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REVIEW ARTICLE

Vibrational spectroscopy of interfaces by infrared–visible sum frequency generation

M. Buck; M. Himmelhaus

J. Vac. Sci. Technol. A 19, 2717–2736 (2001) https://doi.org/10.1116/1.1414120

Abstract

View articletitled, Vibrational spectroscopy of interfaces by infrared–visible sum frequency generation

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ARTICLES

Impression of high voltage pulses on substrate in pulsed laser deposition

T. Ikegami; M. Nakao; T. Ohsima; K. Ebihara; S. Aoqui

J. Vac. Sci. Technol. A 19, 2737–2740 (2001) https://doi.org/10.1116/1.1401744

Abstract

View articletitled, Impression of high voltage pulses on substrate in pulsed laser deposition

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Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets

C. E. Wickersham, Jr.; J. E. Poole; J. S. Fan; L. Zhu

J. Vac. Sci. Technol. A 19, 2741–2750 (2001) https://doi.org/10.1116/1.1403718

Abstract

View articletitled, Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets

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Spectroscopic study of plasma using zirconium tetra-tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide

Byeong-Ok Cho; Sandy Lao; Lin Sha; Jane P. Chang

J. Vac. Sci. Technol. A 19, 2751–2761 (2001) https://doi.org/10.1116/1.1403717

Abstract

View articletitled, Spectroscopic study of plasma using zirconium tetra-tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide

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Development of tin oxide synthesis by plasma-enhanced chemical vapor deposition

Joshua J. Robbins; Robert T. Alexander; Mailasu Bai; Yen-Jung Huang; Tyrone L. Vincent; Colin A. Wolden

J. Vac. Sci. Technol. A 19, 2762–2766 (2001) https://doi.org/10.1116/1.1403716

Abstract

View articletitled, Development of tin oxide synthesis by plasma-enhanced chemical vapor deposition

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Measurements of the critical inclusion size for arcing and macroparticle ejection from aluminum sputtering targets

C. E. Wickersham, Jr.; J. E. Poole; A. Leybovich; L. Zhu

J. Vac. Sci. Technol. A 19, 2767–2772 (2001) https://doi.org/10.1116/1.1403719

Abstract

View articletitled, Measurements of the critical inclusion size for arcing and macroparticle ejection from aluminum sputtering targets

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Plasma immersion ion cleaning of oxidized steel surfaces using hexafluoroethane and argon plasmas

A. M. Peters; M. Nastasi

J. Vac. Sci. Technol. A 19, 2773–2778 (2001) https://doi.org/10.1116/1.1403720

Abstract

View articletitled, Plasma immersion ion cleaning of oxidized steel surfaces using hexafluoroethane and argon plasmas

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Crystallization kinetics in amorphous $({Zr}_{0.62} {Al}_{0.38}) O_{1.8}$ thin films

R. B. van Dover; D. V. Lang; M. L. Green; L. Manchanda

J. Vac. Sci. Technol. A 19, 2779–2784 (2001) https://doi.org/10.1116/1.1403715

Abstract

View articletitled, Crystallization kinetics in amorphous <math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">(</mi><msub xmlns=""><mi mathvariant="normal">Zr</mi><mrow><mtext>0.62</mtext></mrow></msub><msub xmlns=""><mi mathvariant="normal">Al</mi><mrow><mtext>0.38</mtext></mrow></msub><mi xmlns="">)</mi><msub xmlns=""><mi mathvariant="normal">O</mi><mrow><mtext>1.8</mtext></mrow></msub></math> thin films

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Modeling of the slip flow in the spiral grooves of a molecular pump

Yeng-Yung Tsui; Chia-Ping Kung; Hong-Ping Cheng

J. Vac. Sci. Technol. A 19, 2785–2790 (2001) https://doi.org/10.1116/1.1405510

Abstract

View articletitled, Modeling of the slip flow in the spiral grooves of a molecular pump

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Direct correlation of x-ray photoelectron spectroscopy and Fourier transform infrared spectra and images from poly(vinyl chloride)/poly(methyl methacrylate) polymer blends

K. Artyushkova; B. Wall; J. Koenig; J. E. Fulghum

J. Vac. Sci. Technol. A 19, 2791–2799 (2001) https://doi.org/10.1116/1.1405512

Abstract

View articletitled, Direct correlation of x-ray photoelectron spectroscopy and Fourier transform infrared spectra and images from poly(vinyl chloride)/poly(methyl methacrylate) polymer blends

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Spectroscopic ellipsometry measurements of chromium nitride coatings

S. M. Aouadi; D. M. Mihut; M. L. Kuruppu; S. R. Kirkpatrick; S. L. Rohde

J. Vac. Sci. Technol. A 19, 2800–2804 (2001) https://doi.org/10.1116/1.1405513

Abstract

View articletitled, Spectroscopic ellipsometry measurements of chromium nitride coatings

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Estimates of differential sputtering yields for deposition applications

M. Stepanova; S. K. Dew

J. Vac. Sci. Technol. A 19, 2805–2816 (2001) https://doi.org/10.1116/1.1405515

Abstract

View articletitled, Estimates of differential sputtering yields for deposition applications

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Deposition of amorphous and microcrystalline silicon using a graphite filament in the hot wire chemical vapor deposition technique

Scott Morrison; Arun Madan

J. Vac. Sci. Technol. A 19, 2817–2819 (2001) https://doi.org/10.1116/1.1405514

Abstract

View articletitled, Deposition of amorphous and microcrystalline silicon using a graphite filament in the hot wire chemical vapor deposition technique

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Influence of ion stimulated gas desorption from residual gas analyzer on partial pressure measurement

Satoshi Kurokouchi; Shigeki Kato

J. Vac. Sci. Technol. A 19, 2820–2825 (2001) https://doi.org/10.1116/1.1407241

Abstract

View articletitled, Influence of ion stimulated gas desorption from residual gas analyzer on partial pressure measurement

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Sound velocity and Young’s modulus in plasma deposited amorphous hydrogenated carbon

R. O. Dillon; Abbas Ali; N. J. Ianno; A. Ahmad; T. Furtak

J. Vac. Sci. Technol. A 19, 2826–2830 (2001) https://doi.org/10.1116/1.1407242

Abstract

View articletitled, Sound velocity and Young’s modulus in plasma deposited amorphous hydrogenated carbon

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Study on the characteristics of TiAlN thin film deposited by atomic layer deposition method

Jaehyoung Koo; June-Woo Lee; Taehan Doh; Yangdo Kim; Young-Do Kim; Hyeongtag Jeon

J. Vac. Sci. Technol. A 19, 2831–2834 (2001) https://doi.org/10.1116/1.1409375

Abstract

View articletitled, Study on the characteristics of TiAlN thin film deposited by atomic layer deposition method

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Deposition of diamond films at low pressure in a planar large-area microwave surface wave plasma source

W. Y. Yeh; J. Hwang; T. J. Wu; W. J. Guan; C. S. Kou; H. Chang

J. Vac. Sci. Technol. A 19, 2835–2839 (2001) https://doi.org/10.1116/1.1409378

Abstract

View articletitled, Deposition of diamond films at low pressure in a planar large-area microwave surface wave plasma source

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Initial growth step and annealing effect of ${Ta}_{2} O_{5}$ formed by anodization of Ta foil in an ammonium tartrate electrolyte

Kwang-Soon Ahn; Yung-Eun Sung

J. Vac. Sci. Technol. A 19, 2840–2845 (2001) https://doi.org/10.1116/1.1409377

Abstract

View articletitled, Initial growth step and annealing effect of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="bold">Ta</mi><mrow><mi mathvariant="bold">2</mi></mrow></msub><msub xmlns=""><mi mathvariant="bold">O</mi><mrow><mi mathvariant="bold">5</mi></mrow></msub></math> formed by anodization of Ta foil in an ammonium tartrate electrolyte

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A new look at the steel cord–rubber adhesive interphase by chemical depth profiling

G. E. Hammer

J. Vac. Sci. Technol. A 19, 2846–2850 (2001) https://doi.org/10.1116/1.1410945

Abstract

View articletitled, A new look at the steel cord–rubber adhesive interphase by chemical depth profiling

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Ion kinetic energy control in dual plasma deposition of thin films

L. P. Wang; B. Y. Tang; K. Y. Gan; X. B. Tian; P. K. Chu

J. Vac. Sci. Technol. A 19, 2851–2855 (2001) https://doi.org/10.1116/1.1410947

Abstract

View articletitled, Ion kinetic energy control in dual plasma deposition of thin films

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Studies of mid-frequency pulsed dc biasing

P. J. Kelly; R. Hall; J. O’Brien; J. W. Bradley; P. Henderson; G. Roche; R. D. Arnell

J. Vac. Sci. Technol. A 19, 2856–2865 (2001) https://doi.org/10.1116/1.1410949

Abstract

View articletitled, Studies of mid-frequency pulsed dc biasing

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Dynamics and thermal stability of Cs superstructures on a Pt(111) surface

Takahiro Kondo; Hiroyuki Kozakai; Takashi Sasaki; Shigehiko Yamamoto

J. Vac. Sci. Technol. A 19, 2866–2869 (2001) https://doi.org/10.1116/1.1410946

Abstract

View articletitled, Dynamics and thermal stability of Cs superstructures on a Pt(111) surface

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Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering

S. Venkataraj; Jean Geurts; Hansjörg Weis; Oliver Kappertz; Walter K. Njoroge; R. Jayavel; Matthias Wuttig

J. Vac. Sci. Technol. A 19, 2870–2878 (2001) https://doi.org/10.1116/1.1410948

Abstract

View articletitled, Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering

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Fabrication and characterization of C implantation standards for ${Si}_{1−x−y} {Ge}_{x} C_{y}$ alloys

T. Laursen; D. Chandrasekhar; R. L. Hervig; J. W. Mayer; David J. Smith; C. Jasper

J. Vac. Sci. Technol. A 19, 2879–2883 (2001) https://doi.org/10.1116/1.1412652

Abstract

View articletitled, Fabrication and characterization of C implantation standards for <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Si</mi><mrow><mtext>1−x−y</mtext></mrow></msub><msub xmlns=""><mi mathvariant="normal">Ge</mi><mrow><mi>x</mi></mrow></msub><msub xmlns=""><mi mathvariant="normal">C</mi><mrow><mi>y</mi></mrow></msub></math> alloys

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Micromachined piezoresistive cantilever array with integrated resistive microheater for calorimetry and mass detection

N. Abedinov; P. Grabiec; T. Gotszalk; Tz. Ivanov; J. Voigt; I. W. Rangelow

J. Vac. Sci. Technol. A 19, 2884–2888 (2001) https://doi.org/10.1116/1.1412654

Abstract

View articletitled, Micromachined piezoresistive cantilever array with integrated resistive microheater for calorimetry and mass detection

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Steady-state direct-current plasma immersion ion implantation using a multipolar magnetic field electron cyclotron resonance plasma source

Xuchu Zeng; Honghui Tong; Ricky King-Yu Fu; Paul K. Chu; Zejin Xu; Qingchuan Chen

J. Vac. Sci. Technol. A 19, 2889–2892 (2001) https://doi.org/10.1116/1.1412653

Abstract

View articletitled, Steady-state direct-current plasma immersion ion implantation using a multipolar magnetic field electron cyclotron resonance plasma source

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Wall-dependent etching characteristics of organic antireflection coating in $O_{2} + halogen/hydrogen$ halide plasma

Songlin Xu; Thorsten Lill; Dragan Podlesnik

J. Vac. Sci. Technol. A 19, 2893–2899 (2001) https://doi.org/10.1116/1.1412655

Abstract

View articletitled, Wall-dependent etching characteristics of organic antireflection coating in <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">O</mi><mrow><mn>2</mn></mrow></msub><mi xmlns="">+</mi><mi mathvariant="normal" xmlns="">halogen/hydrogen</mi></math> halide plasma

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Analytic expressions of the speed factor for turbomolecular pumps

Yu-Wen Chang; Rong-Yuan Jou

J. Vac. Sci. Technol. A 19, 2900–2904 (2001) https://doi.org/10.1116/1.1414123

Abstract

View articletitled, Analytic expressions of the speed factor for turbomolecular pumps

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Effect of substrate–film lattice mismatch in ${La}_{0.7} {Ba}_{0.3} {MnO}_{3−δ}$ thin films for transport properties

K. Hayashi; E. Ohta; H. Wada

J. Vac. Sci. Technol. A 19, 2905–2909 (2001) https://doi.org/10.1116/1.1414124

Abstract

View articletitled, Effect of substrate–film lattice mismatch in <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">La</mi><mrow><mi mathvariant="normal">0.7</mi></mrow></msub><msub xmlns=""><mi mathvariant="normal">Ba</mi><mrow><mi mathvariant="normal">0.3</mi></mrow></msub><msub xmlns=""><mi mathvariant="normal">MnO</mi><mrow><mtext>3−δ</mtext></mrow></msub></math> thin films for transport properties

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Real-time/in situ diffraction study of phase and microstructural evolution in sputtered ${β-Ta/Ta}_{2} O_{5}$ films

J. F. Whitacre; S. M. Yalisove; J. C. Bilello

J. Vac. Sci. Technol. A 19, 2910–2919 (2001) https://doi.org/10.1116/1.1414119

Abstract

View articletitled, Real-time/in situ diffraction study of phase and microstructural evolution in sputtered <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">β-Ta/Ta</mi><mrow><mi mathvariant="normal">2</mi></mrow></msub><msub xmlns=""><mi mathvariant="normal">O</mi><mrow><mi mathvariant="normal">5</mi></mrow></msub></math> films

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Diamond-based composite layers as protective coatings for ion beam extraction systems

M. L. Terranova; V. Sessa; S. Piccirillo; M. Rossi; S. Valeri; M. Materassi

J. Vac. Sci. Technol. A 19, 2920–2924 (2001) https://doi.org/10.1116/1.1414121

Abstract

View articletitled, Diamond-based composite layers as protective coatings for ion beam extraction systems

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Influence of the elemental composition and crystal structure on the vacuum properties of Ti–Zr–V nonevaporable getter films

C. Benvenuti; P. Chiggiato; A. Mongelluzzo; A. Prodromides; V. Ruzinov; C. Scheuerlein; M. Taborelli; F. Lévy

J. Vac. Sci. Technol. A 19, 2925–2930 (2001) https://doi.org/10.1116/1.1414122

Abstract

View articletitled, Influence of the elemental composition and crystal structure on the vacuum properties of Ti–Zr–V nonevaporable getter films

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Photocatalytic, antifogging mirror

K. Takagi; T. Makimoto; H. Hiraiwa; T. Negishi

J. Vac. Sci. Technol. A 19, 2931–2935 (2001) https://doi.org/10.1116/1.1415357

Abstract

View articletitled, Photocatalytic, antifogging mirror

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Application of magnetic neutral loop discharge plasma in deep silica etching

W. Chen; K. Sugita; Y. Morikawa; S. Yasunami; T. Hayashi; T. Uchida

J. Vac. Sci. Technol. A 19, 2936–2940 (2001) https://doi.org/10.1116/1.1415355

Abstract

View articletitled, Application of magnetic neutral loop discharge plasma in deep silica etching

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Reaction of gas-phase atomic hydrogen with NO on Ru(001)

Tae Won Kim; Michael J. Weiss; Chrisopher J. Hagedorn; W. Henry Weinberg

J. Vac. Sci. Technol. A 19, 2941–2945 (2001) https://doi.org/10.1116/1.1415358

Abstract

View articletitled, Reaction of gas-phase atomic hydrogen with NO on Ru(001)

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Gas-phase studies in inductively coupled fluorocarbon plasmas

M. Schaepkens; I. Martini; E. A. Sanjuan; X. Li; G. S. Oehrlein; W. L. Perry; H. M. Anderson

J. Vac. Sci. Technol. A 19, 2946–2957 (2001) https://doi.org/10.1116/1.1415361

Abstract

View articletitled, Gas-phase studies in inductively coupled fluorocarbon plasmas

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Inner surface coating of TiN by the grid-enhanced plasma source ion implantation technique

Bin Liu; Guling Zhang; Dajung Cheng; Chizi Liu; Rui He; Si-Ze Yang

J. Vac. Sci. Technol. A 19, 2958–2962 (2001) https://doi.org/10.1116/1.1415356

Abstract

View articletitled, Inner surface coating of TiN by the grid-enhanced plasma source ion implantation technique

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Characteristics of a taper-seal type gasket for the Conflat^® sealing system

Satoshi Kurokouchi; Shinsaku Morita; Masayuki Okabe

J. Vac. Sci. Technol. A 19, 2963–2967 (2001) https://doi.org/10.1116/1.1415359

Abstract

View articletitled, Characteristics of a taper-seal type gasket for the Conflat® sealing system

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Investigation of diamond film deposition on steel without and with ion beam nitriding pretreatment

N. G. Shang; C. H. Lee; X. T. Zhou; F. Y. Meng; C. Y. Chan; S. T. Lee; I. Bello

J. Vac. Sci. Technol. A 19, 2968–2973 (2001) https://doi.org/10.1116/1.1415360

Abstract

View articletitled, Investigation of diamond film deposition on steel without and with ion beam nitriding pretreatment

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BRIEF REPORTS AND COMMENTS

Chemical vapor deposition of an electroplating Cu seed layer using hexafluoroacetylacetonate Cu(1,5-dimethylcyclooctadiene)

W. H. Lee; Y. K. Ko; I. J. Byun; B. S. Seo; J. G. Lee; P. J. Reucroft; J. U. Lee; J. Y. Lee

J. Vac. Sci. Technol. A 19, 2974–2978 (2001) https://doi.org/10.1116/1.1405511

Abstract

View articletitled, Chemical vapor deposition of an electroplating Cu seed layer using hexafluoroacetylacetonate Cu(1,5-dimethylcyclooctadiene)

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RAPID COMMUNICATIONS

Preferential resputtering phenomenon on the surface of (100)-oriented Ni–Pt films: Effect of substrate bias during sputter deposition

J. Shi; R. Zhou; M. Hashimoto

J. Vac. Sci. Technol. A 19, 2979–2981 (2001) https://doi.org/10.1116/1.1407243

Abstract

View articletitled, Preferential resputtering phenomenon on the surface of (100)-oriented Ni–Pt films: Effect of substrate bias during sputter deposition

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SHOP NOTES

Reduction of artifacts in temperature programmed desorption measurements of field generated, real-life, powered samples

V. S. Smentkowski; A. L. Linsebigler

J. Vac. Sci. Technol. A 19, 2982–2986 (2001) https://doi.org/10.1116/1.1409376

Abstract

View articletitled, Reduction of artifacts in temperature programmed desorption measurements of field generated, real-life, powered samples

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