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Structure and optical band gaps of (Ba,Sr)SnO₃ films grown by molecular beam epitaxy

Timo Schumann; Santosh Raghavan; Kaveh Ahadi; Honggyu Kim; Susanne Stemmer

J. Vac. Sci. Technol. A 34, 050601 (2016) https://doi.org/10.1116/1.4959004

Abstract

View articletitled, Structure and optical band gaps of (Ba,Sr)SnO3 films grown by molecular beam epitaxy

Supplementary Material

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CHORUS

Narrow thermal hysteresis of NiTi shape memory alloy thin films with submicrometer thickness

Huilong Hou; Reginald F. Hamilton; Mark W. Horn

J. Vac. Sci. Technol. A 34, 050602 (2016) https://doi.org/10.1116/1.4959567

Abstract

View articletitled, Narrow thermal hysteresis of NiTi shape memory alloy thin films with submicrometer thickness

Supplementary Material

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CHORUS

Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)₂ reactions and enhancement by H₂ and Ar plasmas

Nicholas R. Johnson; Huaxing Sun; Kashish Sharma; Steven M. George

J. Vac. Sci. Technol. A 34, 050603 (2016) https://doi.org/10.1116/1.4959779

Abstract

View articletitled, Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas

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CHORUS

New leak assembly based on fluidic nanochannels

Aiqing Zhu; Yongheng Zhao; Xudi Wang; Yu Wang; Wei Wei; Keqiang Qiu; Dong Dong

J. Vac. Sci. Technol. A 34, 050604 (2016) https://doi.org/10.1116/1.4960646

Abstract

View articletitled, New leak assembly based on fluidic nanochannels

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Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition

Triratna Muneshwar; Gem Shoute; Doug Barlage; Ken Cadien

J. Vac. Sci. Technol. A 34, 050605 (2016) https://doi.org/10.1116/1.4961885

Abstract

View articletitled, Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition

Supplementary Material

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Growth and characterization of epitaxial Zr(0001) thin films on Al₂O₃(0001)

Joshua Fankhauser; Masaki Sato; Dian Yu; Abbas Ebnonnasir; Makoto Kobashi; Mark S. Goorsky; Suneel Kodambaka

J. Vac. Sci. Technol. A 34, 050606 (2016) https://doi.org/10.1116/1.4961452

Abstract

View articletitled, Growth and characterization of epitaxial Zr(0001) thin films on Al2O3(0001)

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Photovoltaics and Energy

Laser ablation compatible substoichiometric SiO_x/SiN_y passivating rear side mirror for passivated emitter and rear thin-film crystalline silicon solar cells

Félix Gérenton; Fabien Mandorlo; Erwann Fourmond; Marine Le Coz; Danièle Blanc-Pélissier; Mustapha Lemiti

J. Vac. Sci. Technol. A 34, 051201 (2016) https://doi.org/10.1116/1.4958985

Abstract

View articletitled, Laser ablation compatible substoichiometric SiOx/SiNy passivating rear side mirror for passivated emitter and rear thin-film crystalline silicon solar cells

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Effect of the cadmium chloride treatment on RF sputtered Cd_0.6Zn_0.4Te films for application in multijunction solar cells

Tushar M. Shimpi; Jason M. Kephart; Drew E. Swanson; Amit H. Munshi; Walajabad S. Sampath; A. Abbas; John M. Walls

J. Vac. Sci. Technol. A 34, 051202 (2016) https://doi.org/10.1116/1.4960979

Abstract

View articletitled, Effect of the cadmium chloride treatment on RF sputtered Cd0.6Zn0.4Te films for application in multijunction solar cells

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CHORUS

RBS-channeling study of radiation damage in Ar⁺ implanted CuInSe₂ crystals

Michael V. Yakushev; Vladimir A. Volkov; Niyazi N. Mursakulov; Chimnaz E. Sabzaliyeva; Robert W. Martin

J. Vac. Sci. Technol. A 34, 051203 (2016) https://doi.org/10.1116/1.4961882

Abstract

View articletitled, RBS-channeling study of radiation damage in Ar+ implanted CuInSe2 crystals

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Intense pulsed light annealing of copper zinc tin sulfide nanocrystal coatings

Bryce A. Williams; Michelle A. Smeaton; Collin S. Holgate; Nancy D. Trejo; Lorraine F. Francis; Eray S. Aydil

J. Vac. Sci. Technol. A 34, 051204 (2016) https://doi.org/10.1116/1.4961661

Abstract

View articletitled, Intense pulsed light annealing of copper zinc tin sulfide nanocrystal coatings

Supplementary Material

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Plasma Science and Technology

Measurement of atmospheric pressure microplasma jet with Langmuir probes

Kunning G. Xu; Steven J. Doyle

J. Vac. Sci. Technol. A 34, 051301 (2016) https://doi.org/10.1116/1.4959565

Abstract

View articletitled, Measurement of atmospheric pressure microplasma jet with Langmuir probes

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Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge

Nishant Sirse; Anurag Mishra; Geun Y. Yeom; Albert R. Ellingboe

J. Vac. Sci. Technol. A 34, 051302 (2016) https://doi.org/10.1116/1.4959844

Abstract

View articletitled, Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge

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Surfaces

Bi induced superstructures on Si(110)

Artoni Kevin R. Ang; Sakura Nishino Takeda; Hiroshi Daimon

J. Vac. Sci. Technol. A 34, 051401 (2016) https://doi.org/10.1116/1.4958803

Abstract

View articletitled, Bi induced superstructures on Si(110)

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In silico simulations of tunneling barrier measurements for molecular orbital-mediated junctions: A molecular orbital theory approach to scanning tunneling microscopy

Raymond J. Terryn, III; Krishnan Sriraman; Joel A. Olson; J. Clayton Baum; Mark J. Novak

J. Vac. Sci. Technol. A 34, 051402 (2016) https://doi.org/10.1116/1.4959826

Abstract

View articletitled, In silico simulations of tunneling barrier measurements for molecular orbital-mediated junctions: A molecular orbital theory approach to scanning tunneling microscopy

Supplementary Material

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CHORUS

Vapor deposition of molybdenum oxide using bis(ethylbenzene) molybdenum and water

Tasha L. Drake; Peter C. Stair

J. Vac. Sci. Technol. A 34, 051403 (2016) https://doi.org/10.1116/1.4959532

Abstract

View articletitled, Vapor deposition of molybdenum oxide using bis(ethylbenzene) molybdenum and water

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CHORUS

Order-of-magnitude differences in retention of low-energy Ar implanted in Si and SiO₂

Klaus Wittmaack; Andrew Giordani; Rachel Umbel; Jerry L. Hunter, Jr.

J. Vac. Sci. Technol. A 34, 051404 (2016) https://doi.org/10.1116/1.4961574

Abstract

View articletitled, Order-of-magnitude differences in retention of low-energy Ar implanted in Si and SiO2

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Thin Films

Structural and strain anisotropies of N-polar GaN epilayers on offcut sapphire substrates

Chengguo Li; Hongli Wang; Hongfei Liu; Soo Jin Chua

J. Vac. Sci. Technol. A 34, 051501 (2016) https://doi.org/10.1116/1.4955275

Abstract

View articletitled, Structural and strain anisotropies of N-polar GaN epilayers on offcut sapphire substrates

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Spatial atomic layer deposition of ZnO/TiO₂ nanolaminates

Rong Chen; Ji-Long Lin; Wen-Jie He; Chen-Long Duan; Qi Peng; Xiao-Lei Wang; Bin Shan

J. Vac. Sci. Technol. A 34, 051502 (2016) https://doi.org/10.1116/1.4955289

Abstract

View articletitled, Spatial atomic layer deposition of ZnO/TiO2 nanolaminates

Supplementary Material

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Structural and electronic properties of InN epitaxial layer grown on c-plane sapphire by chemical vapor deposition technique

Barun Kumar Barick; Nivedita Prasad; Rajendra Kumar Saroj; Subhabrata Dhar

J. Vac. Sci. Technol. A 34, 051503 (2016) https://doi.org/10.1116/1.4955270

Abstract

View articletitled, Structural and electronic properties of InN epitaxial layer grown on c-plane sapphire by chemical vapor deposition technique

Supplementary Material

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Growth and coalescence control of inclined c-axis polar and semipolar GaN multilayer structures grown on Si(111), Si(112), and Si(115) by metalorganic vapor phase epitaxy

Tomasz Szymański; Mateusz Wośko; Bartłomiej Paszkiewicz; Bogdan Paszkiewicz; Regina Paszkiewicz; Iwona Sankowska

J. Vac. Sci. Technol. A 34, 051504 (2016) https://doi.org/10.1116/1.4958805

Abstract

View articletitled, Growth and coalescence control of inclined c-axis polar and semipolar GaN multilayer structures grown on Si(111), Si(112), and Si(115) by metalorganic vapor phase epitaxy

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Efficiencies of Eu³⁺ ions and hydrogen atoms as donors in ZnO thin films

Housei Akazawa

J. Vac. Sci. Technol. A 34, 051505 (2016) https://doi.org/10.1116/1.4959543

Abstract

View articletitled, Efficiencies of Eu3+ ions and hydrogen atoms as donors in ZnO thin films

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Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering

Felipe Cemin; Daniel Lundin; Davide Cammilleri; Thomas Maroutian; Philippe Lecoeur; Tiberiu Minea

J. Vac. Sci. Technol. A 34, 051506 (2016) https://doi.org/10.1116/1.4959555

Abstract

View articletitled, Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering

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Optical constants, band gap, and infrared-active phonons of (LaAlO₃)_0.3(Sr₂AlTaO₆)_0.35 (LSAT) from spectroscopic ellipsometry

Timothy Nathan Nunley; Travis I. Willett-Gies; Jacqueline A. Cooke; Felicia S. Manciu; Premysl Marsik; Christian Bernhard; Stefan Zollner

J. Vac. Sci. Technol. A 34, 051507 (2016) https://doi.org/10.1116/1.4960356

Abstract

View articletitled, Optical constants, band gap, and infrared-active phonons of (LaAlO3)0.3(Sr2AlTaO6)0.35 (LSAT) from spectroscopic ellipsometry

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Investigation of TiN thin film oxidation depending on the substrate temperature at vacuum break

Fabien Piallat; Remy Gassilloud; Pierre Caubet; Christophe Vallée

J. Vac. Sci. Technol. A 34, 051508 (2016) https://doi.org/10.1116/1.4960648

Abstract

View articletitled, Investigation of TiN thin film oxidation depending on the substrate temperature at vacuum break

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Characteristics of LaB₆ thin films grown by pulsed laser deposition

Valentin Craciun; Daniel Cristea; Gabriel Socol; Eric Lambers; Roxana Trusca; Steven Fairchild; Tyson Back; Greggory Gruen; Doina Craciun

J. Vac. Sci. Technol. A 34, 051509 (2016) https://doi.org/10.1116/1.4960647

Abstract

View articletitled, Characteristics of LaB6 thin films grown by pulsed laser deposition

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Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

Maria Berdova; Xuwen Liu; Claudia Wiemer; Alessio Lamperti; Grazia Tallarida; Elena Cianci; Marco Fanciulli; Sami Franssila

J. Vac. Sci. Technol. A 34, 051510 (2016) https://doi.org/10.1116/1.4961113

Abstract

View articletitled, Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

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Sputtered carbon as a corrosion barrier for x-ray detector windows

Joseph Rowley; Lei Pei; Robert C. Davis; Richard R. Vanfleet; Steven Liddiard; Mallorie Harker; Jonathan Abbott

J. Vac. Sci. Technol. A 34, 051511 (2016) https://doi.org/10.1116/1.4961451

Abstract

View articletitled, Sputtered carbon as a corrosion barrier for x-ray detector windows

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Structure and stoichiometry evolution of sputtered Nb doped TiO₂ films induced by O₂ pressure variation during postannealing process

Letao Zhang; Xiang Xiao; Xiaoliang Zhou; Hongyu He; Xin Xu; Qingping Lin; Hang Zhou; Shengdong Zhang; Hongyuan Zhang; Qiong Liu

J. Vac. Sci. Technol. A 34, 051512 (2016) https://doi.org/10.1116/1.4961538

Abstract

View articletitled, Structure and stoichiometry evolution of sputtered Nb doped TiO2 films induced by O2 pressure variation during postannealing process

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Substrates with high hardness and high transparency

Jong-Hong Lu; Ting-Wei Huang; Chih-Yuan Cheng; Jyh-Wei Lee; Chia-Wen Chang

J. Vac. Sci. Technol. A 34, 051513 (2016) https://doi.org/10.1116/1.4961570

Abstract

View articletitled, Substrates with high hardness and high transparency

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Conduction and rectification in NbO_x- and NiO-based metal-insulator-metal diodes

Richard M. Osgood, III; Stephen Giardini; Joel Carlson; Prakash Periasamy; Harvey Guthrey; Ryan O'Hayre; Matthew Chin; Barbara Nichols; Madan Dubey; Gustavo Fernandes; Jin Ho Kim; Jimmy Xu; Philip Parilla; Joseph Berry; David Ginley

J. Vac. Sci. Technol. A 34, 051514 (2016) https://doi.org/10.1116/1.4960962

Abstract

View articletitled, Conduction and rectification in NbOx- and NiO-based metal-insulator-metal diodes

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Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone

Joseph P. Klesko; James A. Bellow; Mark J. Saly; Charles H. Winter; Jaakko Julin; Timo Sajavaara

J. Vac. Sci. Technol. A 34, 051515 (2016) https://doi.org/10.1116/1.4961385

Abstract

View articletitled, Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone

Supplementary Material

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CHORUS

Plasma-enhanced atomic layer deposition of tungsten nitride

Mark J. Sowa; Yonas Yemane; Fritz B. Prinz; J Provine

J. Vac. Sci. Technol. A 34, 051516 (2016) https://doi.org/10.1116/1.4961567

Abstract

View articletitled, Plasma-enhanced atomic layer deposition of tungsten nitride

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Characterization of thin film deposits on tungsten filaments in catalytic chemical vapor deposition using 1,1-dimethylsilacyclobutane

Yujun Shi; Ling Tong; Suresh Mulmi

J. Vac. Sci. Technol. A 34, 051517 (2016) https://doi.org/10.1116/1.4961932

Abstract

View articletitled, Characterization of thin film deposits on tungsten filaments in catalytic chemical vapor deposition using 1,1-dimethylsilacyclobutane

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Iron CVD from iron pentacarbonyl: Growth inhibition by CO dissociation and use of ammonia to restore constant growth

Pengyi Zhang; Elham Mohimi; Tushar K. Talukdar; John R. Abelson; Gregory S. Girolami

J. Vac. Sci. Technol. A 34, 051518 (2016) https://doi.org/10.1116/1.4961942

Abstract

View articletitled, Iron CVD from iron pentacarbonyl: Growth inhibition by CO dissociation and use of ammonia to restore constant growth

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CHORUS

Vacuum Science and Technology

Low-cost, high-performance nonevaporable getter pumps using nonevaporable getter pills

Hiraku Kodama; Shinya Ohno; Masatoshi Tanaka; Masato Tanaka; Koji K. Okudaira; Kazuhiko Mase; Takashi Kikuchi

J. Vac. Sci. Technol. A 34, 051601 (2016) https://doi.org/10.1116/1.4961050

Abstract

View articletitled, Low-cost, high-performance nonevaporable getter pumps using nonevaporable getter pills

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