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Letters

Shape anisotropy and instability of holes formed during dewetting of single-crystal palladium and nickel films

Jongpil Ye

J. Vac. Sci. Technol. A 33, 060601 (2015) https://doi.org/10.1116/1.4926373

View articletitled, Shape anisotropy and instability of holes formed during dewetting of single-crystal palladium and nickel films

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Precise control of defects in graphene using oxygen plasma

Geonyeop Lee; Jihyun Kim; Kyeounghak Kim; Jeong Woo Han

J. Vac. Sci. Technol. A 33, 060602 (2015) https://doi.org/10.1116/1.4926378

Abstract

View articletitled, Precise control of defects in graphene using oxygen plasma

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Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth

Triratna Muneshwar; Ken Cadien

J. Vac. Sci. Technol. A 33, 060603 (2015) https://doi.org/10.1116/1.4926382

Abstract

View articletitled, Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth

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Atomic and electronic structure of exfoliated black phosphorus

Ryan J. Wu; Mehmet Topsakal; Tony Low; Matthew C. Robbins; Nazila Haratipour; Jong Seok Jeong; Renata M. Wentzcovitch; Steven J. Koester; K. Andre Mkhoyan

J. Vac. Sci. Technol. A 33, 060604 (2015) https://doi.org/10.1116/1.4926753

Abstract

View articletitled, Atomic and electronic structure of exfoliated black phosphorus

Supplementary Material

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CHORUS

Ferroelectric and magnetic properties of Aurivillius Bi_m+1Ti₃Fe_m−3O_3m+3 thin films

Tingting Jia; Hideo Kimura; Zhenxiang Cheng; Hongyang Zhao

J. Vac. Sci. Technol. A 33, 060605 (2015) https://doi.org/10.1116/1.4926982

Abstract

View articletitled, Ferroelectric and magnetic properties of Aurivillius Bim+1Ti3Fem−3O3m+3 thin films

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Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

Hu Li; Kazuhiro Karahashi; Masanaga Fukasawa; Kazunori Nagahata; Tetsuya Tatsumi; Satoshi Hamaguchi

J. Vac. Sci. Technol. A 33, 060606 (2015) https://doi.org/10.1116/1.4927125

Abstract

View articletitled, Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

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Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

Takanori Mori; Yuya Futagami; Eiichi Kishimoto; Akira Shirakura; Tetsuya Suzuki

J. Vac. Sci. Technol. A 33, 060607 (2015) https://doi.org/10.1116/1.4929467

Abstract

View articletitled, Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge

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Hybrid molecular beam epitaxy for the growth of stoichiometric BaSnO₃

Abhinav Prakash; John Dewey; Hwanhui Yun; Jong Seok Jeong; K. Andre Mkhoyan; Bharat Jalan

J. Vac. Sci. Technol. A 33, 060608 (2015) https://doi.org/10.1116/1.4933401

Abstract

View articletitled, Hybrid molecular beam epitaxy for the growth of stoichiometric BaSnO3

Supplementary Material

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CHORUS

Substrate temperature control for the formation of metal nanohelices by glancing angle deposition

Takashi Sumigawa; Hisashi Tanie; Atsushi Sakurai; Kazuya Iwata; Shaoguang Chen; Takayuki Kitamura

J. Vac. Sci. Technol. A 33, 060609 (2015) https://doi.org/10.1116/1.4932516

Abstract

View articletitled, Substrate temperature control for the formation of metal nanohelices by glancing angle deposition

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Graded silicon nitride films: Optics and passivation

Andrew Thomson; Yimao Wan; Niraj Lal; Robert G. Elliman

J. Vac. Sci. Technol. A 33, 060610 (2015) https://doi.org/10.1116/1.4935101

Abstract

View articletitled, Graded silicon nitride films: Optics and passivation

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Enhanced interfacial thermal transport in pnictogen tellurides metallized with a lead-free solder alloy

Devender; Kelly Lofgreen; Shankar Devasenathipathy; Johanna Swan; Ravi Mahajan; Theodorian Borca-Tasciuc; Ganpati Ramanath

J. Vac. Sci. Technol. A 33, 060611 (2015) https://doi.org/10.1116/1.4935446

Abstract

View articletitled, Enhanced interfacial thermal transport in pnictogen tellurides metallized with a lead-free solder alloy

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CHORUS

Review Articles

Recommended values of clean metal surface work functions

Gregory N. Derry; Megan E. Kern; Eli H. Worth

J. Vac. Sci. Technol. A 33, 060801 (2015) https://doi.org/10.1116/1.4934685

Abstract

View articletitled, Recommended values of clean metal surface work functions

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Interfaces

Ab initio study of Ga-GaN system: Transition from adsorbed metal atoms to a metal–semiconductor junction

Przemysław Witczak; Pawel Kempisty; Pawel Strak; Stanisław Krukowski

J. Vac. Sci. Technol. A 33, 061101 (2015) https://doi.org/10.1116/1.4927166

Abstract

View articletitled, Ab initio study of Ga-GaN system: Transition from adsorbed metal atoms to a metal–semiconductor junction

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Photovoltaics and Energy

Investigation of blister formation in sputtered Cu₂ZnSnS₄ absorbers for thin film solar cells

Patrice Bras; Jan Sterner; Charlotte Platzer-Björkman

J. Vac. Sci. Technol. A 33, 061201 (2015) https://doi.org/10.1116/1.4926754

Abstract

View articletitled, Investigation of blister formation in sputtered Cu2ZnSnS4 absorbers for thin film solar cells

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Two-phonon absorption in LiF and NiO from infrared ellipsometry

Travis I. Willett-Gies; Cayla M. Nelson; Lina S. Abdallah; Stefan Zollner

J. Vac. Sci. Technol. A 33, 061202 (2015) https://doi.org/10.1116/1.4927159

Abstract

View articletitled, Two-phonon absorption in LiF and NiO from infrared ellipsometry

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Optical constants and band structure of trigonal NiO

Ayana Ghosh; Cayla M. Nelson; Lina S. Abdallah; Stefan Zollner

J. Vac. Sci. Technol. A 33, 061203 (2015) https://doi.org/10.1116/1.4932514

Abstract

View articletitled, Optical constants and band structure of trigonal NiO

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CHORUS

Thick sputtered tantalum coatings for high-temperature energy conversion applications

Veronika Stelmakh; Daniel Peykov; Walker R. Chan; Jay J. Senkevich; John D. Joannopoulos; Marin Soljačić; Ivan Celanovic; Robert Castillo; Kent Coulter; Ronghua Wei

J. Vac. Sci. Technol. A 33, 061204 (2015) https://doi.org/10.1116/1.4935156

Abstract

View articletitled, Thick sputtered tantalum coatings for high-temperature energy conversion applications

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CHORUS

Plasma Science and Technology

Temporal evolution of ion energy distribution functions and ion charge states of Cr and Cr-Al pulsed arc plasmas

Koichi Tanaka; André Anders

J. Vac. Sci. Technol. A 33, 061301 (2015) https://doi.org/10.1116/1.4926750

Abstract

View articletitled, Temporal evolution of ion energy distribution functions and ion charge states of Cr and Cr-Al pulsed arc plasmas

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CHORUS

Optical emission diagnostics of plasmas in chemical vapor deposition of single-crystal diamond

Kadek W. Hemawan; Russell J. Hemley

J. Vac. Sci. Technol. A 33, 061302 (2015) https://doi.org/10.1116/1.4928031

Abstract

View articletitled, Optical emission diagnostics of plasmas in chemical vapor deposition of single-crystal diamond

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CHORUS

Fluid simulation of the bias effect in inductive/capacitive discharges

Yu-Ru Zhang; Fei Gao; Xue-Chun Li; Annemie Bogaerts; You-Nian Wang

J. Vac. Sci. Technol. A 33, 061303 (2015) https://doi.org/10.1116/1.4928033

Abstract

View articletitled, Fluid simulation of the bias effect in inductive/capacitive discharges

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Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma

Min Hwan Jeon; Kyung Chae Yang; Sehan Lee; Geun Young Yeom

J. Vac. Sci. Technol. A 33, 061304 (2015) https://doi.org/10.1116/1.4929466

Abstract

View articletitled, Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma

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Fluorophore-based sensor for oxygen radicals in processing plasmas

Faraz A. Choudhury; Grzegorz Sabat; Michael R. Sussman; Yoshio Nishi; J. Leon Shohet

J. Vac. Sci. Technol. A 33, 061305 (2015) https://doi.org/10.1116/1.4930315

Abstract

View articletitled, Fluorophore-based sensor for oxygen radicals in processing plasmas

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CHORUS

Mass spectrometry measurements of a low pressure expanding plasma jet

Stefano Caldirola; Ruggero Barni; H. Eduardo Roman; Claudia Riccardi

J. Vac. Sci. Technol. A 33, 061306 (2015) https://doi.org/10.1116/1.4931612

Abstract

View articletitled, Mass spectrometry measurements of a low pressure expanding plasma jet

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Characterization of CO₂ plasma ashing for less low-dielectric-constant film damage

Yoshio Susa; Hiroto Ohtake; Zhao Jianping; Lee Chen; Toshihisa Nozawa

J. Vac. Sci. Technol. A 33, 061307 (2015) https://doi.org/10.1116/1.4931785

Abstract

View articletitled, Characterization of CO2 plasma ashing for less low-dielectric-constant film damage

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Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model

Nobuyuki Kuboi; Tetsuya Tatsumi; Takashi Kinoshita; Takushi Shigetoshi; Masanaga Fukasawa; Jun Komachi; Hisahiro Ansai

J. Vac. Sci. Technol. A 33, 061308 (2015) https://doi.org/10.1116/1.4931782

Abstract

View articletitled, Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model

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Reversal of the asymmetry in a cylindrical coaxial capacitively coupled Ar/Cl₂ plasma

Janardan Upadhyay; Do Im; Svetozar Popović; Leposava Vušković; Anne-Marie Valente-Feliciano; Larry Phillips

J. Vac. Sci. Technol. A 33, 061309 (2015) https://doi.org/10.1116/1.4932562

Abstract

View articletitled, Reversal of the asymmetry in a cylindrical coaxial capacitively coupled Ar/Cl2 plasma

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Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films

L. Maaloul; R. K. Gangwar; S. Morel; L. Stafford

J. Vac. Sci. Technol. A 33, 061310 (2015) https://doi.org/10.1116/1.4934762

Abstract

View articletitled, Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films

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Surfaces

Superior electro-optical properties of electrically controlled birefringence mode using solution-derived La₂O₃ films

Hae-Chang Jeong; Hong-Gyu Park; Ju Hwan Lee; Dae-Shik Seo; Byeong-Yun Oh

J. Vac. Sci. Technol. A 33, 061401 (2015) https://doi.org/10.1116/1.4926747

Abstract

View articletitled, Superior electro-optical properties of electrically controlled birefringence mode using solution-derived La2O3 films

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Anodic formation of highly ordered TiO₂ nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Motahareh Einollahzadeh-Samadi; Reza S. Dariani

J. Vac. Sci. Technol. A 33, 061402 (2015) https://doi.org/10.1116/1.4926752

Abstract

View articletitled, Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

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Influence of microwave annealing on optical and electrical properties of plasma-induced defect structures in Si substrate

Takaaki Iwai; Koji Eriguchi; Shohei Yamauchi; Naotaka Noro; Junichi Kitagawa; Kouichi Ono

J. Vac. Sci. Technol. A 33, 061403 (2015) https://doi.org/10.1116/1.4927128

Abstract

View articletitled, Influence of microwave annealing on optical and electrical properties of plasma-induced defect structures in Si substrate

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Molecular beam epitaxial growth and scanning tunneling microscopy studies of the gallium rich trench line structure on N-polar w-GaN(⁠ $000 \bar{1}$ ⁠)

Zakia H. Alhashem; Andrada-Oana Mandru; Jeongihm Pak; Arthur R. Smith

J. Vac. Sci. Technol. A 33, 061404 (2015) https://doi.org/10.1116/1.4927163

Abstract

View articletitled, Molecular beam epitaxial growth and scanning tunneling microscopy studies of the gallium rich trench line structure on N-polar w-GaN(⁠ <math xmlns="http://www.w3.org/1998/Math/MathML"> <mrow xmlns=""> <mn>000</mn> <mrow> <mover accent="true"> <mn>1</mn> <mo>¯</mo> </mover> </mrow> </mrow> </math>⁠)

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CHORUS

Li induced effects in the core level and π-band electronic structure of graphene grown on C-face SiC

Leif I. Johansson; Chao Xia; Chariya Virojanadara

J. Vac. Sci. Technol. A 33, 061405 (2015) https://doi.org/10.1116/1.4927856

Abstract

View articletitled, Li induced effects in the core level and π-band electronic structure of graphene grown on C-face SiC

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Interpretation of temperature-programmed desorption data with multivariate curve resolution: Distinguishing sample and background desorption mathematically

Jing Zhao; Jia-Ming Lin; Juan Carlos F. Rodríguez-Reyes; Andrew V. Teplyakov

J. Vac. Sci. Technol. A 33, 061406 (2015) https://doi.org/10.1116/1.4934763

Abstract

View articletitled, Interpretation of temperature-programmed desorption data with multivariate curve resolution: Distinguishing sample and background desorption mathematically

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CHORUS

Quantifying STM-tip induced directed hopping of Sb₂ dimers on Si(001): A kinetic Monte Carlo study

Marvin A. Albao; Anna Patricia S. Cristobal; Jason R. Albia

J. Vac. Sci. Technol. A 33, 061407 (2015) https://doi.org/10.1116/1.4935098

Abstract

View articletitled, Quantifying STM-tip induced directed hopping of Sb2 dimers on Si(001): A kinetic Monte Carlo study

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Thin Films

Monte Carlo simulation of the MoS₂ sputtering process and the influence of the normalized momentum on residual stresses

Bernd Vierneusel; Stephan Tremmel; Sandro Wartzack

J. Vac. Sci. Technol. A 33, 061501 (2015) https://doi.org/10.1116/1.4926383

Abstract

View articletitled, Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses

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Effect of localization states on the electroluminescence spectral width of blue–green light emitting InGaN/GaN multiple quantum wells

Wei Liu; De Gang Zhao; De Sheng Jiang; Ping Chen; Zong Shun Liu; Jian Jun Zhu; Xiang Li; Ming Shi; Dan Mei Zhao; Jian Ping Liu; Shu Ming Zhang; Hui Wang; Hui Yang

J. Vac. Sci. Technol. A 33, 061502 (2015) https://doi.org/10.1116/1.4927388

Abstract

View articletitled, Effect of localization states on the electroluminescence spectral width of blue–green light emitting InGaN/GaN multiple quantum wells

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Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films

Fanping Meng; Shou Peng; Genbao Xu; Yun Wang; Fangfang Ge; Feng Huang

J. Vac. Sci. Technol. A 33, 061503 (2015) https://doi.org/10.1116/1.4927437

Abstract

View articletitled, Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films

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Growth of SrVO₃ thin films by hybrid molecular beam epitaxy

Craig Eaton; Jarrett A. Moyer; Hamideh M. Alipour; Everett D. Grimley; Matthew Brahlek; James M. LeBeau; Roman Engel-Herbert

J. Vac. Sci. Technol. A 33, 061504 (2015) https://doi.org/10.1116/1.4927439

Abstract

View articletitled, Growth of SrVO3 thin films by hybrid molecular beam epitaxy

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CHORUS

Epitaxial growth of tungsten layers on MgO(001)

Pengyuan Zheng; Brian D. Ozsdolay; Daniel Gall

J. Vac. Sci. Technol. A 33, 061505 (2015) https://doi.org/10.1116/1.4928409

Abstract

View articletitled, Epitaxial growth of tungsten layers on MgO(001)

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CHORUS

Influence of Al₂O₃ layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors

Kazunori Kurishima; Toshihide Nabatame; Maki Shimizu; Nobuhiko Mitoma; Takio Kizu; Shinya Aikawa; Kazuhito Tsukagoshi; Akihiko Ohi; Toyohiro Chikyow; Atsushi Ogura

J. Vac. Sci. Technol. A 33, 061506 (2015) https://doi.org/10.1116/1.4928763

Abstract

View articletitled, Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors

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Effect of the annealing temperature and ion-beam bombardment on the properties of solution-derived HfYGaO films as liquid crystal alignment layers

Hong-Gyu Park; Yun-Gun Lee; Sang Bok Jang; Ju Hwan Lee; Hae-Chang Jeong; Dae-Shik Seo; Byeong-Yun Oh

J. Vac. Sci. Technol. A 33, 061507 (2015) https://doi.org/10.1116/1.4929539

Abstract

View articletitled, Effect of the annealing temperature and ion-beam bombardment on the properties of solution-derived HfYGaO films as liquid crystal alignment layers

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Effect of porous morphology on phase transition in vanadium dioxide thin films

Hui Yan Xu; Yu Hong Huang; Jin Ping Li; Fei Ma; Ke Wei Xu

J. Vac. Sci. Technol. A 33, 061508 (2015) https://doi.org/10.1116/1.4929541

Abstract

View articletitled, Effect of porous morphology on phase transition in vanadium dioxide thin films

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Vapor deposition on doublet airfoil substrates: Coating thickness control

Theron M. Rodgers; Hengbei Zhao; Haydn N. G. Wadley

J. Vac. Sci. Technol. A 33, 061509 (2015) https://doi.org/10.1116/1.4929664

Abstract

View articletitled, Vapor deposition on doublet airfoil substrates: Coating thickness control

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Effects of defect density on ultrathin graphene-based metal diffusion barriers

Sooyeoun Oh; Younghun Jung; Jihyun Kim

J. Vac. Sci. Technol. A 33, 061510 (2015) https://doi.org/10.1116/1.4929833

Abstract

View articletitled, Effects of defect density on ultrathin graphene-based metal diffusion barriers

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Optimizing the design of transparent conductive substrates

Jong-Hong Lu; Jen-Wei Luo; Zong-Han Syu; Hsuan-Chung Wu

J. Vac. Sci. Technol. A 33, 061511 (2015) https://doi.org/10.1116/1.4930423

Abstract

View articletitled, Optimizing the design of transparent conductive substrates

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ZrC epitaxy on Si(111)

Takashi Aizawa; Shigeki Otani; Isao Ohkubo; Takao Mori

J. Vac. Sci. Technol. A 33, 061512 (2015) https://doi.org/10.1116/1.4930317

Abstract

View articletitled, ZrC epitaxy on Si(111)

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Thermal stability and oxidation resistance of Cr_1−xAl_xN coatings with single phase cubic structure

Linqing He; Li Chen; Yuxiang Xu; Yong Du

J. Vac. Sci. Technol. A 33, 061513 (2015) https://doi.org/10.1116/1.4930424

Abstract

View articletitled, Thermal stability and oxidation resistance of Cr1−xAlxN coatings with single phase cubic structure

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Hydrogenation effects on carrier transport in boron-doped ultrananocrystalline diamond/amorphous carbon films prepared by coaxial arc plasma deposition

Yūki Katamune; Satoshi Takeichi; Shinya Ohmagari; Tsuyoshi Yoshitake

J. Vac. Sci. Technol. A 33, 061514 (2015) https://doi.org/10.1116/1.4931062

Abstract

View articletitled, Hydrogenation effects on carrier transport in boron-doped ultrananocrystalline diamond/amorphous carbon films prepared by coaxial arc plasma deposition

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CHORUS

High temperature coefficient of resistance achieved by ion beam assisted sputtering with no heat treatment in V_yM_1−yO_x (M = Nb, Hf)

Naor Vardi; Amos Sharoni

J. Vac. Sci. Technol. A 33, 061515 (2015) https://doi.org/10.1116/1.4932035

Abstract

View articletitled, High temperature coefficient of resistance achieved by ion beam assisted sputtering with no heat treatment in VyM1−yOx (M = Nb, Hf)

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New synthesis of MnSi₂ thin film and its thermoelectric properties

Yooleemi Shin; Sung Hyon Rhim; Anh Tuan Duong; Van Quang Nguyen; Soon Cheol Hong; Sunglae Cho; Hyun-Min Park

J. Vac. Sci. Technol. A 33, 061516 (2015) https://doi.org/10.1116/1.4932515

Abstract

View articletitled, New synthesis of MnSi2 thin film and its thermoelectric properties

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Growth optimization and characterization of GaN epilayers on multifaceted (111) surfaces etched on Si(100) substrates

KwaDwo Konadu Ansah-Antwi; Chew Beng Soh; Hongfei Liu; Soo Jin Chua

J. Vac. Sci. Technol. A 33, 061517 (2015) https://doi.org/10.1116/1.4933201

Abstract

View articletitled, Growth optimization and characterization of GaN epilayers on multifaceted (111) surfaces etched on Si(100) substrates

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Vapor deposition on doublet airfoil substrates: Control of coating thickness and microstructure

Theron M. Rodgers; Hengbei Zhao; Haydn N. G. Wadley

J. Vac. Sci. Technol. A 33, 061518 (2015) https://doi.org/10.1116/1.4934258

Abstract

View articletitled, Vapor deposition on doublet airfoil substrates: Control of coating thickness and microstructure

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Effects of N₂O gas addition on the properties of ZnO films grown by catalytic reaction-assisted chemical vapor deposition

Kanji Yasui; Makoto Morioka; Shingo Kanauchi; Yuki Ohashi; Takahiro Kato; Yasuhiro Tamayama

J. Vac. Sci. Technol. A 33, 061519 (2015) https://doi.org/10.1116/1.4935334

Abstract

View articletitled, Effects of N2O gas addition on the properties of ZnO films grown by catalytic reaction-assisted chemical vapor deposition

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Initial stages of growth and the influence of temperature during chemical vapor deposition of sp²-BN films

Mikhail Chubarov; Henrik Pedersen; Hans Högberg; Anne Henry; Zsolt Czigány

J. Vac. Sci. Technol. A 33, 061520 (2015) https://doi.org/10.1116/1.4935155

Abstract

View articletitled, Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films

Supplementary Material

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Iron–cobalt alloy thin films with high saturation magnetizations grown by conformal metalorganic CVD

Pengyi Zhang; Shaista Babar; John R. Abelson; Sarbeswar Sahoo; Meng Zhu; Michael Kautzky; Luke M. Davis; Gregory S. Girolami

J. Vac. Sci. Technol. A 33, 061521 (2015) https://doi.org/10.1116/1.4935449

Abstract

View articletitled, Iron–cobalt alloy thin films with high saturation magnetizations grown by conformal metalorganic CVD

Supplementary Material

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Vacuum Science and Technology

Long-life micro vacuum chamber for a micromachined cryogenic cooler

Haishan Cao; Cristian H. Vermeer; Srinivas Vanapalli; Harry J. Holland; H. J. Marcel ter Brake

J. Vac. Sci. Technol. A 33, 061601 (2015) https://doi.org/10.1116/1.4926961

Abstract

View articletitled, Long-life micro vacuum chamber for a micromachined cryogenic cooler

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Level-energy-dependent mean velocities of excited tungsten atoms sputtered by krypton-ion bombardment

Keisuke Nogami; Yasuhiro Sakai; Shota Mineta; Daiji Kato; Izumi Murakami; Hiroyuki A. Sakaue; Takahiro Kenmotsu; Kenji Furuya; Kenji Motohashi

J. Vac. Sci. Technol. A 33, 061602 (2015) https://doi.org/10.1116/1.4928250

Abstract

View articletitled, Level-energy-dependent mean velocities of excited tungsten atoms sputtered by krypton-ion bombardment

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Partial pressure measurement standard for characterizing partial pressure analyzers and measuring outgassing rates

Karl Jousten; Stephan Putzke; Joachim Buthig

J. Vac. Sci. Technol. A 33, 061603 (2015) https://doi.org/10.1116/1.4935432

Abstract

View articletitled, Partial pressure measurement standard for characterizing partial pressure analyzers and measuring outgassing rates

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Brief Reports and Comments

Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

Takahiro Ohno; Daisuke Yagyu; Shigeru Saito; Yasunori Ohno; Hirofumi Nakano; Masatoshi Itoh; Yoshio Uhara; Tsutomu Miura

J. Vac. Sci. Technol. A 33, 063001 (2015) https://doi.org/10.1116/1.4927442

Abstract

View articletitled, Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

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