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Letters

Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenches

Thomas Defforge; Gaël Gautier; Thomas Tillocher; Rémi Dussart; François Tran-Van

J. Vac. Sci. Technol. A 30, 010601 (2012) https://doi.org/10.1116/1.3665217

View articletitled, Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenches

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Review Article

Atomic layer deposition for nanostructured Li-ion batteries

H. C. M. Knoops; M. E. Donders; M. C. M. van de Sanden; P. H. L. Notten; W. M. M. Kessels

J. Vac. Sci. Technol. A 30, 010801 (2012) https://doi.org/10.1116/1.3660699

Abstract

View articletitled, Atomic layer deposition for nanostructured Li-ion batteries

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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Paul Poodt; David C. Cameron; Eric Dickey; Steven M. George; Vladimir Kuznetsov; Gregory N. Parsons; Fred Roozeboom; Ganesh Sundaram; Ad Vermeer

J. Vac. Sci. Technol. A 30, 010802 (2012) https://doi.org/10.1116/1.3670745

Abstract

View articletitled, Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

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Atomic layer deposition for electrochemical energy generation and storage systems

Qing Peng; Jay S. Lewis; Paul G. Hoertz; Jeffrey T. Glass; Gregory N. Parsons

J. Vac. Sci. Technol. A 30, 010803 (2012) https://doi.org/10.1116/1.3672027

Abstract

View articletitled, Atomic layer deposition for electrochemical energy generation and storage systems

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Photovoltaics and Energy

Impact of CdSe/ZnS quantum dot spectrum converters on InGaP/GaAs/Ge multi-junction solar cells

Chun-Yuan Huang

J. Vac. Sci. Technol. A 30, 011201 (2012) https://doi.org/10.1116/1.3673784

Abstract

View articletitled, Impact of CdSe/ZnS quantum dot spectrum converters on InGaP/GaAs/Ge multi-junction solar cells

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Plasma Science and Technology

Spatially resolved study of primary electron transport in magnetic cusps

Aimee A. Hubble; John E. Foster

J. Vac. Sci. Technol. A 30, 011301 (2012) https://doi.org/10.1116/1.3656742

Abstract

View articletitled, Spatially resolved study of primary electron transport in magnetic cusps

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Power effect of ZnO:Al film as back reflector on the performance of thin-film solar cells

Yang-Shih Lin; Shui-Yang Lien; Chao-Chun Wang; Chueh-Yang Liu; Asheesh Nautiyal; Dong-Sing Wuu; Pi-Chuen Tsai; Chia-Fu Chen; Shuo-Jen Lee

J. Vac. Sci. Technol. A 30, 011302 (2012) https://doi.org/10.1116/1.3667109

Abstract

View articletitled, Power effect of ZnO:Al film as back reflector on the performance of thin-film solar cells

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Surfaces

Substrate grain size and orientation of Cu and Cu–Ni foils used for the growth of graphene films

Zachary R. Robinson; Parul Tyagi; Thomas M. Murray; Carl A. Ventrice, Jr.; Shanshan Chen; Andrew Munson; Carl W. Magnuson; Rodney S. Ruoff

J. Vac. Sci. Technol. A 30, 011401 (2012) https://doi.org/10.1116/1.3663877

Abstract

View articletitled, Substrate grain size and orientation of Cu and Cu–Ni foils used for the growth of graphene films

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Energy calibrations in the x-ray absorption spectroscopy of uranium dioxide

Sung Woo Yu; J. G. Tobin; Paul Olalde-Velasco; Wan Li Yang; Wigbert J. Siekhaus

J. Vac. Sci. Technol. A 30, 011402 (2012) https://doi.org/10.1116/1.3670402

Abstract

View articletitled, Energy calibrations in the x-ray absorption spectroscopy of uranium dioxide

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Thin Films

Probing compositional disorder in vanadium oxide thin films grown on atomic layer deposited hafnia on silicon by capacitance spectroscopy

Changhyun Ko; You Zhou; Shriram Ramanathan

J. Vac. Sci. Technol. A 30, 011501 (2012) https://doi.org/10.1116/1.3659020

Abstract

View articletitled, Probing compositional disorder in vanadium oxide thin films grown on atomic layer deposited hafnia on silicon by capacitance spectroscopy

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Deposition of novel nanocomposite films by a newly developed differential pumping co-sputtering system

Masateru Nose; Takeshi Kurimoto; Atsushi Saiki; Kenji Matsuda; Kiyoshi Terayama

J. Vac. Sci. Technol. A 30, 011502 (2012) https://doi.org/10.1116/1.3659704

Abstract

View articletitled, Deposition of novel nanocomposite films by a newly developed differential pumping co-sputtering system

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Compact tool for deposition of composition spread alloy films

Deepika Priyadarshini; Petro Kondratyuk; James B. Miller; Andrew J. Gellman

J. Vac. Sci. Technol. A 30, 011503 (2012) https://doi.org/10.1116/1.3664078

Abstract

View articletitled, Compact tool for deposition of composition spread alloy films

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Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF₆ based plasmas

Alexander Perros; Markus Bosund; Timo Sajavaara; Mikko Laitinen; Lauri Sainiemi; Teppo Huhtio; Harri Lipsanen

J. Vac. Sci. Technol. A 30, 011504 (2012) https://doi.org/10.1116/1.3664306

Abstract

View articletitled, Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

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Comparison of wet and dry etching of zinc indium oxide for thin film transistors with an inverted gate structure

Michael A. Marrs; Bryan D. Vogt; Gregory B. Raupp

J. Vac. Sci. Technol. A 30, 011505 (2012) https://doi.org/10.1116/1.3668090

Abstract

View articletitled, Comparison of wet and dry etching of zinc indium oxide for thin film transistors with an inverted gate structure

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Transparent polycrystalline monoclinic HfO₂ dielectrics prepared by plasma assisted pulsed laser deposition

Zhifeng Ying; Jian Sun; Zhigao Hu; Wenlei Yu; Ning Xu; Jiada Wu

J. Vac. Sci. Technol. A 30, 011506 (2012) https://doi.org/10.1116/1.3673783

Abstract

View articletitled, Transparent polycrystalline monoclinic HfO2 dielectrics prepared by plasma assisted pulsed laser deposition

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Vacuum Science and Technology

Effects of B₁₈H_x⁺ and B₁₈H_x dimer ion implantations on crystallinity and retained B dose in silicon

Yoji Kawasaki; Kentaro Shibahara

J. Vac. Sci. Technol. A 30, 011601 (2012) https://doi.org/10.1116/1.3655892

Abstract

View articletitled, Effects of B18Hx+ and B18Hx dimer ion implantations on crystallinity and retained B dose in silicon

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Perspectives

Thin-film electronics by atomic layer deposition

David H. Levy; Shelby F. Nelson

J. Vac. Sci. Technol. A 30, 018501 (2012) https://doi.org/10.1116/1.3670748

Abstract

View articletitled, Thin-film electronics by atomic layer deposition

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Atomic Layer Deposition (ALD)

Reaction mechanisms of atomic layer deposition of TaN_x from Ta(NMe₂)₅ precursor and H₂-based plasmas

H. C. M. Knoops; E. Langereis; M. C. M. van de Sanden; W. M. M. Kessels

J. Vac. Sci. Technol. A 30, 01A101 (2012) https://doi.org/10.1116/1.3625565

Abstract

View articletitled, Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas

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Nucleation delay in atomic layer deposition on a thin organic layer and the role of reaction thermochemistry

Kevin J. Hughes; James R. Engstrom

J. Vac. Sci. Technol. A 30, 01A102 (2012) https://doi.org/10.1116/1.3625564

Abstract

View articletitled, Nucleation delay in atomic layer deposition on a thin organic layer and the role of reaction thermochemistry

Supplementary Material

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Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

J. Swerts; S. Armini; L. Carbonell; A. Delabie; A. Franquet; S. Mertens; M. Popovici; M. Schaekers; T. Witters; Z. Tökei; G. Beyer; S. Van Elshocht; V. Gravey; A. Cockburn; K. Shah; J. Aubuchon

J. Vac. Sci. Technol. A 30, 01A103 (2012) https://doi.org/10.1116/1.3625566

Abstract

View articletitled, Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

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Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al₂O₃ film as the tunnel and blocking oxides for nonvolatile memory applications

Jaesang Lee; Hyungchul Kim; Taeyong Park; Youngbin Ko; Jaehun Ryu; Heeyoung Jeon; Jingyu Park; Hyeongtag Jeon

J. Vac. Sci. Technol. A 30, 01A104 (2012) https://doi.org/10.1116/1.3639131

Abstract

View articletitled, Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications

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Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides

Kyle A. Vasquez; Anita J. Vincent-Johnson; W. Christopher Hughes; Brian H. Augustine; Kyoungmi Lee; Gregory N. Parsons; Giovanna Scarel

J. Vac. Sci. Technol. A 30, 01A105 (2012) https://doi.org/10.1116/1.3639134

Abstract

View articletitled, Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides

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Study of amorphous lithium silicate thin films grown by atomic layer deposition

Jani Hämäläinen; Frans Munnik; Timo Hatanpää; Jani Holopainen; Mikko Ritala; Markku Leskelä

J. Vac. Sci. Technol. A 30, 01A106 (2012) https://doi.org/10.1116/1.3643349

Abstract

View articletitled, Study of amorphous lithium silicate thin films grown by atomic layer deposition

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Combination of characterization techniques for atomic layer deposition MoO₃ coatings: From the amorphous to the orthorhombic α-MoO₃ crystalline phase

Madeleine Diskus; Ola Nilsen; Helmer Fjellvåg; Spyros Diplas; Pablo Beato; Clare Harvey; Evelien van Schrojenstein Lantman; Bert M. Weckhuysen

J. Vac. Sci. Technol. A 30, 01A107 (2012) https://doi.org/10.1116/1.3643350

Abstract

View articletitled, Combination of characterization techniques for atomic layer deposition MoO3 coatings: From the amorphous to the orthorhombic α-MoO3 crystalline phase

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Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactor

Xinhua Liang; Ying-Bing Jiang; Alan W. Weimer

J. Vac. Sci. Technol. A 30, 01A108 (2012) https://doi.org/10.1116/1.3644952

Abstract

View articletitled, Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactor

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Plasma and vacuum ultraviolet induced charging of SiO₂ and HfO₂ patterned structures

J. L. Lauer; G. S. Upadhyaya; H. Sinha; J. B. Kruger; Y. Nishi; J. L. Shohet

J. Vac. Sci. Technol. A 30, 01A109 (2012) https://doi.org/10.1116/1.3654012

Abstract

View articletitled, Plasma and vacuum ultraviolet induced charging of SiO2 and HfO2 patterned structures

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Use of a high-flow diaphragm valve in the exhaust line of atomic layer deposition reactors

Neil P. Dasgupta; Orlando Trejo; Fritz B. Prinz

J. Vac. Sci. Technol. A 30, 01A110 (2012) https://doi.org/10.1116/1.3656945

Abstract

View articletitled, Use of a high-flow diaphragm valve in the exhaust line of atomic layer deposition reactors

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Temperature induced changes in a AgPt nanofilm on Ru(0001)

Jens Onsgaard; P. Jan Godowski; Zhe Shen Li

J. Vac. Sci. Technol. A 30, 01A111 (2012) https://doi.org/10.1116/1.3653986

Abstract

View articletitled, Temperature induced changes in a AgPt nanofilm on Ru(0001)

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Thermal chemistry of Mn₂(CO)₁₀ during deposition of thin manganese films on silicon oxide and on copper surfaces

Xiangdong Qin; Huaxing Sun; Francisco Zaera

J. Vac. Sci. Technol. A 30, 01A112 (2012) https://doi.org/10.1116/1.3658373

Abstract

View articletitled, Thermal chemistry of Mn2(CO)10 during deposition of thin manganese films on silicon oxide and on copper surfaces

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Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al₂O₃ tunnel barriers

Nasir Alimardani; E. William Cowell, III; John F. Wager; John F. Conley, Jr.; David R. Evans; Matthew Chin; Stephen J. Kilpatrick; Madan Dubey

J. Vac. Sci. Technol. A 30, 01A113 (2012) https://doi.org/10.1116/1.3658380

Abstract

View articletitled, Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al2O3 tunnel barriers

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Thermal chemistry of copper(I)-N,N ′-di-sec-butylacetamidinate on Cu(110) single-crystal surfaces

Qiang Ma; Francisco Zaera; Roy G. Gordon

J. Vac. Sci. Technol. A 30, 01A114 (2012) https://doi.org/10.1116/1.3658381

Abstract

View articletitled, Thermal chemistry of copper(I)-N,N ′-di-sec-butylacetamidinate on Cu(110) single-crystal surfaces

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Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

Maarit Kariniemi; Jaakko Niinistö; Marko Vehkamäki; Marianna Kemell; Mikko Ritala; Markku Leskelä; Matti Putkonen

J. Vac. Sci. Technol. A 30, 01A115 (2012) https://doi.org/10.1116/1.3659699

Abstract

View articletitled, Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

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Core-shell nanowire arrays of metal oxides fabricated by atomic layer deposition

M. A. Thomas; J. B. Cui

J. Vac. Sci. Technol. A 30, 01A116 (2012) https://doi.org/10.1116/1.3660389

Abstract

View articletitled, Core-shell nanowire arrays of metal oxides fabricated by atomic layer deposition

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Paper deacidification and UV protection using ZnO atomic layer deposition

C. A. Hanson; C. J. Oldham; G. N. Parsons

J. Vac. Sci. Technol. A 30, 01A117 (2012) https://doi.org/10.1116/1.3656251

Abstract

View articletitled, Paper deacidification and UV protection using ZnO atomic layer deposition

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Effect of pulsed deposition of Al₂O₃ for native oxides reduction of GaAs by atomic layer deposition technique

R. B. Konda; R. Mundle; O. Bamiduro; H. Dondapati; M. Bahoura; A. K. Pradhan; C. Donley

J. Vac. Sci. Technol. A 30, 01A118 (2012) https://doi.org/10.1116/1.3662862

Abstract

View articletitled, Effect of pulsed deposition of Al2O3 for native oxides reduction of GaAs by atomic layer deposition technique

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Evaluation of high thermal stability cyclopentadienyl Hf precursors with H₂O as a co-reactant for advanced gate logic applications

Steven Consiglio; Robert D. Clark; Genji Nakamura; Cory S. Wajda; Gert J. Leusink

J. Vac. Sci. Technol. A 30, 01A119 (2012) https://doi.org/10.1116/1.3664106

Abstract

View articletitled, Evaluation of high thermal stability cyclopentadienyl Hf precursors with H2O as a co-reactant for advanced gate logic applications

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Impact of precursor chemistry on atomic layer deposition of lutetium aluminates

Laura Nyns; Xiaoping Shi; Hilde Tielens; Sven Van Elshocht; Lucien Date; Robert Schreutelkamp

J. Vac. Sci. Technol. A 30, 01A120 (2012) https://doi.org/10.1116/1.3662838

Abstract

View articletitled, Impact of precursor chemistry on atomic layer deposition of lutetium aluminates

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Molecular layer deposition of polyethylene terephthalate thin films

Tatyana V. Ivanova; Philipp S. Maydannik; David C. Cameron

J. Vac. Sci. Technol. A 30, 01A121 (2012) https://doi.org/10.1116/1.3662846

Abstract

View articletitled, Molecular layer deposition of polyethylene terephthalate thin films

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Continuous atomic layer deposition: Explanation for anomalous growth rate effects

Philipp S. Maydannik; Tommi O. Kaariainen; David. C. Cameron

J. Vac. Sci. Technol. A 30, 01A122 (2012) https://doi.org/10.1116/1.3662861

Abstract

View articletitled, Continuous atomic layer deposition: Explanation for anomalous growth rate effects

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Atomic layer deposition of Al₂O₃ on V₂O₅ xerogel film for enhanced lithium-ion intercalation stability

Dawei Liu; Yanyi Liu; Stephanie L. Candelaria; Guozhong Cao; Jun Liu; Yoon-Ha Jeong

J. Vac. Sci. Technol. A 30, 01A123 (2012) https://doi.org/10.1116/1.3664115

Abstract

View articletitled, Atomic layer deposition of Al2O3 on V2O5 xerogel film for enhanced lithium-ion intercalation stability

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Atomic layer deposition of GaN at low temperatures

Cagla Ozgit; Inci Donmez; Mustafa Alevli; Necmi Biyikli

J. Vac. Sci. Technol. A 30, 01A124 (2012) https://doi.org/10.1116/1.3664102

Abstract

View articletitled, Atomic layer deposition of GaN at low temperatures

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Atomic layer deposition fabricated substoichiometric TiO_x nanorods as fuel cell catalyst supports

Richard Phillips; Paul Hansen; Eric Eisenbraun

J. Vac. Sci. Technol. A 30, 01A125 (2012) https://doi.org/10.1116/1.3664111

Abstract

View articletitled, Atomic layer deposition fabricated substoichiometric TiOx nanorods as fuel cell catalyst supports

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Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

Seok-Jun Won; Hyung-Suk Jung; Sungin Suh; Yu Jin Choi; Nae-In Lee; Cheol Seong Hwang; Hyeong Joon Kim

J. Vac. Sci. Technol. A 30, 01A126 (2012) https://doi.org/10.1116/1.3664122

Abstract

View articletitled, Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

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Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates

Annelies Delabie; Sonja Sioncke; Jens Rip; Sven Van Elshocht; Geoffrey Pourtois; Matthias Mueller; Burkhard Beckhoff; Kristine Pierloot

J. Vac. Sci. Technol. A 30, 01A127 (2012) https://doi.org/10.1116/1.3664090

Abstract

View articletitled, Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates

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Selective atomic layer deposition with electron-beam patterned self-assembled monolayers

Jie Huang; Mingun Lee; Jiyoung Kim

J. Vac. Sci. Technol. A 30, 01A128 (2012) https://doi.org/10.1116/1.3664282

Abstract

View articletitled, Selective atomic layer deposition with electron-beam patterned self-assembled monolayers

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Atomic layer deposition of Pt growth template for orienting PbZr_xTi₁₋_xO₃ thin films

Daniel M. Potrepka; Luz M. Sanchez; Ronald G. Polcawich

J. Vac. Sci. Technol. A 30, 01A129 (2012) https://doi.org/10.1116/1.3664766

Abstract

View articletitled, Atomic layer deposition of Pt growth template for orienting PbZrxTi1−xO3 thin films

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Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide

Steven A. Vitale; Peter W. Wyatt; Chris J. Hodson

J. Vac. Sci. Technol. A 30, 01A130 (2012) https://doi.org/10.1116/1.3664756

Abstract

View articletitled, Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide

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Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al₂O₃ films and Al₂O₃/a-SiN_x:H stacks

W. Keuning; P. van de Weijer; H. Lifka; W. M. M. Kessels; M. Creatore

J. Vac. Sci. Technol. A 30, 01A131 (2012) https://doi.org/10.1116/1.3664762

Abstract

View articletitled, Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks

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Nanoscratch testing of atomic layer deposition and magnetron sputtered TiO₂ and Al₂O₃ coatings on polymeric substrates

Tommi O. Kääriäinen; Peter J. Kelly; David C. Cameron; Ben Beake; Heqing Li; Clara M. Barker; Carolin F. Struller

J. Vac. Sci. Technol. A 30, 01A132 (2012) https://doi.org/10.1116/1.3665418

Abstract

View articletitled, Nanoscratch testing of atomic layer deposition and magnetron sputtered TiO2 and Al2O3 coatings on polymeric substrates

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Real-time spectroscopic ellipsometric investigation of adsorption and desorption in atomic layer deposition: A case study for the strontium bis(tri-isopropylcyclopentadienyl)/water process

Han Wang (王瀚); Xiaoqiang Jiang (蒋晓强); Brian G. Willis

J. Vac. Sci. Technol. A 30, 01A133 (2012) https://doi.org/10.1116/1.3664757

Abstract

View articletitled, Real-time spectroscopic ellipsometric investigation of adsorption and desorption in atomic layer deposition: A case study for the strontium bis(tri-isopropylcyclopentadienyl)/water process

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Atomic layer deposition of titanium phosphate on silica nanoparticles

Monika K. Wiedmann; David H. K. Jackson; Yomaira J. Pagan-Torres; Eunkyung Cho; James A. Dumesic; T. F. Kuech

J. Vac. Sci. Technol. A 30, 01A134 (2012) https://doi.org/10.1116/1.3664097

Abstract

View articletitled, Atomic layer deposition of titanium phosphate on silica nanoparticles

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Growth characteristics, material properties, and optical properties of zinc oxysulfide films deposited by atomic layer deposition

Jonathan R. Bakke; Jukka T. Tanskanen; Carl Hägglund; Tapani A. Pakkanen; Stacey F. Bent

J. Vac. Sci. Technol. A 30, 01A135 (2012) https://doi.org/10.1116/1.3664758

Abstract

View articletitled, Growth characteristics, material properties, and optical properties of zinc oxysulfide films deposited by atomic layer deposition

Supplementary Material

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Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head

P. Ryan Fitzpatrick; Zachary M. Gibbs; Steven M. George

J. Vac. Sci. Technol. A 30, 01A136 (2012) https://doi.org/10.1116/1.3664765

Abstract

View articletitled, Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head

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Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment

E. Steven Brandt; Jeremy M. Grace

J. Vac. Sci. Technol. A 30, 01A137 (2012) https://doi.org/10.1116/1.3666026

Abstract

View articletitled, Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment

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Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminum

Hai Yuan; Bing Luo; Dan Yu; An-jen Cheng; Stephen A. Campbell; Wayne L. Gladfelter

J. Vac. Sci. Technol. A 30, 01A138 (2012) https://doi.org/10.1116/1.3666030

Abstract

View articletitled, Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminum

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Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

Taeyong Park; Jaesang Lee; Jingyu Park; Heeyoung Jeon; Hyeongtag Jeon; Ki-Hoon Lee; Byung-Chul Cho; Moo-Sung Kim; Heui-Bok Ahn

J. Vac. Sci. Technol. A 30, 01A139 (2012) https://doi.org/10.1116/1.3666033

Abstract

View articletitled, Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

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Process study of gadolinium aluminate atomic layer deposition fromthegadolinium tris-di-isopropylacetamidinate precursor

Leonard N. J. Rodriguez; A. Franquet; B. Brijs; H. Tielens; C. Adelmann

J. Vac. Sci. Technol. A 30, 01A140 (2012) https://doi.org/10.1116/1.3666037

Abstract

View articletitled, Process study of gadolinium aluminate atomic layer deposition fromthegadolinium tris-di-isopropylacetamidinate precursor

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Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline silicon

Sheng-Hui Chen; Shao-Ze Tseng; Wei Chen; Wen-Hao Cho; Chia-Hua Chan

J. Vac. Sci. Technol. A 30, 01A141 (2012) https://doi.org/10.1116/1.3666040

Abstract

View articletitled, Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline silicon

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Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

Paul Poodt; Raymond Knaapen; Andrea Illiberi; Fred Roozeboom; Almie van Asten

J. Vac. Sci. Technol. A 30, 01A142 (2012) https://doi.org/10.1116/1.3667113

Abstract

View articletitled, Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronics

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In situ study of the atomic layer deposition of HfO₂ on Si

Krzysztof Kolanek; Massimo Tallarida; Marcel Michling; Dieter Schmeisser

J. Vac. Sci. Technol. A 30, 01A143 (2012) https://doi.org/10.1116/1.3668080

Abstract

View articletitled, In situ study of the atomic layer deposition of HfO2 on Si

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Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NH_x radical formation

Hideharu Shimizu; Kaoru Sakoda; Takeshi Momose; Mitsuo Koshi; Yukihiro Shimogaki

J. Vac. Sci. Technol. A 30, 01A144 (2012) https://doi.org/10.1116/1.3666034

Abstract

View articletitled, Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation

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Chemical passivation of GaSb-based surfaces by atomic layer deposited ZnS using diethylzinc and hydrogen sulfide

Runshen Xu; Christos G. Takoudis

J. Vac. Sci. Technol. A 30, 01A145 (2012) https://doi.org/10.1116/1.3669519

Abstract

View articletitled, Chemical passivation of GaSb-based surfaces by atomic layer deposited ZnS using diethylzinc and hydrogen sulfide

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Room temperature atomic layer deposition of Al₂O₃ and replication of butterfly wings for photovoltaic application

X. Tang; L. A. Francis; P. Simonis; M. Haslinger; R. Delamare; O. Deschaume; D. Flandre; P. Defrance; A. M. Jonas; J. P. Vigneron; J. P. Raskin

J. Vac. Sci. Technol. A 30, 01A146 (2012) https://doi.org/10.1116/1.3669521

Abstract

View articletitled, Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application

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Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties

Fu Tang; Chiyu Zhu; David J. Smith; Robert J. Nemanich

J. Vac. Sci. Technol. A 30, 01A147 (2012) https://doi.org/10.1116/1.3665419

Abstract

View articletitled, Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties

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Resistive switching properties of plasma enhanced-ALD La₂O₃ for novel nonvolatile memory application

Lin Chen; Wen Yang; Ye Li; Qing-Qing Sun; Peng Zhou; Hong-Liang Lu; Shi-Jin Ding; David Wei Zhang

J. Vac. Sci. Technol. A 30, 01A148 (2012) https://doi.org/10.1116/1.3669516

Abstract

View articletitled, Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application

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Atomic layer deposition of ZnO/Al₂O₃/ZrO₂ nanolaminates for improved thermal and wear resistance in carbon-carbon composites

H. Mohseni; T. W. Scharf

J. Vac. Sci. Technol. A 30, 01A149 (2012) https://doi.org/10.1116/1.3669518

Abstract

View articletitled, Atomic layer deposition of ZnO/Al2O3/ZrO2 nanolaminates for improved thermal and wear resistance in carbon-carbon composites

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Role of surface intermediates in enhanced, uniform growth rates of TiO₂ atomic layer deposition thin films using titanium tetraisopropoxide and ozone

Erin R. Cleveland; Laurent Henn-Lecordier; Gary W. Rubloff

J. Vac. Sci. Technol. A 30, 01A150 (2012) https://doi.org/10.1116/1.3669522

Abstract

View articletitled, Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozone

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In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Martin Knaut; Marcel Junige; Matthias Albert; Johann W. Bartha

J. Vac. Sci. Technol. A 30, 01A151 (2012) https://doi.org/10.1116/1.3670405

Abstract

View articletitled, In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

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Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide

Wolfgang Lehnert; Guenther Ruhl; Alexander Gschwandtner

J. Vac. Sci. Technol. A 30, 01A152 (2012) https://doi.org/10.1116/1.3670876

Abstract

View articletitled, Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide

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Mechanical masking of films deposited by atomic layer deposition

Michael C. Langston; Takane Usui; Fritz B. Prinz

J. Vac. Sci. Technol. A 30, 01A153 (2012) https://doi.org/10.1116/1.3669520

Abstract

View articletitled, Mechanical masking of films deposited by atomic layer deposition

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Cycle time effects on growth and transistor characteristics of spatial atomic layer deposition of zinc oxide

Shelby F. Nelson; David H. Levy; Lee W. Tutt; Mitchell Burberry

J. Vac. Sci. Technol. A 30, 01A154 (2012) https://doi.org/10.1116/1.3670878

Abstract

View articletitled, Cycle time effects on growth and transistor characteristics of spatial atomic layer deposition of zinc oxide

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Effect of temperature and gas velocity on growth per cycle during Al₂O₃ and ZnO atomic layer deposition at atmospheric pressure

Moataz Bellah M. Mousa; Christopher J. Oldham; Jesse S. Jur; Gregory N. Parsons

J. Vac. Sci. Technol. A 30, 01A155 (2012) https://doi.org/10.1116/1.3670961

Abstract

View articletitled, Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

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Hydrophilic mechanical buffer layers and stable hydrophilic finishes on polydimethylsiloxane using combined sequential vapor infiltration and atomic/molecular layer deposition

Bo Gong; Joseph C. Spagnola; Gregory N. Parsons

J. Vac. Sci. Technol. A 30, 01A156 (2012) https://doi.org/10.1116/1.3670963

Abstract

View articletitled, Hydrophilic mechanical buffer layers and stable hydrophilic finishes on polydimethylsiloxane using combined sequential vapor infiltration and atomic/molecular layer deposition

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Effects of atomic layer deposited thin films on dye sensitized solar cell performance

Jonathan A. Campbell; Mervyn deBorniol; Attila J. Mozer; Peter J. Evans; Robert P. Burford; Gerry Triani

J. Vac. Sci. Technol. A 30, 01A157 (2012) https://doi.org/10.1116/1.3670397

Abstract

View articletitled, Effects of atomic layer deposited thin films on dye sensitized solar cell performance

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In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition

Vikrant R. Rai; Sumit Agarwal

J. Vac. Sci. Technol. A 30, 01A158 (2012) https://doi.org/10.1116/1.3670404

Abstract

View articletitled, In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition

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Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

Angel Yanguas-Gil; Jeffrey W. Elam

J. Vac. Sci. Technol. A 30, 01A159 (2012) https://doi.org/10.1116/1.3670396

Abstract

View articletitled, Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

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Mechanical response of atomic layer deposition alumina coatings on stiff and compliant substrates

Steve J. Bull

J. Vac. Sci. Technol. A 30, 01A160 (2012) https://doi.org/10.1116/1.3670401

Abstract

View articletitled, Mechanical response of atomic layer deposition alumina coatings on stiff and compliant substrates

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Fluorine contamination in yttrium-doped barium zirconate film deposited by atomic layer deposition

Jihwan An; Young Beom Kim; Joong Sun Park; Joon Hyung Shim; Turgut M. Gür; Fritz B. Prinz

J. Vac. Sci. Technol. A 30, 01A161 (2012) https://doi.org/10.1116/1.3670750

Abstract

View articletitled, Fluorine contamination in yttrium-doped barium zirconate film deposited by atomic layer deposition

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Atomic layer deposition of Ru onto organic monolayers: Shifting metal effective work function using monolayer structure

Kie Jin Park; Gregory N. Parsons

J. Vac. Sci. Technol. A 30, 01A162 (2012) https://doi.org/10.1116/1.3671938

Abstract

View articletitled, Atomic layer deposition of Ru onto organic monolayers: Shifting metal effective work function using monolayer structure

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Mechanisms for hydrophilic/hydrophobic wetting transitions on cellulose cotton fibers coated using Al₂O₃ atomic layer deposition

Kyoungmi Lee; Jesse S. Jur; Do Han Kim; Gregory N. Parsons

J. Vac. Sci. Technol. A 30, 01A163 (2012) https://doi.org/10.1116/1.3671942

Abstract

View articletitled, Mechanisms for hydrophilic/hydrophobic wetting transitions on cellulose cotton fibers coated using Al2O3 atomic layer deposition

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