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Letters

Phase transition characteristics under vacuum of 9,10-di(2-naphthyl)anthracene for organic light-emitting diodes

Jin-Tae Kim; Seob Shim; Jae-Su Shin; Sangwoo Kang; Ju-Young Yun; Ohyun Kwon

J. Vac. Sci. Technol. A 32, 020601 (2014) https://doi.org/10.1116/1.4831935

View articletitled, Phase transition characteristics under vacuum of 9,10-di(2-naphthyl)anthracene for organic light-emitting diodes

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On the possibility to grow zinc oxide-based transparent conducting oxide films by hot-wire chemical vapor deposition

Adulfas Abrutis; Laimis Silimavicus; Virgaudas Kubilius; Tomas Murauskas; Zita Saltyte; Sabina Kuprenaite; Valentina Plausinaitiene

J. Vac. Sci. Technol. A 32, 020602 (2014) https://doi.org/10.1116/1.4842695

Abstract

View articletitled, On the possibility to grow zinc oxide-based transparent conducting oxide films by hot-wire chemical vapor deposition

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Fluorocarbon assisted atomic layer etching of SiO₂ using cyclic Ar/C₄F₈ plasma

Dominik Metzler; Robert L. Bruce; Sebastian Engelmann; Eric A. Joseph; Gottlieb S. Oehrlein

J. Vac. Sci. Technol. A 32, 020603 (2014) https://doi.org/10.1116/1.4843575

Abstract

View articletitled, Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

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Evolution of morphology and structure of Pb thin films grown by pulsed laser deposition at different substrate temperatures

Antonella Lorusso; Francisco Gontad; Berlinda Maiolo; Giuseppe Maruccio; Vittorianna Tasco; Alessio Perrone

J. Vac. Sci. Technol. A 32, 020604 (2014) https://doi.org/10.1116/1.4859135

Abstract

View articletitled, Evolution of morphology and structure of Pb thin films grown by pulsed laser deposition at different substrate temperatures

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Development of atomic layer deposition-activated microchannel plates for single particle detection at cryogenic temperatures

Dmitry Gorelikov; Neal Sullivan; Philippe de Rouffignac; Huazhi Li; Jayasri Narayanamoorthy; Anton S. Tremsin

J. Vac. Sci. Technol. A 32, 020605 (2014) https://doi.org/10.1116/1.4862947

Abstract

View articletitled, Development of atomic layer deposition-activated microchannel plates for single particle detection at cryogenic temperatures

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Low-temperature CVD of iron, cobalt, and nickel nitride thin films from bis[di(tert-butyl)amido]metal(II) precursors and ammonia

Andrew N. Cloud; Luke M. Davis; Gregory S. Girolami; John R. Abelson

J. Vac. Sci. Technol. A 32, 020606 (2014) https://doi.org/10.1116/1.4865903

Abstract

View articletitled, Low-temperature CVD of iron, cobalt, and nickel nitride thin films from bis[di(tert-butyl)amido]metal(II) precursors and ammonia

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Review Articles

Critical review: Effects of complex interactions on structure and dynamics of supported metal catalysts

Anatoly I. Frenkel; Michael W. Cason; Annika Elsen; Ulrich Jung; Matthew W. Small; Ralph G. Nuzzo; Fernando D. Vila; John J. Rehr; Eric A. Stach; Judith C. Yang

J. Vac. Sci. Technol. A 32, 020801 (2014) https://doi.org/10.1116/1.4820493

Abstract

View articletitled, Critical review: Effects of complex interactions on structure and dynamics of supported metal catalysts

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Interfaces

Controlled ambient and temperature treatment of InGaZnO thin film transistors for improved bias-illumination stress reliability

Rajitha N. P. Vemuri; Muhammad R. Hasin; T. L. Alford

J. Vac. Sci. Technol. A 32, 021101 (2014) https://doi.org/10.1116/1.4846216

Abstract

View articletitled, Controlled ambient and temperature treatment of InGaZnO thin film transistors for improved bias-illumination stress reliability

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Novel method for the prediction of an interface bonding species at alumina/metal interfaces

Michiko Yoshitake; Shinjiro Yagyu; Toyohiro Chikyow

J. Vac. Sci. Technol. A 32, 021102 (2014) https://doi.org/10.1116/1.4849375

Abstract

View articletitled, Novel method for the prediction of an interface bonding species at alumina/metal interfaces

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Second-harmonic intensity and phase spectroscopy as a sensitive method to probe the space-charge field in Si(100) covered with charged dielectrics

Nick M. Terlinden; Vincent Vandalon; Roger H. E. C. Bosch; W. M. M. (Erwin) Kessels

J. Vac. Sci. Technol. A 32, 021103 (2014) https://doi.org/10.1116/1.4862145

Abstract

View articletitled, Second-harmonic intensity and phase spectroscopy as a sensitive method to probe the space-charge field in Si(100) covered with charged dielectrics

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Determination of subband energies and 2DEG characteristics of Al_xGa₁₋_xN/GaN heterojunctions using variational method

Farzin Manouchehri; Pouya Valizadeh; M. Z. Kabir

J. Vac. Sci. Technol. A 32, 021104 (2014) https://doi.org/10.1116/1.4865562

Abstract

View articletitled, Determination of subband energies and 2DEG characteristics of AlxGa1−xN/GaN heterojunctions using variational method

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Photovoltaics and Energy

Self limiting deposition of pyrite absorbers by pulsed PECVD

Christopher D. Sentman; Maria O'Brien; Colin A. Wolden

J. Vac. Sci. Technol. A 32, 021201 (2014) https://doi.org/10.1116/1.4828818

Abstract

View articletitled, Self limiting deposition of pyrite absorbers by pulsed PECVD

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Highly transparent Nb-doped indium oxide electrodes for organic solar cells

Jun Ho Kim; Tae-Yeon Seong; Seok-In Na; Kwun-Bum Chung; Hye-Min Lee; Han-Ki Kim

J. Vac. Sci. Technol. A 32, 021202 (2014) https://doi.org/10.1116/1.4832238

Abstract

View articletitled, Highly transparent Nb-doped indium oxide electrodes for organic solar cells

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Plasma Science and Technology

MD simulations of low energy Cl_x⁺ ions interaction with ultrathin silicon layers for advanced etch processes

Paulin Brichon; Emilie Despiau-Pujo; Olivier Joubert

J. Vac. Sci. Technol. A 32, 021301 (2014) https://doi.org/10.1116/1.4827016

Abstract

View articletitled, MD simulations of low energy Clx+ ions interaction with ultrathin silicon layers for advanced etch processes

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Plasma damage mechanisms in low k organosilicate glass and their inhibition by Ar ion bombardment

Haseeb Kazi; Jeffry A. Kelber

J. Vac. Sci. Technol. A 32, 021302 (2014) https://doi.org/10.1116/1.4838935

Abstract

View articletitled, Plasma damage mechanisms in low k organosilicate glass and their inhibition by Ar ion bombardment

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Modeling of inductively coupled plasma SF₆/O₂/Ar plasma discharge: Effect of O₂ on the plasma kinetic properties

Amand Pateau; Ahmed Rhallabi; Marie-Claude Fernandez; Mohamed Boufnichel; Fabrice Roqueta

J. Vac. Sci. Technol. A 32, 021303 (2014) https://doi.org/10.1116/1.4853675

Abstract

View articletitled, Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties

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Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas

John B. Boffard; Chun C. Lin; Cody Culver; Shicong Wang; Amy E. Wendt; Svetlana Radovanov; Harold Persing

J. Vac. Sci. Technol. A 32, 021304 (2014) https://doi.org/10.1116/1.4859376

Abstract

View articletitled, Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas

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Fabrication of tapered graded-refractive-index micropillars using ion-implanted-photoresist as an etch mask

Ming Ma; E. Fred Schubert; Jaehee Cho; Morgan Evans; Gi Bum Kim; Cheolsoo Sone

J. Vac. Sci. Technol. A 32, 021305 (2014) https://doi.org/10.1116/1.4862547

Abstract

View articletitled, Fabrication of tapered graded-refractive-index micropillars using ion-implanted-photoresist as an etch mask

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Role of the blocking capacitor in control of ion energy distributions in pulsed capacitively coupled plasmas sustained in Ar/CF₄/O₂

Sang-Heon Song; Mark J. Kushner

J. Vac. Sci. Technol. A 32, 021306 (2014) https://doi.org/10.1116/1.4863948

Abstract

View articletitled, Role of the blocking capacitor in control of ion energy distributions in pulsed capacitively coupled plasmas sustained in Ar/CF4/O2

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Process monitoring during AlN_xO_y deposition by reactive magnetron sputtering and correlation with the film's properties

Joel Borges; Nicolas Martin; Filipe Vaz; Luis Marques

J. Vac. Sci. Technol. A 32, 021307 (2014) https://doi.org/10.1116/1.4863957

Abstract

View articletitled, Process monitoring during AlNxOy deposition by reactive magnetron sputtering and correlation with the film's properties

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Surfaces

TOF SIMS analysis and generation of white photoluminescence from strontium silicate codoped with europium and terbium

Modiehi A. Tshabalala; Hendrik C. Swart; Odireleng M. Ntwaeaborwa

J. Vac. Sci. Technol. A 32, 021401 (2014) https://doi.org/10.1116/1.4862752

Abstract

View articletitled, TOF SIMS analysis and generation of white photoluminescence from strontium silicate codoped with europium and terbium

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Chemical mechanical planarization of gold

Golnaz Karbasian; Patrick J. Fay; Huili Grace Xing; Alexei O. Orlov; Gregory L. Snider

J. Vac. Sci. Technol. A 32, 021402 (2014) https://doi.org/10.1116/1.4863275

Abstract

View articletitled, Chemical mechanical planarization of gold

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Thin Films

Reactive sputtering of substoichiometric Ta₂O_x for resistive memory applications

James E. Stevens; Andrew J. Lohn; Seth A. Decker; Barney L. Doyle; Patrick R. Mickel; Matthew J. Marinella

J. Vac. Sci. Technol. A 32, 021501 (2014) https://doi.org/10.1116/1.4828701

Abstract

View articletitled, Reactive sputtering of substoichiometric Ta2Ox for resistive memory applications

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Properties of zinc oxide films grown on sapphire substrates using high-temperature H₂O generated by a catalytic reaction on platinum nanoparticles

Kanji Yasui; Tomohiko Takeuchi; Eichi Nagatomi; Souichi Satomoto; Hitoshi Miura; Takahiro Kato; Takayuki Konya

J. Vac. Sci. Technol. A 32, 021502 (2014) https://doi.org/10.1116/1.4831969

Abstract

View articletitled, Properties of zinc oxide films grown on sapphire substrates using high-temperature H2O generated by a catalytic reaction on platinum nanoparticles

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Mechanical and transparent conductive properties of ZnO and Ga-doped ZnO films sputtered using electron-cyclotron-resonance plasma on polyethylene naphtalate substrates

Housei Akazawa

J. Vac. Sci. Technol. A 32, 021503 (2014) https://doi.org/10.1116/1.4831979

Abstract

View articletitled, Mechanical and transparent conductive properties of ZnO and Ga-doped ZnO films sputtered using electron-cyclotron-resonance plasma on polyethylene naphtalate substrates

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Mechanical and tribological properties of Sn-Cu-O films prepared by reactive magnetron sputtering

Jindřich Musil; Martin Hromádka; Radomír Čerstvý; Zbyněk Soukup

J. Vac. Sci. Technol. A 32, 021504 (2014) https://doi.org/10.1116/1.4859275

Abstract

View articletitled, Mechanical and tribological properties of Sn-Cu-O films prepared by reactive magnetron sputtering

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Vibrational spectra of CO adsorbed on oxide thin films: A tool to probe the surface defects and phase changes of oxide thin films

Aditya Savara

J. Vac. Sci. Technol. A 32, 021505 (2014) https://doi.org/10.1116/1.4858619

Abstract

View articletitled, Vibrational spectra of CO adsorbed on oxide thin films: A tool to probe the surface defects and phase changes of oxide thin films

Supplementary Material

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Effect of thermal annealing on the properties of transparent conductive In–Ga–Zn oxide thin films

Ling Li; Lina Fan; Yanhuai Li; Zhongxiao Song; Fei Ma; Chunliang Liu

J. Vac. Sci. Technol. A 32, 021506 (2014) https://doi.org/10.1116/1.4861352

Abstract

View articletitled, Effect of thermal annealing on the properties of transparent conductive In–Ga–Zn oxide thin films

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Chemical bonding and defect states of LPCVD grown silicon-rich Si₃N₄ for quantum dot applications

Shakil Mohammed; Michael T. Nimmo; Anton V. Malko; Christopher L. Hinkle

J. Vac. Sci. Technol. A 32, 021507 (2014) https://doi.org/10.1116/1.4861338

Abstract

View articletitled, Chemical bonding and defect states of LPCVD grown silicon-rich Si3N4 for quantum dot applications

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Mechanical and phase stability of TiBC coatings up to 1000 °C

Manuel D. Abad; Stephen C. Veldhuis; Jose L. Endrino; Ben D. Beake; Alberto García-Luis; Marta Brizuela; Juan C. Sánchez-López

J. Vac. Sci. Technol. A 32, 021508 (2014) https://doi.org/10.1116/1.4861365

Abstract

View articletitled, Mechanical and phase stability of TiBC coatings up to 1000 °C

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Influence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ions

Praveen Kumar Yadav; Tushar Sant; Chandrachur Mukherjee; Maheswar Nayak; Sanjay Kumar Rai; Gyanendra Singh Lodha; Surinder Mohan Sharma

J. Vac. Sci. Technol. A 32, 021509 (2014) https://doi.org/10.1116/1.4862141

Abstract

View articletitled, Influence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ions

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Dynamic XPS measurements of ultrathin polyelectrolyte films containing antibacterial Ag–Cu nanoparticles

Merve Taner-Camcı; Sefik Suzer

J. Vac. Sci. Technol. A 32, 021510 (2014) https://doi.org/10.1116/1.4862155

Abstract

View articletitled, Dynamic XPS measurements of ultrathin polyelectrolyte films containing antibacterial Ag–Cu nanoparticles

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Deposition and characterization of Cd_1−xMg_xTe thin films grown by a novel cosublimation method

Pavel S. Kobyakov; Andrew Moore; John M. Raguse; Drew E. Swanson; Walajabad S. Sampath

J. Vac. Sci. Technol. A 32, 021511 (2014) https://doi.org/10.1116/1.4863314

Abstract

View articletitled, Deposition and characterization of Cd1−xMgxTe thin films grown by a novel cosublimation method

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Degradation of transparent conductive properties of undoped ZnO and Ga-doped ZnO films left in atmospheric ambient for several years and trials to recover initial conductance

Housei Akazawa

J. Vac. Sci. Technol. A 32, 021512 (2014) https://doi.org/10.1116/1.4866233

Abstract

View articletitled, Degradation of transparent conductive properties of undoped ZnO and Ga-doped ZnO films left in atmospheric ambient for several years and trials to recover initial conductance

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Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties

Kirsten Bobzin; Nazlim Bagcivan; Sebastian Theiß; Jan Trieschmann; Ricardo Henrique Brugnara; Sven Preissing; Ante Hecimovic

J. Vac. Sci. Technol. A 32, 021513 (2014) https://doi.org/10.1116/1.4865917

Abstract

View articletitled, Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties

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Characterization of plasma-enhanced atomic layer deposition of Al₂O₃ using dimethylaluminum isopropoxide

Jialing Yang; Brianna S. Eller; Manpuneet Kaur; Robert J. Nemanich

J. Vac. Sci. Technol. A 32, 021514 (2014) https://doi.org/10.1116/1.4866378

Abstract

View articletitled, Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide

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Effects of the cathode grain size and substrate fixture movement on the evolution of arc evaporated Cr-cathodes and Cr-N coating synthesis

Jianqiang Zhu; Bilal Syed; Peter Polcik; Greger Håkansson; Mats Johansson-Jöesaar; Mats Ahlgren; Magnus Odén

J. Vac. Sci. Technol. A 32, 021515 (2014) https://doi.org/10.1116/1.4865923

Abstract

View articletitled, Effects of the cathode grain size and substrate fixture movement on the evolution of arc evaporated Cr-cathodes and Cr-N coating synthesis

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Vacuum Science and Technology

Gas flow through microtubes with different internal surface coatings

M. Hadj Nacer; I. Graur; P. Perrier; J. G. Méolans; M. Wuest

J. Vac. Sci. Technol. A 32, 021601 (2014) https://doi.org/10.1116/1.4828955

Abstract

View articletitled, Gas flow through microtubes with different internal surface coatings

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Hybrid modeling of time-dependent rarefied gas expansion

Manuel Vargas; Steryios Naris; Dimitris Valougeorgis; Sarantis Pantazis; Karl Jousten

J. Vac. Sci. Technol. A 32, 021602 (2014) https://doi.org/10.1116/1.4830283

Abstract

View articletitled, Hybrid modeling of time-dependent rarefied gas expansion

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Optimization of closed ion source for a high-sensitivity residual gas analyzer

Cheolsu Han; Jong Rok Ahn; Sang Jung Ahn; Chang Joon Park

J. Vac. Sci. Technol. A 32, 021603 (2014) https://doi.org/10.1116/1.4835635

Abstract

View articletitled, Optimization of closed ion source for a high-sensitivity residual gas analyzer

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Effect of heat treatments and coatings on the outgassing rate of stainless steel chambers

Md Abdullah A. Mamun; Abdelmageed A. Elmustafa; Marcy L. Stutzman; Philip A. Adderley; Matthew Poelker

J. Vac. Sci. Technol. A 32, 021604 (2014) https://doi.org/10.1116/1.4853795

Abstract

View articletitled, Effect of heat treatments and coatings on the outgassing rate of stainless steel chambers

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Shop Notes

Vacuum compatibility of silver and titanium parts made using three-dimensional printing

Ashley R. Gans; Matthew M. Jobbins; David Y. Lee; S. Alex Kandel

J. Vac. Sci. Technol. A 32, 023201 (2014) https://doi.org/10.1116/1.4846195

Abstract

View articletitled, Vacuum compatibility of silver and titanium parts made using three-dimensional printing

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Low cost photoelectron yield setup for surface process monitoring

Adrian Hemmi; Huanyao Cun; Silvan Roth; Jürg Osterwalder; Thomas Greber

J. Vac. Sci. Technol. A 32, 023202 (2014) https://doi.org/10.1116/1.4866095

Extract

View articletitled, Low cost photoelectron yield setup for surface process monitoring

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Papers from the 12th International Symposium on Sputtering and Plasma Processes

Internal oxidation and mechanical properties of Ru based alloy coatings

Yung-I Chen; Hsiu-Nuan Chu; Li-Chun Chang; Jyh-Wei Lee

J. Vac. Sci. Technol. A 32, 02B101 (2014) https://doi.org/10.1116/1.4826585

Abstract

View articletitled, Internal oxidation and mechanical properties of Ru based alloy coatings

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Effect of hydrogen plasma irradiation of catalyst films on growth of carbon nanotubes filled with iron nanowires

Hideki Sato; Nobuo Kubonaka; Atsushi Nagata; Yuji Fujiwara

J. Vac. Sci. Technol. A 32, 02B102 (2014) https://doi.org/10.1116/1.4827822

Abstract

View articletitled, Effect of hydrogen plasma irradiation of catalyst films on growth of carbon nanotubes filled with iron nanowires

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Defects in nonpolar (⁠ $13 \bar{4}$ ⁠) ZnO epitaxial film grown on (114) LaAlO₃ substrate

Tzu-Chun Yen; Wei-Lin Wang; Chun-Yen Peng; Jr-Sheng Tian; Yen-Teng Ho; Li Chang

J. Vac. Sci. Technol. A 32, 02B103 (2014) https://doi.org/10.1116/1.4830275

Abstract

View articletitled, Defects in nonpolar (⁠<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>13</mn><mover accent="true"><mn>4</mn><mo>¯</mo></mover><mn></mn></mrow></math>⁠) ZnO epitaxial film grown on (114) LaAlO3 substrate

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Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma

Tatsunori Koda; Hiroshi Toyota

J. Vac. Sci. Technol. A 32, 02B104 (2014) https://doi.org/10.1116/1.4832226

Abstract

View articletitled, Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma

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Low-cost Xe sputtering of amorphous In-Ga-Zn-O thin-film transistors by rotation magnet sputtering incorporating a Xe recycle-and-supply system

Tetsuya Goto; Hidekazu Ishii; Shigetoshi Sugawa; Tadahiro Ohmi

J. Vac. Sci. Technol. A 32, 02B105 (2014) https://doi.org/10.1116/1.4835775

Abstract

View articletitled, Low-cost Xe sputtering of amorphous In-Ga-Zn-O thin-film transistors by rotation magnet sputtering incorporating a Xe recycle-and-supply system

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Colored hard coatings with AlN–TiN multilayer structures

Jong Hong Lu; Bo Ying Chen

J. Vac. Sci. Technol. A 32, 02B106 (2014) https://doi.org/10.1116/1.4838895

Abstract

View articletitled, Colored hard coatings with AlN–TiN multilayer structures

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Investigation of nanostructured transparent conductive films grown by rotational-sequential-sputtering

Jong-Hong Lu; Bo-Ying Chen; Chih-Hsuan Wang

J. Vac. Sci. Technol. A 32, 02B107 (2014) https://doi.org/10.1116/1.4846155

Abstract

View articletitled, Investigation of nanostructured transparent conductive films grown by rotational-sequential-sputtering

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Performance improvement of gadolinium oxide resistive random access memory treated by hydrogen plasma immersion ion implantation

Jer-Chyi Wang; Chih-Hsien Hsu; Yu-Ren Ye; Chi-Fong Ai; Wen-Fa Tsai

J. Vac. Sci. Technol. A 32, 02B108 (2014) https://doi.org/10.1116/1.4846176

Abstract

View articletitled, Performance improvement of gadolinium oxide resistive random access memory treated by hydrogen plasma immersion ion implantation

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Interaction between water cluster ions and mica surface

Hiromichi Ryuto; Yuki Ohmura; Minoru Nakagawa; Mitsuaki Takeuchi; Gikan H. Takaoka

J. Vac. Sci. Technol. A 32, 02B109 (2014) https://doi.org/10.1116/1.4849323

Abstract

View articletitled, Interaction between water cluster ions and mica surface

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Low-temperature synthesis of diamond films by photoemission-assisted plasma-enhanced chemical vapor deposition

Mayuri Kawata; Yoshihiro Ojiro; Shuichi Ogawa; Tomoaki Masuzawa; Ken Okano; Yuji Takakuwa

J. Vac. Sci. Technol. A 32, 02B110 (2014) https://doi.org/10.1116/1.4849355

Abstract

View articletitled, Low-temperature synthesis of diamond films by photoemission-assisted plasma-enhanced chemical vapor deposition

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Effect of plasma treatment of resistive layer on a Cu/SiO_x/Pt memory device

Chih-Yi Liu; Yueh-Ying Tsai; Chun-Hung Lai

J. Vac. Sci. Technol. A 32, 02B111 (2014) https://doi.org/10.1116/1.4859235

Abstract

View articletitled, Effect of plasma treatment of resistive layer on a Cu/SiOx/Pt memory device

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Oxygen plasma immersion ion implantation treatment to enhance data retention of tungsten nanocrystal nonvolatile memory

Jer-Chyi Wang; Wei-Cheng Chang; Chao-Sung Lai; Li-Chun Chang; Chi-Fong Ai; Wen-Fa Tsai

J. Vac. Sci. Technol. A 32, 02B112 (2014) https://doi.org/10.1116/1.4858600

Abstract

View articletitled, Oxygen plasma immersion ion implantation treatment to enhance data retention of tungsten nanocrystal nonvolatile memory

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Synthesis and deposition of metal nanoparticles by gas condensation process

Marina Maicu; Ralph Schmittgens; Dominic Hecker; Daniel Glöß; Peter Frach; Gerald Gerlach

J. Vac. Sci. Technol. A 32, 02B113 (2014) https://doi.org/10.1116/1.4859260

Abstract

View articletitled, Synthesis and deposition of metal nanoparticles by gas condensation process

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Growth of FePt encapsulated carbon nanotubes by thermal chemical vapor deposition

Yuji Fujiwara; Tetsuya Kaneko; Kenta Hori; Sho Takase; Hideki Sato; Kohji Maeda; Tadashi Kobayashi; Takeshi Kato; Satoshi Iwata; Mutsuko Jimbo

J. Vac. Sci. Technol. A 32, 02B114 (2014) https://doi.org/10.1116/1.4862087

Abstract

View articletitled, Growth of FePt encapsulated carbon nanotubes by thermal chemical vapor deposition

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CrN_x films prepared using feedback-controlled high power impulse magnetron sputter deposition

Wan-Yu Wu; Bo-Hung Hsiao; Pin-Hung Chen; Wei-Chih Chen; Chun-Ta Ho; Chi-Lung Chang

J. Vac. Sci. Technol. A 32, 02B115 (2014) https://doi.org/10.1116/1.4862147

Abstract

View articletitled, CrNx films prepared using feedback-controlled high power impulse magnetron sputter deposition

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Electrical properties of TiN on gallium nitride grown using different deposition conditions and annealing

Liuan Li; Akinori Kishi; Takayuki Shiraishi; Ying Jiang; Qingpeng Wang; Jin-Ping Ao

J. Vac. Sci. Technol. A 32, 02B116 (2014) https://doi.org/10.1116/1.4862084

Abstract

View articletitled, Electrical properties of TiN on gallium nitride grown using different deposition conditions and annealing

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Antibacterial properties and cytocompatibility of tantalum oxide coatings with different silver content

Heng-Li Huang; Yin-Yu Chang; Hung-Jui Chen; Yu-Kai Chou; Chih-Ho Lai; Michael Y. C. Chen

J. Vac. Sci. Technol. A 32, 02B117 (2014) https://doi.org/10.1116/1.4862543

Abstract

View articletitled, Antibacterial properties and cytocompatibility of tantalum oxide coatings with different silver content

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Structural, optical, and electrical properties of NiO-In composite films deposited by radio frequency cosputtering

Sheng-Chi Chen; Tsung-Yen Kuo; Hsin-Chih Lin; Chao-Kuang Wen; Yu-Chin Lin; Cong-Da Chen

J. Vac. Sci. Technol. A 32, 02B118 (2014) https://doi.org/10.1116/1.4865808

Abstract

View articletitled, Structural, optical, and electrical properties of NiO-In composite films deposited by radio frequency cosputtering

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Effect of annealing treatment on the electrical characteristics of Pt/Cr-embedded ZnO/Pt resistance random access memory devices

Li-Chun Chang; Hsuan-Ling Kao; Keng-Hao Liu

J. Vac. Sci. Technol. A 32, 02B119 (2014) https://doi.org/10.1116/1.4865551

Abstract

View articletitled, Effect of annealing treatment on the electrical characteristics of Pt/Cr-embedded ZnO/Pt resistance random access memory devices

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Issues

Letters

Review Articles

Interfaces

Photovoltaics and Energy

Plasma Science and Technology

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