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Issues
July 2012
ISSN 0734-2101
EISSN 1520-8559
Letters
Optimizing charge neutralization for a magnetic sector SIMS instrument in negative mode
J. Vac. Sci. Technol. A 30, 040601 (2012)
https://doi.org/10.1116/1.4719960
Selective chemical etch of gallium nitride by phosphoric acid
Chongmin Lee; Jennifer K. Hite; Michael A. Mastro; Jaime A. Freitas, Jr.; Charles R. Eddy, Jr.; Hong-Yeol Kim; Jihyun Kim
J. Vac. Sci. Technol. A 30, 040602 (2012)
https://doi.org/10.1116/1.4719528
Effect of p-type doping on the oxidation of H–Si(111) studied by second-harmonic generation
J. Vac. Sci. Technol. A 30, 040603 (2012)
https://doi.org/10.1116/1.4721329
Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study
J. Vac. Sci. Technol. A 30, 040604 (2012)
https://doi.org/10.1116/1.4722728
Nanopillar ITO electrodes via argon plasma etching
J. Vac. Sci. Technol. A 30, 040606 (2012)
https://doi.org/10.1116/1.4729592
Review Article
Pulsed high-density plasmas for advanced dry etching processes
J. Vac. Sci. Technol. A 30, 040801 (2012)
https://doi.org/10.1116/1.4716176
Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
J. Vac. Sci. Technol. A 30, 040802 (2012)
https://doi.org/10.1116/1.4728205
Plasma Science and Technology
Dry etching characteristics of TaN absorber for extreme ultraviolet mask with Ru buffer layer
J. Vac. Sci. Technol. A 30, 041301 (2012)
https://doi.org/10.1116/1.4718420
Comprehensive computer model for magnetron sputtering. I. Gas heating and rarefaction
J. Vac. Sci. Technol. A 30, 041302 (2012)
https://doi.org/10.1116/1.4712534
Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. I. Ar/O2 and He/H2 plasmas
J. Vac. Sci. Technol. A 30, 041303 (2012)
https://doi.org/10.1116/1.4718444
Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. II. Water uptake and change in dielectric constant
J. Vac. Sci. Technol. A 30, 041304 (2012)
https://doi.org/10.1116/1.4718447
Role of surface temperature in fluorocarbon plasma-surface interactions
J. Vac. Sci. Technol. A 30, 041305 (2012)
https://doi.org/10.1116/1.4729445
Nanostructuring of molybdenum and tungsten surfaces by low-energy helium ions
Gregory De Temmerman; Kirill Bystrov; Jakub J. Zielinski; Martin Balden; Gabriele Matern; Cecile Arnas; Laurent Marot
J. Vac. Sci. Technol. A 30, 041306 (2012)
https://doi.org/10.1116/1.4731196
Surfaces
Tracking electron-induced carbon contamination and cleaning of Ru surfaces by Auger electron spectroscopy
J. Vac. Sci. Technol. A 30, 041401 (2012)
https://doi.org/10.1116/1.4718426
Effect of surface contamination on electron tunneling in the high bias range
J. Vac. Sci. Technol. A 30, 041402 (2012)
https://doi.org/10.1116/1.4721640
In situ laser processing in a scanning electron microscope
Nicholas A. Roberts; Gregory A. Magel; Cheryl D. Hartfield; Thomas M. Moore; Jason D. Fowlkes; Philip D. Rack
J. Vac. Sci. Technol. A 30, 041404 (2012)
https://doi.org/10.1116/1.4731254
Thin Films
Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications
Tomi Ryynänen; Laura Ylä-Outinen; Susanna Narkilahti; Jarno M. A. Tanskanen; Jari Hyttinen; Jani Hämäläinen; Markku Leskelä; Jukka Lekkala
J. Vac. Sci. Technol. A 30, 041501 (2012)
https://doi.org/10.1116/1.4709447
Characterization studies of aluminum oxide barrier coatings on polymeric substrates
J. Vac. Sci. Technol. A 30, 041502 (2012)
https://doi.org/10.1116/1.4709451
Initiated-chemical vapor deposition of organosilicon layers: Monomer adsorption, bulk growth, and process window definition
J. Vac. Sci. Technol. A 30, 041503 (2012)
https://doi.org/10.1116/1.4711762
In/ITO whisker and optoelectronic properties of ITO films deposited by ion beam sputtering
J. Vac. Sci. Technol. A 30, 041504 (2012)
https://doi.org/10.1116/1.4716468
Influence of gamma irradiation on the C-V characteristics of the Al/SiNx/Si MIS capacitors
J. Vac. Sci. Technol. A 30, 041507 (2012)
https://doi.org/10.1116/1.4720351
Oxidation resistance of quintuple Ti-Al-Si-C-N coatings and associated mechanism
J. Vac. Sci. Technol. A 30, 041508 (2012)
https://doi.org/10.1116/1.4721376
Cooling effect of nanoscale Bi2Te3/Sb2Te3 multilayered thermoelectric thin films
J. Vac. Sci. Technol. A 30, 041509 (2012)
https://doi.org/10.1116/1.4725483
Compositional depth profiling of TaCN thin films
Christoph Adelmann; Thierry Conard; Alexis Franquet; Bert Brijs; Frans Munnik; Simon Burgess; Thomas Witters; Johan Meersschaut; Jorge A. Kittl; Wilfried Vandervorst; Sven Van Elshocht
J. Vac. Sci. Technol. A 30, 041510 (2012)
https://doi.org/10.1116/1.4726261
Extensive Raman spectroscopic investigation of ultrathin Co1−xNixSi2 films grown on Si(100)
Yinghua Piao; Zhiwei Zhu; Xindong Gao; Aliaksandra Karabko; Cheng Hu; Zhijun Qiu; Jun Luo; Zhi-Bin Zhang; Shi-Li Zhang; Dongping Wu
J. Vac. Sci. Technol. A 30, 041511 (2012)
https://doi.org/10.1116/1.4726295
Microstructure, phase transition, and interfacial chemistry of Gd2O3/Si(111) grown by electron-beam physical vapor deposition
J. Vac. Sci. Technol. A 30, 041512 (2012)
https://doi.org/10.1116/1.4726266
Indium and impurity incorporation in InGaN films on polar, nonpolar, and semipolar GaN orientations grown by ammonia molecular beam epitaxy
J. Vac. Sci. Technol. A 30, 041513 (2012)
https://doi.org/10.1116/1.4727967
Spectroscopic ellipsometry of superparamagnetic nanoparticles in thin films of poly(N-isopropylacrylamide)
J. Vac. Sci. Technol. A 30, 041514 (2012)
https://doi.org/10.1116/1.4727737
Permeability and corrosion in ZrO2/Al2O3 nanolaminate and Al2O3 thin films grown by atomic layer deposition on polymers
J. Vac. Sci. Technol. A 30, 041515 (2012)
https://doi.org/10.1116/1.4729447
Magnetron-sputter epitaxy of β-FeSi2(220)/Si(111) and β-FeSi2(431)/Si(001) thin films at elevated temperatures
J. Vac. Sci. Technol. A 30, 041516 (2012)
https://doi.org/10.1116/1.4731200
Vacuum Science and Technology
In situ study of erosion and deposition of amorphous hydrogenated carbon films by exposure to a hydrogen atom beam
J. Vac. Sci. Technol. A 30, 041601 (2012)
https://doi.org/10.1116/1.4723637
Energy Frontiers
Tin dioxide as an alternative window layer for improving the damp-heat stability of copper indium gallium diselenide solar cells
J. Vac. Sci. Technol. A 30, 04D101 (2012)
https://doi.org/10.1116/1.3692225
Effect of inserting a thin buffer layer on the efficiency in n-ZnO/p-Cu2O heterojunction solar cells
J. Vac. Sci. Technol. A 30, 04D103 (2012)
https://doi.org/10.1116/1.3698596
Solar cell with built-in charge: Experimental studies of diode model parameters
J. Vac. Sci. Technol. A 30, 04D104 (2012)
https://doi.org/10.1116/1.3703607
Electrochemical properties of sputter-deposited MoO3 films in lithium microbatteries
J. Vac. Sci. Technol. A 30, 04D105 (2012)
https://doi.org/10.1116/1.3701763
Chemical and structural study of electrically passivating Al2O3/Si interfaces prepared by atomic layer deposition
J. Vac. Sci. Technol. A 30, 04D106 (2012)
https://doi.org/10.1116/1.4704601
Investigating the effects of proton exchange membrane fuel cell conditions on carbon supported platinum electrocatalyst composition and performance
Anant Patel; Kateryna Artyushkova; Plamen Atanassov; Vesna Colbow; Monica Dutta; David Harvey; Silvia Wessel
J. Vac. Sci. Technol. A 30, 04D107 (2012)
https://doi.org/10.1116/1.4707153
Amorphous and nanocrystalline silicon thin film photovoltaic technology on flexible substrates
J. Vac. Sci. Technol. A 30, 04D108 (2012)
https://doi.org/10.1116/1.4707154
Photoresponse of PbS nanoparticles–quaterthiophene films prepared by gaseous deposition as probed by XPS
J. Vac. Sci. Technol. A 30, 04D109 (2012)
https://doi.org/10.1116/1.4709386
Charge transport and relaxation in hydrogenated barium titanate films and their potential for integrated supercapacitors
J. Vac. Sci. Technol. A 30, 04D110 (2012)
https://doi.org/10.1116/1.4714356
Correlations of Cu(In, Ga)Se2 imaging with device performance, defects, and microstructural properties
Steve Johnston; Thomas Unold; Ingrid Repins; Ana Kanevce; Katherine Zaunbrecher; Fei Yan; Jian V. Li; Patricia Dippo; Rajalakshmi Sundaramoorthy; Kim M. Jones; Bobby To
J. Vac. Sci. Technol. A 30, 04D111 (2012)
https://doi.org/10.1116/1.4714358
Variation in band offsets at ZnO/Sn:In2O3 heterojunctions measured by x-ray photoelectron spectroscopy
J. Vac. Sci. Technol. A 30, 04D112 (2012)
https://doi.org/10.1116/1.4719541
Effects of showerhead hole structure on the deposition of hydrogenated microcrystalline silicon thin films by vhf PECVD
J. Vac. Sci. Technol. A 30, 04D113 (2012)
https://doi.org/10.1116/1.4721287
Electronic effects of Cd on the formation of the CdS/CuInS2 heterojunction
J. Vac. Sci. Technol. A 30, 04D114 (2012)
https://doi.org/10.1116/1.4721639
Growth mechanism and surface atomic structure of AgInSe2
J. Vac. Sci. Technol. A 30, 04D115 (2012)
https://doi.org/10.1116/1.4728160
Photoreflectance characteristics of chemical-bath-deposited-CdS layer in Cu(In,Ga)Se2 thin-film solar cells
Yong-Duck Chung; Dae-Hyung Cho; Hae-Won Choi; Soo-Jeong Park; Ju-Hee Kim; Byung-Jun Ahn; Jung-Hoon Song; Kyu-Seok Lee; Jeha Kim
J. Vac. Sci. Technol. A 30, 04D116 (2012)
https://doi.org/10.1116/1.4728980
Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
Tiffany C. Kaspar, Sarah Akers, et al.
Recent trends in thermal atomic layer deposition chemistry
Georgi Popov, Miika Mattinen, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.