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Review Articles
Review Article: Catalysts design and synthesis via selective atomic layer deposition
J. Vac. Sci. Technol. A 36, 010801 (2018)
https://doi.org/10.1116/1.5000587
Special Issue on Atomic Layer Deposition (ALD)
Thermal study of an indium trisguanidinate as a possible indium nitride precursor
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A101 (2018)
https://doi.org/10.1116/1.5002634
Atomic layer deposition of Ti-Nb-O thin films onto electrospun fibers for fibrous and tubular catalyst support structures
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A102 (2018)
https://doi.org/10.1116/1.4999826
Tailoring nanopore formation in atomic layer deposited ultrathin films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A103 (2018)
https://doi.org/10.1116/1.5003360
Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A104 (2018)
https://doi.org/10.1116/1.5002667
Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A105 (2018)
https://doi.org/10.1116/1.5003361
Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A106 (2018)
https://doi.org/10.1116/1.5002716
Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A107 (2018)
https://doi.org/10.1116/1.5003421
Comparison on atomic/molecular layer deposition grown aluminum alkoxide polymer films using alkane and alkyne organic precursors
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A108 (2018)
https://doi.org/10.1116/1.4990776
Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A109 (2018)
https://doi.org/10.1116/1.5003334
Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A110 (2018)
https://doi.org/10.1116/1.4998920
Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A111 (2018)
https://doi.org/10.1116/1.5003403
Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A112 (2018)
https://doi.org/10.1116/1.5006781
Plasma enhanced atomic layer deposition of aluminum sulfide thin films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A113 (2018)
https://doi.org/10.1116/1.5003339
Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A114 (2018)
https://doi.org/10.1116/1.5003356
Grazing-incidence small angle x-ray scattering, x-ray reflectivity, and atomic force microscopy: A combined approach to assess atomic-layer-deposited Al2O3 dielectric films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A115 (2018)
https://doi.org/10.1116/1.5003422
Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A116 (2018)
https://doi.org/10.1116/1.4999561
Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A117 (2018)
https://doi.org/10.1116/1.5004041
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A118 (2018)
https://doi.org/10.1116/1.5006696
Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A119 (2018)
https://doi.org/10.1116/1.5003388
Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al2O3/p-Ge MOS structures
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A120 (2018)
https://doi.org/10.1116/1.5003375
Growth behavior and structural analysis of atomic layer deposited SnxTi1−xOy films
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A121 (2018)
https://doi.org/10.1116/1.5004993
Tribological properties of thin films made by atomic layer deposition sliding against silicon
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A122 (2018)
https://doi.org/10.1116/1.5003729
Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A123 (2018)
https://doi.org/10.1116/1.5006670
Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A124 (2018)
https://doi.org/10.1116/1.5003412
Atomic layer deposition of molybdenum disulfide films using MoF6 and H2S
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A125 (2018)
https://doi.org/10.1116/1.5003423
Atomically dispersed vanadium oxides on multiwalled carbon nanotubes via atomic layer deposition: A multiparameter optimization
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01A126 (2018)
https://doi.org/10.1116/1.5006783
Investigation of the influence of oxygen plasma on supported silver nanoparticles
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01B101 (2018)
https://doi.org/10.1116/1.4986208
Patterned films by atomic layer deposition using Parafilm as a mask
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01B102 (2018)
https://doi.org/10.1116/1.5001033
Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
In Special Collection:
2018 Special Collection on Atomic Layer Deposition (ALD)
J. Vac. Sci. Technol. A 36, 01B103 (2018)
https://doi.org/10.1116/1.4986202
Special Issue on Atomic Layer Etching (ALE)
Thermal adsorption-enhanced atomic layer etching of Si3N4
In Special Collection:
2018 Special Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 36, 01B104 (2018)
https://doi.org/10.1116/1.5003271
Applying sputtering theory to directional atomic layer etching
In Special Collection:
2018 Special Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 36, 01B105 (2018)
https://doi.org/10.1116/1.5003393
Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning
In Special Collection:
2018 Special Collection on Atomic Layer Etching (ALE)
J. Vac. Sci. Technol. A 36, 01B106 (2018)
https://doi.org/10.1116/1.5003417