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W chemical-vapor deposition using ${(i - C_{3} H_{7} C_{5} H_{4})}_{2} W H_{2}$

Atsushi Ogura; Satoshi Imai; Taihei Kagawa; Hirotaka Kurozaki; Masato Ishikawa; Ikuyo Muramoto; Hideaki Machida; Yoshio Ohshita

J. Vac. Sci. Technol. A 26, 561–564 (2008) https://doi.org/10.1116/1.2913581

Abstract

View articletitled, W chemical-vapor deposition using <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mo>(</mo><mi>i</mi><mtext>-</mtext><msub><mi mathvariant="normal">C</mi><mn>3</mn></msub><msub><mi mathvariant="normal">H</mi><mn>7</mn></msub><msub><mi mathvariant="normal">C</mi><mn>5</mn></msub><msub><mi mathvariant="normal">H</mi><mn>4</mn></msub><mo>)</mo></mrow><mn>2</mn></msub><mi mathvariant="normal">W</mi><msub><mi mathvariant="normal">H</mi><mn>2</mn></msub></mrow></math>

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Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

T. Kubart; D. H. Trinh; L. Liljeholm; L. Hultman; H. Högberg; T. Nyberg; S. Berg

J. Vac. Sci. Technol. A 26, 565–570 (2008) https://doi.org/10.1116/1.2913582

Abstract

View articletitled, Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

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Study of electron beam evaporated compositionally modulated Fe/Al multilayers

R. Brajpuriya; S. Tripathi; A. Sharma; S. M. Chaudhari; T. Shripathi; N. Lakshmi

J. Vac. Sci. Technol. A 26, 571–580 (2008) https://doi.org/10.1116/1.2924414

Abstract

View articletitled, Study of electron beam evaporated compositionally modulated Fe/Al multilayers

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Development of a cosputter-evaporation chamber for Fe–Ga films

N. A. Morley; S.-L. Yeh; S. Rigby; A. Javed; M. R. J. Gibbs

J. Vac. Sci. Technol. A 26, 581–586 (2008) https://doi.org/10.1116/1.2924416

Abstract

View articletitled, Development of a cosputter-evaporation chamber for Fe–Ga films

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Growth of InN on Si (111) by atmospheric-pressure metal-organic chemical vapor deposition using $In N ∕ Al N$ double-buffer layers

Zhen-Yu Li; Shan-Ming Lan; Wu-Yih Uen; Ying-Ru Chen; Meng-Chu Chen; Yu-Hsiang Huang; Chien-Te Ku; Sen-Mao Liao; Tsun-Neng Yang; Shing-Chung Wang; Gou-Chung Chi

J. Vac. Sci. Technol. A 26, 587–591 (2008) https://doi.org/10.1116/1.2929849

Abstract

View articletitled, Growth of InN on Si (111) by atmospheric-pressure metal-organic chemical vapor deposition using <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">In</mi><mi mathvariant="normal">N</mi><mo>∕</mo><mi mathvariant="normal">Al</mi><mi mathvariant="normal">N</mi></mrow></math> double-buffer layers

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Characterization of molecular nitrogen in III-V compound semiconductors by near-edge x-ray absorption fine structure and photoemission spectroscopies

A. Bozanic; Z. Majlinger; M. Petravic; Q. Gao; D. Llewellyn; C. Crotti; Y.-W. Yang

J. Vac. Sci. Technol. A 26, 592–596 (2008) https://doi.org/10.1116/1.2929851

Abstract

View articletitled, Characterization of molecular nitrogen in III-V compound semiconductors by near-edge x-ray absorption fine structure and photoemission spectroscopies

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Mechanisms and selectivity for etching of $Hf O_{2}$ and Si in $B {Cl}_{3}$ plasmas

Chunyu Wang; Vincent M. Donnelly

J. Vac. Sci. Technol. A 26, 597–604 (2008) https://doi.org/10.1116/1.2938396

Abstract

View articletitled, Mechanisms and selectivity for etching of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Hf</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> and Si in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">B</mi><msub><mi mathvariant="normal">Cl</mi><mn>3</mn></msub></mrow></math> plasmas

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Classical size effect in oxide-encapsulated Cu thin films: Impact of grain boundaries versus surfaces on resistivity

Tik Sun; Bo Yao; Andrew P. Warren; Vineet Kumar; Scott Roberts; Katayun Barmak; Kevin R. Coffey

J. Vac. Sci. Technol. A 26, 605–609 (2008) https://doi.org/10.1116/1.2938395

Abstract

View articletitled, Classical size effect in oxide-encapsulated Cu thin films: Impact of grain boundaries versus surfaces on resistivity

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Morphological analysis of $Ti B_{2}$ thin film prepared by rf magnetron sputtering

Wei Dai; Tongjun Zhang; Junyou Yang; Rongxing Sun; Juliang Xu

J. Vac. Sci. Technol. A 26, 610–615 (2008) https://doi.org/10.1116/1.2943642

Abstract

View articletitled, Morphological analysis of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">B</mi><mn>2</mn></msub></mrow></math> thin film prepared by rf magnetron sputtering

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X-ray photoelectron spectroscopy studies of water-induced surface reorganization of amphiphilic poly(2-hydroxyethyl methacrylate- $g$ -dimethylsiloxane) copolymers using cryogenic sample handling techniques

Lu Chen; Daniel J. Hook; Paul L. Valint, Jr.; Joseph A. Gardella, Jr

J. Vac. Sci. Technol. A 26, 616–623 (2008) https://doi.org/10.1116/1.2943643

Abstract

View articletitled, X-ray photoelectron spectroscopy studies of water-induced surface reorganization of amphiphilic poly(2-hydroxyethyl methacrylate-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">g</mi></math>-dimethylsiloxane) copolymers using cryogenic sample handling techniques

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Can the throttling of a perfect gas through a free molecular orifice produce a cooling effect?

Robert M. Young; Timothy T. Braggins; Christopher F. Kirby; J. Douglas Adam; Michael B. Petach; Emanuel Tward

J. Vac. Sci. Technol. A 26, 624–633 (2008) https://doi.org/10.1116/1.2929843

Abstract

View articletitled, Can the throttling of a perfect gas through a free molecular orifice produce a cooling effect?

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Survey on measurement of tangential momentum accommodation coefficient

Amit Agrawal; S. V. Prabhu

J. Vac. Sci. Technol. A 26, 634–645 (2008) https://doi.org/10.1116/1.2943641

Abstract

View articletitled, Survey on measurement of tangential momentum accommodation coefficient

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PAPERS FROM THE 54TH INTERNATIONAL SYMPOSIUM OF AVS

Applied Surface Science

Bulk ratio method for determining surface enhancement using Auger analysis

J. D. Geller

J. Vac. Sci. Technol. A 26, 650–653 (2008) https://doi.org/10.1116/1.2908433

Abstract

View articletitled, Bulk ratio method for determining surface enhancement using Auger analysis

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Investigation of thin-oxide-free protective coatings on chromium and $316 L$ stainless steel formed by treatment with etidronic acid

S. L. Johnson; P. M. A. Sherwood

J. Vac. Sci. Technol. A 26, 654–659 (2008) https://doi.org/10.1116/1.2902963

Abstract

View articletitled, Investigation of thin-oxide-free protective coatings on chromium and <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>316</mn><mspace width="0.3em"></mspace><mi mathvariant="normal">L</mi></mrow></math> stainless steel formed by treatment with etidronic acid

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Cluster primary ions: Spikes, sputtering yields, secondary ion yields, and interrelationships for secondary molecular ions for static secondary ion mass spectrometry

Martin P. Seah

J. Vac. Sci. Technol. A 26, 660–667 (2008) https://doi.org/10.1116/1.2891260

Abstract

View articletitled, Cluster primary ions: Spikes, sputtering yields, secondary ion yields, and interrelationships for secondary molecular ions for static secondary ion mass spectrometry

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Three dimensional image construction and spectrum extraction from two dimensional elemental mapping in Auger electron spectroscopy

N. Urushihara; S. Iida; N. Sanada; M. Suzuki; D. F. Paul; S. Bryan; Y. Nakajima; T. Hanajiri; K. Kakushima; P. Ahmet; K. Tsutsui; H. Iwai

J. Vac. Sci. Technol. A 26, 668–672 (2008) https://doi.org/10.1116/1.2870232

Abstract

View articletitled, Three dimensional image construction and spectrum extraction from two dimensional elemental mapping in Auger electron spectroscopy

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Electronic states of Fe nanostructures on Pt(997) surface

Ruihua Cheng; E. Ayieta; Ya. B. Losovyj

J. Vac. Sci. Technol. A 26, 673–677 (2008) https://doi.org/10.1116/1.2830632

Abstract

View articletitled, Electronic states of Fe nanostructures on Pt(997) surface

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Effect of annealing temperature on the photocatalytic activity of sol-gel derived $Ti O_{2}$ thin films

S. Biswas; Arpi Majumder; M. F. Hossain; T. Takahashi; Y. Kubota; A. Fujishima

J. Vac. Sci. Technol. A 26, 678–682 (2008) https://doi.org/10.1116/1.2889416

Abstract

View articletitled, Effect of annealing temperature on the photocatalytic activity of sol-gel derived <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> thin films

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Electronic Materials and Processing

Role of hydrogen bonding environment in $a - Si : H$ films for $c - Si$ surface passivation

M. Z. Burrows; U. K. Das; R. L. Opila; S. De Wolf; R. W. Birkmire

J. Vac. Sci. Technol. A 26, 683–687 (2008) https://doi.org/10.1116/1.2897929

Abstract

View articletitled, Role of hydrogen bonding environment in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi>a</mi><mtext>-</mtext><mi mathvariant="normal">Si</mi><mo>:</mo><mi mathvariant="normal">H</mi></mrow></math> films for <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi>c</mi><mtext>-</mtext><mi mathvariant="normal">Si</mi></mrow></math> surface passivation

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Microstructural evolution of nickel-germanide in the ${Ni}_{1 - x} {Ta}_{x} / Ge$ systems during in situ annealing

Jae-Wook Lee; Jee-Hwan Bae; Min-Ho Park; Han-Byul Kang; Hyoungsub Kim; Cheol-Woong Yang

J. Vac. Sci. Technol. A 26, 688–691 (2008) https://doi.org/10.1116/1.2839763

Abstract

View articletitled, Microstructural evolution of nickel-germanide in the <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>Ni</mtext></mrow><mrow><mn>1</mn><mo>−</mo><mi>x</mi></mrow></msub><msub><mrow><mtext>Ta</mtext></mrow><mi>x</mi></msub><mo>/</mo><mtext>Ge</mtext></mrow></math> systems during in situ annealing

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Effects of hydrogen ambient and film thickness on ZnO:Al properties

Joel N. Duenow; Timothy A. Gessert; David M. Wood; Anne C. Dillon; Timothy J. Coutts

J. Vac. Sci. Technol. A 26, 692–696 (2008) https://doi.org/10.1116/1.2891261

Abstract

View articletitled, Effects of hydrogen ambient and film thickness on ZnO:Al properties

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Main determinants for III–V metal-oxide-semiconductor field-effect transistors (invited)

Peide D. Ye

J. Vac. Sci. Technol. A 26, 697–704 (2008) https://doi.org/10.1116/1.2905246

Abstract

View articletitled, Main determinants for III–V metal-oxide-semiconductor field-effect transistors (invited)

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Characterization of plasma etching induced interface states at $Ti ∕ p - Si Ge$ Schottky contacts

M. Mamor; A. Sellai

J. Vac. Sci. Technol. A 26, 705–709 (2008) https://doi.org/10.1116/1.2913576

Abstract

View articletitled, Characterization of plasma etching induced interface states at <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><mo>∕</mo><mi>p</mi><mtext>-</mtext><mi mathvariant="normal">Si</mi><mi mathvariant="normal">Ge</mi></mrow></math> Schottky contacts

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Fabrication and characterization of a pentacene thin film transistor with a polymer insulator as a gate dielectric

Chulwoo Lee; Jungmin Ko; Junyoung Lee; Ilsub Chung

J. Vac. Sci. Technol. A 26, 710–715 (2008) https://doi.org/10.1116/1.2889434

Abstract

View articletitled, Fabrication and characterization of a pentacene thin film transistor with a polymer insulator as a gate dielectric

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Photoluminescence characterization of polythiophene films doped with highly functional molecules

H. Kato; S. Takemura; H. Kobe; Y. Mori; A. Yamada; Y. Matsuoka; Y. Watanabe; K. Shimada; T. Hiramatsu; N. Nanba; K. Matsui

J. Vac. Sci. Technol. A 26, 716–719 (2008) https://doi.org/10.1116/1.2891259

Abstract

View articletitled, Photoluminescence characterization of polythiophene films doped with highly functional molecules

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Influence of a post–chemical mechanical polishing cleaning process on the ferroelectric properties of a $Pb (Zr, Ti) O_{3}$ thin film capacitor fabricated by the damascene process

Nam-Hoon Kim; Young-Kil Jun; Pil-Ju Ko; Woo-Sun Lee

J. Vac. Sci. Technol. A 26, 720–723 (2008) https://doi.org/10.1116/1.2900712

Abstract

View articletitled, Influence of a post–chemical mechanical polishing cleaning process on the ferroelectric properties of a <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Pb</mi><mrow><mo>(</mo><mi mathvariant="normal">Zr</mi><mo>,</mo><mi mathvariant="normal">Ti</mi><mo>)</mo></mrow><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> thin film capacitor fabricated by the damascene process

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Silicate formation and thermal stability of ternary rare earth oxides as high- $k$ dielectrics

S. Van Elshocht; C. Adelmann; T. Conard; A. Delabie; A. Franquet; L. Nyns; O. Richard; P. Lehnen; J. Swerts; S. De Gendt

J. Vac. Sci. Technol. A 26, 724–730 (2008) https://doi.org/10.1116/1.2891257

Abstract

View articletitled, Silicate formation and thermal stability of ternary rare earth oxides as high-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">k</mi></math> dielectrics

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MEMS and NEMS

Process development and material characterization of polycrystalline ${Bi}_{2} {Te}_{3}$ ⁠, PbTe, and PbSnSeTe thin films on silicon for millimeter-scale thermoelectric generators

I. Boniche; B. C. Morgan; P. J. Taylor; C. D. Meyer; D. P. Arnold

J. Vac. Sci. Technol. A 26, 739–744 (2008) https://doi.org/10.1116/1.2841522

Abstract

View articletitled, Process development and material characterization of polycrystalline <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>Bi</mtext></mrow><mn>2</mn></msub><msub><mrow><mtext>Te</mtext></mrow><mn>3</mn></msub></mrow></math>⁠, PbTe, and PbSnSeTe thin films on silicon for millimeter-scale thermoelectric generators

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Fabrication of metal-based high-aspect-ratio microscale structures by compression molding

J. Jiang; Fanghua Mei; W. J. Meng

J. Vac. Sci. Technol. A 26, 745–751 (2008) https://doi.org/10.1116/1.2912078

Abstract

View articletitled, Fabrication of metal-based high-aspect-ratio microscale structures by compression molding

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Design and fabrication of a multilayer micro-/nanofluidic device with an electrically driven nanovalve

Hao Li; Leonidas E. Ocola; Orlando Auciello; Millicent Firestone

J. Vac. Sci. Technol. A 26, 752–756 (2008) https://doi.org/10.1116/1.2936227

Abstract

View articletitled, Design and fabrication of a multilayer micro-/nanofluidic device with an electrically driven nanovalve

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Advances in magnetometry through miniaturization

A. S. Edelstein; J. Burnette; G. A. Fischer; S. F. Cheng; W. F. Egelhoff, Jr.; P. W. T. Pong; R. D. McMichael; E. R. Nowak

J. Vac. Sci. Technol. A 26, 757–762 (2008) https://doi.org/10.1116/1.2841516

Abstract

View articletitled, Advances in magnetometry through miniaturization

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Fabrication of stationary micro-optical shutter based on semiconductor-to-metallic phase transition of W-doped ${VO}_{2}$ active layer driven by an external voltage

M. Soltani; M. Chaker; E. Haddad; R. Kruzelecky; J. Margot; P. Laou; S. Paradis

J. Vac. Sci. Technol. A 26, 763–767 (2008) https://doi.org/10.1116/1.2870227

Abstract

View articletitled, Fabrication of stationary micro-optical shutter based on semiconductor-to-metallic phase transition of W-doped <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>VO</mtext></mrow><mn>2</mn></msub></mrow></math> active layer driven by an external voltage

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Nanotribological and nanomechanical properties of lubricated PZT thin films for ferroelectric data storage applications

Manuel Palacio; Bharat Bhushan

J. Vac. Sci. Technol. A 26, 768–776 (2008) https://doi.org/10.1116/1.2870230

Abstract

View articletitled, Nanotribological and nanomechanical properties of lubricated PZT thin films for ferroelectric data storage applications

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Technique to measure contact angle of micro/nanodroplets using atomic force microscopy

Yong Chae Jung; Bharat Bhushan

J. Vac. Sci. Technol. A 26, 777–782 (2008) https://doi.org/10.1116/1.2832409

Abstract

View articletitled, Technique to measure contact angle of micro/nanodroplets using atomic force microscopy

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Platinum-coated probes sliding at up to 100 mm/s against lead zirconate titanate films for atomic force microscopy probe-based ferroelectric recording technology

Kwang Joo Kwak; Bharat Bhushan

J. Vac. Sci. Technol. A 26, 783–793 (2008) https://doi.org/10.1116/1.2832362

Abstract

View articletitled, Platinum-coated probes sliding at up to 100 mm/s against lead zirconate titanate films for atomic force microscopy probe-based ferroelectric recording technology

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Improvement of the surface roughness and sensing properties of cerium dioxide thin film by chemical mechanical polishing

Nam-Hoon Kim; Pil-Ju Ko; Woo-Sun Lee

J. Vac. Sci. Technol. A 26, 794–797 (2008) https://doi.org/10.1116/1.2885208

Abstract

View articletitled, Improvement of the surface roughness and sensing properties of cerium dioxide thin film by chemical mechanical polishing

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Evaluation of bond quality and heat transfer of Cu-based microchannel heat exchange devices

Fanghua Mei; J. Jiang; W. J. Meng

J. Vac. Sci. Technol. A 26, 798–804 (2008) https://doi.org/10.1116/1.2913580

Abstract

View articletitled, Evaluation of bond quality and heat transfer of Cu-based microchannel heat exchange devices

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Manufacturing Science and Technology

Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line

A. Le Gouil; N. Cabuil; P. Dupeyrat; B. Dickson; M. Kwan; D. Barge; E. Gurer; O. Doclot; J.-C. Royer

J. Vac. Sci. Technol. A 26, 805–811 (2008) https://doi.org/10.1116/1.2902966

Abstract

View articletitled, Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line

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Photoconductive analysis of ion implantation damage and annealing in silicon wafers

R. K. Ahrenkiel

J. Vac. Sci. Technol. A 26, 812–818 (2008) https://doi.org/10.1116/1.2919144

Abstract

View articletitled, Photoconductive analysis of ion implantation damage and annealing in silicon wafers

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Nanometer-Scale Science and Technology

Nanometer-scaled triangular platinum islands fabricated using the bridge phenomenon of polystyrene beads

Byoung-Kyu Lee; Kyoung Seob Kim; Ji-Hye Lee; Nam-Hoon Kim; Yonghan Roh

J. Vac. Sci. Technol. A 26, 819–823 (2008) https://doi.org/10.1116/1.2936230

Abstract

View articletitled, Nanometer-scaled triangular platinum islands fabricated using the bridge phenomenon of polystyrene beads

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Conducting polymer nanofilm growth on a nanoscale linked-crater pattern fabricated on an Al surface

H. Kato; S. Takemura; A. Ishii; Y. Takarai; Y. Watanabe; T. Sugiyama; T. Hiramatsu; N. Nanba; O. Nishikawa; M. Taniguchi

J. Vac. Sci. Technol. A 26, 824–831 (2008) https://doi.org/10.1116/1.2889420

Abstract

View articletitled, Conducting polymer nanofilm growth on a nanoscale linked-crater pattern fabricated on an Al surface

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Growth and characterization of carbon nanotubes on constantan (Cu–Ni–Mn alloy) metallic substrates without adding additional catalysts

C. V. Varanasi; J. Bulmer; L. Brunke; J. Burke; J. Baca; K. Yost; P. Barnes

J. Vac. Sci. Technol. A 26, 832–835 (2008) https://doi.org/10.1116/1.2841520

Abstract

View articletitled, Growth and characterization of carbon nanotubes on constantan (Cu–Ni–Mn alloy) metallic substrates without adding additional catalysts

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Plasmonics Topical Conference

Thermoplasmonic shift and dispersion in thin metal films

A. L. Lereu; A. Passian; R. H. Farahi; N. F. van Hulst; T. L. Ferrell; T. Thundat

J. Vac. Sci. Technol. A 26, 836–841 (2008) https://doi.org/10.1116/1.2900713

Abstract

View articletitled, Thermoplasmonic shift and dispersion in thin metal films

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Plasma Science and Technology

Effect of capacitive to inductive coupling transition in multiple linear U-type antenna on silicon thin film deposition from pure $Si H_{4}$ discharges

Hong Bum Kim; Hyoung Cheol Lee; Kyong Nam Kim; Geun Young Yeom

J. Vac. Sci. Technol. A 26, 842–846 (2008) https://doi.org/10.1116/1.2924340

Abstract

View articletitled, Effect of capacitive to inductive coupling transition in multiple linear U-type antenna on silicon thin film deposition from pure <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">H</mi><mn>4</mn></msub></mrow></math> discharges

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Study on plasma assisted metal-organic chemical vapor deposition of Zr(C,N) and Ti(C,N) thin films and in situ plasma diagnostics with optical emission spectroscopy

S. J. Cho; S.-H. Nam; C.-K. Jung; H.-G. Jee; J.-H. Boo; S. Kim; J. G. Han

J. Vac. Sci. Technol. A 26, 847–853 (2008) https://doi.org/10.1116/1.2944262

Abstract

View articletitled, Study on plasma assisted metal-organic chemical vapor deposition of Zr(C,N) and Ti(C,N) thin films and in situ plasma diagnostics with optical emission spectroscopy

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Exotic shapes of gold nanoparticles synthesized using plasma in aqueous solution

Junko Hieda; Nagahiro Saito; Osamu Takai

J. Vac. Sci. Technol. A 26, 854–856 (2008) https://doi.org/10.1116/1.2919139

Abstract

View articletitled, Exotic shapes of gold nanoparticles synthesized using plasma in aqueous solution

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Dry etching of extreme ultraviolet lithography mask structures in inductively coupled plasmas

D. Y. Kim; H. J. Lee; H. Y. Jung; N.-E. Lee; T. G. Kim; B. H. Kim; Jinho Ahn; C. Y. Kim

J. Vac. Sci. Technol. A 26, 857–860 (2008) https://doi.org/10.1116/1.2902964

Abstract

View articletitled, Dry etching of extreme ultraviolet lithography mask structures in inductively coupled plasmas

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Etching characteristics and application of physical-vapor-deposited amorphous carbon for multilevel resist

H. T. Kim; B. S. Kwon; N.-E. Lee; Y. S. Park; H. J. Cho; B. Hong

J. Vac. Sci. Technol. A 26, 861–864 (2008) https://doi.org/10.1116/1.2936231

Abstract

View articletitled, Etching characteristics and application of physical-vapor-deposited amorphous carbon for multilevel resist

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Plasma Science and Technology I

Global plasma simulations using dynamically generated chemical models

James J. Munro; Jonathan Tennyson

J. Vac. Sci. Technol. A 26, 865–869 (2008) https://doi.org/10.1116/1.2889433

Abstract

View articletitled, Global plasma simulations using dynamically generated chemical models

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Surface reactions during low- $k$ etching using $H_{2} ∕ N_{2}$ plasma

Masanaga Fukasawa; Tetsuya Tatsumi; Keiji Oshima; Kazunori Nagahata; Saburo Uchida; Seigo Takashima; Masaru Hori; Yukihiro Kamide

J. Vac. Sci. Technol. A 26, 870–874 (2008) https://doi.org/10.1116/1.2839764

Abstract

View articletitled, Surface reactions during low-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">k</mi></math> etching using <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">H</mi><mn>2</mn></msub><mo>∕</mo><msub><mi mathvariant="normal">N</mi><mn>2</mn></msub></mrow></math> plasma

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Low-damage low- $k$ etching with an environmentally friendly $C F_{3} I$ plasma

Eiichi Soda; Seiichi Kondo; Shuichi Saito; Yoshinari Ichihashi; Aiko Sato; Hiroto Ohtake; Seiji Samukawa

J. Vac. Sci. Technol. A 26, 875–880 (2008) https://doi.org/10.1116/1.2919137

Abstract

View articletitled, Low-damage low-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">k</mi></math> etching with an environmentally friendly <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">C</mi><msub><mi mathvariant="normal">F</mi><mn>3</mn></msub><mi mathvariant="normal">I</mi></mrow></math> plasma

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Advanced Surface Engineering

Temperature effect on the glancing angle deposition of Si sculptured thin films

Christian Patzig; Bernd Rauschenbach

J. Vac. Sci. Technol. A 26, 881–886 (2008) https://doi.org/10.1116/1.2834684

Abstract

View articletitled, Temperature effect on the glancing angle deposition of Si sculptured thin films

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Effect of swift heavy ion irradiation on the hardness of chromium nanorods

Rupali Nagar; B. R. Mehta; J. P. Singh; D. Jain; V. Ganesan; S. V. Kesapragada; D. Gall

J. Vac. Sci. Technol. A 26, 887–892 (2008) https://doi.org/10.1116/1.2834683

Abstract

View articletitled, Effect of swift heavy ion irradiation on the hardness of chromium nanorods

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High rate deposition of photocatalytic $Ti O_{2}$ films with high activity by hollow cathode gas-flow sputtering method

Yoshiyuki Kubo; Yoshinori Iwabuchi; Masato Yoshikawa; Yasushi Sato; Yuzo Shigesato

J. Vac. Sci. Technol. A 26, 893–897 (2008) https://doi.org/10.1116/1.2836425

Abstract

View articletitled, High rate deposition of photocatalytic <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> films with high activity by hollow cathode gas-flow sputtering method

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Preparation of ${TiO}_{2}$ thin films by laser ablation for photocatalytic applications

S. J. Wang; W.-T. Chang; J.-Y. Ciou; M.-K. Wei; M. S. Wong

J. Vac. Sci. Technol. A 26, 898–902 (2008) https://doi.org/10.1116/1.2870228

Abstract

View articletitled, Preparation of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>TiO</mtext></mrow><mn>2</mn></msub></mrow></math> thin films by laser ablation for photocatalytic applications

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High rate deposition of photocatalytic ${TiO}_{2}$ films by dc magnetron sputtering using a ${TiO}_{2 - x}$ target

Yasushi Sato; Akira Uebayashi; Norihiro Ito; Toshihisa Kamiyama; Yuzo Shigesato

J. Vac. Sci. Technol. A 26, 903–907 (2008) https://doi.org/10.1116/1.2870226

Abstract

View articletitled, High rate deposition of photocatalytic <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>TiO</mtext></mrow><mn>2</mn></msub></mrow></math> films by dc magnetron sputtering using a <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>TiO</mtext></mrow><mrow><mn>2</mn><mo>−</mo><mi>x</mi></mrow></msub></mrow></math> target

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Surface Science

Plasma modification of $Co {Pt}_{3}$ nanoparticle arrays: A route to catalytic coatings of surfaces

Bernhard Gehl; Jan Ingo Flege; Vesna Aleksandrovic; Thomas Schmidt; Andreas Kornowski; Sigrid Bernstorff; Jens Falta; Horst Weller; Marcus Bäumer

J. Vac. Sci. Technol. A 26, 908–912 (2008) https://doi.org/10.1116/1.2936222

Abstract

View articletitled, Plasma modification of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Co</mi><msub><mi mathvariant="normal">Pt</mi><mn>3</mn></msub></mrow></math> nanoparticle arrays: A route to catalytic coatings of surfaces

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Surface Science I

Preparation of nickel nanoparticles and their catalytic activity in the cracking of methane

Juan Carlos De Jesús; Ismael González; Miguel García; Caribay Urbina

J. Vac. Sci. Technol. A 26, 913–918 (2008) https://doi.org/10.1116/1.2885212

Abstract

View articletitled, Preparation of nickel nanoparticles and their catalytic activity in the cracking of methane

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Surface science investigations of photoprocesses in model interstellar ices

J. D. Thrower; M. P. Collings; M. R. S. McCoustra; D. J. Burke; W. A. Brown; A. Dawes; P. D. Holtom; P. Kendall; N. J. Mason; F. Jamme; H. J. Fraser; I. P. Clark; A. W. Parker

J. Vac. Sci. Technol. A 26, 919–924 (2008) https://doi.org/10.1116/1.2834687

Abstract

View articletitled, Surface science investigations of photoprocesses in model interstellar ices

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Surface Science II

Photo-induced surface functionalization of carbon surfaces: The role of photoelectron ejection

Paula E. Colavita; Bin Sun; Kiu-Yuen Tse; Robert J. Hamers

J. Vac. Sci. Technol. A 26, 925–931 (2008) https://doi.org/10.1116/1.2908435

Abstract

View articletitled, Photo-induced surface functionalization of carbon surfaces: The role of photoelectron ejection

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Thin Films

Atomic-scale investigation of graphene formation on $6 H - Si C (0001)$

N. P. Guisinger; G. M. Rutter; J. N. Crain; C. Heiliger; P. N. First; J. A. Stroscio

J. Vac. Sci. Technol. A 26, 932–937 (2008) https://doi.org/10.1116/1.2900661

Abstract

View articletitled, Atomic-scale investigation of graphene formation on <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>6</mn><mi>H</mi><mtext>-</mtext><mi mathvariant="normal">Si</mi><mi mathvariant="normal">C</mi><mrow><mo>(</mo><mn>0001</mn><mo>)</mo></mrow></mrow></math>

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Structural and electronic properties of bilayer epitaxial graphene

G. M. Rutter; J. N. Crain; N. P. Guisinger; P. N. First; J. A. Stroscio

J. Vac. Sci. Technol. A 26, 938–943 (2008) https://doi.org/10.1116/1.2944257

Abstract

View articletitled, Structural and electronic properties of bilayer epitaxial graphene

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Photoluminescence and electroluminescence from Eu-activated $Ca {Al}_{2} O_{4}$ -based multicomponent oxide thin-film phosphors

Haruki Fukada; Shun Matsui; Toshihiro Miyata; Tadatsugu Minami

J. Vac. Sci. Technol. A 26, 944–948 (2008) https://doi.org/10.1116/1.2913577

Abstract

View articletitled, Photoluminescence and electroluminescence from Eu-activated <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ca</mi><msub><mi mathvariant="normal">Al</mi><mn>2</mn></msub><msub><mi mathvariant="normal">O</mi><mn>4</mn></msub></mrow></math>-based multicomponent oxide thin-film phosphors

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Single-chamber plasma enhanced chemical vapor deposition of transparent organic/inorganic multilayer barrier coating at low temperature

S. M. Park; D. J. Kim; S. I. Kim; N.-E. Lee

J. Vac. Sci. Technol. A 26, 949–955 (2008) https://doi.org/10.1116/1.2940348

Abstract

View articletitled, Single-chamber plasma enhanced chemical vapor deposition of transparent organic/inorganic multilayer barrier coating at low temperature

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An electron impact emission spectroscopy flux sensor for monitoring deposition rate at high background gas pressure with improved accuracy

C. Lu; C. D. Blissett; G. Diehl

J. Vac. Sci. Technol. A 26, 956–960 (2008) https://doi.org/10.1116/1.2830633

Abstract

View articletitled, An electron impact emission spectroscopy flux sensor for monitoring deposition rate at high background gas pressure with improved accuracy

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Top-emitting organic light-emitting diodes with $Ba ∕ Ag$ /indium tin oxide cathode and built-in potential analyses in these devices

J. T. Lim; J. H. Lee; G. Y. Yeom; E. H. Lee; T. W. Kim

J. Vac. Sci. Technol. A 26, 961–965 (2008) https://doi.org/10.1116/1.2924333

Abstract

View articletitled, Top-emitting organic light-emitting diodes with <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ba</mi><mo>∕</mo><mi mathvariant="normal">Ag</mi></mrow></math>/indium tin oxide cathode and built-in potential analyses in these devices

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Effect of substrate temperatures on amorphous carbon nitride films prepared by reactive sputtering

Masami Aono; Hidenobu Akiyoshi; Shunsuke Kikuchi; Nobuaki Kitazawa; Yoshihisa Watanabe

J. Vac. Sci. Technol. A 26, 966–969 (2008) https://doi.org/10.1116/1.2919140

Abstract

View articletitled, Effect of substrate temperatures on amorphous carbon nitride films prepared by reactive sputtering

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Optical radiation selective photodetectors based on III nitrides

R. Pillai; D. Starikov; C. Boney; A. Bensaoula

J. Vac. Sci. Technol. A 26, 970–973 (2008) https://doi.org/10.1116/1.2940347

Abstract

View articletitled, Optical radiation selective photodetectors based on III nitrides

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Effects of P on amorphous chemical vapor deposition Ru-P alloy films for Cu interconnect liner applications

Jinhong Shin; Hyun-Woo Kim; Kyriacos Agapiou; Richard A. Jones; Gyeong S. Hwang; John G. Ekerdt

J. Vac. Sci. Technol. A 26, 974–979 (2008) https://doi.org/10.1116/1.2832360

Abstract

View articletitled, Effects of P on amorphous chemical vapor deposition Ru-P alloy films for Cu interconnect liner applications

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Study on the amorphous Ta–Zr films as diffusion barrier in Cu metallization

Chuan Li; J. H. Hsieh; Z. Z. Tang

J. Vac. Sci. Technol. A 26, 980–984 (2008) https://doi.org/10.1116/1.2889441

Abstract

View articletitled, Study on the amorphous Ta–Zr films as diffusion barrier in Cu metallization

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Ferroelectric properties of $Pb ({Mn}_{1 / 3} {Nb}_{2 / 3}) O_{3} - Pb (Zr, Ti) O_{3}$ thin films epitaxially grown on (001)MgO substrates

Tao Zhang; Kiyotaka Wasa; Isaku Kanno; Shu-Yi Zhang

J. Vac. Sci. Technol. A 26, 985–990 (2008) https://doi.org/10.1116/1.2900659

Abstract

View articletitled, Ferroelectric properties of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mtext>Pb</mtext><mrow><mo>(</mo><mrow><msub><mrow><mtext>Mn</mtext></mrow><mrow><mn>1</mn><mo>/</mo><mn>3</mn></mrow></msub><msub><mrow><mtext>Nb</mtext></mrow><mrow><mn>2</mn><mo>/</mo><mn>3</mn></mrow></msub></mrow><mo>)</mo></mrow><msub><mtext>O</mtext><mn>3</mn></msub><mo>−</mo><mtext>Pb</mtext><mrow><mo>(</mo><mrow><mtext>Zr</mtext><mo>,</mo><mtext>Ti</mtext></mrow><mo>)</mo></mrow><msub><mtext>O</mtext><mn>3</mn></msub></mrow></math> thin films epitaxially grown on (001)MgO substrates

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Ion beam deposition of tantalum pentoxide thin film at room temperature

W. Kulisch; D. Gilliland; G. Ceccone; H. Rauscher; L. Sirghi; P. Colpo; F. Rossi

J. Vac. Sci. Technol. A 26, 991–995 (2008) https://doi.org/10.1116/1.2832407

Abstract

View articletitled, Ion beam deposition of tantalum pentoxide thin film at room temperature

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Effects of manganese oxide–mixed abrasive slurry on the tetraethyl orthosilicate oxide chemical mechanical polishing for planarization of interlayer dielectric film in the multilevel interconnection

Yong-Jin Seo; Sung-Woo Park; Woo-Sun Lee

J. Vac. Sci. Technol. A 26, 996–1001 (2008) https://doi.org/10.1116/1.2936225

Abstract

View articletitled, Effects of manganese oxide–mixed abrasive slurry on the tetraethyl orthosilicate oxide chemical mechanical polishing for planarization of interlayer dielectric film in the multilevel interconnection

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Comparative study of photocatalytic activity in $Cd S - Ti O_{2}$ thin films prepared by two different techniques

S. Biswas; M. F. Hossain; T. Takahashi; Y. Kubota; A. Fujishima

J. Vac. Sci. Technol. A 26, 1002–1006 (2008) https://doi.org/10.1116/1.2938392

Abstract

View articletitled, Comparative study of photocatalytic activity in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Cd</mi><mi mathvariant="normal">S</mi><mo>–</mo><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> thin films prepared by two different techniques

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Effect of structure and surface morphology of sol-gel derived $Ti O_{2}$ photoelectrode on the performance of dye-sensitized solar cells

M. F. Hossain; S. Biswas; T. Takahashi; Y. Kubota; A. Fujishima

J. Vac. Sci. Technol. A 26, 1007–1011 (2008) https://doi.org/10.1116/1.2832410

Abstract

View articletitled, Effect of structure and surface morphology of sol-gel derived <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> photoelectrode on the performance of dye-sensitized solar cells

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Effect of substrate temperature on the facing target sputter deposited $Ti O_{2}$ photoelectrode of dye-sensitized solar cells

M. F. Hossain; S. Biswas; T. Takahashi; Y. Kubota; A. Fujishima

J. Vac. Sci. Technol. A 26, 1012–1017 (2008) https://doi.org/10.1116/1.2834686

Abstract

View articletitled, Effect of substrate temperature on the facing target sputter deposited <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> photoelectrode of dye-sensitized solar cells

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Silicon carbonitrides: On the attainability of stable compounds with high nitrogen content

M. Rudolphi; H. Baumann; U. Geckle; M. Bruns

J. Vac. Sci. Technol. A 26, 1018–1022 (2008) https://doi.org/10.1116/1.2924331

Abstract

View articletitled, Silicon carbonitrides: On the attainability of stable compounds with high nitrogen content

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Thin Films I

Optical characterization of InN layers grown by high-pressure chemical vapor deposition

M. Alevli; R. Atalay; G. Durkaya; A. Weesekara; A. G. U. Perera; N. Dietz; R. Kirste; A. Hoffmann

J. Vac. Sci. Technol. A 26, 1023–1026 (2008) https://doi.org/10.1116/1.2908736

Abstract

View articletitled, Optical characterization of InN layers grown by high-pressure chemical vapor deposition

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Structural study of $Ti O_{2}$ -based transparent conducting films

T. Hitosugi; N. Yamada; S. Nakao; K. Hatabayashi; T. Shimada; T. Hasegawa

J. Vac. Sci. Technol. A 26, 1027–1029 (2008) https://doi.org/10.1116/1.2944260

Abstract

View articletitled, Structural study of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math>-based transparent conducting films

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Thin Films II

A model for calculating resputter rates in codeposition

J. M. Gregoire; R. B. van Dover

J. Vac. Sci. Technol. A 26, 1030–1036 (2008) https://doi.org/10.1116/1.2885213

Abstract

View articletitled, A model for calculating resputter rates in codeposition

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Electronic Material and Processing/Nanometer-Scale Science and Technology

Optical properties of organic and inorganic capped CdS nanoparticles and the effects of x-ray irradiation on organic capped CdS nanoparticles

Nilima V. Hullavarad; Shiva S. Hullavarad

J. Vac. Sci. Technol. A 26, 1050–1057 (2008) https://doi.org/10.1116/1.2940346

Abstract

View articletitled, Optical properties of organic and inorganic capped CdS nanoparticles and the effects of x-ray irradiation on organic capped CdS nanoparticles

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Characterization of electrospray ion-beam-deposited CdSe/ZnS quantum dot thin films from a colloidal solution

Yuki Tani; Satoshi Kobayashi; Hiroshi Kawazoe

J. Vac. Sci. Technol. A 26, 1058–1061 (2008) https://doi.org/10.1116/1.2912072

Abstract

View articletitled, Characterization of electrospray ion-beam-deposited CdSe/ZnS quantum dot thin films from a colloidal solution

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Programmable memory devices using gold nanoparticles capped with alkanethiols of different carbon chain lengths

Pei Ying Lai; J. S. Chen

J. Vac. Sci. Technol. A 26, 1062–1067 (2008) https://doi.org/10.1116/1.2836426

Abstract

View articletitled, Programmable memory devices using gold nanoparticles capped with alkanethiols of different carbon chain lengths

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Renewable Energy Science & Technology Topical Conference/Thin Films/Surface Science

Electron backscatter diffraction of CdTe thin films: Effects of ${CdCl}_{2}$ treatment

H. R. Moutinho; R. G. Dhere; M. J. Romero; C.-S. Jiang; B. To; M. M. Al-Jassim

J. Vac. Sci. Technol. A 26, 1068–1073 (2008) https://doi.org/10.1116/1.2841523

Abstract

View articletitled, Electron backscatter diffraction of CdTe thin films: Effects of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>CdCl</mtext></mrow><mn>2</mn></msub></mrow></math> treatment

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Nanometer-Scale Science and Technology/Manufacturing Science and Technology

Study of characteristic fragmentation of nanocarbon by the scanning atom probe

Osamu Nishikawa; Masahiro Taniguchi; Yahachi Saito

J. Vac. Sci. Technol. A 26, 1074–1078 (2008) https://doi.org/10.1116/1.2832364

Abstract

View articletitled, Study of characteristic fragmentation of nanocarbon by the scanning atom probe

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Plasma Science and Technology I/Thin Films

Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition

Scott F. Szymanski; Pieter Rowlette; Colin A. Wolden

J. Vac. Sci. Technol. A 26, 1079–1084 (2008) https://doi.org/10.1116/1.2891258

Abstract

View articletitled, Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition

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Tribology 4/Advanced Surface Energy

Microstructure and tribological behavior of tungsten-containing diamondlike carbon coated rubbers

Y. T. Pei; X. L. Bui; X. B. Zhou; J. Th. M. De Hosson

J. Vac. Sci. Technol. A 26, 1085–1092 (2008) https://doi.org/10.1116/1.2889443

Abstract

View articletitled, Microstructure and tribological behavior of tungsten-containing diamondlike carbon coated rubbers

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Effects of annealing on antiwear and antibacteria behaviors of TaN–Cu nanocomposite thin films

J. H. Hsieh; M. K. Cheng; Y. K. Chang; C. Li; C. L. Chang; P. C. Liu

J. Vac. Sci. Technol. A 26, 1093–1097 (2008) https://doi.org/10.1116/1.2900660

Abstract

View articletitled, Effects of annealing on antiwear and antibacteria behaviors of TaN–Cu nanocomposite thin films

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PAPERS FROM THE 54TH INTERNATION SYMPOSIUM OF AVS

Magnetic Interfaces and Nanostructures

High magnetization $Fe Co ∕ Pd$ multilayers

M. J. Walock; H. Ambaye; M. Chshiev; F. R. Klose; W. H. Butler; G. J. Mankey

J. Vac. Sci. Technol. A 26, 731–734 (2008) https://doi.org/10.1116/1.2830631

Abstract

View articletitled, High magnetization <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Fe</mi><mi mathvariant="normal">Co</mi><mo>∕</mo><mi mathvariant="normal">Pd</mi></mrow></math> multilayers

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Thermal stability of synthetic antiferromagnet and hard magnet coupled spin valves

Zeenath R. Tadisina; Subhadra Gupta; Patrick LeClair; Tim Mewes

J. Vac. Sci. Technol. A 26, 735–738 (2008) https://doi.org/10.1116/1.2912070

Abstract

View articletitled, Thermal stability of synthetic antiferromagnet and hard magnet coupled spin valves

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Vacuum Technology

Efficient combining of ion pumps and getter-palladium thin films

C. Paolini; M. Mura; F. Ravelli

J. Vac. Sci. Technol. A 26, 1037–1041 (2008) https://doi.org/10.1116/1.2834685

Abstract

View articletitled, Efficient combining of ion pumps and getter-palladium thin films

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Vacuum Technology II

Recent advances to enhance low Earth orbit space simulation

Frank G. Collins

J. Vac. Sci. Technol. A 26, 1042–1049 (2008) https://doi.org/10.1116/1.2839696

Abstract

View articletitled, Recent advances to enhance low Earth orbit space simulation

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Issues

Regular Articles

PAPERS FROM THE 54TH INTERNATIONAL SYMPOSIUM OF AVS

Applied Surface Science

Electronic Materials and Processing

MEMS and NEMS

Manufacturing Science and Technology

Nanometer-Scale Science and Technology

Plasmonics Topical Conference

Plasma Science and Technology

Plasma Science and Technology I

Advanced Surface Engineering

Surface Science

Surface Science I

Surface Science II

Thin Films

Thin Films I

Thin Films II

Electronic Material and Processing/Nanometer-Scale Science and Technology

Renewable Energy Science & Technology Topical Conference/Thin Films/Surface Science

Nanometer-Scale Science and Technology/Manufacturing Science and Technology

Plasma Science and Technology I/Thin Films

Tribology 4/Advanced Surface Energy

PAPERS FROM THE 54TH INTERNATION SYMPOSIUM OF AVS

Magnetic Interfaces and Nanostructures

Vacuum Technology

Vacuum Technology II

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