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Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles
Review Articles
Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles
J. Vac. Sci. Technol. A 34, 010801 (2016)
https://doi.org/10.1116/1.4938104
Atomic Layer Deposition (ALD)
Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS
J. Vac. Sci. Technol. A 34, 01A101 (2016)
https://doi.org/10.1116/1.4927843
Comparison of B2O3 and BN deposited by atomic layer deposition for forming ultrashallow dopant regions by solid state diffusion
J. Vac. Sci. Technol. A 34, 01A102 (2016)
https://doi.org/10.1116/1.4928705
Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
J. Vac. Sci. Technol. A 34, 01A103 (2016)
https://doi.org/10.1116/1.4930161
Dynamic order reduction of thin-film deposition kinetics models: A reaction factorization approach
J. Vac. Sci. Technol. A 34, 01A104 (2016)
https://doi.org/10.1116/1.4930591
Diffusion and interface evolution during the atomic layer deposition of TiO2 on GaAs(100) and InAs(100) surfaces
J. Vac. Sci. Technol. A 34, 01A105 (2016)
https://doi.org/10.1116/1.4931568
Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film
J. Vac. Sci. Technol. A 34, 01A106 (2016)
https://doi.org/10.1116/1.4931723
Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers
J. Vac. Sci. Technol. A 34, 01A107 (2016)
https://doi.org/10.1116/1.4931722
Mechanistic modeling study on process optimization and precursor utilization with atmospheric spatial atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A108 (2016)
https://doi.org/10.1116/1.4932564
Low-temperature atomic layer deposition of copper(II) oxide thin films
J. Vac. Sci. Technol. A 34, 01A109 (2016)
https://doi.org/10.1116/1.4933089
Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy
J. Vac. Sci. Technol. A 34, 01A111 (2016)
https://doi.org/10.1116/1.4933088
Morphology, composition and electrical properties of SnO2:Cl thin films grown by atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A112 (2016)
https://doi.org/10.1116/1.4933328
Blistering during the atomic layer deposition of iridium
J. Vac. Sci. Technol. A 34, 01A113 (2016)
https://doi.org/10.1116/1.4934753
Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A114 (2016)
https://doi.org/10.1116/1.4935337
Atomic layer deposited cobalt oxide: An efficient catalyst for NaBH4 hydrolysis
J. Vac. Sci. Technol. A 34, 01A115 (2016)
https://doi.org/10.1116/1.4935353
Novel copper compounds for vapor deposition: Characterization and thermolysis
J. Vac. Sci. Technol. A 34, 01A116 (2016)
https://doi.org/10.1116/1.4935447
Spectroscopic investigation of the electronic structure of thin atomic layer deposition HfO2 films
J. Vac. Sci. Technol. A 34, 01A117 (2016)
https://doi.org/10.1116/1.4935338
Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
J. Vac. Sci. Technol. A 34, 01A118 (2016)
https://doi.org/10.1116/1.4935356
Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material
J. Vac. Sci. Technol. A 34, 01A119 (2016)
https://doi.org/10.1116/1.4935650
Ultraviolet optical properties of aluminum fluoride thin films deposited by atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A120 (2016)
https://doi.org/10.1116/1.4935450
Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
J. Vac. Sci. Technol. A 34, 01A123 (2016)
https://doi.org/10.1116/1.4936072
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
J. Vac. Sci. Technol. A 34, 01A124 (2016)
https://doi.org/10.1116/1.4935959
Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A125 (2016)
https://doi.org/10.1116/1.4936230
Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
J. Vac. Sci. Technol. A 34, 01A126 (2016)
https://doi.org/10.1116/1.4936221
Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
J. Vac. Sci. Technol. A 34, 01A127 (2016)
https://doi.org/10.1116/1.4936227
Atomic layer deposition of alternative glass microchannel plates
J. Vac. Sci. Technol. A 34, 01A128 (2016)
https://doi.org/10.1116/1.4936231
Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
J. Vac. Sci. Technol. A 34, 01A129 (2016)
https://doi.org/10.1116/1.4936387
Luminescence properties of lanthanide and ytterbium lanthanide titanate thin films grown by atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A130 (2016)
https://doi.org/10.1116/1.4936389
Novel chemoresistive CH4 sensor with 10 ppm sensitivity based on multiwalled carbon nanotubes functionalized with SnO2 nanocrystals
J. Vac. Sci. Technol. A 34, 01A131 (2016)
https://doi.org/10.1116/1.4936384
Atomic layer deposition of boron-containing films using B2F4
J. Vac. Sci. Technol. A 34, 01A132 (2016)
https://doi.org/10.1116/1.4935651
Electrical characterization of atomic layer deposited Al2O3/InN interfaces
J. Vac. Sci. Technol. A 34, 01A133 (2016)
https://doi.org/10.1116/1.4936928
Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A135 (2016)
https://doi.org/10.1116/1.4936390
Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
J. Vac. Sci. Technol. A 34, 01A136 (2016)
https://doi.org/10.1116/1.4937734
Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
J. Vac. Sci. Technol. A 34, 01A138 (2016)
https://doi.org/10.1116/1.4937991
Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction
J. Vac. Sci. Technol. A 34, 01A139 (2016)
https://doi.org/10.1116/1.4937992
Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
J. Vac. Sci. Technol. A 34, 01A140 (2016)
https://doi.org/10.1116/1.4937993
Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A141 (2016)
https://doi.org/10.1116/1.4938074
Atomic layer deposition of NiS and its application as cathode material in dye sensitized solar cell
J. Vac. Sci. Technol. A 34, 01A142 (2016)
https://doi.org/10.1116/1.4938078
Standing and sitting adlayers in atomic layer deposition of ZnO
J. Vac. Sci. Technol. A 34, 01A143 (2016)
https://doi.org/10.1116/1.4938080
Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A144 (2016)
https://doi.org/10.1116/1.4938180
Periodic oxidation for fabricating titanium oxynitride thin films via atomic layer deposition
J. Vac. Sci. Technol. A 34, 01A145 (2016)
https://doi.org/10.1116/1.4938106
Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
J. Vac. Sci. Technol. A 34, 01A146 (2016)
https://doi.org/10.1116/1.4937728
Low-temperature atomic layer deposition of TiO2 thin layers for the processing of memristive devices
J. Vac. Sci. Technol. A 34, 01A147 (2016)
https://doi.org/10.1116/1.4938465
Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates
J. Vac. Sci. Technol. A 34, 01A149 (2016)
https://doi.org/10.1116/1.4938496
Simulation of nucleation and growth of atomic layer deposition phosphorus for doping of advanced FinFETs
J. Vac. Sci. Technol. A 34, 01A150 (2016)
https://doi.org/10.1116/1.4938585
Low temperature platinum atomic layer deposition on nylon-6 for highly conductive and catalytic fiber mats
J. Vac. Sci. Technol. A 34, 01A152 (2016)
https://doi.org/10.1116/1.4935448
Atomic Layer Etching (ALE)
Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
J. Vac. Sci. Technol. A 34, 01B101 (2016)
https://doi.org/10.1116/1.4935462
Application of cyclic fluorocarbon/argon discharges to device patterning
J. Vac. Sci. Technol. A 34, 01B102 (2016)
https://doi.org/10.1116/1.4935460
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
J. Vac. Sci. Technol. A 34, 01B103 (2016)
https://doi.org/10.1116/1.4936622
