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Issues
November 2015
ISSN 0734-2101
EISSN 1520-8559
Letters
Shape anisotropy and instability of holes formed during dewetting of single-crystal palladium and nickel films
J. Vac. Sci. Technol. A 33, 060601 (2015)
https://doi.org/10.1116/1.4926373
Precise control of defects in graphene using oxygen plasma
J. Vac. Sci. Technol. A 33, 060602 (2015)
https://doi.org/10.1116/1.4926378
Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
J. Vac. Sci. Technol. A 33, 060603 (2015)
https://doi.org/10.1116/1.4926382
Atomic and electronic structure of exfoliated black phosphorus
Ryan J. Wu; Mehmet Topsakal; Tony Low; Matthew C. Robbins; Nazila Haratipour; Jong Seok Jeong; Renata M. Wentzcovitch; Steven J. Koester; K. Andre Mkhoyan
J. Vac. Sci. Technol. A 33, 060604 (2015)
https://doi.org/10.1116/1.4926753
Ferroelectric and magnetic properties of Aurivillius Bim+1Ti3Fem−3O3m+3 thin films
J. Vac. Sci. Technol. A 33, 060605 (2015)
https://doi.org/10.1116/1.4926982
Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching
J. Vac. Sci. Technol. A 33, 060606 (2015)
https://doi.org/10.1116/1.4927125
Synthesis of hard hydrogenated amorphous carbon films by atmospheric pressure filamentary dielectric barrier discharge
J. Vac. Sci. Technol. A 33, 060607 (2015)
https://doi.org/10.1116/1.4929467
Hybrid molecular beam epitaxy for the growth of stoichiometric BaSnO3
J. Vac. Sci. Technol. A 33, 060608 (2015)
https://doi.org/10.1116/1.4933401
Substrate temperature control for the formation of metal nanohelices by glancing angle deposition
J. Vac. Sci. Technol. A 33, 060609 (2015)
https://doi.org/10.1116/1.4932516
Graded silicon nitride films: Optics and passivation
J. Vac. Sci. Technol. A 33, 060610 (2015)
https://doi.org/10.1116/1.4935101
Enhanced interfacial thermal transport in pnictogen tellurides metallized with a lead-free solder alloy
Devender; Kelly Lofgreen; Shankar Devasenathipathy; Johanna Swan; Ravi Mahajan; Theodorian Borca-Tasciuc; Ganpati Ramanath
J. Vac. Sci. Technol. A 33, 060611 (2015)
https://doi.org/10.1116/1.4935446
Review Articles
Recommended values of clean metal surface work functions
J. Vac. Sci. Technol. A 33, 060801 (2015)
https://doi.org/10.1116/1.4934685
Interfaces
Ab initio study of Ga-GaN system: Transition from adsorbed metal atoms to a metal–semiconductor junction
J. Vac. Sci. Technol. A 33, 061101 (2015)
https://doi.org/10.1116/1.4927166
Photovoltaics and Energy
Investigation of blister formation in sputtered Cu2ZnSnS4 absorbers for thin film solar cells
J. Vac. Sci. Technol. A 33, 061201 (2015)
https://doi.org/10.1116/1.4926754
Two-phonon absorption in LiF and NiO from infrared ellipsometry
J. Vac. Sci. Technol. A 33, 061202 (2015)
https://doi.org/10.1116/1.4927159
Optical constants and band structure of trigonal NiO
J. Vac. Sci. Technol. A 33, 061203 (2015)
https://doi.org/10.1116/1.4932514
Thick sputtered tantalum coatings for high-temperature energy conversion applications
Veronika Stelmakh; Daniel Peykov; Walker R. Chan; Jay J. Senkevich; John D. Joannopoulos; Marin Soljačić; Ivan Celanovic; Robert Castillo; Kent Coulter; Ronghua Wei
J. Vac. Sci. Technol. A 33, 061204 (2015)
https://doi.org/10.1116/1.4935156
Plasma Science and Technology
Temporal evolution of ion energy distribution functions and ion charge states of Cr and Cr-Al pulsed arc plasmas
J. Vac. Sci. Technol. A 33, 061301 (2015)
https://doi.org/10.1116/1.4926750
Optical emission diagnostics of plasmas in chemical vapor deposition of single-crystal diamond
J. Vac. Sci. Technol. A 33, 061302 (2015)
https://doi.org/10.1116/1.4928031
Fluid simulation of the bias effect in inductive/capacitive discharges
J. Vac. Sci. Technol. A 33, 061303 (2015)
https://doi.org/10.1116/1.4928033
Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma
J. Vac. Sci. Technol. A 33, 061304 (2015)
https://doi.org/10.1116/1.4929466
Fluorophore-based sensor for oxygen radicals in processing plasmas
J. Vac. Sci. Technol. A 33, 061305 (2015)
https://doi.org/10.1116/1.4930315
Mass spectrometry measurements of a low pressure expanding plasma jet
J. Vac. Sci. Technol. A 33, 061306 (2015)
https://doi.org/10.1116/1.4931612
Characterization of CO2 plasma ashing for less low-dielectric-constant film damage
J. Vac. Sci. Technol. A 33, 061307 (2015)
https://doi.org/10.1116/1.4931785
Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model
Nobuyuki Kuboi; Tetsuya Tatsumi; Takashi Kinoshita; Takushi Shigetoshi; Masanaga Fukasawa; Jun Komachi; Hisahiro Ansai
J. Vac. Sci. Technol. A 33, 061308 (2015)
https://doi.org/10.1116/1.4931782
Reversal of the asymmetry in a cylindrical coaxial capacitively coupled Ar/Cl2 plasma
Janardan Upadhyay; Do Im; Svetozar Popović; Leposava Vušković; Anne-Marie Valente-Feliciano; Larry Phillips
J. Vac. Sci. Technol. A 33, 061309 (2015)
https://doi.org/10.1116/1.4932562
Surfaces
Superior electro-optical properties of electrically controlled birefringence mode using solution-derived La2O3 films
J. Vac. Sci. Technol. A 33, 061401 (2015)
https://doi.org/10.1116/1.4926747
Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness
J. Vac. Sci. Technol. A 33, 061402 (2015)
https://doi.org/10.1116/1.4926752
Influence of microwave annealing on optical and electrical properties of plasma-induced defect structures in Si substrate
J. Vac. Sci. Technol. A 33, 061403 (2015)
https://doi.org/10.1116/1.4927128
Molecular beam epitaxial growth and scanning tunneling microscopy studies of the gallium rich trench line structure on N-polar w-GaN( )
J. Vac. Sci. Technol. A 33, 061404 (2015)
https://doi.org/10.1116/1.4927163
Li induced effects in the core level and π-band electronic structure of graphene grown on C-face SiC
J. Vac. Sci. Technol. A 33, 061405 (2015)
https://doi.org/10.1116/1.4927856
Quantifying STM-tip induced directed hopping of Sb2 dimers on Si(001): A kinetic Monte Carlo study
J. Vac. Sci. Technol. A 33, 061407 (2015)
https://doi.org/10.1116/1.4935098
Thin Films
Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses
J. Vac. Sci. Technol. A 33, 061501 (2015)
https://doi.org/10.1116/1.4926383
Effect of localization states on the electroluminescence spectral width of blue–green light emitting InGaN/GaN multiple quantum wells
Wei Liu; De Gang Zhao; De Sheng Jiang; Ping Chen; Zong Shun Liu; Jian Jun Zhu; Xiang Li; Ming Shi; Dan Mei Zhao; Jian Ping Liu; Shu Ming Zhang; Hui Wang; Hui Yang
J. Vac. Sci. Technol. A 33, 061502 (2015)
https://doi.org/10.1116/1.4927388
Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films
J. Vac. Sci. Technol. A 33, 061503 (2015)
https://doi.org/10.1116/1.4927437
Growth of SrVO3 thin films by hybrid molecular beam epitaxy
Craig Eaton; Jarrett A. Moyer; Hamideh M. Alipour; Everett D. Grimley; Matthew Brahlek; James M. LeBeau; Roman Engel-Herbert
J. Vac. Sci. Technol. A 33, 061504 (2015)
https://doi.org/10.1116/1.4927439
Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
Kazunori Kurishima; Toshihide Nabatame; Maki Shimizu; Nobuhiko Mitoma; Takio Kizu; Shinya Aikawa; Kazuhito Tsukagoshi; Akihiko Ohi; Toyohiro Chikyow; Atsushi Ogura
J. Vac. Sci. Technol. A 33, 061506 (2015)
https://doi.org/10.1116/1.4928763
Effect of the annealing temperature and ion-beam bombardment on the properties of solution-derived HfYGaO films as liquid crystal alignment layers
Hong-Gyu Park; Yun-Gun Lee; Sang Bok Jang; Ju Hwan Lee; Hae-Chang Jeong; Dae-Shik Seo; Byeong-Yun Oh
J. Vac. Sci. Technol. A 33, 061507 (2015)
https://doi.org/10.1116/1.4929539
Effect of porous morphology on phase transition in vanadium dioxide thin films
J. Vac. Sci. Technol. A 33, 061508 (2015)
https://doi.org/10.1116/1.4929541
Vapor deposition on doublet airfoil substrates: Coating thickness control
J. Vac. Sci. Technol. A 33, 061509 (2015)
https://doi.org/10.1116/1.4929664
Effects of defect density on ultrathin graphene-based metal diffusion barriers
J. Vac. Sci. Technol. A 33, 061510 (2015)
https://doi.org/10.1116/1.4929833
Optimizing the design of transparent conductive substrates
J. Vac. Sci. Technol. A 33, 061511 (2015)
https://doi.org/10.1116/1.4930423
Thermal stability and oxidation resistance of Cr1−xAlxN coatings with single phase cubic structure
J. Vac. Sci. Technol. A 33, 061513 (2015)
https://doi.org/10.1116/1.4930424
High temperature coefficient of resistance achieved by ion beam assisted sputtering with no heat treatment in VyM1−yOx (M = Nb, Hf)
J. Vac. Sci. Technol. A 33, 061515 (2015)
https://doi.org/10.1116/1.4932035
New synthesis of MnSi2 thin film and its thermoelectric properties
Yooleemi Shin; Sung Hyon Rhim; Anh Tuan Duong; Van Quang Nguyen; Soon Cheol Hong; Sunglae Cho; Hyun-Min Park
J. Vac. Sci. Technol. A 33, 061516 (2015)
https://doi.org/10.1116/1.4932515
Growth optimization and characterization of GaN epilayers on multifaceted (111) surfaces etched on Si(100) substrates
J. Vac. Sci. Technol. A 33, 061517 (2015)
https://doi.org/10.1116/1.4933201
Vapor deposition on doublet airfoil substrates: Control of coating thickness and microstructure
J. Vac. Sci. Technol. A 33, 061518 (2015)
https://doi.org/10.1116/1.4934258
Effects of N2O gas addition on the properties of ZnO films grown by catalytic reaction-assisted chemical vapor deposition
J. Vac. Sci. Technol. A 33, 061519 (2015)
https://doi.org/10.1116/1.4935334
Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films
J. Vac. Sci. Technol. A 33, 061520 (2015)
https://doi.org/10.1116/1.4935155
Iron–cobalt alloy thin films with high saturation magnetizations grown by conformal metalorganic CVD
Pengyi Zhang; Shaista Babar; John R. Abelson; Sarbeswar Sahoo; Meng Zhu; Michael Kautzky; Luke M. Davis; Gregory S. Girolami
J. Vac. Sci. Technol. A 33, 061521 (2015)
https://doi.org/10.1116/1.4935449
Vacuum Science and Technology
Long-life micro vacuum chamber for a micromachined cryogenic cooler
J. Vac. Sci. Technol. A 33, 061601 (2015)
https://doi.org/10.1116/1.4926961
Level-energy-dependent mean velocities of excited tungsten atoms sputtered by krypton-ion bombardment
Keisuke Nogami; Yasuhiro Sakai; Shota Mineta; Daiji Kato; Izumi Murakami; Hiroyuki A. Sakaue; Takahiro Kenmotsu; Kenji Furuya; Kenji Motohashi
J. Vac. Sci. Technol. A 33, 061602 (2015)
https://doi.org/10.1116/1.4928250
Partial pressure measurement standard for characterizing partial pressure analyzers and measuring outgassing rates
J. Vac. Sci. Technol. A 33, 061603 (2015)
https://doi.org/10.1116/1.4935432
Brief Reports and Comments
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)
George H. Major, Joshua W. Pinder, et al.
Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
Tiffany C. Kaspar, Sarah Akers, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.