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Low temperature grown polycrystalline ${La}_{0.7} {Sr}_{0.3} Mn O_{3}$ thin films on amorphous $Si O_{2}$ substrates by rf magnetron sputtering

Sun Gyu Choi; A. Sivasankar Reddy; Hyung-Ho Park; Woo Seok Yang; Hojun Ryu; Byoung-Gon Yu

J. Vac. Sci. Technol. A 27, 595–600 (2009) https://doi.org/10.1116/1.3125265

View articletitled, Low temperature grown polycrystalline <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">La</mi><mn>0.7</mn></msub><msub><mi mathvariant="normal">Sr</mi><mn>0.3</mn></msub><mi mathvariant="normal">Mn</mi><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> thin films on amorphous <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> substrates by rf magnetron sputtering

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Collisionless gas flows over a flat cryogenic pump plate

Chunpei Cai; Khaleel Khasawneh

J. Vac. Sci. Technol. A 27, 601–610 (2009) https://doi.org/10.1116/1.3125266

Abstract

View articletitled, Collisionless gas flows over a flat cryogenic pump plate

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Surface effects on the luminescence degradation of hydride vapor-phase epitaxy-grown GaN induced by electron-beam irradiation

Y. Wang; B. Dierre; T. Sekiguchi; Y. Z. Yao; X. L. Yuan; F. J. Xu; B. Shen

J. Vac. Sci. Technol. A 27, 611–613 (2009) https://doi.org/10.1116/1.3130148

Abstract

View articletitled, Surface effects on the luminescence degradation of hydride vapor-phase epitaxy-grown GaN induced by electron-beam irradiation

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Fabrication of surface plasmon waveguides on thin CYTOP membranes

Norman Fong; Pierre Berini; R. Niall Tait

J. Vac. Sci. Technol. A 27, 614–619 (2009) https://doi.org/10.1116/1.3131723

Abstract

View articletitled, Fabrication of surface plasmon waveguides on thin CYTOP membranes

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Large crystal grain niobium thin films deposited by energetic condensation in vacuum arc

Xin Zhao; A.-M. Valente-Feliciano; C. Xu; R. L. Geng; L. Phillips; C. E. Reece; K. Seo; R. Crooks; M. Krishnan; A. Gerhan; B. Bures; K. Wilson Elliott; J. Wright

J. Vac. Sci. Technol. A 27, 620–625 (2009) https://doi.org/10.1116/1.3131725

Abstract

View articletitled, Large crystal grain niobium thin films deposited by energetic condensation in vacuum arc

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Studies on hard TaN thin film deposition by R C-Mag technique

Krishna Valleti

J. Vac. Sci. Technol. A 27, 626–630 (2009) https://doi.org/10.1116/1.3136858

Abstract

View articletitled, Studies on hard TaN thin film deposition by R C-Mag technique

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Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model

S. P. Sant; C. T. Nelson; L. J. Overzet; M. J. Goeckner

J. Vac. Sci. Technol. A 27, 631–642 (2009) https://doi.org/10.1116/1.3136850

Abstract

View articletitled, Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model

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Effect of cesium assistance on the electrical and structural properties of indium tin oxide films grown by magnetron sputtering

Jaewon Song; Cheol Seong Hwang; Sung Jin Park; Neung Ku Yoon

J. Vac. Sci. Technol. A 27, 643–647 (2009) https://doi.org/10.1116/1.3136854

Abstract

View articletitled, Effect of cesium assistance on the electrical and structural properties of indium tin oxide films grown by magnetron sputtering

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Thermal stability of sputter deposited nanomosaic rutile $Ti O_{2}$

Carolyn Rubin Aita

J. Vac. Sci. Technol. A 27, 648–652 (2009) https://doi.org/10.1116/1.3139900

Abstract

View articletitled, Thermal stability of sputter deposited nanomosaic rutile <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math>

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Rotation magnet sputtering: Damage-free novel magnetron sputtering using rotating helical magnet with very high target utilization

Tetsuya Goto; Takaaki Matsuoka; Tadahiro Ohmi

J. Vac. Sci. Technol. A 27, 653–659 (2009) https://doi.org/10.1116/1.3139903

Abstract

View articletitled, Rotation magnet sputtering: Damage-free novel magnetron sputtering using rotating helical magnet with very high target utilization

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Characterization of ALD copper thin films on palladium seed layers

Irene J. Hsu; Brian E. McCandless; Conan Weiland; Brian G. Willis

J. Vac. Sci. Technol. A 27, 660–667 (2009) https://doi.org/10.1116/1.3143663

Abstract

View articletitled, Characterization of ALD copper thin films on palladium seed layers

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Particle-induced x-ray emission in stainless steel using $30 keV$ ${Ga}^{+}$ focused ion beams

Lucille A. Giannuzzi; Brian P. Gorman

J. Vac. Sci. Technol. A 27, 668–671 (2009) https://doi.org/10.1116/1.3136852

Abstract

View articletitled, Particle-induced x-ray emission in stainless steel using <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>30</mn><mspace width="0.3em"></mspace><mi>keV</mi></mrow></math> <math xmlns="http://www.w3.org/1998/Math/MathML"><msup xmlns=""><mi mathvariant="normal">Ga</mi><mo>+</mo></msup></math> focused ion beams

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Structure and mechanical properties of nanoscale multilayered CrN/ZrSiN coatings

Z. G. Zhang; O. Rapaud; N. Allain; M. Baraket; C. Dong; C. Coddet

J. Vac. Sci. Technol. A 27, 672–680 (2009) https://doi.org/10.1116/1.3136856

Abstract

View articletitled, Structure and mechanical properties of nanoscale multilayered CrN/ZrSiN coatings

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Inductively coupled plasma-reactive ion etching of InSb using $C H_{4} ∕ H_{2} ∕ Ar$ plasma

Guo-Dong Zhang; Wei-Guo Sun; Shu-Li Xu; Hong-Yan Zhao; Hong-Yi Su; Hai-Zhen Wang

J. Vac. Sci. Technol. A 27, 681–685 (2009) https://doi.org/10.1116/1.3143664

Abstract

View articletitled, Inductively coupled plasma-reactive ion etching of InSb using <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">C</mi><msub><mi mathvariant="normal">H</mi><mn>4</mn></msub><mo>∕</mo><msub><mi mathvariant="normal">H</mi><mn>2</mn></msub><mo>∕</mo><mi mathvariant="normal">Ar</mi></mrow></math> plasma

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Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate

Tetsuya Goto; Atsutoshi Inokuchi; Kiyotaka Ishibashi; Seij Yasuda; Toshio Nakanishi; Masayuki Kohno; Masahiro Okesaku; Masaru Sasaki; Toshihisa Nozawa; Masaki Hirayama; Tadahiro Ohmi

J. Vac. Sci. Technol. A 27, 686–695 (2009) https://doi.org/10.1116/1.3143665

Abstract

View articletitled, Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate

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Low-temperature growth of InN on Si(100) by femtosecond pulsed laser deposition

M. A. Hafez; H. E. Elsayed-Ali

J. Vac. Sci. Technol. A 27, 696–699 (2009) https://doi.org/10.1116/1.3151819

Abstract

View articletitled, Low-temperature growth of InN on Si(100) by femtosecond pulsed laser deposition

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Silicon-oxide-high- $κ$ -oxide-silicon memory using a high- $κ$ $Y_{2} O_{3}$ nanocrystal film for flash memory application

Tung-Ming Pan; Wen-Wei Yeh

J. Vac. Sci. Technol. A 27, 700–705 (2009) https://doi.org/10.1116/1.3151816

Abstract

View articletitled, Silicon-oxide-high-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">κ</mi></math>-oxide-silicon memory using a high-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">κ</mi></math> <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Y</mi><mn>2</mn></msub><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> nanocrystal film for flash memory application

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Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas

Kallol Bera; Shahid Rauf; Kartik Ramaswamy; Ken Collins

J. Vac. Sci. Technol. A 27, 706–711 (2009) https://doi.org/10.1116/1.3151821

Abstract

View articletitled, Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas

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Nitrogen stabilized reactive sputtering of optimized ${TiO}_{2 - x}$ photocatalysts with visible light reactivity

Le Chen; Michael E. Graham; Kimberly A. Gray

J. Vac. Sci. Technol. A 27, 712–715 (2009) https://doi.org/10.1116/1.3139906

Abstract

View articletitled, Nitrogen stabilized reactive sputtering of optimized <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>TiO</mtext></mrow><mrow><mn>2</mn><mo>−</mo><mi>x</mi></mrow></msub></mrow></math> photocatalysts with visible light reactivity

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Nucleation and growth of tantalum nitride atomic layer deposition on ${Al}_{2} O_{3}$ using TBTDET and hydrogen radicals

G. B. Rayner, Jr.; S. M. George

J. Vac. Sci. Technol. A 27, 716–724 (2009) https://doi.org/10.1116/1.3147215

Abstract

View articletitled, Nucleation and growth of tantalum nitride atomic layer deposition on <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Al</mi><mn>2</mn></msub><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> using TBTDET and hydrogen radicals

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Physical and optical properties of room temperature microwave plasma anodically grown $Ti O_{2}$

T. Busani; R. A. B. Devine

J. Vac. Sci. Technol. A 27, 725–730 (2009) https://doi.org/10.1116/1.3154514

Abstract

View articletitled, Physical and optical properties of room temperature microwave plasma anodically grown <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math>

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Ge nanocrystals embedded in a $Ge O_{x}$ matrix formed by thermally annealing of Ge oxide films

K. Vijayarangamuthu; Shyama Rath; D. Kabiraj; D. K. Avasthi; Pawan K. Kulriya; V. N. Singh; B. R. Mehta

J. Vac. Sci. Technol. A 27, 731–733 (2009) https://doi.org/10.1116/1.3155402

Abstract

View articletitled, Ge nanocrystals embedded in a <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ge</mi><msub><mi mathvariant="normal">O</mi><mi>x</mi></msub></mrow></math> matrix formed by thermally annealing of Ge oxide films

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PAPERS FROM THE 55TH INTERNATIONAL SYMPOSIUM OF AVS

Preface

Gerald Lucovsky

J. Vac. Sci. Technol. A 27, 736 (2009) https://doi.org/10.1116/1.3167387

Extract

View articletitled, Preface

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Applied Surface Science

Scanning Auger of a specific via interface in an integrated circuit using a novel focused ion beam sample preparation technique

W. Liu; H. Ramirez; S. Schauer; N. D. Theodore

J. Vac. Sci. Technol. A 27, 738–742 (2009) https://doi.org/10.1116/1.3110003

Abstract

View articletitled, Scanning Auger of a specific via interface in an integrated circuit using a novel focused ion beam sample preparation technique

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X-ray photoelectron spectroscopy analysis of organic materials etched by charged water droplet impact

Yuji Sakai; Yoshitoki Iijima; Riou Takaishi; Daiki Asakawa; Kenzo Hiraoka

J. Vac. Sci. Technol. A 27, 743–747 (2009) https://doi.org/10.1116/1.3077283

Abstract

View articletitled, X-ray photoelectron spectroscopy analysis of organic materials etched by charged water droplet impact

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Surface characterization of polymethylmetacrylate bombarded by charged water droplets

Kenzo Hiraoka; Riou Takaishi; Daiki Asakawa; Yuji Sakai; Yoshitoki Iijima

J. Vac. Sci. Technol. A 27, 748–753 (2009) https://doi.org/10.1116/1.3100219

Abstract

View articletitled, Surface characterization of polymethylmetacrylate bombarded by charged water droplets

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BioMEMS Topical Conference

Atomic force microscopy measurement of boundary slip on hydrophilic, hydrophobic, and superhydrophobic surfaces

Yuliang Wang; Bharat Bhushan; Abdelhamid Maali

J. Vac. Sci. Technol. A 27, 754–760 (2009) https://doi.org/10.1116/1.3086637

Abstract

View articletitled, Atomic force microscopy measurement of boundary slip on hydrophilic, hydrophobic, and superhydrophobic surfaces

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Electronic Materials and Processing

Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition

Pieter C. Rowlette; Cary G. Allen; Olivia B. Bromley; Colin A. Wolden

J. Vac. Sci. Technol. A 27, 761–766 (2009) https://doi.org/10.1116/1.3119673

Abstract

View articletitled, Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition

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Graphene Topical Conference

Synthesis, characterization, and luminescent properties of $Zn O - Si O_{2} : Pb S$

O. M. Ntwaeaborwa; H. C. Swart; R. E. Kroon; J. J. Terblans; P. H. Holloway

J. Vac. Sci. Technol. A 27, 767–769 (2009) https://doi.org/10.1116/1.3086645

Abstract

View articletitled, Synthesis, characterization, and luminescent properties of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Zn</mi><mi mathvariant="normal">O</mi><mo>–</mo><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub><mo>:</mo><mi mathvariant="normal">Pb</mi><mi mathvariant="normal">S</mi></mrow></math>

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MEMS and NEMS

Integrated aluminum nitride piezoelectric microelectromechanical system for radio front ends

Gianluca Piazza

J. Vac. Sci. Technol. A 27, 776–784 (2009) https://doi.org/10.1116/1.3077276

Abstract

View articletitled, Integrated aluminum nitride piezoelectric microelectromechanical system for radio front ends

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Nanomanufacturing Focus Topic

Ultrasonic nanoimprint on engineering plastics

Harutaka Mekaru; Masaharu Takahashi

J. Vac. Sci. Technol. A 27, 785–792 (2009) https://doi.org/10.1116/1.3153278

Abstract

View articletitled, Ultrasonic nanoimprint on engineering plastics

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Fabrication of a highly oriented line structure on an aluminum surface and the nanoscale patterning on the nanoscale structure using highly functional molecules

Y. Watanabe; H. Kato; S. Takemura; H. Watanabe; K. Hayakawa; S. Kimura; D. Okumura; T. Sugiyama; T. Hiramatsu; N. Nanba; O. Nishikawa; M. Taniguchi

J. Vac. Sci. Technol. A 27, 793–798 (2009) https://doi.org/10.1116/1.3125264

Abstract

View articletitled, Fabrication of a highly oriented line structure on an aluminum surface and the nanoscale patterning on the nanoscale structure using highly functional molecules

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Nanometer-Scale Science and Technology

Structural and morphological evolution of gallium nitride nanorods grown by chemical beam epitaxy

Shou-Yi Kuo; Fang-I Lai; Wei-Chun Chen; Chien-Nan Hsiao; Woei-Tyng Lin

J. Vac. Sci. Technol. A 27, 799–802 (2009) https://doi.org/10.1116/1.3117248

Abstract

View articletitled, Structural and morphological evolution of gallium nitride nanorods grown by chemical beam epitaxy

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Fabrication of ordered anodic aluminum oxide with matrix arrays of pores using nanoimprint

Namyong Kwon; KyoHyeok Kim; Jinhee Heo; IlSub Chung

J. Vac. Sci. Technol. A 27, 803–807 (2009) https://doi.org/10.1116/1.3139884

Abstract

View articletitled, Fabrication of ordered anodic aluminum oxide with matrix arrays of pores using nanoimprint

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Fabrication and characterization of metal-semiconductor-metal nanorod using template synthesis

Kyohyeok Kim; Namyong Kwon; Junki Hong; Ilsub Chung

J. Vac. Sci. Technol. A 27, 808–812 (2009) https://doi.org/10.1116/1.3100217

Abstract

View articletitled, Fabrication and characterization of metal-semiconductor-metal nanorod using template synthesis

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Plasma Science and Technology

Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry

Masanori Shinohara; Ken Cho; Yoshinobu Matsuda; Takanori Inayoshi; Hiroki Kawazoe; Hiroshi Fujiyama; Yuuki Nitta; Tatsuyuki Nakatani

J. Vac. Sci. Technol. A 27, 813–817 (2009) https://doi.org/10.1116/1.3077278

Abstract

View articletitled, Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry

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Dry etching of CoFe films using a $C H_{4} ∕ Ar$ inductively coupled plasma for magnetic random access memory application

Doo-Seung Um; Dong-Pyo Kim; Jong-Chang Woo; Chang-Il Kim; Sung-Kwon Lee; Tae-Woo Jung; Seung-Chan Moon

J. Vac. Sci. Technol. A 27, 818–820 (2009) https://doi.org/10.1116/1.3155401

Abstract

View articletitled, Dry etching of CoFe films using a <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">C</mi><msub><mi mathvariant="normal">H</mi><mn>4</mn></msub><mo>∕</mo><mi mathvariant="normal">Ar</mi></mrow></math> inductively coupled plasma for magnetic random access memory application

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Temperature dependence on dry etching of ${Al}_{2} O_{3}$ thin films in ${BCl}_{3} / {Cl}_{2} / Ar$ plasma

Xue Yang; Dong-Pyo Kim; Doo-Seung Um; Gwan-Ha Kim; Chang-Il Kim

J. Vac. Sci. Technol. A 27, 821–825 (2009) https://doi.org/10.1116/1.3086642

Abstract

View articletitled, Temperature dependence on dry etching of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>Al</mtext></mrow><mn>2</mn></msub><msub><mtext>O</mtext><mn>3</mn></msub></mrow></math> thin films in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>BCl</mtext></mrow><mn>3</mn></msub><mo>/</mo><msub><mrow><mtext>Cl</mtext></mrow><mn>2</mn></msub><mo>/</mo><mtext>Ar</mtext></mrow></math> plasma

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Characterization of platinum catalyst supported on carbon nanoballs prepared by solution plasma processing

Yoshimichi Ichin; Koji Mitamura; Nagahiro Saito; Osamu Takai

J. Vac. Sci. Technol. A 27, 826–830 (2009) https://doi.org/10.1116/1.3077285

Abstract

View articletitled, Characterization of platinum catalyst supported on carbon nanoballs prepared by solution plasma processing

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Plasma Science and Technology I

Fluorination mechanisms of ${Al}_{2} O_{3}$ and $Y_{2} O_{3}$ surfaces irradiated by high-density $C F_{4} ∕ O_{2}$ and $S F_{6} ∕ O_{2}$ plasmas

Kazuhiro Miwa; Noriharu Takada; Koichi Sasaki

J. Vac. Sci. Technol. A 27, 831–835 (2009) https://doi.org/10.1116/1.3112624

Abstract

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Sidewall damage in plasma etching of Si/SiGe heterostructures

R. Ding; L. J. Klein; Mark G. Friesen; M. A. Eriksson; A. E. Wendt

J. Vac. Sci. Technol. A 27, 836–843 (2009) https://doi.org/10.1116/1.3097858

Abstract

View articletitled, Sidewall damage in plasma etching of Si/SiGe heterostructures

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$Co {Si}_{x}$ contact resistance after etching and ashing plasma exposure

Ken Katahira; Masanaga Fukasawa; Shoji Kobayashi; Toshifumi Takizawa; Michio Isobe; Satoshi Hamaguchi; Kazunori Nagahata; Tetsuya Tatsumi

J. Vac. Sci. Technol. A 27, 844–848 (2009) https://doi.org/10.1116/1.3130146

Abstract

View articletitled, <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Co</mi><msub><mi mathvariant="normal">Si</mi><mi>x</mi></msub></mrow></math> contact resistance after etching and ashing plasma exposure

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Plasma Science and Technology II

Capillary jet injection of $Si H_{4}$ in the high density plasma chemical vapor deposition of $Si O_{2}$

R. Botha; T. Novikova; P. Bulkin

J. Vac. Sci. Technol. A 27, 849–854 (2009) https://doi.org/10.1116/1.3153283

Abstract

View articletitled, Capillary jet injection of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">H</mi><mn>4</mn></msub></mrow></math> in the high density plasma chemical vapor deposition of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math>

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Effect of Ar and $N_{2}$ addition on $C H_{4} - H_{2}$ based chemistry inductively coupled plasma etching of HgCdTe

F. Boulard; J. Baylet; C. Cardinaud

J. Vac. Sci. Technol. A 27, 855–861 (2009) https://doi.org/10.1116/1.3147219

Abstract

View articletitled, Effect of Ar and <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">N</mi><mn>2</mn></msub></math> addition on <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">C</mi><msub><mi mathvariant="normal">H</mi><mn>4</mn></msub><mo>–</mo><msub><mi mathvariant="normal">H</mi><mn>2</mn></msub></mrow></math> based chemistry inductively coupled plasma etching of HgCdTe

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Advanced Surface Engineering

Role of carbon in titania as visible-light photocatalyst prepared by flat-flame chemical vapor condensation method

Y. J. Chen; J. M. Wu; C. S. Lin; G. Y. Jhan; M. S. Wong; S.-C. Ke; H. H. Lo

J. Vac. Sci. Technol. A 27, 862–866 (2009) https://doi.org/10.1116/1.3081889

Abstract

View articletitled, Role of carbon in titania as visible-light photocatalyst prepared by flat-flame chemical vapor condensation method

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Thermal stability and tribological properties of CrZr–Si–N films synthesized by closed field unbalanced magnetron sputtering

Sang Yul Lee; Young Su Kim; Gwang Seok Kim

J. Vac. Sci. Technol. A 27, 867–872 (2009) https://doi.org/10.1116/1.3116589

Abstract

View articletitled, Thermal stability and tribological properties of CrZr–Si–N films synthesized by closed field unbalanced magnetron sputtering

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Comparative studies on the thermal stability and corrosion resistance of CrN, CrSiN, and $Cr Si N ∕ Al N$ coatings

Gwang Seok Kim; Sung Min Kim; Sang Yul Lee; Bo Young Lee

J. Vac. Sci. Technol. A 27, 873–879 (2009) https://doi.org/10.1116/1.3155396

Abstract

View articletitled, Comparative studies on the thermal stability and corrosion resistance of CrN, CrSiN, and <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Cr</mi><mi mathvariant="normal">Si</mi><mi mathvariant="normal">N</mi><mo>∕</mo><mi mathvariant="normal">Al</mi><mi mathvariant="normal">N</mi></mrow></math> coatings

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Investigation of photocatalytic activity of $Ti O_{2} ∕ W O_{3}$ bilayered thin films with various amounts of $W O_{3}$ exposed surface

S. Biswas; M. F. Hossain; M. Shahjahan; K. Takahashi; T. Takahashi; A. Fujishima

J. Vac. Sci. Technol. A 27, 880–884 (2009) https://doi.org/10.1116/1.3086647

Abstract

View articletitled, Investigation of photocatalytic activity of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub><mo>∕</mo><mi mathvariant="normal">W</mi><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> bilayered thin films with various amounts of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">W</mi><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> exposed surface

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Structural, optical, and photocatalytic properties of ZnO:Al nanowall structure deposited on glass substrate by spray pyrolysis

M. Shahjahan; M. K. R. Khan; M. F. Hossain; S. Biswas; T. Takahashi

J. Vac. Sci. Technol. A 27, 885–888 (2009) https://doi.org/10.1116/1.3093878

Abstract

View articletitled, Structural, optical, and photocatalytic properties of ZnO:Al nanowall structure deposited on glass substrate by spray pyrolysis

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Surface Science

Ultrathin $K ∕ p - Si (001)$ Schottky diodes as detectors of chemically generated hot charge carriers

K. Huba; D. Krix; C. Meier; H. Nienhaus

J. Vac. Sci. Technol. A 27, 889–894 (2009) https://doi.org/10.1116/1.3100218

Abstract

View articletitled, Ultrathin <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">K</mi><mo>∕</mo><mi>p</mi><mtext>-</mtext><mi mathvariant="normal">Si</mi><mrow><mo>(</mo><mn>001</mn><mo>)</mo></mrow></mrow></math> Schottky diodes as detectors of chemically generated hot charge carriers

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Effect of ${Al}_{2} O_{3}$ support on morphology and NO reactivity of Rh

I. Nakamura; T. Fujitani

J. Vac. Sci. Technol. A 27, 895–899 (2009) https://doi.org/10.1116/1.3081887

Abstract

View articletitled, Effect of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>Al</mtext></mrow><mn>2</mn></msub><msub><mtext>O</mtext><mn>3</mn></msub></mrow></math> support on morphology and NO reactivity of Rh

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Surface characterization of hydrophobic thin films deposited by inductively coupled and pulsed plasmas

Youngsoo Kim; Ji-Hye Lee; Kang-Jin Kim; Yeonhee Lee

J. Vac. Sci. Technol. A 27, 900–906 (2009) https://doi.org/10.1116/1.3136763

Abstract

View articletitled, Surface characterization of hydrophobic thin films deposited by inductively coupled and pulsed plasmas

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Surface Science II

Efficient translational excitation of a solid metal surface: State-to-state translational energy distributions of vibrational ground state HCl scattering from Au(111)

Russell Cooper; Igor Rahinov; Cheng Yuan; Xueming Yang; Daniel J. Auerbach; Alec M. Wodtke

J. Vac. Sci. Technol. A 27, 907–912 (2009) https://doi.org/10.1116/1.3071971

Abstract

View articletitled, Efficient translational excitation of a solid metal surface: State-to-state translational energy distributions of vibrational ground state HCl scattering from Au(111)

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Kinetics of hydride front in Zircaloy-2 and H release from a fractional hydrided surface

M. Díaz; A. González-González; J. S. Moya; B. Remartínez; S. Pérez; J. L. Sacedón

J. Vac. Sci. Technol. A 27, 913–917 (2009) https://doi.org/10.1116/1.3130147

Abstract

View articletitled, Kinetics of hydride front in Zircaloy-2 and H release from a fractional hydrided surface

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Surface Science III

Chemicurrent measurements using alkali metal covered $Pd ∕ p - Si (001)$ Schottky diodes

David Krix; Kornelia Huba; Hermann Nienhaus

J. Vac. Sci. Technol. A 27, 918–922 (2009) https://doi.org/10.1116/1.3086643

Abstract

View articletitled, Chemicurrent measurements using alkali metal covered <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Pd</mi><mo>∕</mo><mi>p</mi><mtext>-</mtext><mi mathvariant="normal">Si</mi><mrow><mo>(</mo><mn>001</mn><mo>)</mo></mrow></mrow></math> Schottky diodes

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Thin Films

Atomic layer deposition of GaN using $Ga {Cl}_{3}$ and $N H_{3}$

Oh Hyun Kim; Dojun Kim; Tim Anderson

J. Vac. Sci. Technol. A 27, 923–928 (2009) https://doi.org/10.1116/1.3106619

Abstract

View articletitled, Atomic layer deposition of GaN using <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ga</mi><msub><mi mathvariant="normal">Cl</mi><mn>3</mn></msub></mrow></math> and <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">N</mi><msub><mi mathvariant="normal">H</mi><mn>3</mn></msub></mrow></math>

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Mechanical and tribological property comparison of melt-compounded nanocomposites of atomic-layer-deposition-coated polyamide particles and commercial nanofillers

K. Nevalainen; R. Suihkonen; P. Eteläaho; J. Vuorinen; P. Järvelä; N. Isomäki; C. Hintze; M. Leskelä

J. Vac. Sci. Technol. A 27, 929–936 (2009) https://doi.org/10.1116/1.3072920

Abstract

View articletitled, Mechanical and tribological property comparison of melt-compounded nanocomposites of atomic-layer-deposition-coated polyamide particles and commercial nanofillers

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High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon

C. Ichihara; S. Yasuno; H. Takeuchi; A. Kobayashi; S. Mure; K. Fujikawa; K. Sasakawa

J. Vac. Sci. Technol. A 27, 937–942 (2009) https://doi.org/10.1116/1.3125263

Abstract

View articletitled, High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon

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Chemical vapor deposition of $W N_{x} C_{y}$ using the tungsten piperidylhydrazido complex ${Cl}_{4} (C H_{3} C N) W (N - pip)$ ⁠: Deposition, characterization, and diffusion barrier evaluation

Dojun Kim; Oh Hyun Kim; Tim Anderson; Jürgen Koller; Lisa McElwee-White; Lii-Cherng Leu; Joseph M. Tsai; David P. Norton

J. Vac. Sci. Technol. A 27, 943–950 (2009) https://doi.org/10.1116/1.3106625

Abstract

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Vanadium oxide thin films for bolometric applications deposited by reactive pulsed dc sputtering

N. Fieldhouse; S. M. Pursel; R. Carey; M. W. Horn; S. S. N. Bharadwaja

J. Vac. Sci. Technol. A 27, 951–955 (2009) https://doi.org/10.1116/1.3119675

Abstract

View articletitled, Vanadium oxide thin films for bolometric applications deposited by reactive pulsed dc sputtering

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Correlation of temperature response and structure of annealed $V O_{x}$ thin films for IR detector applications

Chandrasekaran Venkatasubramanian; Orlando M. Cabarcos; David L. Allara; Mark W. Horn; S. Ashok

J. Vac. Sci. Technol. A 27, 956–961 (2009) https://doi.org/10.1116/1.3143667

Abstract

View articletitled, Correlation of temperature response and structure of annealed <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">V</mi><msub><mi mathvariant="normal">O</mi><mi>x</mi></msub></mrow></math> thin films for IR detector applications

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Thin films by metal-organic precursor plasma spray

Douglas L. Schulz; Robert A. Sailer; Scott Payne; James Leach; Ronald J. Molz

J. Vac. Sci. Technol. A 27, 962–969 (2009) https://doi.org/10.1116/1.3148826

Abstract

View articletitled, Thin films by metal-organic precursor plasma spray

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Latest innovations in large area web coating technology via plasma enhanced chemical vapor deposition source technology

M. A. George; H. Chandra; P. Mórse; J. Madocks

J. Vac. Sci. Technol. A 27, 970–974 (2009) https://doi.org/10.1116/1.3077287

Abstract

View articletitled, Latest innovations in large area web coating technology via plasma enhanced chemical vapor deposition source technology

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Thermally stable very thin Ag films for electrodes

M. Kawamura; D. Fukuda; Y. Inami; Y. Abe; K. Sasaki

J. Vac. Sci. Technol. A 27, 975–978 (2009) https://doi.org/10.1116/1.3071968

Abstract

View articletitled, Thermally stable very thin Ag films for electrodes

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High rate sputtering deposition of silicon oxide thin films from new $Si O_{2} : Si$ target composition

Qi Hua Fan; Li Qin Zhou; David Stevenson

J. Vac. Sci. Technol. A 27, 979–985 (2009) https://doi.org/10.1116/1.3071962

Abstract

View articletitled, High rate sputtering deposition of silicon oxide thin films from new <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub><mo>:</mo><mi mathvariant="normal">Si</mi></mrow></math> target composition

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Molecularly thick dicationic ionic liquid films for nanolubrication

Manuel Palacio; Bharat Bhushan

J. Vac. Sci. Technol. A 27, 986–995 (2009) https://doi.org/10.1116/1.3086640

Abstract

View articletitled, Molecularly thick dicationic ionic liquid films for nanolubrication

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Structural, electrical, and optical properties of antimony-doped tin oxide films prepared at room temperature by radio frequency magnetron sputtering for transparent electrodes

Sung Uk Lee; Byungyou Hong; Won Seok Choi

J. Vac. Sci. Technol. A 27, 996–1000 (2009) https://doi.org/10.1116/1.3139891

Abstract

View articletitled, Structural, electrical, and optical properties of antimony-doped tin oxide films prepared at room temperature by radio frequency magnetron sputtering for transparent electrodes

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Transparent conducting Si-codoped Al-doped ZnO thin films prepared by magnetron sputtering using Al-doped ZnO powder targets containing SiC

Jun-ichi Nomoto; Toshihiro Miyata; Tadatsugu Minami

J. Vac. Sci. Technol. A 27, 1001–1005 (2009) https://doi.org/10.1116/1.3153284

Abstract

View articletitled, Transparent conducting Si-codoped Al-doped ZnO thin films prepared by magnetron sputtering using Al-doped ZnO powder targets containing SiC

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Transparent conducting impurity-doped ZnO thin films prepared using oxide targets sintered by millimeter-wave heating

Tadatsugu Minami; Kenji Okada; Toshihiro Miyata; Juni-chi Nomoto; Youhei Hara; Hiroshi Abe

J. Vac. Sci. Technol. A 27, 1006–1011 (2009) https://doi.org/10.1116/1.3119674

Abstract

View articletitled, Transparent conducting impurity-doped ZnO thin films prepared using oxide targets sintered by millimeter-wave heating

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Surface slope distribution with mathematical molding on Au(111) thin film growth

A. González-González; J. L. Sacedón; C. Polop; E. Rodríguez-Cañas; J. A. Aznárez; E. Vasco

J. Vac. Sci. Technol. A 27, 1012–1016 (2009) https://doi.org/10.1116/1.3130145

Abstract

View articletitled, Surface slope distribution with mathematical molding on Au(111) thin film growth

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Vacuum Technology

Introduction to MOLFLOW+: New graphical processing unit-based Monte Carlo code for simulating molecular flows and for calculating angular coefficients in the compute unified device architecture environment

R. Kersevan; J.-L. Pons

J. Vac. Sci. Technol. A 27, 1017–1023 (2009) https://doi.org/10.1116/1.3153280

Abstract

View articletitled, Introduction to MOLFLOW+: New graphical processing unit-based Monte Carlo code for simulating molecular flows and for calculating angular coefficients in the compute unified device architecture environment

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Compact deposition system for device-based ultrathin crystalline film growth

R. E. Lake; J. R. Puls; M. P. Ray; C. E. Sosolik

J. Vac. Sci. Technol. A 27, 1024–1028 (2009) https://doi.org/10.1116/1.3097859

Abstract

View articletitled, Compact deposition system for device-based ultrathin crystalline film growth

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Biological, Organic, and Soft Materials Focus Topic/Applied Surface Science/Biomaterial Interfaces/Nano Content

Reflectance anisotropy spectroscopy: A probe to explore organic epitaxial growth

G. Bussetti; S. Cirilli; A. Violante; V. Chiostri; C. Goletti; P. Chiaradia; A. Sassella; M. Campione; L. Raimondo; D. Braga; A. Borghesi

J. Vac. Sci. Technol. A 27, 1029–1034 (2009) https://doi.org/10.1116/1.3155399

Abstract

View articletitled, Reflectance anisotropy spectroscopy: A probe to explore organic epitaxial growth

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Biological, Organic, and Soft Materials Focus Topic/Plasma Science and Technology/Applied Surface Science/Biomaterial Interfaces/Surface Science

Characterization of microwave plasmas for deposition of polyparylene

Gerhard Franz; Florian Rauter; Stanislav F. Dribinskiy

J. Vac. Sci. Technol. A 27, 1035–1041 (2009) https://doi.org/10.1116/1.3148825

Abstract

View articletitled, Characterization of microwave plasmas for deposition of polyparylene

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Energy Science and Technology Focus Topic/Applied Surface Science/Thin Film/Vacuum Technology/Nano Content

Fabrication of dye-sensitized solar cells with $Ti O_{2}$ photoelectrode prepared by sol-gel technique with low annealing temperature

M. F. Hossain; S. Biswas; M. Shahjahan; Arpi Majumder; T. Takahashi

J. Vac. Sci. Technol. A 27, 1042–1046 (2009) https://doi.org/10.1116/1.3116588

Abstract

View articletitled, Fabrication of dye-sensitized solar cells with <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> photoelectrode prepared by sol-gel technique with low annealing temperature

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Energy Science and Technology Focus Topic/Electronic Materials and Processing/Nanometer-Scale Science and Technology/Plasma Science and Technology/Applied Surface Science/Thin Film/Vacuum Technology

Study of sol-gel derived porous ZnO photoelectrode for the application of dye-sensitized solar cells

M. F. Hossain; S. Biswas; M. Shahjahan; T. Takahashi

J. Vac. Sci. Technol. A 27, 1047–1051 (2009) https://doi.org/10.1116/1.3139887

Abstract

View articletitled, Study of sol-gel derived porous ZnO photoelectrode for the application of dye-sensitized solar cells

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Graphene Topical Conference/Surface Science/Nano Content

Tunneling spectroscopy of graphene and related reconstructions on SiC(0001)

Shu Nie; R. M. Feenstra

J. Vac. Sci. Technol. A 27, 1052–1057 (2009) https://doi.org/10.1116/1.3071977

Abstract

View articletitled, Tunneling spectroscopy of graphene and related reconstructions on SiC(0001)

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In Situ Microscopy and Spectroscopy: Interfacial and Nanoscale Science Topical Conference/Nanometer-Scale Science and Technology/Tribology Focus Topic/Nano Content

In situ electron diffraction characterization of the deformation of nanobelts: Gallium oxide

J. M. Vaughn; M. E. Kordesch

J. Vac. Sci. Technol. A 27, 1058–1061 (2009) https://doi.org/10.1116/1.3081888

Abstract

View articletitled, In situ electron diffraction characterization of the deformation of nanobelts: Gallium oxide

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Magnetic Interfaces and Nanostructures/Nano Content

Preparation and properties of perpendicular CoPt magnetic nanodot arrays patterned by nanosphere lithography

Xiao Li; Zeenath R. Tadisina; Subhadra Gupta; Ganping Ju

J. Vac. Sci. Technol. A 27, 1062–1066 (2009) https://doi.org/10.1116/1.3116586

Abstract

View articletitled, Preparation and properties of perpendicular CoPt magnetic nanodot arrays patterned by nanosphere lithography

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Controlling magnetic anisotropy in epitaxial FePt(001) films

Zhihong Lu; M. J. Walock; P. LeClair; W. H. Butler; G. J. Mankey

J. Vac. Sci. Technol. A 27, 1067–1070 (2009) https://doi.org/10.1116/1.3098497

Abstract

View articletitled, Controlling magnetic anisotropy in epitaxial FePt(001) films

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Nanomanufacturing Focus Topic/Plasma Science and Technology/Applied Surface Science

Large-scale production and metrology of vertically aligned carbon nanotube films

Lei Dai; Peter Wang; Ken Bosnick

J. Vac. Sci. Technol. A 27, 1071–1075 (2009) https://doi.org/10.1116/1.3148827

Abstract

View articletitled, Large-scale production and metrology of vertically aligned carbon nanotube films

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Nanometer-Scale Science and Technology/Nano Content

Quantitative evaluation of carbon nanotubes by the scanning atom probe

Osamu Nishikawa; Masahiro Taniguchi

J. Vac. Sci. Technol. A 27, 1076–1079 (2009) https://doi.org/10.1116/1.3077280

Abstract

View articletitled, Quantitative evaluation of carbon nanotubes by the scanning atom probe

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Advanced Surface Engineering/Nano Content

Deposition of various metal, ceramic, and cermet coatings by an industrial-scale large area filtered arc deposition process

V. Gorokhovsky; C. Bowman; D. VanVorous; J. Wallace

J. Vac. Sci. Technol. A 27, 1080–1095 (2009) https://doi.org/10.1116/1.3114462

Abstract

View articletitled, Deposition of various metal, ceramic, and cermet coatings by an industrial-scale large area filtered arc deposition process

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Tribology Focus Topic/Nanometer-Scale Science and Technology/Electronic Materials and Processing/Nano Content

Characterization of surface damage in AlSi alloys

J. Su; X. Nie; V. Stoilov; Q. Yang

J. Vac. Sci. Technol. A 27, 1096–1103 (2009) https://doi.org/10.1116/1.3139898

Abstract

View articletitled, Characterization of surface damage in AlSi alloys

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PAPERS FROM THE 55TH INTERNATION SYMPOSIUM OF AVS

Magnetic Interfaces and Nanostructures

Structural and magnetic properties of epitaxial ${Fe}_{25} {Pt}_{75}$

Z. Lu; M. J. Walock; P. R. LeClair; G. J. Mankey; P. Mani; D. Lott; F. Klose; H. Ambaye; V. Lauter; M. Wolff; A. Schreyer; H. M. Christen; B. C. Sales

J. Vac. Sci. Technol. A 27, 770–775 (2009) https://doi.org/10.1116/1.3143668

Abstract

View articletitled, Structural and magnetic properties of epitaxial <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Fe</mi><mn>25</mn></msub><msub><mi mathvariant="normal">Pt</mi><mn>75</mn></msub></mrow></math>

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PAPERS FROM THE 55TH INTERNATIONAL SYMPOSIUM OF AVS

Applied Surface Science

BioMEMS Topical Conference

Electronic Materials and Processing

Graphene Topical Conference

MEMS and NEMS

Nanomanufacturing Focus Topic

Nanometer-Scale Science and Technology

Plasma Science and Technology

Plasma Science and Technology I

Plasma Science and Technology II

Advanced Surface Engineering

Surface Science

Surface Science II

Surface Science III

Thin Films

Vacuum Technology

Biological, Organic, and Soft Materials Focus Topic/Applied Surface Science/Biomaterial Interfaces/Nano Content

Biological, Organic, and Soft Materials Focus Topic/Plasma Science and Technology/Applied Surface Science/Biomaterial Interfaces/Surface Science

Energy Science and Technology Focus Topic/Applied Surface Science/Thin Film/Vacuum Technology/Nano Content

Energy Science and Technology Focus Topic/Electronic Materials and Processing/Nanometer-Scale Science and Technology/Plasma Science and Technology/Applied Surface Science/Thin Film/Vacuum Technology

Graphene Topical Conference/Surface Science/Nano Content

In Situ Microscopy and Spectroscopy: Interfacial and Nanoscale Science Topical Conference/Nanometer-Scale Science and Technology/Tribology Focus Topic/Nano Content

Magnetic Interfaces and Nanostructures/Nano Content

Nanomanufacturing Focus Topic/Plasma Science and Technology/Applied Surface Science

Nanometer-Scale Science and Technology/Nano Content

Advanced Surface Engineering/Nano Content

Tribology Focus Topic/Nanometer-Scale Science and Technology/Electronic Materials and Processing/Nano Content

PAPERS FROM THE 55TH INTERNATION SYMPOSIUM OF AVS

Magnetic Interfaces and Nanostructures

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