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Vapor deposition of copper(I) bromide films via a two-step conversion process
Room temperature atomic layer deposition of TiO2 on gold nanoparticles
Room temperature TiO2 atomic layer deposition on collagen membrane from a titanium alkylamide precursor
Issues
January 2017
ISSN 0734-2101
EISSN 1520-8559
Review Article
Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
Esko Ahvenniemi; Andrew R. Akbashev; Saima Ali; Mikhael Bechelany; Maria Berdova; Stefan Boyadjiev; David C. Cameron; Rong Chen; Mikhail Chubarov; Veronique Cremers; Anjana Devi; Viktor Drozd; Liliya Elnikova; Gloria Gottardi; Kestutis Grigoras; Dennis M. Hausmann; Cheol Seong Hwang; Shih-Hui Jen; Tanja Kallio; Jaana Kanervo; Ivan Khmelnitskiy; Do Han Kim; Lev Klibanov; Yury Koshtyal; A. Outi I. Krause; Jakob Kuhs; Irina Kärkkänen; Marja-Leena Kääriäinen; Tommi Kääriäinen; Luca Lamagna; Adam A. Łapicki; Markku Leskelä; Harri Lipsanen; Jussi Lyytinen; Anatoly Malkov; Anatoly Malygin; Abdelkader Mennad; Christian Militzer; Jyrki Molarius; Małgorzata Norek; Çağla Özgit-Akgün; Mikhail Panov; Henrik Pedersen; Fabien Piallat; Georgi Popov; Riikka L. Puurunen; Geert Rampelberg; Robin H. A. Ras; Erwan Rauwel; Fred Roozeboom; Timo Sajavaara; Hossein Salami; Hele Savin; Nathanaelle Schneider; Thomas E. Seidel; Jonas Sundqvist; Dmitry B. Suyatin; Tobias Törndahl; J. Ruud van Ommen; Claudia Wiemer; Oili M. E. Ylivaara; Oksana Yurkevich
J. Vac. Sci. Technol. A 35, 010801 (2017)
https://doi.org/10.1116/1.4971389
Special Issue on Atomic Layer Deposition (ALD)
Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
Hwanwoo Kim; Hyoseok Song; Changhee Shin; Kangsoo Kim; Woochool Jang; Hyunjung Kim; Seokyoon Shin; Hyeongtag Jeon
J. Vac. Sci. Technol. A 35, 01A101 (2017)
https://doi.org/10.1116/1.4964889
Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions
J. Vac. Sci. Technol. A 35, 01B101 (2017)
https://doi.org/10.1116/1.4963368
Mechanistic modeling study of atomic layer deposition process optimization in a fluidized bed reactor
J. Vac. Sci. Technol. A 35, 01B102 (2017)
https://doi.org/10.1116/1.4964848
Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors
J. Vac. Sci. Technol. A 35, 01B103 (2017)
https://doi.org/10.1116/1.4964890
Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
J. Vac. Sci. Technol. A 35, 01B104 (2017)
https://doi.org/10.1116/1.4965966
Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties
Oili M. E. Ylivaara; Lauri Kilpi; Xuwen Liu; Sakari Sintonen; Saima Ali; Mikko Laitinen; Jaakko Julin; Eero Haimi; Timo Sajavaara; Harri Lipsanen; Simo-Pekka Hannula; Helena Ronkainen; Riikka L. Puurunen
J. Vac. Sci. Technol. A 35, 01B105 (2017)
https://doi.org/10.1116/1.4966198
Tunable optical properties in atomic layer deposition grown ZnO thin films
Dipayan Pal; Aakash Mathur; Ajaib Singh; Jaya Singhal; Amartya Sengupta; Surjendu Dutta; Stefan Zollner; Sudeshna Chattopadhyay
J. Vac. Sci. Technol. A 35, 01B108 (2017)
https://doi.org/10.1116/1.4967296
Vapor deposition of copper(I) bromide films via a two-step conversion process
J. Vac. Sci. Technol. A 35, 01B109 (2017)
https://doi.org/10.1116/1.4967726
Plasma enhanced atomic layer deposition of zinc sulfide thin films
J. Vac. Sci. Technol. A 35, 01B111 (2017)
https://doi.org/10.1116/1.4967724
Potential gold(I) precursors evaluated for atomic layer deposition
Maarit Mäkelä; Timo Hatanpää; Mikko Ritala; Markku Leskelä; Kenichiro Mizohata; Kristoffer Meinander; Jyrki Räisänen
J. Vac. Sci. Technol. A 35, 01B112 (2017)
https://doi.org/10.1116/1.4968193
Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes—An alternative initial step
J. Vac. Sci. Technol. A 35, 01B113 (2017)
https://doi.org/10.1116/1.4968196
As2S3 thin films deposited by atomic layer deposition
Elina Färm; Mikko J. Heikkilä; Marko Vehkamäki; Kenichiro Mizohata; Mikko Ritala; Markku Leskelä; Marianna Kemell
J. Vac. Sci. Technol. A 35, 01B114 (2017)
https://doi.org/10.1116/1.4968202
Simulation of atomic layer deposition on nanoparticle agglomerates
J. Vac. Sci. Technol. A 35, 01B116 (2017)
https://doi.org/10.1116/1.4968548
Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
Sebastian Franke; Matthias Baumkötter; Carsten Monka; Sebastian Raabe; Reinhard Caspary; Hans-Hermann Johannes; Wolfgang Kowalsky; Sebastian Beck; Annemarie Pucci; Hassan Gargouri
J. Vac. Sci. Technol. A 35, 01B117 (2017)
https://doi.org/10.1116/1.4971173
Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures
Matthias C. Schwille; Timo Schössler; Jonas Barth; Martin Knaut; Florian Schön; Arnim Höchst; Martin Oettel; Johann W. Bartha
J. Vac. Sci. Technol. A 35, 01B118 (2017)
https://doi.org/10.1116/1.4971196
Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition
J. Vac. Sci. Technol. A 35, 01B119 (2017)
https://doi.org/10.1116/1.4971197
Fabrication of nanopower generators using thin atomic layer deposited films
J. Vac. Sci. Technol. A 35, 01B120 (2017)
https://doi.org/10.1116/1.4971403
Room temperature atomic layer deposition of TiO2 on gold nanoparticles
J. Vac. Sci. Technol. A 35, 01B121 (2017)
https://doi.org/10.1116/1.4971398
Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
J. Vac. Sci. Technol. A 35, 01B122 (2017)
https://doi.org/10.1116/1.4971399
Atomic layer deposited single-crystal hexagonal perovskite YAlO3 epitaxially on GaAs(111)A
Lawrence Boyu Young; Chao-Kai Cheng; Guan-Jie Lu; Keng-Yung Lin; Yen-Hsun Lin; Hsien-Wen Wan; Mei-Yi Li; Ren-Fong Cai; Shen-Chuan Lo; Chia-Hung Hsu; Jueinai Kwo; Minghwei Hong
J. Vac. Sci. Technol. A 35, 01B123 (2017)
https://doi.org/10.1116/1.4971989
Activation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces
Bo Chen; Yichen Duan; Yunxi Yao; Qiang Ma; Jason P. Coyle; Seán T. Barry; Andrew V. Teplyakov; Francisco Zaera
J. Vac. Sci. Technol. A 35, 01B124 (2017)
https://doi.org/10.1116/1.4971990
Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
J. Vac. Sci. Technol. A 35, 01B125 (2017)
https://doi.org/10.1116/1.4971991
Microstructure-dependent thermoelectric properties of polycrystalline InGaO3(ZnO)2 superlattice films
J. Vac. Sci. Technol. A 35, 01B126 (2017)
https://doi.org/10.1116/1.4972207
Deposition temperature dependence and long-term stability of the conductivity of undoped ZnO grown by atomic layer deposition
J. Vac. Sci. Technol. A 35, 01B127 (2017)
https://doi.org/10.1116/1.4972466
Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
J. Vac. Sci. Technol. A 35, 01B128 (2017)
https://doi.org/10.1116/1.4972469
Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
J. Vac. Sci. Technol. A 35, 01B129 (2017)
https://doi.org/10.1116/1.4972208
Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
J. Vac. Sci. Technol. A 35, 01B130 (2017)
https://doi.org/10.1116/1.4972210
Low-temperature-atomic-layer-deposition of SiO2 using various organic precursors
J. Vac. Sci. Technol. A 35, 01B131 (2017)
https://doi.org/10.1116/1.4972211
Enhanced process and composition control for atomic layer deposition with lithium trimethylsilanolate
J. Vac. Sci. Technol. A 35, 01B133 (2017)
https://doi.org/10.1116/1.4972209
Room temperature TiO2 atomic layer deposition on collagen membrane from a titanium alkylamide precursor
J. Vac. Sci. Technol. A 35, 01B134 (2017)
https://doi.org/10.1116/1.4972245
In-gap states in titanium dioxide and oxynitride atomic layer deposited films
Karsten Henkel; Chittaranjan Das; Małgorzata Kot; Dieter Schmeißer; Franziska Naumann; Irina Kärkkänen; Hassan Gargouri
J. Vac. Sci. Technol. A 35, 01B135 (2017)
https://doi.org/10.1116/1.4972247
Molecular layer deposition using cyclic azasilanes, maleic anhydride, trimethylaluminum, and water
J. Vac. Sci. Technol. A 35, 01B136 (2017)
https://doi.org/10.1116/1.4972418
Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
Denis V. Nazarov; Maxim Yu. Maximov; Pavel A. Novikov; Anatoly A. Popovich; Aleksey O. Silin; Vladimir M. Smirnov; Natalia P. Bobrysheva; Olga M. Osmolovskaya; Michail G. Osmolovsky; Aleksandr M. Rumyantsev
J. Vac. Sci. Technol. A 35, 01B137 (2017)
https://doi.org/10.1116/1.4972554
Atomic layer deposition of h-BN(0001) on RuO2(110)/Ru(0001)
Jessica Jones; Brock Beauclair; Opeyemi Olanipekun; Sherard Lightbourne; Mofei Zhang; Brittany Pollok; Aparna Pilli; Jeffry Kelber
J. Vac. Sci. Technol. A 35, 01B139 (2017)
https://doi.org/10.1116/1.4972784
Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
J. Vac. Sci. Technol. A 35, 01B141 (2017)
https://doi.org/10.1116/1.4972776
Growth of aluminum oxide on silicon carbide with an atomically sharp interface
J. Vac. Sci. Technol. A 35, 01B142 (2017)
https://doi.org/10.1116/1.4972774
Plasma-enhanced atomic layer deposition of superconducting niobium nitride
Mark J. Sowa; Yonas Yemane; Jinsong Zhang; Johanna C. Palmstrom; Ling Ju; Nicholas C. Strandwitz; Fritz B. Prinz; J. Provine
J. Vac. Sci. Technol. A 35, 01B143 (2017)
https://doi.org/10.1116/1.4972858
Stress modulation of titanium nitride thin films deposited using atomic layer deposition
J. Vac. Sci. Technol. A 35, 01B144 (2017)
https://doi.org/10.1116/1.4972859
Special Issue on Atomic Layer Etching (ALE)
Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision
J. Vac. Sci. Technol. A 35, 01A104 (2017)
https://doi.org/10.1116/1.4971416
What more can be done with XPS? Highly informative but underused approaches to XPS data collection and analysis
Donald R. Baer, Merve Taner Camci, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)
George H. Major, Joshua W. Pinder, et al.