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Volume 30, Issue 3

May 2012

All Issues

ISSN 0734-2101

EISSN 1520-8559

In this Issue

Letters
Review Article
Interfaces
Plasma Science and Technology
Surfaces
Thin Films
Vacuum Science and Technology

Letters

Noninvasive measurement and control of the temperature of Pt nanofilms on Si supports

I. I. Nedrygailov; E. Hasselbrink; D. Diesing; S. K. Dasari; M. A. Hashemian; E. G. Karpov

J. Vac. Sci. Technol. A 30, 030601 (2012) https://doi.org/10.1116/1.3696973

Abstract

View articletitled, Noninvasive measurement and control of the temperature of Pt nanofilms on Si supports

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Influence of magnetic ordering on the elastic properties of PdFe₃N

Tetsuya Takahashi; Denis Music; Jochen M. Schneider

J. Vac. Sci. Technol. A 30, 030602 (2012) https://doi.org/10.1116/1.4703897

Abstract

View articletitled, Influence of magnetic ordering on the elastic properties of PdFe3N

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Review Article

High power impulse magnetron sputtering discharge

J. T. Gudmundsson; N. Brenning; D. Lundin; U. Helmersson

J. Vac. Sci. Technol. A 30, 030801 (2012) https://doi.org/10.1116/1.3691832

Abstract

View articletitled, High power impulse magnetron sputtering discharge

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Colloidal nanocrystal quantum dot assemblies as artificial solids

Tobias Hanrath

J. Vac. Sci. Technol. A 30, 030802 (2012) https://doi.org/10.1116/1.4705402

Abstract

View articletitled, Colloidal nanocrystal quantum dot assemblies as artificial solids

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Interfaces

Improved characteristics of mesa-type intrinsic Josephson junctions by vacuum cleavage process for Bi₂Sr₂CaCu₂O_8+δ/Au contacts

Hiroki Ishida; Takahiro Kato; Atsushi Saito; Kanji Yasui

J. Vac. Sci. Technol. A 30, 031101 (2012) https://doi.org/10.1116/1.4707151

Abstract

View articletitled, Improved characteristics of mesa-type intrinsic Josephson junctions by vacuum cleavage process for Bi2Sr2CaCu2O8+δ/Au contacts

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Plasma Science and Technology

Effect of Cl₂- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy

S. Bouchoule; L. Vallier; G. Patriarche; T. Chevolleau; C. Cardinaud

J. Vac. Sci. Technol. A 30, 031301 (2012) https://doi.org/10.1116/1.3692751

Abstract

View articletitled, Effect of Cl2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy

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Negative plasma potential in a multidipole chamber with a dielectric coated plasma boundary

J. P. Sheehan; Noah Hershkowitz

J. Vac. Sci. Technol. A 30, 031302 (2012) https://doi.org/10.1116/1.4705514

Abstract

View articletitled, Negative plasma potential in a multidipole chamber with a dielectric coated plasma boundary

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Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

Bayu A. Thedjoisworo; David Cheung; Davoud Zamani

J. Vac. Sci. Technol. A 30, 031303 (2012) https://doi.org/10.1116/1.4705512

Abstract

View articletitled, Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

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Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges

Hyungjoo Shin; Weiye Zhu; Demetre J. Economou; Vincent M. Donnelly

J. Vac. Sci. Technol. A 30, 031304 (2012) https://doi.org/10.1116/1.4705515

Abstract

View articletitled, Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges

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Surfaces

Binding of styrene on silicon (111)-7 × 7 surfaces as a model molecular electronics system

Conan R. Weiland; Liu Yang; Douglas J. Doren; Carl A. Menning; Dimitri Skliar; Brian G. Willis; Jingguang G. Chen; Robert L. Opila

J. Vac. Sci. Technol. A 30, 031401 (2012) https://doi.org/10.1116/1.3701712

Abstract

View articletitled, Binding of styrene on silicon (111)-7 × 7 surfaces as a model molecular electronics system

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Solvent-assisted growth of metal phthalocyanine thin films on Au(111)

Levan Tskipuri; Qian Shao; Janice Reutt-Robey

J. Vac. Sci. Technol. A 30, 031402 (2012) https://doi.org/10.1116/1.4705511

Abstract

View articletitled, Solvent-assisted growth of metal phthalocyanine thin films on Au(111)

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Thin Films

Improvement of electrical and optical properties of molybdenum oxide thin films by ultralow pressure sputtering method

Myeong Sook Oh; Bong Seob Yang; Jong Ho Lee; Seong Ha Oh; Ung Soo Lee; Yoon Jang Kim; Hyeong Joon Kim; Myung Soo Huh

J. Vac. Sci. Technol. A 30, 031501 (2012) https://doi.org/10.1116/1.3692753

Abstract

View articletitled, Improvement of electrical and optical properties of molybdenum oxide thin films by ultralow pressure sputtering method

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Influence of process parameters on rolling-contact-fatigue life of ion plated nickel–copper–silver lubrication

Mike Danyluk; Anoop Dhingra

J. Vac. Sci. Technol. A 30, 031502 (2012) https://doi.org/10.1116/1.3693603

Abstract

View articletitled, Influence of process parameters on rolling-contact-fatigue life of ion plated nickel–copper–silver lubrication

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Visible light-induced photocatalytic properties of WO₃ films deposited by dc reactive magnetron sputtering

Masahiro Imai; Maiko Kikuchi; Nobuto Oka; Yuzo Shigesato

J. Vac. Sci. Technol. A 30, 031503 (2012) https://doi.org/10.1116/1.3696876

Abstract

View articletitled, Visible light-induced photocatalytic properties of WO3 films deposited by dc reactive magnetron sputtering

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Influence of chemical composition and deposition conditions on microstructure evolution during annealing of arc evaporated ZrAlN thin films

L. Rogström; M. P. Johansson; N. Ghafoor; L. Hultman; M. Odén

J. Vac. Sci. Technol. A 30, 031504 (2012) https://doi.org/10.1116/1.3698592

Abstract

View articletitled, Influence of chemical composition and deposition conditions on microstructure evolution during annealing of arc evaporated ZrAlN thin films

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Equivalent-circuit model for vacuum ultraviolet irradiation of dielectric films

Harsh Sinha; J. Leon Shohet

J. Vac. Sci. Technol. A 30, 031505 (2012) https://doi.org/10.1116/1.3693602

Abstract

View articletitled, Equivalent-circuit model for vacuum ultraviolet irradiation of dielectric films

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Influence of process parameters on properties of reactively sputtered tungsten nitride thin films

Maria L. Addonizio; Anna Castaldo; Alessandro Antonaia; Emilia Gambale; Laura Iemmo

J. Vac. Sci. Technol. A 30, 031506 (2012) https://doi.org/10.1116/1.3698399

Abstract

View articletitled, Influence of process parameters on properties of reactively sputtered tungsten nitride thin films

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Influence of ionization degree on film properties when using high power impulse magnetron sputtering

Mattias Samuelsson; Daniel Lundin; Kostas Sarakinos; Fredrik Björefors; Bengt Wälivaara; Henrik Ljungcrantz; U. Helmersson

J. Vac. Sci. Technol. A 30, 031507 (2012) https://doi.org/10.1116/1.3700227

Abstract

View articletitled, Influence of ionization degree on film properties when using high power impulse magnetron sputtering

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Incompatibility of standard III–V compound semiconductor processing techniques with terbium-doped InGaAs of high terbium concentration

Ashok T. Ramu; Laura E. Clinger; Pernell B. Dongmo; Jeffrey T. Imamura; Joshua M. O. Zide; John E. Bowers

J. Vac. Sci. Technol. A 30, 031508 (2012) https://doi.org/10.1116/1.3701951

Abstract

View articletitled, Incompatibility of standard III–V compound semiconductor processing techniques with terbium-doped InGaAs of high terbium concentration

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Thin layer composition profiling with angular resolved x-ray photoemission spectroscopy: Factors affecting quantitative results

T. Conard; W. Vandervorst; A. Bergmaier; K. Kimura

J. Vac. Sci. Technol. A 30, 031509 (2012) https://doi.org/10.1116/1.4704603

Abstract

View articletitled, Thin layer composition profiling with angular resolved x-ray photoemission spectroscopy: Factors affecting quantitative results

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Effect of target–substrate distance on properties of flexible InZnSnO films grown by linear facing target sputtering

Hyun-Su Shin; Ju-Hyun Lee; Han-Ki Kim

J. Vac. Sci. Technol. A 30, 031510 (2012) https://doi.org/10.1116/1.4705520

Abstract

View articletitled, Effect of target–substrate distance on properties of flexible InZnSnO films grown by linear facing target sputtering

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Effect of reactor pressure on the electrical and structural properties of InN epilayers grown by high-pressure chemical vapor deposition

M. K. Indika Senevirathna; Sampath Gamage; Ramazan Atalay; Ananta R. Acharya; A. G. Unil Perera; Nikolaus Dietz; Max Buegler; Axel Hoffmann; Liqin Su; Andrew Melton; Ian Ferguson

J. Vac. Sci. Technol. A 30, 031511 (2012) https://doi.org/10.1116/1.4705727

Abstract

View articletitled, Effect of reactor pressure on the electrical and structural properties of InN epilayers grown by high-pressure chemical vapor deposition

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Atomic force microscopy and x-ray diffraction studies on agglomeration phenomena of ultrathin Au/Fe bilayers

Masao Kamiko; Jung-Woo Koo; Jae-Min Kim; Jae-Geun Ha

J. Vac. Sci. Technol. A 30, 031512 (2012) https://doi.org/10.1116/1.4705518

Abstract

View articletitled, Atomic force microscopy and x-ray diffraction studies on agglomeration phenomena of ultrathin Au/Fe bilayers

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Vacuum Science and Technology

Study on surface modification of silicon using CHF₃/O₂ plasma for nano-imprint lithography

Youngkeun Kim; Sungchil Kang; Yong-Hyun Ham; Kwang-Ho Kwon; Dmitriy Alexandrovich Shutov; Hyun-Woo Lee; Jae Jong Lee; Lee-Mi Do; Kyu-Ha Baek

J. Vac. Sci. Technol. A 30, 031601 (2012) https://doi.org/10.1116/1.3695995

Abstract

View articletitled, Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithography

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Design and construction of the SuperKEKB vacuum system

Yusuke Suetsugu; Ken-ichi Kanazawa; Kyo Shibata; Takuya Ishibashi; Hiromi Hisamatsu; Mitsuru Shirai; Shinji Terui

J. Vac. Sci. Technol. A 30, 031602 (2012) https://doi.org/10.1116/1.3696683

Abstract

View articletitled, Design and construction of the SuperKEKB vacuum system

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Quantification of the atomic hydrogen flux as a function of filament temperature and H₂ flow rate

D. Ugur; A. J. Storm; R. Verberk; J. C. Brouwer; W. G. Sloof

J. Vac. Sci. Technol. A 30, 031603 (2012) https://doi.org/10.1116/1.3700231

Abstract

View articletitled, Quantification of the atomic hydrogen flux as a function of filament temperature and H2 flow rate

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Letters

Noninvasive measurement and control of the temperature of Pt nanofilms on Si supports

Influence of magnetic ordering on the elastic properties of PdFe₃N

Review Article

High power impulse magnetron sputtering discharge

Colloidal nanocrystal quantum dot assemblies as artificial solids

Interfaces

Improved characteristics of mesa-type intrinsic Josephson junctions by vacuum cleavage process for Bi₂Sr₂CaCu₂O_8+δ/Au contacts

Plasma Science and Technology

Effect of Cl₂- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy

Negative plasma potential in a multidipole chamber with a dielectric coated plasma boundary

Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges

Surfaces

Binding of styrene on silicon (111)-7 × 7 surfaces as a model molecular electronics system

Solvent-assisted growth of metal phthalocyanine thin films on Au(111)

Thin Films

Improvement of electrical and optical properties of molybdenum oxide thin films by ultralow pressure sputtering method

Influence of process parameters on rolling-contact-fatigue life of ion plated nickel–copper–silver lubrication

Visible light-induced photocatalytic properties of WO₃ films deposited by dc reactive magnetron sputtering

Influence of chemical composition and deposition conditions on microstructure evolution during annealing of arc evaporated ZrAlN thin films

Equivalent-circuit model for vacuum ultraviolet irradiation of dielectric films

Influence of process parameters on properties of reactively sputtered tungsten nitride thin films

Influence of ionization degree on film properties when using high power impulse magnetron sputtering

Incompatibility of standard III–V compound semiconductor processing techniques with terbium-doped InGaAs of high terbium concentration

Thin layer composition profiling with angular resolved x-ray photoemission spectroscopy: Factors affecting quantitative results

Effect of target–substrate distance on properties of flexible InZnSnO films grown by linear facing target sputtering

Effect of reactor pressure on the electrical and structural properties of InN epilayers grown by high-pressure chemical vapor deposition

Atomic force microscopy and x-ray diffraction studies on agglomeration phenomena of ultrathin Au/Fe bilayers

Vacuum Science and Technology

Study on surface modification of silicon using CHF₃/O₂ plasma for nano-imprint lithography

Design and construction of the SuperKEKB vacuum system

Quantification of the atomic hydrogen flux as a function of filament temperature and H₂ flow rate

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Review Article

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