyu Park; Donggeun Jung

J. Vac. Sci. Technol. A 36, 031403 (2018) https://doi.org/10.1116/1.5020851

Abstract

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Role of defects in the etching of graphene by intercalated oxygen

Tianbai Li; Jory A. Yarmoff

J. Vac. Sci. Technol. A 36, 031404 (2018) https://doi.org/10.1116/1.5025489

Abstract

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CHORUS

Thin Films

Plasma assisted low temperature electron beam deposited NiO thin films for electro-optic applications

Mustafa Burak Cosar; Kerem Cagatay Icli; Macit Ozenbas

J. Vac. Sci. Technol. A 36, 031501 (2018) https://doi.org/10.1116/1.5013126

Abstract

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Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier

Yong-Ping Wang; Zi-Jun Ding; Bao Zhu; Wen-Jun Liu; David Wei Zhang; Shi-Jin Ding

J. Vac. Sci. Technol. A 36, 031502 (2018) https://doi.org/10.1116/1.5002727

Abstract

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Electronic structure of BaSnO₃ investigated by high-energy-resolution electron energy-loss spectroscopy and ab initio calculations

Hwanhui Yun; Mehmet Topsakal; Abhinav Prakash; Koustav Ganguly; Chris Leighton; Bharat Jalan; Renata M. Wentzcovitch; K. Andre Mkhoyan; Jong Seok Jeong

J. Vac. Sci. Technol. A 36, 031503 (2018) https://doi.org/10.1116/1.5026298

Abstract

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CHORUS

Oxygen vacancy-passivated ZnO thin film formed by atomic layer deposition using H₂O₂

In Special Collection: Special Issue on Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials

Yue Wang; Kyung-Mun Kang; Minjae Kim; Hyung-Ho Park

J. Vac. Sci. Technol. A 36, 031504 (2018) https://doi.org/10.1116/1.5012022

Abstract

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Compositional, structural, and optical properties of atomic layer deposited tantalum oxide for optical fiber sensor overlays

In Special Collection: Special Issue on Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials

Kamil Kosiel; Karolina Pągowska; Maciej Kozubal; Marek Guziewicz; Krystyna Lawniczak-Jablonska; Rafał Jakieła; Yevgen Syryanyy; Tomasz Gabler; Mateusz Śmietana

J. Vac. Sci. Technol. A 36, 031505 (2018) https://doi.org/10.1116/1.5017725

Abstract

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Influence of deposition conditions on the growth of micron-thick highly c-axis textured superconducting GdBa₂Cu₃O_7-δ films on SrTiO₃ (100)

Jeffrey C. De Vero; Doopyo Lee; Hyeonseop Shin; Shielo B. Namuco; Inwoong Hwang; Rolang V. Sarmago; Jong Hyun Song

J. Vac. Sci. Technol. A 36, 031506 (2018) https://doi.org/10.1116/1.5019393

Abstract

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Surface morphology control of Nb thin films by biased target ion beam deposition

Salinporn Kittiwatanakul; Nattawut Anuniwat; Nam Dao; Stuart A. Wolf; Jiwei Lu

J. Vac. Sci. Technol. A 36, 031507 (2018) https://doi.org/10.1116/1.5023723

Abstract

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CHORUS

Optical characterization of pore filling in mesoporous multilayers by ultrathin atomic layer deposited hafnium dioxide

Andras Kovacs; Ulrich Mescheder

J. Vac. Sci. Technol. A 36, 031508 (2018) https://doi.org/10.1116/1.5003355

Abstract

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Atomic layer deposition of PbTiO₃ and PbZr_xTi_1-xO₃ films using metal alkyl and alkylamide precursors

Nick M. Sbrockey; Gary S. Tompa; Robert Lavelle; Kathleen A. Trumbull; Mark A. Fanton; David W. Snyder; Ronald G. Polcawich; Daniel M. Potrepka

J. Vac. Sci. Technol. A 36, 031509 (2018) https://doi.org/10.1116/1.5014030

Abstract

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Effect of synchronized bias in the deposition of TiB₂ thin films using high power impulse magnetron sputtering

Nils Nedfors; Oleksiy Vozniy; Johanna Rosen

J. Vac. Sci. Technol. A 36, 031510 (2018) https://doi.org/10.1116/1.5003194

Abstract

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Microstructure, mechanical, and tribological properties of niobium vanadium carbon nitride films

Hongbo Ju; Dian Yu; Junhua Xu; Lihua Yu; Yaoxiang Geng; Ting Gao; Guo Yi; Shunuo Bian

J. Vac. Sci. Technol. A 36, 031511 (2018) https://doi.org/10.1116/1.5020954

Abstract

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Photoremediation of heavy metals from aqueous environments onto ZnO coated fibrous polyethylene terephthalate nonwovens

Wade F. Ingram; Jonathan C. Halbur; Ankesh Madan; Jesse S. Jur

J. Vac. Sci. Technol. A 36, 031512 (2018) https://doi.org/10.1116/1.5016172

Abstract

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In situ infrared spectroscopy during La₂O₃ atomic layer deposition using La(ⁱPrCp)₃ and H₂O

Brent A. Sperling; James E. Maslar; Sergei V. Ivanov

J. Vac. Sci. Technol. A 36, 031513 (2018) https://doi.org/10.1116/1.5026488

Abstract

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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N₂ plasma for gate spacer

Woochool Jang; Hyunjung Kim; Youngkyun Kweon; Chanwon Jung; Haewon Cho; Seokyoon Shin; Hyunjun Kim; Kyungpil Lim; Hyeongtag Jeon; Heewoo Lim

J. Vac. Sci. Technol. A 36, 031514 (2018) https://doi.org/10.1116/1.5024605

Abstract

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Space-resolved plasma diagnostics in a hybrid (Cr,Al)N process

Kirsten Bobzin; Tobias Brögelmann; Nathan C. Kruppe; Martin Engels

J. Vac. Sci. Technol. A 36, 031515 (2018) https://doi.org/10.1116/1.5020151

Abstract

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Electrodeposition of metallic Cu from CuCl gas source transported into ionic liquid in a vacuum

Yosuke Sato; Shingo Maruyama; Yuji Matsumoto

J. Vac. Sci. Technol. A 36, 031516 (2018) https://doi.org/10.1116/1.5019959

Abstract

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Modeling and experimental demonstration of high-throughput flow-through spatial atomic layer deposition of Al₂O₃ coatings on textiles at atmospheric pressure

Moataz Bellah M. Mousa; Jennifer S. Ovental; Alexandra H. Brozena; Christopher J. Oldham; Gregory N. Parsons

J. Vac. Sci. Technol. A 36, 031517 (2018) https://doi.org/10.1116/1.5022077

Abstract

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CHORUS

Growth of yttrium iron garnet on SiO₂

Hadrian Renaldo O. Aquino; Sergei Rouvimov; Alexei Orlov; Wolfgang Porod; Gary H. Bernstein

J. Vac. Sci. Technol. A 36, 031518 (2018) https://doi.org/10.1116/1.5022483

Abstract

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Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnO_x

Siliang Chang; Sriram Vijayan; Mark Aindow; Gregory Jursich; Christos G. Takoudis

J. Vac. Sci. Technol. A 36, 031519 (2018) https://doi.org/10.1116/1.5026696

Abstract

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CHORUS

Vacuum Science and Technology

In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WO_x as hole-selective contacts for Si solar cells

Tian Zhang; Chang-Yeh Lee; Bin Gong; Sean Lim; Stuart Wenham; Bram Hoex

J. Vac. Sci. Technol. A 36, 031601 (2018) https://doi.org/10.1116/1.5020339

Abstract

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Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO₂

Abdullah H. Alshehri; Nathan Nelson-Fitzpatrick; Khaled H. Ibrahim; Kissan Mistry; Mustafa Yavuz; Kevin P. Musselman

J. Vac. Sci. Technol. A 36, 031602 (2018) https://doi.org/10.1116/1.5019170

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Nonevaporable getter coating chambers for extreme high vacuum

Marcy L. Stutzman; Philip A. Adderley; Md Abdullah A. Mamun; Matt Poelker

J. Vac. Sci. Technol. A 36, 031603 (2018) https://doi.org/10.1116/1.5010154

Abstract

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CHORUS

Quantitative measurements of various gases in high and ultrahigh vacuum

Hajime Yoshida; Kenta Arai

J. Vac. Sci. Technol. A 36, 031604 (2018) https://doi.org/10.1116/1.5018210

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Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf₃N₄ atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry

Laurent Lecordier; Sebastiaan Herregods; Silvia Armini

J. Vac. Sci. Technol. A 36, 031605 (2018) https://doi.org/10.1116/1.5025688

Abstract

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Measurement and simulation of rarefied Couette Poiseuille flow with variable cross section

Christopher Huck; Heiko Pleskun; Andreas Brümmer

J. Vac. Sci. Technol. A 36, 031606 (2018) https://doi.org/10.1116/1.5024899

Abstract

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Errata

Errata: “Influence of surface roughness on secondary electron emission from graphite” [J. Vac. Sci. Technol., A 35, 041404 (2017)]

Thomas S. Burton; Tyson C. Back; Steven B. Fairchild; Gregory B. Thompson

J. Vac. Sci. Technol. A 36, 033401 (2018) https://doi.org/10.1116/1.5030547

Extract

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Special Issue: AVS 64

Oxidant K edge x-ray emission spectroscopy of UF₄ and UO₂

In Special Collection: Special Issue: AVS 64

J. G. Tobin; S.-W. Yu; R. Qiao; W. L. Yang; D. K. Shuh

J. Vac. Sci. Technol. A 36, 03E101 (2018) https://doi.org/10.1116/1.5016393

Abstract

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CHORUS

Low temperature growth of amorphous VO₂ films on flexible polyimide substrates with a TiO₂ buffer layer

In Special Collection: Special Issue: AVS 64

Dae Ho Jung; Hyeon Seob So; Jae Seong Ahn; Hosun Lee; Trang Thi Thu Nguyen; Seokhyun Yoon; So Yeun Kim; Haeng-Yoon Jung

J. Vac. Sci. Technol. A 36, 03E102 (2018) https://doi.org/10.1116/1.5019388

Abstract

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Modeling physical vapor deposition of energetic materials

In Special Collection: Special Issue: AVS 64

Koroush Shirvan; Eric C. Forrest

J. Vac. Sci. Technol. A 36, 03E103 (2018) https://doi.org/10.1116/1.5022805

Abstract

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Application of linear least squares to the analysis of Auger electron spectroscopy depth profiles of plutonium oxides

In Special Collection: Special Issue: AVS 64

Scott B. Donald; Jeff A. Stanford; William McLean; Art J. Nelson

J. Vac. Sci. Technol. A 36, 03E104 (2018) https://doi.org/10.1116/1.5021587

Abstract

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CHORUS

Gas modulation refractometry for high-precision assessment of pressure under non-temperature-stabilized conditions

In Special Collection: Special Issue: AVS 64

Isak Silander; Thomas Hausmaninger; Martin Zelan; Ove Axner

J. Vac. Sci. Technol. A 36, 03E105 (2018) https://doi.org/10.1116/1.5022244

Abstract

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Large-aperture alumina ceramics beam pipes with titanium bellows for the rapid cycling synchrotron at Japan Proton Accelerator Research Complex

In Special Collection: Special Issue: AVS 64

Junichiro Kamiya; Michikazu Kinsho; Kazuhiko Abe; Kyusaku Higa; Oji Koizumi

J. Vac. Sci. Technol. A 36, 03E106 (2018) https://doi.org/10.1116/1.5023350

Abstract

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Epitaxial titanium nitride on sapphire: Effects of substrate temperature on microstructure and optical properties

In Special Collection: Special Issue: AVS 64

Hadley A. Smith; Said Elhamri; Kurt G. Eyink; Lawrence Grazulis; Madelyn J. Hill; Tyson C. Back; Augustine M. Urbas; Brandon M. Howe; Amber N. Reed

J. Vac. Sci. Technol. A 36, 03E107 (2018) https://doi.org/10.1116/1.5022068

Abstract

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Impact of plasma jet geometry on residence times of radical species

In Special Collection: Special Issue: AVS 64

James Lalor; Laurence Scally; Patrick J. Cullen; Vladimir Milosavljević

J. Vac. Sci. Technol. A 36, 03E108 (2018) https://doi.org/10.1116/1.5022294

Abstract

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Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties

In Special Collection: Special Issue: AVS 64

Guillaume Le Dain; Ahmed Rhallabi; Christophe Cardinaud; Aurélie Girard; Marie-Claude Fernandez; Mohamed Boufnichel; Fabrice Roqueta

J. Vac. Sci. Technol. A 36, 03E109 (2018) https://doi.org/10.1116/1.5023590

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Issues

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Letters

Review Articles

Interfaces

Photovoltaics and Energy

Plasma Science and Technology

Surfaces

Thin Films

Vacuum Science and Technology

Errata

Special Issue: AVS 64

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