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Review Article: Catalysts design and synthesis via selective atomic layer deposition
Tailoring nanopore formation in atomic layer deposited ultrathin films
Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3
Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
Plasma enhanced atomic layer deposition of aluminum sulfide thin films
Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor
Atomic layer deposition of molybdenum disulfide films using MoF6 and H2S
Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
Review Articles
Review Article: Catalysts design and synthesis via selective atomic layer deposition
J. Vac. Sci. Technol. A 36, 010801 (2018)
https://doi.org/10.1116/1.5000587
Special Issue on Atomic Layer Deposition (ALD)
Thermal study of an indium trisguanidinate as a possible indium nitride precursor
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A101 (2018)
https://doi.org/10.1116/1.5002634
Atomic layer deposition of Ti-Nb-O thin films onto electrospun fibers for fibrous and tubular catalyst support structures
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A102 (2018)
https://doi.org/10.1116/1.4999826
Tailoring nanopore formation in atomic layer deposited ultrathin films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A103 (2018)
https://doi.org/10.1116/1.5003360
Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A104 (2018)
https://doi.org/10.1116/1.5002667
Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A105 (2018)
https://doi.org/10.1116/1.5003361
Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A106 (2018)
https://doi.org/10.1116/1.5002716
Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A107 (2018)
https://doi.org/10.1116/1.5003421
Comparison on atomic/molecular layer deposition grown aluminum alkoxide polymer films using alkane and alkyne organic precursors
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A108 (2018)
https://doi.org/10.1116/1.4990776
Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A109 (2018)
https://doi.org/10.1116/1.5003334
Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A110 (2018)
https://doi.org/10.1116/1.4998920
Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A111 (2018)
https://doi.org/10.1116/1.5003403
Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A112 (2018)
https://doi.org/10.1116/1.5006781
Plasma enhanced atomic layer deposition of aluminum sulfide thin films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A113 (2018)
https://doi.org/10.1116/1.5003339
Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A114 (2018)
https://doi.org/10.1116/1.5003356
Grazing-incidence small angle x-ray scattering, x-ray reflectivity, and atomic force microscopy: A combined approach to assess atomic-layer-deposited Al2O3 dielectric films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A115 (2018)
https://doi.org/10.1116/1.5003422
Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A116 (2018)
https://doi.org/10.1116/1.4999561
Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A117 (2018)
https://doi.org/10.1116/1.5004041
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A118 (2018)
https://doi.org/10.1116/1.5006696
Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A119 (2018)
https://doi.org/10.1116/1.5003388
Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al2O3/p-Ge MOS structures
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A120 (2018)
https://doi.org/10.1116/1.5003375
Growth behavior and structural analysis of atomic layer deposited SnxTi1−xOy films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A121 (2018)
https://doi.org/10.1116/1.5004993
Tribological properties of thin films made by atomic layer deposition sliding against silicon
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A122 (2018)
https://doi.org/10.1116/1.5003729
Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A123 (2018)
https://doi.org/10.1116/1.5006670
Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A124 (2018)
https://doi.org/10.1116/1.5003412
Atomic layer deposition of molybdenum disulfide films using MoF6 and H2S
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A125 (2018)
https://doi.org/10.1116/1.5003423
Atomically dispersed vanadium oxides on multiwalled carbon nanotubes via atomic layer deposition: A multiparameter optimization
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A126 (2018)
https://doi.org/10.1116/1.5006783
Investigation of the influence of oxygen plasma on supported silver nanoparticles
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01B101 (2018)
https://doi.org/10.1116/1.4986208
Patterned films by atomic layer deposition using Parafilm as a mask
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01B102 (2018)
https://doi.org/10.1116/1.5001033
Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01B103 (2018)
https://doi.org/10.1116/1.4986202
Special Issue on Atomic Layer Etching (ALE)
Thermal adsorption-enhanced atomic layer etching of Si3N4
In Special Collection:
2018 Special Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 36, 01B104 (2018)
https://doi.org/10.1116/1.5003271
Applying sputtering theory to directional atomic layer etching
In Special Collection:
2018 Special Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 36, 01B105 (2018)
https://doi.org/10.1116/1.5003393
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
In Special Collection:
2018 Special Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 36, 01B106 (2018)
https://doi.org/10.1116/1.5003417
