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REGULAR ARTICLES

J. Vac. Sci. Technol. A 22, 1087–1092 (2004) https://doi.org/10.1116/1.1738653
J. Vac. Sci. Technol. A 22, 1093–1100 (2004) https://doi.org/10.1116/1.1738656
J. Vac. Sci. Technol. A 22, 1101–1104 (2004) https://doi.org/10.1116/1.1738657
J. Vac. Sci. Technol. A 22, 1105–1109 (2004) https://doi.org/10.1116/1.1740770
J. Vac. Sci. Technol. A 22, 1110–1114 (2004) https://doi.org/10.1116/1.1752891
J. Vac. Sci. Technol. A 22, 1115–1119 (2004) https://doi.org/10.1116/1.1752898
J. Vac. Sci. Technol. A 22, 1120–1123 (2004) https://doi.org/10.1116/1.1756876
J. Vac. Sci. Technol. A 22, 1124–1128 (2004) https://doi.org/10.1116/1.1756877
J. Vac. Sci. Technol. A 22, 1129–1133 (2004) https://doi.org/10.1116/1.1738652
J. Vac. Sci. Technol. A 22, 1134–1138 (2004) https://doi.org/10.1116/1.1738655
J. Vac. Sci. Technol. A 22, 1139–1145 (2004) https://doi.org/10.1116/1.1738654
J. Vac. Sci. Technol. A 22, 1146–1151 (2004) https://doi.org/10.1116/1.1759355
J. Vac. Sci. Technol. A 22, 1152–1157 (2004) https://doi.org/10.1116/1.1761160
J. Vac. Sci. Technol. A 22, 1158–1165 (2004) https://doi.org/10.1116/1.1759354
J. Vac. Sci. Technol. A 22, 1166–1168 (2004) https://doi.org/10.1116/1.1761119
J. Vac. Sci. Technol. A 22, 1169–1174 (2004) https://doi.org/10.1116/1.1761083
J. Vac. Sci. Technol. A 22, 1175–1181 (2004) https://doi.org/10.1116/1.1761186
J. Vac. Sci. Technol. A 22, 1182–1187 (2004) https://doi.org/10.1116/1.1763906
J. Vac. Sci. Technol. A 22, 1188–1190 (2004) https://doi.org/10.1116/1.1763909
J. Vac. Sci. Technol. A 22, 1191–1194 (2004) https://doi.org/10.1116/1.1763910
J. Vac. Sci. Technol. A 22, 1195–1199 (2004) https://doi.org/10.1116/1.1763911
J. Vac. Sci. Technol. A 22, 1200–1207 (2004) https://doi.org/10.1116/1.1763912
J. Vac. Sci. Technol. A 22, 1208–1217 (2004) https://doi.org/10.1116/1.1763913
J. Vac. Sci. Technol. A 22, 1218–1222 (2004) https://doi.org/10.1116/1.1761071
J. Vac. Sci. Technol. A 22, 1223–1228 (2004) https://doi.org/10.1116/1.1764820
J. Vac. Sci. Technol. A 22, 1229–1234 (2004) https://doi.org/10.1116/1.1763907
J. Vac. Sci. Technol. A 22, 1235–1241 (2004) https://doi.org/10.1116/1.1763908
J. Vac. Sci. Technol. A 22, 1242–1259 (2004) https://doi.org/10.1116/1.1764821
J. Vac. Sci. Technol. A 22, 1260–1274 (2004) https://doi.org/10.1116/1.1764822
J. Vac. Sci. Technol. A 22, 1275–1284 (2004) https://doi.org/10.1116/1.1761072
J. Vac. Sci. Technol. A 22, 1285–1289 (2004) https://doi.org/10.1116/1.1764819

BRIEF REPORTS AND COMMENTS

J. Vac. Sci. Technol. A 22, 1290–1292 (2004) https://doi.org/10.1116/1.1765133

Papers from the 50th International Symposium of AVS

Applied Surface Science
J. Vac. Sci. Technol. A 22, 1297–1300 (2004) https://doi.org/10.1116/1.1735867
J. Vac. Sci. Technol. A 22, 1301–1308 (2004) https://doi.org/10.1116/1.1755714
J. Vac. Sci. Technol. A 22, 1309–1314 (2004) https://doi.org/10.1116/1.1701867
J. Vac. Sci. Technol. A 22, 1315–1318 (2004) https://doi.org/10.1116/1.1759350
J. Vac. Sci. Technol. A 22, 1319–1325 (2004) https://doi.org/10.1116/1.1701866
J. Vac. Sci. Technol. A 22, 1326–1330 (2004) https://doi.org/10.1116/1.1701865
J. Vac. Sci. Technol. A 22, 1331–1336 (2004) https://doi.org/10.1116/1.1763904
High-k Gate Dielectrics and Devices Topical Conference
J. Vac. Sci. Technol. A 22, 1337–1341 (2004) https://doi.org/10.1116/1.1705593
J. Vac. Sci. Technol. A 22, 1342–1346 (2004) https://doi.org/10.1116/1.1760751
J. Vac. Sci. Technol. A 22, 1347–1350 (2004) https://doi.org/10.1116/1.1743119
Electronic Materials and Devices
J. Vac. Sci. Technol. A 22, 1351–1355 (2004) https://doi.org/10.1116/1.1705644
J. Vac. Sci. Technol. A 22, 1356–1360 (2004) https://doi.org/10.1116/1.1765657
J. Vac. Sci. Technol. A 22, 1361–1370 (2004) https://doi.org/10.1116/1.1688364
Magnetic Interfaces and Nanostructures
J. Vac. Sci. Technol. A 22, 1371–1374 (2004) https://doi.org/10.1116/1.1692250
J. Vac. Sci. Technol. A 22, 1375–1378 (2004) https://doi.org/10.1116/1.1743087
J. Vac. Sci. Technol. A 22, 1379–1382 (2004) https://doi.org/10.1116/1.1690254
Microelectromechanical Systems (MEMS)
J. Vac. Sci. Technol. A 22, 1383–1387 (2004) https://doi.org/10.1116/1.1690255
J. Vac. Sci. Technol. A 22, 1388–1396 (2004) https://doi.org/10.1116/1.1743050
J. Vac. Sci. Technol. A 22, 1397–1405 (2004) https://doi.org/10.1116/1.1738659
Manufacturing Science and Technology
J. Vac. Sci. Technol. A 22, 1406–1409 (2004) https://doi.org/10.1116/1.1760752
J. Vac. Sci. Technol. A 22, 1410–1414 (2004) https://doi.org/10.1116/1.1705592
J. Vac. Sci. Technol. A 22, 1415–1419 (2004) https://doi.org/10.1116/1.1688365
J. Vac. Sci. Technol. A 22, 1420–1424 (2004) https://doi.org/10.1116/1.1705640
Nanometer Structures
J. Vac. Sci. Technol. A 22, 1425–1427 (2004) https://doi.org/10.1116/1.1759353
J. Vac. Sci. Technol. A 22, 1428–1432 (2004) https://doi.org/10.1116/1.1764818
J. Vac. Sci. Technol. A 22, 1433–1438 (2004) https://doi.org/10.1116/1.1690259
J. Vac. Sci. Technol. A 22, 1439–1443 (2004) https://doi.org/10.1116/1.1692417
J. Vac. Sci. Technol. A 22, 1444–1449 (2004) https://doi.org/10.1116/1.1763898
Nanotubes
J. Vac. Sci. Technol. A 22, 1450–1454 (2004) https://doi.org/10.1116/1.1705588
J. Vac. Sci. Technol. A 22, 1455–1460 (2004) https://doi.org/10.1116/1.1743143
J. Vac. Sci. Technol. A 22, 1461–1465 (2004) https://doi.org/10.1116/1.1735908
J. Vac. Sci. Technol. A 22, 1466–1470 (2004) https://doi.org/10.1116/1.1705587
J. Vac. Sci. Technol. A 22, 1471–1476 (2004) https://doi.org/10.1116/1.1752895
Contacts to Organic Materials Topical Conference
J. Vac. Sci. Technol. A 22, 1477–1481 (2004) https://doi.org/10.1116/1.1701860
J. Vac. Sci. Technol. A 22, 1482–1487 (2004) https://doi.org/10.1116/1.1752897
J. Vac. Sci. Technol. A 22, 1488–1492 (2004) https://doi.org/10.1116/1.1688363
Plasma Science and Technology
J. Vac. Sci. Technol. A 22, 1493–1499 (2004) https://doi.org/10.1116/1.1692396
J. Vac. Sci. Technol. A 22, 1500–1505 (2004) https://doi.org/10.1116/1.1690258
J. Vac. Sci. Technol. A 22, 1506–1512 (2004) https://doi.org/10.1116/1.1723338
J. Vac. Sci. Technol. A 22, 1513–1518 (2004) https://doi.org/10.1116/1.1701858
J. Vac. Sci. Technol. A 22, 1519–1523 (2004) https://doi.org/10.1116/1.1764816
J. Vac. Sci. Technol. A 22, 1524–1529 (2004) https://doi.org/10.1116/1.1705641
Plasma Science and Technology I
J. Vac. Sci. Technol. A 22, 1530–1535 (2004) https://doi.org/10.1116/1.1752894
J. Vac. Sci. Technol. A 22, 1536–1539 (2004) https://doi.org/10.1116/1.1763905
J. Vac. Sci. Technol. A 22, 1540–1545 (2004) https://doi.org/10.1116/1.1759349
J. Vac. Sci. Technol. A 22, 1546–1551 (2004) https://doi.org/10.1116/1.1764815
Plasma Science and Technology II
J. Vac. Sci. Technol. A 22, 1552–1558 (2004) https://doi.org/10.1116/1.1705590
J. Vac. Sci. Technol. A 22, 1559–1563 (2004) https://doi.org/10.1116/1.1701859
QSA-10 Topical Conference
J. Vac. Sci. Technol. A 22, 1564–1571 (2004) https://doi.org/10.1116/1.1705594
J. Vac. Sci. Technol. A 22, 1572–1578 (2004) https://doi.org/10.1116/1.1701864
J. Vac. Sci. Technol. A 22, 1579–1586 (2004) https://doi.org/10.1116/1.1765134
Semiconductors
J. Vac. Sci. Technol. A 22, 1587–1590 (2004) https://doi.org/10.1116/1.1759348
J. Vac. Sci. Technol. A 22, 1591–1595 (2004) https://doi.org/10.1116/1.1705643
J. Vac. Sci. Technol. A 22, 1596–1599 (2004) https://doi.org/10.1116/1.1705589
J. Vac. Sci. Technol. A 22, 1600–1605 (2004) https://doi.org/10.1116/1.1752896
J. Vac. Sci. Technol. A 22, 1606–1609 (2004) https://doi.org/10.1116/1.1764814
Advanced Surface Engineering
J. Vac. Sci. Technol. A 22, 1610–1614 (2004) https://doi.org/10.1116/1.1701863
Surface Science
J. Vac. Sci. Technol. A 22, 1615–1619 (2004) https://doi.org/10.1116/1.1692318
J. Vac. Sci. Technol. A 22, 1620–1624 (2004) https://doi.org/10.1116/1.1756881
J. Vac. Sci. Technol. A 22, 1625–1630 (2004) https://doi.org/10.1116/1.1743254
J. Vac. Sci. Technol. A 22, 1631–1635 (2004) https://doi.org/10.1116/1.1723308
J. Vac. Sci. Technol. A 22, 1636–1639 (2004) https://doi.org/10.1116/1.1752892
J. Vac. Sci. Technol. A 22, 1640–1646 (2004) https://doi.org/10.1116/1.1701862
Surface Science I
J. Vac. Sci. Technol. A 22, 1647–1651 (2004) https://doi.org/10.1116/1.1690253
J. Vac. Sci. Technol. A 22, 1652–1658 (2004) https://doi.org/10.1116/1.1705591
J. Vac. Sci. Technol. A 22, 1659–1666 (2004) https://doi.org/10.1116/1.1735887
J. Vac. Sci. Technol. A 22, 1667–1670 (2004) https://doi.org/10.1116/1.1760750
Surface Science II
J. Vac. Sci. Technol. A 22, 1671–1674 (2004) https://doi.org/10.1116/1.1705647
J. Vac. Sci. Technol. A 22, 1675–1681 (2004) https://doi.org/10.1116/1.1763900
J. Vac. Sci. Technol. A 22, 1682–1689 (2004) https://doi.org/10.1116/1.1756880
Surface Science III
J. Vac. Sci. Technol. A 22, 1690–1696 (2004) https://doi.org/10.1116/1.1763899
Thin Films
J. Vac. Sci. Technol. A 22, 1697–1704 (2004) https://doi.org/10.1116/1.1723289
J. Vac. Sci. Technol. A 22, 1705–1710 (2004) https://doi.org/10.1116/1.1765658
J. Vac. Sci. Technol. A 22, 1711–1715 (2004) https://doi.org/10.1116/1.1759351
J. Vac. Sci. Technol. A 22, 1716–1722 (2004) https://doi.org/10.1116/1.1705646
J. Vac. Sci. Technol. A 22, 1723–1725 (2004) https://doi.org/10.1116/1.1756879
J. Vac. Sci. Technol. A 22, 1726–1729 (2004) https://doi.org/10.1116/1.1692270
J. Vac. Sci. Technol. A 22, 1730–1733 (2004) https://doi.org/10.1116/1.1705642
J. Vac. Sci. Technol. A 22, 1734–1738 (2004) https://doi.org/10.1116/1.1692231
J. Vac. Sci. Technol. A 22, 1739–1742 (2004) https://doi.org/10.1116/1.1759352
J. Vac. Sci. Technol. A 22, 1743–1745 (2004) https://doi.org/10.1116/1.1752893
J. Vac. Sci. Technol. A 22, 1746–1750 (2004) https://doi.org/10.1116/1.1764813
J. Vac. Sci. Technol. A 22, 1751–1756 (2004) https://doi.org/10.1116/1.1763902
J. Vac. Sci. Technol. A 22, 1757–1762 (2004) https://doi.org/10.1116/1.1763903
J. Vac. Sci. Technol. A 22, 1763–1766 (2004) https://doi.org/10.1116/1.1764812
J. Vac. Sci. Technol. A 22, 1767–1772 (2004) https://doi.org/10.1116/1.1692341
J. Vac. Sci. Technol. A 22, 1773–1777 (2004) https://doi.org/10.1116/1.1766035
J. Vac. Sci. Technol. A 22, 1778–1784 (2004) https://doi.org/10.1116/1.1743178
J. Vac. Sci. Technol. A 22, 1785–1787 (2004) https://doi.org/10.1116/1.1705648
Thin Films I
J. Vac. Sci. Technol. A 22, 1788–1792 (2004) https://doi.org/10.1116/1.1692366
Thin Films II
J. Vac. Sci. Technol. A 22, 1793–1798 (2004) https://doi.org/10.1116/1.1764817
Vacuum Technology
J. Vac. Sci. Technol. A 22, 1799–1803 (2004) https://doi.org/10.1116/1.1735844
J. Vac. Sci. Technol. A 22, 1804–1809 (2004) https://doi.org/10.1116/1.1738661
J. Vac. Sci. Technol. A 22, 1810–1815 (2004) https://doi.org/10.1116/1.1701861
J. Vac. Sci. Technol. A 22, 1816–1819 (2004) https://doi.org/10.1116/1.1735935
J. Vac. Sci. Technol. A 22, 1820–1827 (2004) https://doi.org/10.1116/1.1743218
J. Vac. Sci. Technol. A 22, 1828–1835 (2004) https://doi.org/10.1116/1.1705639
Applied Surface Science/Biomaterials Characterization
J. Vac. Sci. Technol. A 22, 1836–1841 (2004) https://doi.org/10.1116/1.1738662
Electrochemistry and Fluid Solid Interfaces/Water at Interfaces
J. Vac. Sci. Technol. A 22, 1842–1846 (2004) https://doi.org/10.1116/1.1690257
Electronic Materials and Devices/Poster Session
J. Vac. Sci. Technol. A 22, 1847–1851 (2004) https://doi.org/10.1116/1.1690256
J. Vac. Sci. Technol. A 22, 1852–1856 (2004) https://doi.org/10.1116/1.1738658
J. Vac. Sci. Technol. A 22, 1857–1861 (2004) https://doi.org/10.1116/1.1756878
Magnetic Interfaces and Nanostructures/Semiconductor Spin Injection
J. Vac. Sci. Technol. A 22, 1862–1867 (2004) https://doi.org/10.1116/1.1692202
Magnetic Interfaces and Nanostructures/Magnetic Thin Films
J. Vac. Sci. Technol. A 22, 1868–1872 (2004) https://doi.org/10.1116/1.1692292
Processing at the Nanoscale/Nanoscale Patterning and Lithography
J. Vac. Sci. Technol. A 22, 1873–1878 (2004) https://doi.org/10.1116/1.1756882
J. Vac. Sci. Technol. A 22, 1879–1884 (2004) https://doi.org/10.1116/1.1723269
Organic Films and Devices/Molecular and Organic Films
J. Vac. Sci. Technol. A 22, 1885–1891 (2004) https://doi.org/10.1116/1.1759347
J. Vac. Sci. Technol. A 22, 1892–1895 (2004) https://doi.org/10.1116/1.1766304
Plasma Science and Technology/MEMS Etching
J. Vac. Sci. Technol. A 22, 1896–1902 (2004) https://doi.org/10.1116/1.1738660
Plasma Science and Technology/Poster Session
J. Vac. Sci. Technol. A 22, 1903–1907 (2004) https://doi.org/10.1116/1.1738663
Semiconductors/Poster Session
J. Vac. Sci. Technol. A 22, 1908–1911 (2004) https://doi.org/10.1116/1.1705645
Semiconductors/Low Dimensional Structures
J. Vac. Sci. Technol. A 22, 1912–1916 (2004) https://doi.org/10.1116/1.1759346
Surface Science/Self-Assembled Monolayers
J. Vac. Sci. Technol. A 22, 1917–1925 (2004) https://doi.org/10.1116/1.1763901
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