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Volume 25, Issue 3

May 2007

ISSN 0734-2101

EISSN 1520-8559

Articles

Passivation layer on polyimide deposited by combined plasma immersion ion implantation and deposition and cathodic vacuum arc technique

Z. J. Han; B. K. Tay; J. Y. Sze; P. C. T. Ha

J. Vac. Sci. Technol. A 25, 411–414 (2007) https://doi.org/10.1116/1.2712196

Abstract

View articletitled, Passivation layer on polyimide deposited by combined plasma immersion ion implantation and deposition and cathodic vacuum arc technique

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Reduction of thin oxidized copper films using a hot-filament hydrogen radical source

E. Kondoh; M. Fukasawa; T. Ojimi

J. Vac. Sci. Technol. A 25, 415–420 (2007) https://doi.org/10.1116/1.2712197

Abstract

View articletitled, Reduction of thin oxidized copper films using a hot-filament hydrogen radical source

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Thermal stability of nonhydrogenated multilayer amorphous carbon prepared by the filtered cathodic vacuum arc technique

Edwin H. T. Teo; M. L. Lee; C. K. Lee; C. L. Ee; B. K. Tay; Daniel H. C. Chua

J. Vac. Sci. Technol. A 25, 421–424 (2007) https://doi.org/10.1116/1.2712193

Abstract

View articletitled, Thermal stability of nonhydrogenated multilayer amorphous carbon prepared by the filtered cathodic vacuum arc technique

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Influence of the positive ion composition on the ion-assisted chemical etch yield of $Sr Ti O_{3}$ films in $Ar ∕ S F_{6}$ plasmas

L. Stafford; O. Langlois; J. Margot; M. Gaidi; M. Chaker

J. Vac. Sci. Technol. A 25, 425–431 (2007) https://doi.org/10.1116/1.2713410

Abstract

View articletitled, Influence of the positive ion composition on the ion-assisted chemical etch yield of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Sr</mi><mi mathvariant="normal">Ti</mi><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> films in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ar</mi><mo>∕</mo><mi mathvariant="normal">S</mi><msub><mi mathvariant="normal">F</mi><mn>6</mn></msub></mrow></math> plasmas

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Reactive and anisotropic etching of magnetic tunnel junction films using pulse-time-modulated plasma

Tomonori Mukai; Norikazu Ohshima; Hiromitsu Hada; Seiji Samukawa

J. Vac. Sci. Technol. A 25, 432–436 (2007) https://doi.org/10.1116/1.2712192

Abstract

View articletitled, Reactive and anisotropic etching of magnetic tunnel junction films using pulse-time-modulated plasma

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Infrared absorber for pyroelectric detectors

M. P. Thompson; J. R. Troxell; M. E. Murray; C. M. Thrush; J. V. Mantese

J. Vac. Sci. Technol. A 25, 437–440 (2007) https://doi.org/10.1116/1.2712194

Abstract

View articletitled, Infrared absorber for pyroelectric detectors

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Identification of important growth parameters for the development of high quality ${Al}_{x > 0.5} {Ga}_{1 - x} N$ grown by metal organic chemical vapor deposition

J. R. Grandusky; M. Jamil; V. Jindal; N. Tripathi; F. Shahedipour-Sandvik

J. Vac. Sci. Technol. A 25, 441–447 (2007) https://doi.org/10.1116/1.2713409

Abstract

View articletitled, Identification of important growth parameters for the development of high quality <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Al</mi><mrow><mi>x</mi><mo>></mo><mn>0.5</mn></mrow></msub><msub><mi mathvariant="normal">Ga</mi><mrow><mn>1</mn><mo>−</mo><mi>x</mi></mrow></msub><mi mathvariant="normal">N</mi></mrow></math> grown by metal organic chemical vapor deposition

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Fluorine content of SiOF films as determined by IR spectroscopy and resonant nuclear reaction analysis

J. C. Alonso; X. M. Díaz-Bucio; A. Ortiz; A. Benami; J. C. Cheang-Wong; L. Rodríguez-Fernández

J. Vac. Sci. Technol. A 25, 448–454 (2007) https://doi.org/10.1116/1.2712195

Abstract

View articletitled, Fluorine content of SiOF films as determined by IR spectroscopy and resonant nuclear reaction analysis

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Electron and ion kinetics in magnetized capacitively coupled plasma source

S. H. Lee; S. J. You; H. Y. Chang; J. K. Lee

J. Vac. Sci. Technol. A 25, 455–463 (2007) https://doi.org/10.1116/1.2713408

Abstract

View articletitled, Electron and ion kinetics in magnetized capacitively coupled plasma source

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Structural and electrical characteristics of microcrystalline silicon prepared by hot-wire chemical vapor deposition using a graphite filament

Michael M. Adachi; Karen L. Kavanagh; Karim S. Karim

J. Vac. Sci. Technol. A 25, 464–467 (2007) https://doi.org/10.1116/1.2716671

Abstract

View articletitled, Structural and electrical characteristics of microcrystalline silicon prepared by hot-wire chemical vapor deposition using a graphite filament

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NiCr etching in a reactive gas

J. Ritter; R. Boucher; W. Morgenroth; H. G. Meyer

J. Vac. Sci. Technol. A 25, 468–473 (2007) https://doi.org/10.1116/1.2716668

Abstract

View articletitled, NiCr etching in a reactive gas

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Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows

R. Dorsman; C. R. Kleijn; J. F. M. Velthuis; J. P. Zijp; A. M. B. van Mol

J. Vac. Sci. Technol. A 25, 474–479 (2007) https://doi.org/10.1116/1.2717191

Abstract

View articletitled, Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows

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Mass fractionation of carbon and hydrogen secondary ions upon ${Cs}^{+}$ and $O_{2}^{+}$ bombardment of organic materials

Shane E. Harton; Zhengmao Zhu; Frederick A. Stevie; Dieter P. Griffis; Harald Ade

J. Vac. Sci. Technol. A 25, 480–484 (2007) https://doi.org/10.1116/1.2718957

Abstract

View articletitled, Mass fractionation of carbon and hydrogen secondary ions upon <math xmlns="http://www.w3.org/1998/Math/MathML"><msup xmlns=""><mi mathvariant="normal">Cs</mi><mo>+</mo></msup></math> and <math xmlns="http://www.w3.org/1998/Math/MathML"><msubsup xmlns=""><mi mathvariant="normal">O</mi><mn>2</mn><mo>+</mo></msubsup></math> bombardment of organic materials

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Effects of the deposition parameters on the growth of ultrathin and thin $Si O_{2}$ films

E. Quartarone; P. Mustarelli; S. Grandi; F. Marabelli; E. Bontempi

J. Vac. Sci. Technol. A 25, 485–491 (2007) https://doi.org/10.1116/1.2714958

Abstract

View articletitled, Effects of the deposition parameters on the growth of ultrathin and thin <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> films

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Sputter deposited electroluminescent zinc sulfide thin films doped with rare earths

William Glass; Ajay Kale; Nigel Shepherd; Mark Davidson; David DeVito; Paul H. Holloway

J. Vac. Sci. Technol. A 25, 492–499 (2007) https://doi.org/10.1116/1.2718956

Abstract

View articletitled, Sputter deposited electroluminescent zinc sulfide thin films doped with rare earths

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Coverage dependent reaction of yttrium on silicon and the oxidation of yttrium silicide investigated by x-ray photoelectron spectroscopy

S. Y. Chiam; W. K. Chim; A. C. H. Huan; J. Zhang; J. S. Pan

J. Vac. Sci. Technol. A 25, 500–507 (2007) https://doi.org/10.1116/1.2720849

Abstract

View articletitled, Coverage dependent reaction of yttrium on silicon and the oxidation of yttrium silicide investigated by x-ray photoelectron spectroscopy

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Radiative wafer heating during plasma deposition process

R. C. M. Bosch; C. H. Kant; A. J. M. van Erven; W. T. M. Stals; M. D. Bijker

J. Vac. Sci. Technol. A 25, 508–513 (2007) https://doi.org/10.1116/1.2720848

Abstract

View articletitled, Radiative wafer heating during plasma deposition process

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Femtomolar isothermal desorption using microhotplate sensors

Amol G. Shirke; Richard E. Cavicchi; Steve Semancik; Robert H. Jackson; Brian G. Frederick; M. Clayton Wheeler

J. Vac. Sci. Technol. A 25, 514–526 (2007) https://doi.org/10.1116/1.2720850

Abstract

View articletitled, Femtomolar isothermal desorption using microhotplate sensors

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Improvement of corrosion resistance of transparent conductive multilayer coating consisting of silver layers and transparent metal oxide layers

Katsuhiko Koike; Fumiharu Yamazaki; Tomoyuki Okamura; Shin Fukuda

J. Vac. Sci. Technol. A 25, 527–531 (2007) https://doi.org/10.1116/1.2722758

Abstract

View articletitled, Improvement of corrosion resistance of transparent conductive multilayer coating consisting of silver layers and transparent metal oxide layers

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Enhancement of thermal stability of $Ta ∕ Si (100)$ film by a Ta–Si interlayer

D. C. Ahn; H. H. Lee; S. S. Kim; T. C. Kim; D. Y. Noh; D. H. Kim

J. Vac. Sci. Technol. A 25, 532–535 (2007) https://doi.org/10.1116/1.2722756

Abstract

View articletitled, Enhancement of thermal stability of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ta</mi><mo>∕</mo><mi mathvariant="normal">Si</mi><mrow><mo>(</mo><mn>100</mn><mo>)</mo></mrow></mrow></math> film by a Ta–Si interlayer

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Compound semiconductor bonded to AlN heat spreader substrate using graded intermediate layer

K. Jagannadham

J. Vac. Sci. Technol. A 25, 536–542 (2007) https://doi.org/10.1116/1.2722762

Abstract

View articletitled, Compound semiconductor bonded to AlN heat spreader substrate using graded intermediate layer

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Combined filtered cathodic arc etching pretreatment–magnetron sputter deposition of highly adherent CrN films

A. P. Ehiasarian; A. Anders; I. Petrov

J. Vac. Sci. Technol. A 25, 543–550 (2007) https://doi.org/10.1116/1.2730512

Abstract

View articletitled, Combined filtered cathodic arc etching pretreatment–magnetron sputter deposition of highly adherent CrN films

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Residence times of water molecules on stainless steel and aluminum surfaces in vacuum and atmosphere

R. Dobrozemsky; S. Menhart; K. Buchtela

J. Vac. Sci. Technol. A 25, 551–556 (2007) https://doi.org/10.1116/1.2718958

Abstract

View articletitled, Residence times of water molecules on stainless steel and aluminum surfaces in vacuum and atmosphere

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Effects of deposition parameters on the structure of AlN coatings grown by reactive magnetron sputtering

Atul Khanna; Deepak G. Bhat

J. Vac. Sci. Technol. A 25, 557–565 (2007) https://doi.org/10.1116/1.2730513

Abstract

View articletitled, Effects of deposition parameters on the structure of AlN coatings grown by reactive magnetron sputtering

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Role of surface tension in copper electroplating

Shih-Chieh Chang; Ying-Lang Wang; Chi-Cheng Hung; Wen-His Lee; Gwo-Jen Hwang

J. Vac. Sci. Technol. A 25, 566–569 (2007) https://doi.org/10.1116/1.2731354

Abstract

View articletitled, Role of surface tension in copper electroplating

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Sealing ultralow $κ$ porous dielectrics with thin boron carbonitride films

W. J. Ahearn; P. R. Fitzpatrick; J. G. Ekerdt

J. Vac. Sci. Technol. A 25, 570–574 (2007) https://doi.org/10.1116/1.2731365

Abstract

View articletitled, Sealing ultralow <math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">κ</mi></math> porous dielectrics with thin boron carbonitride films

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Resonant soft x-ray reflectivity of organic thin films

Cheng Wang; Tohru Araki; Benjamin Watts; Shane Harton; Tadanori Koga; Saibal Basu; Harald Ade

J. Vac. Sci. Technol. A 25, 575–586 (2007) https://doi.org/10.1116/1.2731352

Abstract

View articletitled, Resonant soft x-ray reflectivity of organic thin films

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Spectral behavior of the optical constants in the visible∕near infrared of GeSbSe chalcogenide thin films grown at glancing angle

R. J. Martín-Palma; J. V. Ryan; C. G. Pantano

J. Vac. Sci. Technol. A 25, 587–591 (2007) https://doi.org/10.1116/1.2731353

Abstract

View articletitled, Spectral behavior of the optical constants in the visible∕near infrared of GeSbSe chalcogenide thin films grown at glancing angle

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Effects of in situ $N_{2}$ plasma treatment on etch of $Hf O_{2}$ in inductively coupled ${Cl}_{2} ∕ N_{2}$ plasmas

Chaung Lin; Keh-Chyang Leou; Yeou-Chung Fan; Ting-Chieh Li; Kuei-Hui Chang; Lurng-Shehng Lee; Pei-Jer Tzeng

J. Vac. Sci. Technol. A 25, 592–596 (2007) https://doi.org/10.1116/1.2731361

Abstract

View articletitled, Effects of in situ <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">N</mi><mn>2</mn></msub></math> plasma treatment on etch of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Hf</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> in inductively coupled <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Cl</mi><mn>2</mn></msub><mo>∕</mo><msub><mi mathvariant="normal">N</mi><mn>2</mn></msub></mrow></math> plasmas

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Measurement and prediction of $H_{2} O$ outgassing kinetics from silica-filled polydimethylsiloxane TR55 and S5370

L. N. Dinh; A. K. Burnham; M. A. Schildbach; R. A. Smith; R. S. Maxwell; B. Balazs; W. McLean, II

J. Vac. Sci. Technol. A 25, 597–600 (2007) https://doi.org/10.1116/1.2731363

Abstract

View articletitled, Measurement and prediction of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">H</mi><mn>2</mn></msub><mi mathvariant="normal">O</mi></mrow></math> outgassing kinetics from silica-filled polydimethylsiloxane TR55 and S5370

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Optimization of the incident angle in infrared spectroscopic ellipsometry: Spectra of $C_{18}$ -alkylthiol monolayers

Z. G. Hu; P. Hess

J. Vac. Sci. Technol. A 25, 601–606 (2007) https://doi.org/10.1116/1.2731350

Abstract

View articletitled, Optimization of the incident angle in infrared spectroscopic ellipsometry: Spectra of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">C</mi><mn>18</mn></msub></math>-alkylthiol monolayers

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Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas

C. C. Hsu; M. J. Titus; D. B. Graves

J. Vac. Sci. Technol. A 25, 607–614 (2007) https://doi.org/10.1116/1.2731369

Abstract

View articletitled, Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas

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Photosynthesis and structure of electroless Ni–P films by synchrotron x-ray irradiation

Pei-Cheng Hsu; Chang-Hai Wang; Tsung-Yeh Yang; Yeu-Kuang Hwu; Chao-Sung Lin; Chih-Hsiung Chen; Liu-Wen Chang; Seung-Kwon Seol; Jung-Ho Je; G. Margaritondo

J. Vac. Sci. Technol. A 25, 615–620 (2007) https://doi.org/10.1116/1.2731349

Abstract

View articletitled, Photosynthesis and structure of electroless Ni–P films by synchrotron x-ray irradiation

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Quantifying the flux and spatial distribution of atomic hydrogen generated by a thermal source using atomic force microscopy to measure the chemical erosion of highly ordered pyrolytic graphite

Joshua D. Wnuk; Justin M. Gorham; Billy A. Smith; Mi Shin; D. Howard Fairbrother

J. Vac. Sci. Technol. A 25, 621–625 (2007) https://doi.org/10.1116/1.2731351

Abstract

View articletitled, Quantifying the flux and spatial distribution of atomic hydrogen generated by a thermal source using atomic force microscopy to measure the chemical erosion of highly ordered pyrolytic graphite

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Brief Reports and Comments

Simple versatile vacuum feedthrough

Richard J. Armstrong

J. Vac. Sci. Technol. A 25, 626–627 (2007) https://doi.org/10.1116/1.2720847

Abstract

View articletitled, Simple versatile vacuum feedthrough

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Shop Notes

CF16 differentially pumped window for ultrahigh vacuum applications

Oskar Asvany; Edouard Hugo; Stephan Schlemmer

J. Vac. Sci. Technol. A 25, 628 (2007) https://doi.org/10.1116/1.2722760

Abstract

View articletitled, CF16 differentially pumped window for ultrahigh vacuum applications

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Simple designs to avoid high-voltage discharge in a silicon electron beam-heating cell

Wang Ke-Fan; Shen Zhong-Lan; Xu Peng-Shou; Pan Hai-Bin; Zou Chong-Wen; Liu Jin-Feng

J. Vac. Sci. Technol. A 25, 629–630 (2007) https://doi.org/10.1116/1.2731355

Abstract

View articletitled, Simple designs to avoid high-voltage discharge in a silicon electron beam-heating cell

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